Liquid metal sources

Industry

CPC
H01J2237/0805

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0805Liquid metal sources

Industries

Patents Grantslast 30 patents

Information Patent Grant
Liquid metal ion source and focused ion beam apparatus
- Patent number 11,749,493
- Issue date Sep 5, 2023
- Hitachi High-Tech Science Corporation
- Yoshihiro Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid metal ion source
- Patent number 11,170,967
- Issue date Nov 9, 2021
- Axcelis Technologies, Inc.
- Neil Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system and method
- Patent number 10,854,421
- Issue date Dec 1, 2020
- Carl Zeiss Microscopy GmbH
- Daniela Donhauser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a particle beam generator for a particle beam...
- Patent number 10,763,076
- Issue date Sep 1, 2020
- Carl Zeiss Microscopy GmbH
- Giuseppe Pavia
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Focused ion beam apparatus
- Patent number 10,176,964
- Issue date Jan 8, 2019
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for optimizing nanotips derived from frozen taylor cones
- Patent number 9,837,239
- Issue date Dec 5, 2017
- Gregory Hirsch
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Grant
Bright and durable field emission source derived from refractory ta...
- Patent number 9,524,848
- Issue date Dec 20, 2016
- Gregory Hirsch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated ion beam idle
- Patent number 9,123,500
- Issue date Sep 1, 2015
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion sources, systems and methods
- Patent number 9,029,765
- Issue date May 12, 2015
- Carl Zeiss Microscopy, LLC
- Richard Comunale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion sources, systems and methods
- Patent number 8,633,451
- Issue date Jan 21, 2014
- Carl Zeiss Microscopy, LLC
- Billy W. Ward
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Grant
Liquid metal ion gun
- Patent number 8,581,484
- Issue date Nov 12, 2013
- Hitachi High-Technologies Corporation
- Hiroyasu Kaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas field ion source, charged particle microscope, and apparatus
- Patent number 8,530,865
- Issue date Sep 10, 2013
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid metal ion source and secondary ion mass spectrometric method...
- Patent number 8,525,125
- Issue date Sep 3, 2013
- Ion-Tof Technologies GmbH
- Felix Kollmer
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Ion sources, systems and methods
- Patent number 8,461,557
- Issue date Jun 11, 2013
- Carl Zeiss Microscopy, LLC
- Richard Comunale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Navigation and sample processing using an ion source containing bot...
- Patent number 8,455,822
- Issue date Jun 4, 2013
- FEI Company
- Chad Rue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid metal wetting of micro-fabricated charge-emission structures
- Patent number 8,410,678
- Issue date Apr 2, 2013
- SRI International
- Christopher E. Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid metal ion source, secondary ion mass spectrometer, secondary...
- Patent number 8,410,425
- Issue date Apr 2, 2013
- Ion-Tof Technologies GmbH
- Felix Kollmer
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Dual beam system
- Patent number 8,399,864
- Issue date Mar 19, 2013
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus using an electrostatic lens gun
- Patent number 8,399,863
- Issue date Mar 19, 2013
- Hitachi High-Technologies Corporation
- Hiroyasu Kaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle source with automated tip formation
- Patent number 8,330,130
- Issue date Dec 11, 2012
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Dieter Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite focused ion beam device, and processing observation metho...
- Patent number 8,269,194
- Issue date Sep 18, 2012
- SII NanoTechnology Inc.
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Grant
High resolution gas field ion column
- Patent number 8,158,939
- Issue date Apr 17, 2012
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Juergen Frosien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid metal wetting of micro-fabricated charge-emission structures
- Patent number 8,138,665
- Issue date Mar 20, 2012
- SRI International
- Christopher E. Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for backside circuit editing on full thickness si...
- Patent number 8,133,760
- Issue date Mar 13, 2012
- Avago Technologies Enterprise IP (Singapore) Pte. Ltd.
- David Winslow Niles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Increasing current in charged particle sources and systems
- Patent number 8,124,941
- Issue date Feb 28, 2012
- Carl Zeiss NTS, LLC
- John A. Notte, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas field ion source, charged particle microscope, and apparatus
- Patent number 8,115,184
- Issue date Feb 14, 2012
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Achromatic mass separator
- Patent number 8,049,180
- Issue date Nov 1, 2011
- ICT, Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Juergen Frosien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual beam system
- Patent number 8,013,311
- Issue date Sep 6, 2011
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 7,956,336
- Issue date Jun 7, 2011
- Hitachi High-Technologies Corporation
- Hiroyasu Kaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra high precision measurement tool with control loop
- Patent number 7,851,768
- Issue date Dec 14, 2010
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Juergen Frosien
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LIQUID METAL ION SOURCE DEVICE FOR USING BISMUTH AND ALLOY OF BISMUTH
- Publication number 20240331967
