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Industry

CPC
H01J2237/2816

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2816Length

Industries

Patents Grantslast 30 patents

Information Patent Grant
Overlay structure and method of fabricating the same
- Patent number 10,790,205
- Issue date Sep 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Feng-Pin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple beam image acquisition apparatus and multiple beam image a...
- Patent number 10,777,384
- Issue date Sep 15, 2020
- NuFlare Technology, Inc.
- Nobutaka Kikuiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image analysis apparatus and charged particle beam apparatus
- Patent number 10,724,856
- Issue date Jul 28, 2020
- HITACHI HIGH-TECH CORPORATION
- Atsuko Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam apparatus, alignment method of charged partic...
- Patent number 10,312,053
- Issue date Jun 4, 2019
- Hitachi High-Technologies Corporation
- Kazuki Ishizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for estimating shape before shrink and CD-SEM apparatus
- Patent number 9,830,524
- Issue date Nov 28, 2017
- Hitachi High-Technologies Corporation
- Tomoko Sekiguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern analysis method of a semiconductor device
- Patent number 9,672,611
- Issue date Jun 6, 2017
- Samsung Electronics Co., Ltd.
- Kiho Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 9,368,314
- Issue date Jun 14, 2016
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Pattern determination device and computer program
- Patent number 9,329,034
- Issue date May 3, 2016
- Hitachi High-Technologies Corporation
- Hitoshi Namai
- G01 - MEASURING TESTING
Information Patent Grant
Pattern dimension measurement method and charged particle beam appa...
- Patent number 9,297,649
- Issue date Mar 29, 2016
- Hitachi High-Technologies Corporation
- Hiroki Kawada
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor inspection device and semiconductor inspection method...
- Patent number 9,123,504
- Issue date Sep 1, 2015
- Hitachi High-Technologies Corporation
- Atsuko Yamaguchi
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for inspection with electron beam, method for operating s...
- Patent number 8,822,919
- Issue date Sep 2, 2014
- Ebara Corporation
- Toshifumi Kimba
- G01 - MEASURING TESTING
Information Patent Grant
Ultra high precision measurement tool
- Patent number 8,785,849
- Issue date Jul 22, 2014
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnick mbH
- Juergen Frosien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 8,648,300
- Issue date Feb 11, 2014
- Hitachi High-Technologies Corporation
- Miki Isawa
- G01 - MEASURING TESTING
Information Patent Grant
Scanning electron microscope
- Patent number 8,481,935
- Issue date Jul 9, 2013
- Hitachi High-Technologies Corporation
- Akira Ikegami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measuring apparatus and pattern measuring method
- Patent number 8,431,895
- Issue date Apr 30, 2013
- Advantest Corp.
- Jun Matsumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 8,368,031
- Issue date Feb 5, 2013
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Method for adjusting optical axis of charged particle radiation and...
- Patent number 8,294,118
- Issue date Oct 23, 2012
- Hitachi High-Technologies Corporation
- Akemi Kono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and its system for calibrating measured data between differe...
- Patent number 8,214,166
- Issue date Jul 3, 2012
- Hitachi High-Technologies Corporation
- Maki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope for inspecting dimension and shape of a pattern...
- Patent number 8,199,191
- Issue date Jun 12, 2012
- Hitachi High-Technologies Corporation
- Hidetoshi Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample transfer unit and sample transferring method
- Patent number 8,173,971
- Issue date May 8, 2012
- Hitachi High-Technologies Corporation
- Takashi Gunji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 8,053,726
- Issue date Nov 8, 2011
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus and dimension measuring method
- Patent number 8,030,614
- Issue date Oct 4, 2011
- Hitachi High-Technologies Corporation
- Mitsugu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 7,989,768
- Issue date Aug 2, 2011
- Hitachi High-Technologies Corporation
- Akira Ikegami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and dimension measuring method
- Patent number 7,973,282
- Issue date Jul 5, 2011
- Hitachi High-Technologies Corporation
- Mitsugu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for inspection with electron beam, method for operating s...
- Patent number 7,928,378
- Issue date Apr 19, 2011
- Ebara Corporation
- Toshifumi Kimba
- G01 - MEASURING TESTING
Information Patent Grant
System and method for determining a cross sectional feature of a st...
- Patent number 7,910,885
- Issue date Mar 22, 2011
- Applied Materials Israel, Ltd.
- Zvika Rosenberg
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus and method of manufacturing semiconductor d...
- Patent number 7,888,642
- Issue date Feb 15, 2011
- Ebara Corporation
- Mamoru Nakasuji
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Standard component for calibration and calibration method using it...
- Patent number 7,834,997
- Issue date Nov 16, 2010
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Sheet beam-type testing apparatus
- Patent number 7,829,871
- Issue date Nov 9, 2010
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Pattern measuring method and electron microscope
- Patent number 7,795,581
- Issue date Sep 14, 2010
