Magnetic control means

Industry

CPC
H01J37/3266

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3266Magnetic control means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi racetrack cathodic arc
- Patent number 12,198,905
- Issue date Jan 14, 2025
- Vapor Technologies, Inc.
- Zachary Zembower
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for increasing energy output in Z-pinch plasma...
- Patent number 12,183,556
- Issue date Dec 31, 2024
- Zap Energy, Inc.
- Peter H. Stoltz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Vacuum deposition into trenches and vias
- Patent number 12,154,770
- Issue date Nov 26, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of manufacturing interconnect structures
- Patent number 12,091,752
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Ting Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,068,136
- Issue date Aug 20, 2024
- Kokusai Electric Corporation
- Tsuyoshi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition apparatus and deposition method using the same
- Patent number 12,051,569
- Issue date Jul 30, 2024
- Samsung Display Co., Ltd.
- Kwan Yong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method of processing substrate
- Patent number 12,020,898
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Akihiro Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic holding structures for plasma processing applications
- Patent number 12,020,965
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method fabricating semiconductor device
- Patent number 12,014,905
- Issue date Jun 18, 2024
- Samsung Electronics Co., Ltd.
- Nam Kyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,014,930
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film-forming method, manufacturing method of electronic device, and...
- Patent number 12,009,183
- Issue date Jun 11, 2024
- The Japan Steel Works, Ltd.
- Keisuke Washio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion collector for use in plasma systems
- Patent number 11,996,276
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing apparatus
- Patent number 11,996,270
- Issue date May 28, 2024
- Samsung Electronics Co., Ltd.
- Eunhee Jeang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic-material shield around plasma chambers near pedestal
- Patent number 11,984,302
- Issue date May 14, 2024
- Applied Materials, Inc.
- Job George Konnoth Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shunt door for magnets in plasma process chamber
- Patent number 11,959,174
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for controlling stress variation in a material...
- Patent number 11,961,722
- Issue date Apr 16, 2024
- SPTS Technologies Limited
- Anthony Wilby
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Magnet arrangement for a plasma source for performing plasma treatm...
- Patent number 11,942,311
- Issue date Mar 26, 2024
- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
- Jörg Vetter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering system with a plurality of cathode assemblies
- Patent number 11,932,932
- Issue date Mar 19, 2024
- Alluxa, Inc.
- Michael A. Scobey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for generating magnetic fields during semiconductor proce...
- Patent number 11,915,915
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Suhas Bangalore Umesh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multipactor plasma ignition devices and techniques
- Patent number 11,915,916
- Issue date Feb 27, 2024
- Eric Benjamin Frederick Gilbert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for depositing a material
- Patent number 11,875,980
- Issue date Jan 16, 2024
- Stephen R Burgess
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, calculation method, and calculation pr...
- Patent number 11,862,438
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,823,876
- Issue date Nov 21, 2023
- ASM IP Holding B.V.
- ChangMin Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate treating apparatus and method for controlling temperature...
- Patent number 11,823,874
- Issue date Nov 21, 2023
- Semes Co., Ltd.
- Ogsen Galstyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,810,758
- Issue date Nov 7, 2023
- Tokyo Electron Limited
- Satoshi Itou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and processing method, and gas cluster generat...
- Patent number 11,772,138
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Grant
Modular microwave source with local lorentz force
- Patent number 11,721,532
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching and plasma processing apparatus
- Patent number 11,710,643
- Issue date Jul 25, 2023
- Tokyo Electron Limited
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple frequency electron cyclotron resonance thruster
- Patent number 11,699,575
- Issue date Jul 11, 2023
- The Regents of the University of Michigan
- Benjamin Alexander Jorns
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
EXTERNAL MAGNETIC FIELD-COUPLED PLASMA ATOMIC LAYER DEPOSITION DEVI...
- Publication number 20250046581
- Publication date Feb 6, 2025
- Research & Business Foundation Sungkyunkwan University
- Ji Eun KANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20250037977
- Publication date Jan 30, 2025
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240420930
- Publication date Dec 19, 2024
- Pusan National University Industry-University Cooperation Foundation
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240395510
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF MANUFACTURING INTERCONNECT STRUCTURES
- Publication number 20240384408
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Ting TSAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus and Plasma Control Method
- Publication number 20240339304
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE
- Publication number 20240331980
- Publication date Oct 3, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Honoka WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC FIBERS FOR SHIELDING IN VACUUM CHAMBER SYSTEMS AND METHODS...
- Publication number 20240304424
- Publication date Sep 12, 2024
- Helion Energy, Inc.
- Brian Campbell
- C01 - INORGANIC CHEMISTRY
Information Patent Application
ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM
- Publication number 20240304425
- Publication date Sep 12, 2024
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Othmar ZÜGER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF...
- Publication number 20240301546
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Thomas Werner Zilbauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETIC HOLDING STRUCTURES FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240297059
- Publication date Sep 5, 2024
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240290625
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION COLLECTOR FOR USE IN PLASMA SYSTEMS
- Publication number 20240290588
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Otto Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER
- Publication number 20240271284
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Kallol BERA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
- Publication number 20240266152
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Michael Andrew STEARNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR INCREASING ENERGY OUTPUT IN Z-PINCH PLASMA...
- Publication number 20240212994
- Publication date Jun 27, 2024
- ZAP ENERGY, INC.
- Peter H. Stoltz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20240212996
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Toshiyuki ARAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240177973
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Koki HIDAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOOLS AND METHODS FOR SUBTRACTIVE METAL PATTERNING
- Publication number 20240162058
- Publication date May 16, 2024
- Intel Corporation
- Christopher J. Jezewski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND METHO...
- Publication number 20240120177
- Publication date Apr 11, 2024
- Samsung Electronics Co., Ltd.
- Ji Mo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROFILE TWISTING CONTROL IN DIELECTRIC ETCH
- Publication number 20240105432
- Publication date Mar 28, 2024
- LAM RESEARCH CORPORATION
- Neil Macaraeg Mackie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20240096599
- Publication date Mar 21, 2024
- Hitachi High-Tech Corporation
- Koichi Takasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, CALCULATION METHOD, AND CALCULATION PR...
- Publication number 20240087855
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke OKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20240047180
- Publication date Feb 8, 2024
- Kokusai Electric Corporation
- Daisuke HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240038505
- Publication date Feb 1, 2024
- Samsung Electronics Co., Ltd.
- Donghyeon Na
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing with Magnetic Ring X Point
- Publication number 20240038506
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM DEPOSITION INTO TRENCHES AND VIAS
- Publication number 20240021421
- Publication date Jan 18, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230420228
- Publication date Dec 28, 2023
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230386800
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- H01 - BASIC ELECTRIC ELEMENTS

