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Wafer stage for symmetric wafer processing
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Patent number 9,863,036
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Issue date Jan 9, 2018
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Plasma-Therm NES LLC
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Sarpangala H. Hegde
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Compact, filtered ion source
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Patent number 9,624,570
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Issue date Apr 18, 2017
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FLUXION INC.
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Paul Erik Sathrum
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Proximity deposition
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Patent number 6,926,935
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Issue date Aug 9, 2005
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FEI Company
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Jason Harrison Arjavac
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Cold cathode element
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Issue date Jul 2, 2002
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Honda Giken Kogyo Kabushiki Kaisha
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Takashi Iwasa
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma processing system and method
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Patent number 6,368,678
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Issue date Apr 9, 2002
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Terry Bluck
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Plasma processing system and method
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Patent number 6,101,972
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Issue date Aug 15, 2000
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Intevac, Inc.
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Terry Bluck
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Ion source based on the cathodic arc
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Issue date Feb 1, 1994
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The United States of America as represented by the United States Department o...
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David M. Sanders
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Filtered cathodic arc source
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Issue date Jan 18, 1994
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as represented by the United States Department of Energy
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Steven Falabella
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...