- Publication date Oct 3, 2024
- KOREA BASIC SCIENCE INSTITUTE
- Myoung Choul Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID METAL ION SOURCE AND FOCUSED ION BEAM APPARATUS
- Publication number 20210090842
- Publication date Mar 25, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yoshihiro KOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID METAL ION SOURCE
- Publication number 20200303154
- Publication date Sep 24, 2020
- Axcelis Technologies, Inc.
- Neil Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM GENERATING DEVICE INCLUDING LIQUID METAL ION SOURCE AND ME...
- Publication number 20200152410
- Publication date May 14, 2020
- KOREA BASIC SCIENCE INSTITUTE
- Myoung Choul Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A PARTICLE BEAM GENERATOR FOR A PARTICLE BEAM...
- Publication number 20190355551
- Publication date Nov 21, 2019
- CARL ZEISS MICROSCOPY GMBH
- Giuseppe Pavia
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Automated Ion Beam Idle
- Publication number 20130256553
- Publication date Oct 3, 2013
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCES, SYSTEMS AND METHODS
- Publication number 20130256532
- Publication date Oct 3, 2013
- Carl Zeiss Microscopy, LLC
- Richard Comunale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID METAL ION SOURCE AND SECONDARY ION MASS SPECTROMETRIC METHO...
- Publication number 20130216427
- Publication date Aug 22, 2013
- ION-TOF TECHNOLOGIES GMBH
- Felix Kollmer
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
ION SOURCES, SYSTEMS AND METHODS
- Publication number 20120241640
- Publication date Sep 27, 2012
- CARL ZEISS NTS, LLC.
- Billy W. Ward
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Application
Liquid Metal Wetting of Micro-Fabricated Charge-Emission Structures
- Publication number 20120212120
- Publication date Aug 23, 2012
- SRI International
- Christopher E. Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID METAL ION GUN
- Publication number 20120126684
- Publication date May 24, 2012
- Hiroyasu Kaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS FIELD ION SOURCE, CHARGED PARTICLE MICROSCOPE, AND APPARATUS
- Publication number 20120119086
- Publication date May 17, 2012
- Hitachi High-Technologies Corporation
- Hiroyasu SHICHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Navigation and Sample Processing Using an Ion Source Containing bot...
- Publication number 20120056088
- Publication date Mar 8, 2012
- FEI Company
- Chad Rue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Beam System
- Publication number 20110309263
- Publication date Dec 22, 2011
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCES, SYSTEMS AND METHODS
- Publication number 20110240853
- Publication date Oct 6, 2011
- CARL ZEISS NTS, LLC.
- Richard Comunale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE GUN AND FOCUSED ION BEAM APPARATUS USING THE GUN
- Publication number 20110186745
- Publication date Aug 4, 2011
- Hiroyasu Kqaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR BACKSIDE CIRCUIT EDITING ON FULL THICKNESS SI...
- Publication number 20100297787
- Publication date Nov 25, 2010
- Avago Technologies Enterprise IP (Singapore) Pte. Ltd.
- David Winslow Niles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID METAL ION SOURCE, SECONDARY IION MASS SPECTROMETER,SECONDARY...
- Publication number 20100237234
- Publication date Sep 23, 2010
- ION-TOF TECHNOLOGIES GMBH
- Felix Kollmer
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
HIGH RESOLUTION GAS FIELD ION COLUMN
- Publication number 20100187436
- Publication date Jul 29, 2010
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- JUERGEN FROSIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE FOCUSED ION BEAM DEVICE, AND PROCESSING OBSERVATION METHO...
- Publication number 20100176296
- Publication date Jul 15, 2010
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Application
Dual Beam System
- Publication number 20100025578
- Publication date Feb 4, 2010
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INCREASING CURRENT IN CHARGED PARTICLE SOURCES AND SYSTEMS
- Publication number 20100012839
- Publication date Jan 21, 2010
- Carl Zeiss SMT Inc.
- John A. Notte, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA HIGH PRECISION MEASUREMENT TOOL WITH CONTROL LOOP
- Publication number 20090289191
- Publication date Nov 26, 2009
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Juergen Frosien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid Metal Wetting of Micro-Fabricated Charge-Emission Structures
- Publication number 20090278434
- Publication date Nov 12, 2009
- SRI International
- Christopher E. Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20090256081
- Publication date Oct 15, 2009
- Hitachi High-Technologies Corporation
- Hiroyasu Kaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas field ion source, charged particle microscope, and apparatus
- Publication number 20090173888
- Publication date Jul 9, 2009
- Hitachi High-Technologies Corporation
- Hiroyasu SHICHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE WITH AUTOMATED TIP FORMATION
- Publication number 20090121160
- Publication date May 14, 2009
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Dieter Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid metal ion gun
- Publication number 20080210883
- Publication date Sep 4, 2008
- Hitachi High-Technologies Corporation
- Hiroyasu Kaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACHROMATIC MASS SEPARATOR
- Publication number 20080185514
- Publication date Aug 7, 2008
- JUERGEN FROSIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR IN-SITU SAMPLE PREPARATION
- Publication number 20080185517
- Publication date Aug 7, 2008
- Juergen Frosien
- H01 - BASIC ELECTRIC ELEMENTS