Magnetic control means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi racetrack cathodic arc

Methods and systems for increasing energy output in Z-pinch plasma...

Vacuum deposition into trenches and vias

Apparatus and method of manufacturing interconnect structures

Substrate processing apparatus, method of manufacturing semiconduct...

Deposition apparatus and deposition method using the same

Plasma processing system and method of processing substrate

Magnetic holding structures for plasma processing applications

Apparatus and method fabricating semiconductor device

Etching method and plasma processing apparatus

Film-forming method, manufacturing method of electronic device, and...

Ion collector for use in plasma systems

Wafer processing apparatus

Magnetic-material shield around plasma chambers near pedestal

Shunt door for magnets in plasma process chamber

Method and apparatus for controlling stress variation in a material...

Magnet arrangement for a plasma source for performing plasma treatm...

Symmetric VHF source for a plasma reactor

Sputtering system with a plurality of cathode assemblies

Apparatus for generating magnetic fields during semiconductor proce...

Multipactor plasma ignition devices and techniques

Method and apparatus for depositing a material

Plasma processing apparatus, calculation method, and calculation pr...

Substrate processing apparatus

Substrate treating apparatus and method for controlling temperature...

Plasma processing apparatus

Processing apparatus and processing method, and gas cluster generat...

Modular microwave source with local lorentz force

Method of etching and plasma processing apparatus

Multiple frequency electron cyclotron resonance thruster

Patents Applicationslast 30 patents

EXTERNAL MAGNETIC FIELD-COUPLED PLASMA ATOMIC LAYER DEPOSITION DEVI...

APPARATUS AND METHOD FOR PLASMA PROCESSING

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

APPARATUS AND METHOD OF MANUFACTURING INTERCONNECT STRUCTURES

Plasma Processing Apparatus and Plasma Control Method

PLASMA SOURCE

CERAMIC FIBERS FOR SHIELDING IN VACUUM CHAMBER SYSTEMS AND METHODS...

ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF...

MAGNETIC HOLDING STRUCTURES FOR PLASMA PROCESSING APPLICATIONS

PLASMA PROCESSING APPARATUS

ION COLLECTOR FOR USE IN PLASMA SYSTEMS

SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER

PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS

METHODS AND SYSTEMS FOR INCREASING ENERGY OUTPUT IN Z-PINCH PLASMA...

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

TOOLS AND METHODS FOR SUBTRACTIVE METAL PATTERNING

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND METHO...

PROFILE TWISTING CONTROL IN DIELECTRIC ETCH

PLASMA PROCESSING DEVICE

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

PLASMA PROCESSING APPARATUS, CALCULATION METHOD, AND CALCULATION PR...

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

PLASMA PROCESSING APPARATUS

Plasma Processing with Magnetic Ring X Point

VACUUM DEPOSITION INTO TRENCHES AND VIAS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS