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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

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H01J2237/3325large area

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Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment device and structure of reaction vessel for plasma...
- Patent number 11,225,718
- Issue date Jan 18, 2022
- CORE TECHNOLOGY, INC.
- Toshiaki Yoshimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hollow cathode plasma source
- Patent number 10,586,685
- Issue date Mar 10, 2020
- AGC GLASS EUROPE
- Thomas Biquet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hollow cathode plasma source
- Patent number 10,535,503
- Issue date Jan 14, 2020
- AGC GLASS EUROPE
- Thomas Biquet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma uniformity control by gas diffuser hole design
- Patent number 10,312,058
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma uniformity control by gas diffuser hole design
- Patent number 10,262,837
- Issue date Apr 16, 2019
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus of high frequency plasma
- Patent number 9,741,541
- Issue date Aug 22, 2017
- Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan,...
- Hsin-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PECVD process chamber backing plate reinforcement
- Patent number 8,733,279
- Issue date May 27, 2014
- Applied Materials, Inc.
- John M. White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma excitation module
- Patent number 8,604,696
- Issue date Dec 10, 2013
- Industrial Technology Research Institute
- Tung-Ying Lin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Coater with a large-area assembly of rotatable magnetrons
- Patent number 8,137,510
- Issue date Mar 20, 2012
- Applied Materials GmbH & Co. KG
- Stefan Bangert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma uniformity control by gas diffuser hole design
- Patent number 8,083,853
- Issue date Dec 27, 2011
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, method for producing reaction vessel f...
- Patent number 7,543,546
- Issue date Jun 9, 2009
- Matsushita Electric Works, Ltd.
- Tetsuji Shibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for in-situ film stack processing
- Patent number 7,358,192
- Issue date Apr 15, 2008
- Applied Materials, Inc.
- Walter R. Merry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing flat panels
- Patent number 6,679,977
- Issue date Jan 20, 2004
- Unakis Trading AG
- Walter Haag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface-treated shower head for use in a substrate processing chamber
- Patent number 6,647,993
- Issue date Nov 18, 2003
- Applied Komatsu Technology, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputtering source
- Patent number 6,454,920
- Issue date Sep 24, 2002
- Unaxis Trading AG
- Walter Haag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of producing flat panels
- Patent number 6,284,106
- Issue date Sep 4, 2001
- Unaxis Trading AG
- Walter Haag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface-treated shower head for use in a substrate processing chamber
- Patent number 6,182,603
- Issue date Feb 6, 2001
- Applied Komatsu Technology, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputtering source
- Patent number 6,093,293
- Issue date Jul 25, 2000
- Balzers Hochvakuum AG
- Walter Haag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density plasma physical vapor deposition
- Patent number 5,792,522
- Issue date Aug 11, 1998
- Intel Corporation
- Shu Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for continuously forming functional deposited...
- Patent number 5,527,391
- Issue date Jun 18, 1996
- Canon Kabushiki Kaisha
- Hiroshi Echizen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for continuously forming a large area functional deposited...
- Patent number 5,520,740
- Issue date May 28, 1996
- Canon Kabushiki Kaisha
- Masahiro Kanai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD apparatus including rotating magnetic field generation m...
- Patent number 5,423,915
- Issue date Jun 13, 1995
- Mitsubishi Jukogyo Kagushiki Kaisha
- Masayoshi Murata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for the coating of material on a substrate using a microw...
- Patent number 5,311,103
- Issue date May 10, 1994
- Board of Trustees operating Michigan State University
- Jes Asmussen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma system comprising hollow mesh plate electrode
- Patent number 5,304,250
- Issue date Apr 19, 1994
- Sony Corporation
- Toshiyuki Sameshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave PCVD method for continuously forming a large area functio...
- Patent number 5,130,170
- Issue date Jul 14, 1992
- Canon Kabushiki Kaisha
- Masahiro Kanai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for continuously forming functional deposited films with a l...
- Patent number 5,114,770
- Issue date May 19, 1992
- Canon Kabushiki Kaisha
- Hiroshi Echizen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for microwave glow discharge deposition
- Patent number 4,566,403
- Issue date Jan 28, 1986
- Sovonics Solar Systems
- Eugene Fournier
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for the manufacture of photovoltaic devices
- Patent number 4,515,107
- Issue date May 7, 1985
- Sovonics Solar Systems
- Eugene Fournier
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reduced capacitance electrode assembly
- Patent number 4,461,239
- Issue date Jul 24, 1984
- Energy Conversion Devices, Inc.
- Vincent D. Cannella
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Installation for depositing thin layers in the reactive vapor phase
- Patent number 4,434,742
- Issue date Mar 6, 1984
- Louis Henaff
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...
- Publication number 20230272530
- Publication date Aug 31, 2023
- Applied Materials, Inc.
- Suhail ANWAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AUTOMATED FEEDFORWARD AND FEEDBACK SEQUENCE FOR PATTERNING CD CONTROL
- Publication number 20230170195
- Publication date Jun 1, 2023
- LAM RESEARCH CORPORATION
- Ravi Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...
- Publication number 20200347499
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- Suhail ANWAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEAT CONDUCTIVE SPACER FOR PLASMA PROCESSING CHAMBER
- Publication number 20200098549
- Publication date Mar 26, 2020
- Applied Materials, Inc.
- Beom Soo PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA TREATMENT DEVICE AND STRUCTURE OF REACTION VESSEL FOR PLASMA...
- Publication number 20190048468
- Publication date Feb 14, 2019
- CORE TECHNOLOGY, INC.
- Toshiaki YOSHIMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Large Sized Showerhead Assembly
- Publication number 20180182598
- Publication date Jun 28, 2018
- TES CO., LTD.
- Jae-Hwan Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN
- Publication number 20180025890
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Soo Young CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HOLLOW CATHODE PLASMA SOURCE
- Publication number 20180025892
- Publication date Jan 25, 2018
- AGC GLASS EUROPE, S.A.
- Thomas BIQUET
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION SYSTEM USING BACKSIDE GAS COOLING OF WORK...
- Publication number 20170114448
- Publication date Apr 27, 2017
- TANGO SYSTEMS, INC.
- Ravi Mullapudi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION SYSTEM WITH TARGET MAGNETS CONTROLLED TO...
- Publication number 20170114447
- Publication date Apr 27, 2017
- TANGO SYSTEMS, INC.
- Ravi Mullapudi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN
- Publication number 20160056019
- Publication date Feb 25, 2016
- Applied Materials, Inc.
- Soo Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CVD APPARATUS, PLASMA CVD METHOD, REACTIVE SPUTTERING APPARA...
- Publication number 20140023796
- Publication date Jan 23, 2014
- TORAY INDUSTRIES, INC.
- Hiroe Ejiri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Uniformity Control By Gas Diffuser Hole Design
- Publication number 20110290183
- Publication date Dec 1, 2011
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma excitation module
- Publication number 20100156300
- Publication date Jun 24, 2010
- Industrial Technology Research Institute
- Tung-Ying Lin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PECVD PROCESS CHAMBER BACKING PLATE REINFORCEMENT
- Publication number 20080268173
- Publication date Oct 30, 2008
- John M. White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum Processing Chamber for Very Large Area Substrates
- Publication number 20080050536
- Publication date Feb 28, 2008
- OC OERLIKON BALZERS AG
- Phannara Aing
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER CHAMBER FOR COATING A SUBSTRATE
- Publication number 20070227882
- Publication date Oct 4, 2007
- Roland Trassl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and methods for deposition of graded materials on continuou...
- Publication number 20070148346
- Publication date Jun 28, 2007
- General Electric Company
- Tae Won Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma uniformity control by gas diffuser hole design
- Publication number 20060236934
- Publication date Oct 26, 2006
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma treatment apparatus, method of producing reaction vessel for...
- Publication number 20060042545
- Publication date Mar 2, 2006
- Tetsuji Shibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method of shaping profiles of large-area PECVD electr...
- Publication number 20060005771
- Publication date Jan 12, 2006
- APPLIED MATERIALS, INC.
- John M. White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Coater with a large-area assembly of rotatable magnetrons
- Publication number 20050252768
- Publication date Nov 17, 2005
- Applied Films GmbH & Co. KG
- Stefan Bangert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma uniformity control by gas diffuser hole design
- Publication number 20050251990
- Publication date Nov 17, 2005
- APPLIED MATERIALS, INC.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for in-situ film stack processing
- Publication number 20050224181
- Publication date Oct 13, 2005
- APPLIED MATERIALS, INC.
- Walter R. Merry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of producing flat panels
- Publication number 20030062255
- Publication date Apr 3, 2003
- Walter Haag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetron sputtering source
- Publication number 20020036133
- Publication date Mar 28, 2002
- Unaxis Trading AG
- Walter Haag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Surface-treated shower head for use in a substrate processing chamber
- Publication number 20010006070
- Publication date Jul 5, 2001
- Komatsu Technology, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma treatment device and structure of reaction vessel for plasma...