- Hitachi High-Technologies Corporation
- Shuichi Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE BEAM IMAGE A...
- Publication number 20190195815
- Publication date Jun 27, 2019
- NuFlare Technology, Inc.
- Nobutaka KIKUIRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE INSPECTION METHOD AND A SUBSTRATE PROCESSING METHOD
- Publication number 20140367570
- Publication date Dec 18, 2014
- EBARA CORPORATION
- Toshifumi Kimba
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20140319346
- Publication date Oct 30, 2014
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
PATTERN DIMENSION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM APPA...
- Publication number 20140048706
- Publication date Feb 20, 2014
- Hitachi High-Technologies Corporation
- Hiroki Kawada
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20140034831
- Publication date Feb 6, 2014
- KABUSHIKI KAISHA TOSHIBA
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20140014836
- Publication date Jan 16, 2014
- Hitachi High-Technologies Corporation
- Miki ISAWA
- G01 - MEASURING TESTING
Information Patent Application
PATTERN DETERMINATION DEVICE AND COMPUTER PROGRAM
- Publication number 20130270436
- Publication date Oct 17, 2013
- Hitachi High-Technologies Corporation
- Hitoshi Namai
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR INSPECTION DEVICE AND SEMICONDUCTOR INSPECTION METHOD...
- Publication number 20120098954
- Publication date Apr 26, 2012
- Atsuko Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20120032079
- Publication date Feb 9, 2012
- KABUSHIKI KAISHA TOSHIBA
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR ADJUSTING OPTICAL AXIS OF CHARGED PARTICLE RADIATION AND...
- Publication number 20110284759
- Publication date Nov 24, 2011
- Akemi Kono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20110278454
- Publication date Nov 17, 2011
- Hitachi High-Technologies Corporation
- Akira IKEGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR INSPECTION WITH ELECTRON BEAM, METHOD FOR OPERATING S...
- Publication number 20110104830
- Publication date May 5, 2011
- EBARA CORPORATION
- Toshifumi Kimba
- G01 - MEASURING TESTING
Information Patent Application
Pattern measuring apparatus and pattern measuring method
- Publication number 20110049362
- Publication date Mar 3, 2011
- Jun Matsumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sample Transfer Unit and Sample Transferring Method
- Publication number 20100230592
- Publication date Sep 16, 2010
- Hitachi High-Technologies Corporation
- Takashi GUNJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND DIMENSION MEASURING METHOD
- Publication number 20090314938
- Publication date Dec 24, 2009
- Hitachi High-Technologies Corporation
- Mitsugu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA HIGH PRECISION MEASUREMENT TOOL
- Publication number 20090289185
- Publication date Nov 26, 2009
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Juergen FROSIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam apparatus and method of manufacturing semiconductor d...
- Publication number 20090050822
- Publication date Feb 26, 2009
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON BEAM APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20090039262
- Publication date Feb 12, 2009
- EBARA CORPORATION
- Mamoru NAKASUJI
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON MICROSCOPE
- Publication number 20090039264
- Publication date Feb 12, 2009
- Hitachi High-Technologies Corporation
- Akira IKEGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection system by charged particle beam and method of manufactur...
- Publication number 20090032708
- Publication date Feb 5, 2009
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Method and Its System for Calibrating Measured Data Between Differe...
- Publication number 20080319696
- Publication date Dec 25, 2008
- Maki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for inspection with electron beam, method for operating s...
- Publication number 20080308729
- Publication date Dec 18, 2008
- EBARA CORPORATION
- Toshifumi Kimba
- G01 - MEASURING TESTING
Information Patent Application
SHEET BEAM-TYPE TESTING APPARATUS
- Publication number 20080302963
- Publication date Dec 11, 2008
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Pattern Measuring Method and Electron Microscope
- Publication number 20080210865
- Publication date Sep 4, 2008
- Hitachi High-Technologies Corporation
- Shuichi NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE TRANSFER UNIT AND SAMPLE TRANSFERRING METHOD
- Publication number 20080203302
- Publication date Aug 28, 2008
- Hitachi High-Technologies Corporation
- Takashi Gunji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Standard Component For Length Measurement, Method For Producing The...
- Publication number 20080198467
- Publication date Aug 21, 2008
- Yoshinori Nakayama
- G01 - MEASURING TESTING
Information Patent Application
Electron beam apparatus and device production method using the elec...
- Publication number 20080173815
- Publication date Jul 24, 2008
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Method for inspecting substrate, substrate inspecting system and el...
- Publication number 20080121804
- Publication date May 29, 2008
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
STANDARD REFERENCE COMPONENT FOR CALIBRATION, FABRICATION METHOD FO...
- Publication number 20080121791
- Publication date May 29, 2008
- Yoshinori Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of determining micro- and nano- sizes in scanning electron m...
- Publication number 20080114561
- Publication date May 15, 2008
- Dmitriy Yeremin
- G06 - COMPUTING CALCULATING COUNTING

