Lithography

Industry

CPC
H01J2237/3175

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3175Lithography

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Electron beam lithography with dynamic fin overlay correction
- Patent number 12,099,304
- Issue date Sep 24, 2024
- International Business Machines Corporation
- Simon Dawes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam apparatus, defect repair method, lithographic exposur...
- Patent number 11,996,267
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Ruben Cornelis Maas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam grid layout
- Patent number RE49952
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,747,736
- Issue date Sep 5, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Grant
Proximity effect correcting method, master plate manufacturing meth...
- Patent number 11,742,179
- Issue date Aug 29, 2023
- Kioxia Corporation
- Yoshinori Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number RE49602
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Pieter Kruit
Information Patent Grant
Method for determining a beamlet position and method for determinin...
- Patent number RE49483
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Paul IJmert Scheffers
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,579,532
- Issue date Feb 14, 2023
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fill pattern to enhance ebeam process margin
- Patent number 11,581,162
- Issue date Feb 14, 2023
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for irradiating a target using restricted placement grids
- Patent number 11,569,064
- Issue date Jan 31, 2023
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,545,339
- Issue date Jan 3, 2023
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,508,553
- Issue date Nov 22, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanofabrication using a new class of electron beam induced surface...
- Patent number 11,377,740
- Issue date Jul 5, 2022
- FEI Company
- James Bishop
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exposure apparatus and exposure method, lithography method, and dev...
- Patent number 11,276,558
- Issue date Mar 15, 2022
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anomaly determination method and writing apparatus
- Patent number 11,275,044
- Issue date Mar 15, 2022
- NuFlare Technology, Inc.
- Shun Kanezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,256,175
- Issue date Feb 22, 2022
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam lithography process adapted for a sample comprising a...
- Patent number 11,127,565
- Issue date Sep 21, 2021
- Centre National de la Recherche Scientifique
- Agnès Maitre
- G01 - MEASURING TESTING
Information Patent Grant
Bias correction for lithography
- Patent number 11,126,085
- Issue date Sep 21, 2021
- D2S, Inc.
- Harold Robert Zable
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fill pattern to enhance e-beam process margin
- Patent number 11,107,658
- Issue date Aug 31, 2021
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Depassivation lithography by scanning tunneling microscopy
- Patent number 10,983,142
- Issue date Apr 20, 2021
- Zyvex Labs, LLC
- John Randall
- G01 - MEASURING TESTING
Information Patent Grant
Multiple charged particle beam writing method and apparatus using b...
- Patent number 10,978,273
- Issue date Apr 13, 2021
- NuFlare Technology, Inc.
- Hideo Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,937,629
- Issue date Mar 2, 2021
- NuFlare Technology, Inc.
- Hironori Teguri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for projecting a beam of particles onto a substrate with cor...
- Patent number 10,923,319
- Issue date Feb 16, 2021
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Christophe Constancias
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 10,852,639
- Issue date Dec 1, 2020
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Grant
Bias correction for lithography
- Patent number 10,725,383
- Issue date Jul 28, 2020
- D25, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Deflection scan speed adjustment during charged particle exposure
- Patent number 10,692,696
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number RE48046
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Pieter Kruit
Information Patent Grant
Micro-electro-mechanical-systems processing method, and micro-elect...
- Patent number 10,662,059
- Issue date May 26, 2020
- Hitachi, Ltd.
- Keiji Watanabe
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Exposure apparatus and exposure method, lithography method, and dev...
- Patent number 10,658,157
- Issue date May 19, 2020
- Nikon Corporation
- Yuichi Shibazaki
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...
- Publication number 20240363307
- Publication date Oct 31, 2024
- NuFlare Technology, Inc.
- Hiroshi SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242922
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM LITHOGRAPHY AND NANOENGINEERING
- Publication number 20240222073
- Publication date Jul 4, 2024
- Intel Corporation
- Shida Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Pattern Definition Device
- Publication number 20230360880
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Stefan Eder-Kapl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20230143407
- Publication date May 11, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20230056463
- Publication date Feb 23, 2023
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROXIMITY EFFECT CORRECTING METHOD, MASTER PLATE MANUFACTURING METH...
- Publication number 20220238303
- Publication date Jul 28, 2022
- KIOXIA Corporation
- Yoshinori KAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20220121125
- Publication date Apr 21, 2022
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN
- Publication number 20210358713
- Publication date Nov 18, 2021
- Intel Corporation
- Shakul TANDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM APPARATUS, DEFECT REPAIR METHOD, LITHOGRAPHIC EXPOSUR...
- Publication number 20210327678
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Ruben Cornelis MAAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLADE DEPLOYMENT MECHANISMS FOR SURGICAL FORCEPS
- Publication number 20210065335
- Publication date Mar 4, 2021
- Covidien LP
- RYAN C. ARTALE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20210041789
- Publication date Feb 11, 2021
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Application
BIAS CORRECTION FOR LITHOGRAPHY
- Publication number 20200341380
- Publication date Oct 29, 2020
- D2S, INC.
- Harold Robert Zable
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, LITHOGRAPHY METHOD, AND DEV...
- Publication number 20200251306
- Publication date Aug 6, 2020
- Nikon Corporation
- Yuichi Shibazaki
- G02 - OPTICS
Information Patent Application
NANOFABRICATION USING A NEW CLASS OF ELECTRON BEAM INDUCED SURFACE...
- Publication number 20200190669
- Publication date Jun 18, 2020
- FEI Company
- James Bishop
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20200135428
- Publication date Apr 30, 2020
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Depassivation Lithography by Scanning Tunneling Microscopy
- Publication number 20200132718
- Publication date Apr 30, 2020
- ZYVEX LABS, LLC
- John Randall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20200118791
- Publication date Apr 16, 2020
- NuFlare Technology, Inc.
- Hironori TEGURI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANOMALY DETERMINATION METHOD AND WRITING APPARATUS
- Publication number 20200072777
- Publication date Mar 5, 2020
- NuFlare Technology, Inc.
- Shun KANEZAWA
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON-BEAM LITHOGRAPHY PROCESS ADAPTED FOR A SAMPLE COMPRISING A...
- Publication number 20200006037
- Publication date Jan 2, 2020
- Centre National de la Recherche Scientifique
- Agnès MAITRE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20190346770
- Publication date Nov 14, 2019
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...
- Publication number 20190304747
- Publication date Oct 3, 2019
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Christophe CONSTANCIAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND MULTIPLE CHARGED...
- Publication number 20190198294
- Publication date Jun 27, 2019
- NuFlare Technology, Inc.
- Hideo INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLADE DEPLOYMENT MECHANISMS FOR SURGICAL FORCEPS
- Publication number 20190172185
- Publication date Jun 6, 2019
- Covidien LP
- RYAN C. ARTALE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN
- Publication number 20190164723
- Publication date May 30, 2019
- Intel Corporation
- Shakul TANDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Irradiating a Target Using Restricted Placement Grids
- Publication number 20190088448
- Publication date Mar 21, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICRO-ELECTRO-MECHANICAL-SYSTEMS PROCESSING METHOD, AND MICRO-ELECT...
- Publication number 20190062157
- Publication date Feb 28, 2019
- Hitachi, Ltd
- Keiji WATANABE
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Substrate Alignment Detection Using Circumferentially Extending Tim...
- Publication number 20180197763
- Publication date Jul 12, 2018
- Doug Carson & Associates, Inc.
- Douglas M. Carson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron-Beam Lithography Method and System
- Publication number 20180149980
- Publication date May 31, 2018
- National Taiwan University
- Chieh-Hsiung KUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM EXPOSURE METHOD AND CHARGED-PARTICLE BEAM COR...
- Publication number 20180012730
- Publication date Jan 11, 2018
- Samsung Electronics Co., Ltd.
- SUKJONG BAE
- H01 - BASIC ELECTRIC ELEMENTS

Lithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Electron beam lithography with dynamic fin overlay correction

Multi-charged particle beam writing apparatus, and multi-charged pa...

Particle beam apparatus, defect repair method, lithographic exposur...

Beam grid layout

Exposure apparatus and exposure method, and device manufacturing me...

Proximity effect correcting method, master plate manufacturing meth...

Lithography system, sensor and measuring method

Method for determining a beamlet position and method for determinin...

Exposure apparatus and exposure method, and device manufacturing me...

Fill pattern to enhance ebeam process margin

Method for irradiating a target using restricted placement grids

Multi-charged particle beam writing apparatus, and multi-charged pa...

Multi-charged particle beam writing apparatus, and multi-charged pa...

Nanofabrication using a new class of electron beam induced surface...

Exposure apparatus and exposure method, lithography method, and dev...

Anomaly determination method and writing apparatus

Exposure apparatus and exposure method, and device manufacturing me...

Electron-beam lithography process adapted for a sample comprising a...

Bias correction for lithography

Fill pattern to enhance e-beam process margin

Depassivation lithography by scanning tunneling microscopy

Multiple charged particle beam writing method and apparatus using b...

Multi charged particle beam writing apparatus and multi charged par...

Method for projecting a beam of particles onto a substrate with cor...

Exposure apparatus and exposure method, and device manufacturing me...

Bias correction for lithography

Deflection scan speed adjustment during charged particle exposure

Lithography system, sensor and measuring method

Micro-electro-mechanical-systems processing method, and micro-elect...

Exposure apparatus and exposure method, lithography method, and dev...

Patents Applicationslast 30 patents

MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

ION BEAM LITHOGRAPHY AND NANOENGINEERING

Multi-Beam Pattern Definition Device

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

PROXIMITY EFFECT CORRECTING METHOD, MASTER PLATE MANUFACTURING METH...

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN

PARTICLE BEAM APPARATUS, DEFECT REPAIR METHOD, LITHOGRAPHIC EXPOSUR...

BLADE DEPLOYMENT MECHANISMS FOR SURGICAL FORCEPS

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

BIAS CORRECTION FOR LITHOGRAPHY

EXPOSURE APPARATUS AND EXPOSURE METHOD, LITHOGRAPHY METHOD, AND DEV...

NANOFABRICATION USING A NEW CLASS OF ELECTRON BEAM INDUCED SURFACE...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

Depassivation Lithography by Scanning Tunneling Microscopy

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

ANOMALY DETERMINATION METHOD AND WRITING APPARATUS

ELECTRON-BEAM LITHOGRAPHY PROCESS ADAPTED FOR A SAMPLE COMPRISING A...

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND MULTIPLE CHARGED...

BLADE DEPLOYMENT MECHANISMS FOR SURGICAL FORCEPS

FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN

Method for Irradiating a Target Using Restricted Placement Grids

MICRO-ELECTRO-MECHANICAL-SYSTEMS PROCESSING METHOD, AND MICRO-ELECT...

Substrate Alignment Detection Using Circumferentially Extending Tim...

Electron-Beam Lithography Method and System

CHARGED-PARTICLE BEAM EXPOSURE METHOD AND CHARGED-PARTICLE BEAM COR...