Hollow cathode plasma source

Hollow cathode plasma source

Plasma uniformity control by gas diffuser hole design

Plasma uniformity control by gas diffuser hole design

Apparatus of high frequency plasma

PECVD process chamber backing plate reinforcement

Plasma excitation module

Coater with a large-area assembly of rotatable magnetrons

Plasma uniformity control by gas diffuser hole design

Plasma processing apparatus, method for producing reaction vessel f...

Method and apparatus for in-situ film stack processing

Method of producing flat panels

Surface-treated shower head for use in a substrate processing chamber

Magnetron sputtering source

Method of producing flat panels

Surface-treated shower head for use in a substrate processing chamber

Magnetron sputtering source

High density plasma physical vapor deposition

Method and apparatus for continuously forming functional deposited...

Process for continuously forming a large area functional deposited...

Plasma CVD apparatus including rotating magnetic field generation m...

Apparatus for the coating of material on a substrate using a microw...

Plasma system comprising hollow mesh plate electrode

Microwave PCVD method for continuously forming a large area functio...

Method for continuously forming functional deposited films with a l...

Apparatus for microwave glow discharge deposition

Apparatus for the manufacture of photovoltaic devices

Reduced capacitance electrode assembly

Installation for depositing thin layers in the reactive vapor phase

Patents Applicationslast 30 patents

LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...

AUTOMATED FEEDFORWARD AND FEEDBACK SEQUENCE FOR PATTERNING CD CONTROL

LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...

HEAT CONDUCTIVE SPACER FOR PLASMA PROCESSING CHAMBER

PLASMA TREATMENT DEVICE AND STRUCTURE OF REACTION VESSEL FOR PLASMA...

Large Sized Showerhead Assembly

PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN

HOLLOW CATHODE PLASMA SOURCE

PHYSICAL VAPOR DEPOSITION SYSTEM USING BACKSIDE GAS COOLING OF WORK...

PHYSICAL VAPOR DEPOSITION SYSTEM WITH TARGET MAGNETS CONTROLLED TO...

PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN

PLASMA CVD APPARATUS, PLASMA CVD METHOD, REACTIVE SPUTTERING APPARA...

Plasma Uniformity Control By Gas Diffuser Hole Design

Plasma excitation module

PECVD PROCESS CHAMBER BACKING PLATE REINFORCEMENT

Vacuum Processing Chamber for Very Large Area Substrates

SPUTTER CHAMBER FOR COATING A SUBSTRATE

Systems and methods for deposition of graded materials on continuou...

Plasma uniformity control by gas diffuser hole design

Plasma treatment apparatus, method of producing reaction vessel for...

Apparatus and method of shaping profiles of large-area PECVD electr...

Coater with a large-area assembly of rotatable magnetrons

Plasma uniformity control by gas diffuser hole design

Method and apparatus for in-situ film stack processing

Method of producing flat panels

Magnetron sputtering source

Surface-treated shower head for use in a substrate processing chamber