magnetic

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H01J2237/055

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/055magnetic

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for metal contamination control in an ion impl...
- Patent number 11,923,169
- Issue date Mar 5, 2024
- Axcelis Technologies, Inc.
- Causon Ko-Chuan Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 11,804,355
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and beam park device
- Patent number 11,017,978
- Issue date May 25, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Takanori Yagita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and method of controlling ion implanter
- Patent number 10,854,418
- Issue date Dec 1, 2020
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Haruka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam irradiation apparatus
- Patent number 10,714,302
- Issue date Jul 14, 2020
- NISSIN ION EQUIPMENT CO., LTD.
- Tetsuro Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post column filter with enhanced energy range
- Patent number 10,431,420
- Issue date Oct 1, 2019
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus
- Patent number 10,361,066
- Issue date Jul 23, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Haruka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator and method of controlling ion generator
- Patent number 10,283,326
- Issue date May 7, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Kawaguchi
- B08 - CLEANING
Information Patent Grant
Mass analyzing electromagnet and ion beam irradiation apparatus
- Patent number 9,728,390
- Issue date Aug 8, 2017
- Nissin ION Equipment Co., Ltd.
- Junichi Tatemichi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for transmitting a broadband ion beam and ion implanter
- Patent number 9,263,230
- Issue date Feb 16, 2016
- BEIJING ZHONGKEXIN ELECTRONICS EQUIPMENT CO., LTD.
- Libo Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broadband ion beam analyzer
- Patent number 9,123,522
- Issue date Sep 1, 2015
- BEIJING ZHONGKEXIN ELECTRONICS EQUIPMENT CO., LTD.
- Libo Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dual energy implantation for ultra-shallow junction form...
- Patent number 9,024,281
- Issue date May 5, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- Hanming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mass analyzer apparatus and systems operative for focusing ribbon i...
- Patent number 8,921,802
- Issue date Dec 30, 2014
- Nicholas R. White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam bending magnet for a ribbon-shaped ion beam
- Patent number 8,723,135
- Issue date May 13, 2014
- Nissin Ion Equipment Co., Ltd.
- Hilton Frank Glavish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mass analysis variable exit aperture
- Patent number 8,669,517
- Issue date Mar 11, 2014
- Axcelis Technologies, Inc.
- William O. Hamby
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dual energy implantation for ultra-shallow junction form...
- Patent number 8,466,050
- Issue date Jun 18, 2013
- Semiconductor Manufacturing International (Shanghai) Corporation
- Hanming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample transfer device and sample transferring method
- Patent number 8,410,457
- Issue date Apr 2, 2013
- Hitachi, Ltd.
- Shohei Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resolution energy-selecting electron beam apparatus
- Patent number 8,373,137
- Issue date Feb 12, 2013
- Nion Co.
- Ondrej L. Krivanek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration-corrected wien ExB mass filter with removal of neutrals...
- Patent number 8,283,629
- Issue date Oct 9, 2012
- FEI Company
- David Tuggle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mass analysis magnet for a ribbon beam
- Patent number 8,263,941
- Issue date Sep 11, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Victor Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced low energy ion beam transport in ion implantation
- Patent number 8,237,135
- Issue date Aug 7, 2012
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Collimator magnet for ion implantation system
- Patent number 8,164,070
- Issue date Apr 24, 2012
- Nissin Ion Equipment Co., Ltd.
- Dan Nicolaescu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam quality in FIB systems
- Patent number 8,053,725
- Issue date Nov 8, 2011
- FEI Company
- Gregory A. Schwind
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for ion beam implantation using ribbon and sp...
- Patent number 7,902,527
- Issue date Mar 8, 2011
- Jiong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus
- Patent number 7,888,652
- Issue date Feb 15, 2011
- Nissin Ion Equipment Co., Ltd.
- Hideki Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broad energy-range ribbon ion beam collimation using a variable-gra...
- Patent number 7,829,866
- Issue date Nov 9, 2010
- Kenneth H. Purser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanting apparatus and method of correcting beam orbit
- Patent number 7,772,573
- Issue date Aug 10, 2010
- Nissin Ion Equipment Co., Ltd.
- Tetsuya Igo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for plasma injection
- Patent number 7,723,707
- Issue date May 25, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam processing system and beam processing method
- Patent number 7,718,980
- Issue date May 18, 2010
- Sen Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoelectron microscope
- Patent number 7,718,961
- Issue date May 18, 2010
- Raymond Browning
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS
- Publication number 20220068587
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR METAL CONTAMINATION CONTROL IN AN ION IMPL...
- Publication number 20210249222
- Publication date Aug 12, 2021
- Axcelis Technologies, Inc.
- Causon Ko-Chuan Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND BEAM PARK DEVICE
- Publication number 20200152409
- Publication date May 14, 2020
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Takanori Yagita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM IRRADIATION APPARATUS
- Publication number 20190371563
- Publication date Dec 5, 2019
- NISSIN ION EQUIPMENT CO., LTD.
- Tetsuro YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND METHOD OF CONTROLLING ION IMPLANTER
- Publication number 20190157035
- Publication date May 23, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Haruka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS
- Publication number 20180330920
- Publication date Nov 15, 2018
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Haruka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATOR AND METHOD OF CONTROLLING ION GENRATOR
- Publication number 20170140898
- Publication date May 18, 2017
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Kawaguchi
- B08 - CLEANING
Information Patent Application
METHOD FOR TRANSMITTING A BROADBAND ION BEAM AND ION IMPLANTER
- Publication number 20150069261
- Publication date Mar 12, 2015
- BEIJING ZHONGKEXIN ELECTRONICS EQUIPMENT CO., LTD.
- Libo Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BROADBAND ION BEAM ANALYZER
- Publication number 20140312223
- Publication date Oct 23, 2014
- Libo Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DUAL ENERGY IMPLANTATION FOR ULTRA-SHALLOW JUNCTION FORM...
- Publication number 20130264491
- Publication date Oct 10, 2013
- Hanming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Beam Bending Magnet for a Ribbon-Shaped Ion Beam
- Publication number 20130256552
- Publication date Oct 3, 2013
- NISSIN ION EQUIPMENT CO., LTD.
- Hilton Frank Glavish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR PRODUCING A MASS ANALYZED ION BEAM FOR HIGH T...
- Publication number 20130001414
- Publication date Jan 3, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mass Analysis Variable Exit Aperture
- Publication number 20120298854
- Publication date Nov 29, 2012
- Axcelis Technologies, Inc.
- William O. Hamby
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION-CORRECTED WIEN EXB MASS FILTER WITH REMOVAL OF NEUTRALS...
- Publication number 20120261566
- Publication date Oct 18, 2012
- FEI Company
- David Tuggle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mass analyzer apparatus and systems operative for focusing ribbon i...
- Publication number 20120235053
- Publication date Sep 20, 2012
- Nicholas R. White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR PRODUCING A MASS ANALYZED ION BEAM
- Publication number 20120168622
- Publication date Jul 5, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High resolution energy-selecting electron beam apparatus
- Publication number 20120074315
- Publication date Mar 29, 2012
- Nion Co.
- Ondrej L. Krivanek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE TRANSFER DEVICE AND SAMPLE TRANSFERRING METHOD
- Publication number 20110180724
- Publication date Jul 28, 2011
- Hitachi, Ltd.
- Shohei TERADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DUAL ENERGY IMPLANTATION FOR ULTRA-SHALLOW JUNCTION FORM...
- Publication number 20110143512
- Publication date Jun 16, 2011
- Semiconductor Manufacturing International (Shanghai) Corporation
- HANMING WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM QUALITY IN FIB SYSTEMS
- Publication number 20100327180
- Publication date Dec 30, 2010
- FEI Company
- Gregory A. Schwind
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED LOW ENERGY ION BEAM TRANSPORT IN ION IMPLANTATION
- Publication number 20100181499
- Publication date Jul 22, 2010
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COLLIMATOR MAGNET FOR ION IMPLANTATION SYSTEM
- Publication number 20100140494
- Publication date Jun 10, 2010
- NISSIN ION EQUIPMENT CO., LTD.
- Dan NICOLAESCU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASS ANALYSIS MAGNET FOR A RIBBON BEAM
- Publication number 20100116983
- Publication date May 13, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Victor Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTING APPARATUS AND METHOD OF CORRECTING BEAM ORBIT
- Publication number 20090302214
- Publication date Dec 10, 2009
- NISSIN ION EQUIPMENT CO., LTD.
- Tetsuya Igo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR ION BEAM IMPLANTATION USING RIBBON AND SP...
- Publication number 20090189096
- Publication date Jul 30, 2009
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Jiong CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR PLASMA INJECTION
- Publication number 20090026390
- Publication date Jan 29, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM GUIDANCE MAGNET
- Publication number 20080315113
- Publication date Dec 25, 2008
- Dirk Diehl
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Broad energy-range ribbon ion beam collimation using a variable-gra...
- Publication number 20080302972
- Publication date Dec 11, 2008
- Kenneth H. Purser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR CONFINING ELECTRONS IN AN ION IMPLANTER
- Publication number 20080135775
- Publication date Jun 12, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Donna L. Smatlak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER
- Publication number 20080135777
- Publication date Jun 12, 2008
- Takatoshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and method for metal contamination control in an ion impl...

Apparatus for multiple charged-particle beams

Ion implanter and beam park device

Ion implanter and method of controlling ion implanter

Ion beam irradiation apparatus

Post column filter with enhanced energy range

Ion implantation apparatus

Ion generator and method of controlling ion generator

Mass analyzing electromagnet and ion beam irradiation apparatus

Method for transmitting a broadband ion beam and ion implanter

Broadband ion beam analyzer

Method for dual energy implantation for ultra-shallow junction form...

Mass analyzer apparatus and systems operative for focusing ribbon i...

Ion beam bending magnet for a ribbon-shaped ion beam

Mass analysis variable exit aperture

Method for dual energy implantation for ultra-shallow junction form...

Sample transfer device and sample transferring method

High resolution energy-selecting electron beam apparatus

Aberration-corrected wien ExB mass filter with removal of neutrals...

Mass analysis magnet for a ribbon beam

Enhanced low energy ion beam transport in ion implantation

Collimator magnet for ion implantation system

Beam quality in FIB systems

Apparatus and methods for ion beam implantation using ribbon and sp...

Ion implantation apparatus

Broad energy-range ribbon ion beam collimation using a variable-gra...

Ion implanting apparatus and method of correcting beam orbit

Techniques for plasma injection

Beam processing system and beam processing method

Photoelectron microscope

Patents Applicationslast 30 patents

APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS

APPARATUS AND METHOD FOR METAL CONTAMINATION CONTROL IN AN ION IMPL...

ION IMPLANTER AND BEAM PARK DEVICE

ION BEAM IRRADIATION APPARATUS

ION IMPLANTER AND METHOD OF CONTROLLING ION IMPLANTER

ION IMPLANTATION APPARATUS

ION GENERATOR AND METHOD OF CONTROLLING ION GENRATOR

METHOD FOR TRANSMITTING A BROADBAND ION BEAM AND ION IMPLANTER

BROADBAND ION BEAM ANALYZER

METHOD FOR DUAL ENERGY IMPLANTATION FOR ULTRA-SHALLOW JUNCTION FORM...

Ion Beam Bending Magnet for a Ribbon-Shaped Ion Beam

SYSTEM AND METHOD FOR PRODUCING A MASS ANALYZED ION BEAM FOR HIGH T...

Mass Analysis Variable Exit Aperture

ABERRATION-CORRECTED WIEN EXB MASS FILTER WITH REMOVAL OF NEUTRALS...

Mass analyzer apparatus and systems operative for focusing ribbon i...

SYSTEM AND METHOD FOR PRODUCING A MASS ANALYZED ION BEAM

High resolution energy-selecting electron beam apparatus

SAMPLE TRANSFER DEVICE AND SAMPLE TRANSFERRING METHOD

METHOD FOR DUAL ENERGY IMPLANTATION FOR ULTRA-SHALLOW JUNCTION FORM...

BEAM QUALITY IN FIB SYSTEMS

ENHANCED LOW ENERGY ION BEAM TRANSPORT IN ION IMPLANTATION

COLLIMATOR MAGNET FOR ION IMPLANTATION SYSTEM

MASS ANALYSIS MAGNET FOR A RIBBON BEAM

ION IMPLANTING APPARATUS AND METHOD OF CORRECTING BEAM ORBIT

APPARATUS AND METHODS FOR ION BEAM IMPLANTATION USING RIBBON AND SP...

TECHNIQUES FOR PLASMA INJECTION

BEAM GUIDANCE MAGNET

Broad energy-range ribbon ion beam collimation using a variable-gra...

TECHNIQUES FOR CONFINING ELECTRONS IN AN ION IMPLANTER

ION IMPLANTER