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Overlay structure and method of fabricating the same

Multiple beam image acquisition apparatus and multiple beam image a...

Image analysis apparatus and charged particle beam apparatus

Charged particle beam apparatus, alignment method of charged partic...

Method for estimating shape before shrink and CD-SEM apparatus

Pattern analysis method of a semiconductor device

Inspection system by charged particle beam and method of manufactur...

Pattern determination device and computer program

Pattern dimension measurement method and charged particle beam appa...

Semiconductor inspection device and semiconductor inspection method...

Apparatus for inspection with electron beam, method for operating s...

Ultra high precision measurement tool

Charged particle beam apparatus

Scanning electron microscope

Pattern measuring apparatus and pattern measuring method

Inspection system by charged particle beam and method of manufactur...

Method for adjusting optical axis of charged particle radiation and...

Method and its system for calibrating measured data between differe...

Electron microscope for inspecting dimension and shape of a pattern...

Sample transfer unit and sample transferring method

Inspection system by charged particle beam and method of manufactur...

Charged particle beam apparatus and dimension measuring method

Scanning electron microscope

Charged particle beam apparatus and dimension measuring method

Apparatus for inspection with electron beam, method for operating s...

System and method for determining a cross sectional feature of a st...

Electron beam apparatus and method of manufacturing semiconductor d...

Standard component for calibration and calibration method using it...

Sheet beam-type testing apparatus

Pattern measuring method and electron microscope

Patents Applicationslast 30 patents

MULTIPLE BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE BEAM IMAGE A...

SUBSTRATE INSPECTION METHOD AND A SUBSTRATE PROCESSING METHOD

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

PATTERN DIMENSION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM APPA...

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

CHARGED PARTICLE BEAM APPARATUS

PATTERN DETERMINATION DEVICE AND COMPUTER PROGRAM

SEMICONDUCTOR INSPECTION DEVICE AND SEMICONDUCTOR INSPECTION METHOD...

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

METHOD FOR ADJUSTING OPTICAL AXIS OF CHARGED PARTICLE RADIATION AND...

SCANNING ELECTRON MICROSCOPE

APPARATUS FOR INSPECTION WITH ELECTRON BEAM, METHOD FOR OPERATING S...

Pattern measuring apparatus and pattern measuring method

Sample Transfer Unit and Sample Transferring Method

CHARGED PARTICLE BEAM APPARATUS AND DIMENSION MEASURING METHOD

ULTRA HIGH PRECISION MEASUREMENT TOOL

Electron beam apparatus and method of manufacturing semiconductor d...

ELECTRON BEAM APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

ELECTRON MICROSCOPE

Inspection system by charged particle beam and method of manufactur...

Method and Its System for Calibrating Measured Data Between Differe...

Apparatus for inspection with electron beam, method for operating s...

SHEET BEAM-TYPE TESTING APPARATUS

Pattern Measuring Method and Electron Microscope

SAMPLE TRANSFER UNIT AND SAMPLE TRANSFERRING METHOD

Standard Component For Length Measurement, Method For Producing The...

Electron beam apparatus and device production method using the elec...

Method for inspecting substrate, substrate inspecting system and el...

STANDARD REFERENCE COMPONENT FOR CALIBRATION, FABRICATION METHOD FO...

Method of determining micro- and nano- sizes in scanning electron m...