Liquid metal sources

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Liquid metal ion source and focused ion beam apparatus

Liquid metal ion source

Charged particle beam system and method

Method for operating a particle beam generator for a particle beam...

Focused ion beam apparatus

Techniques for optimizing nanotips derived from frozen taylor cones

Bright and durable field emission source derived from refractory ta...

Automated ion beam idle

Ion sources, systems and methods

Ion sources, systems and methods

Liquid metal ion gun

Gas field ion source, charged particle microscope, and apparatus

Liquid metal ion source and secondary ion mass spectrometric method...

Ion sources, systems and methods

Navigation and sample processing using an ion source containing bot...

Liquid metal wetting of micro-fabricated charge-emission structures

Liquid metal ion source, secondary ion mass spectrometer, secondary...

Dual beam system

Charged particle beam apparatus using an electrostatic lens gun

Charged particle source with automated tip formation

Composite focused ion beam device, and processing observation metho...

High resolution gas field ion column

Liquid metal wetting of micro-fabricated charge-emission structures

System and method for backside circuit editing on full thickness si...

Increasing current in charged particle sources and systems

Gas field ion source, charged particle microscope, and apparatus

Achromatic mass separator

Dual beam system

Focused ion beam apparatus

Ultra high precision measurement tool with control loop

Patents Applicationslast 30 patents

LIQUID METAL ION SOURCE DEVICE FOR USING BISMUTH AND ALLOY OF BISMUTH

LIQUID METAL ION SOURCE AND FOCUSED ION BEAM APPARATUS

LIQUID METAL ION SOURCE

ION BEAM GENERATING DEVICE INCLUDING LIQUID METAL ION SOURCE AND ME...

METHOD FOR OPERATING A PARTICLE BEAM GENERATOR FOR A PARTICLE BEAM...

Automated Ion Beam Idle

ION SOURCES, SYSTEMS AND METHODS

LIQUID METAL ION SOURCE AND SECONDARY ION MASS SPECTROMETRIC METHO...

ION SOURCES, SYSTEMS AND METHODS

Liquid Metal Wetting of Micro-Fabricated Charge-Emission Structures

LIQUID METAL ION GUN

GAS FIELD ION SOURCE, CHARGED PARTICLE MICROSCOPE, AND APPARATUS

Navigation and Sample Processing Using an Ion Source Containing bot...

Dual Beam System

ION SOURCES, SYSTEMS AND METHODS

CHARGED PARTICLE GUN AND FOCUSED ION BEAM APPARATUS USING THE GUN

SYSTEM AND METHOD FOR BACKSIDE CIRCUIT EDITING ON FULL THICKNESS SI...

LIQUID METAL ION SOURCE, SECONDARY IION MASS SPECTROMETER,SECONDARY...

HIGH RESOLUTION GAS FIELD ION COLUMN

COMPOSITE FOCUSED ION BEAM DEVICE, AND PROCESSING OBSERVATION METHO...

Dual Beam System

INCREASING CURRENT IN CHARGED PARTICLE SOURCES AND SYSTEMS

ULTRA HIGH PRECISION MEASUREMENT TOOL WITH CONTROL LOOP

Liquid Metal Wetting of Micro-Fabricated Charge-Emission Structures

FOCUSED ION BEAM APPARATUS

Gas field ion source, charged particle microscope, and apparatus

CHARGED PARTICLE SOURCE WITH AUTOMATED TIP FORMATION

Liquid metal ion gun

ACHROMATIC MASS SEPARATOR

METHOD AND APPARATUS FOR IN-SITU SAMPLE PREPARATION