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H01J37/3255

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3255Material

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Laminated aerosol deposition coating for aluminum components for pl...
- Patent number 12,198,902
- Issue date Jan 14, 2025
- Lam Research Corporation
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HTCC antenna for generation of microplasma
- Patent number 12,198,897
- Issue date Jan 14, 2025
- Inficon, Inc.
- Shawn Briglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for particle control in MRAM processing
- Patent number 12,176,192
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Han Kuo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrode for plasma processing apparatus and plasma processing app...
- Patent number 12,165,850
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Takaki Kobune
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of plasma sheath with bias supplies
- Patent number 12,142,460
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interlocking fastening upper electrode assembly having improved fas...
- Patent number 12,104,638
- Issue date Oct 1, 2024
- TEM CO., LTD.
- Jin Kyung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,080,526
- Issue date Sep 3, 2024
- Jusung Engineering Co., Ltd.
- Woong Kyo Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thread profiles for semiconductor process chamber components
- Patent number 12,068,137
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Reyn Tetsuro Wakabayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus and deposition method using the same
- Patent number 12,051,569
- Issue date Jul 30, 2024
- Samsung Display Co., Ltd.
- Kwan Yong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower plate, lower dielectric member and plasma processing apparatus
- Patent number 12,046,455
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for joining quartz pieces and quartz electrodes and other de...
- Patent number 12,020,971
- Issue date Jun 25, 2024
- Watlow Electric Manufacturing Company
- Brent Elliot
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Forming method of component and plasma processing apparatus
- Patent number 11,967,487
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and semiconductor device manufacturing...
- Patent number 11,929,239
- Issue date Mar 12, 2024
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,923,170
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,908,666
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and method of cleaning vacuum processin...
- Patent number 11,901,162
- Issue date Feb 13, 2024
- ULVAC, Inc.
- Takehisa Miyaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sector shunts for plasma-based wafer processing systems
- Patent number 11,887,820
- Issue date Jan 30, 2024
- COMET Technologies USA, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source utilizing a macro-particle reduction coating and meth...
- Patent number 11,875,976
- Issue date Jan 16, 2024
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for hydrogen sulfide dissociation in electric arc
- Patent number 11,875,975
- Issue date Jan 16, 2024
- REDSHIFT ENERGY, INC.
- Alexander Gutsol
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Mechanical suppression of parasitic plasma in substrate processing...
- Patent number 11,862,435
- Issue date Jan 2, 2024
- Lam Research Corporation
- Douglas Keil
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,862,436
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Toru Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,842,884
- Issue date Dec 12, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic showerheads with conductive electrodes
- Patent number 11,834,744
- Issue date Dec 5, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, plasma generating apparatus, and me...
- Patent number 11,804,365
- Issue date Oct 31, 2023
- Kokusai Electric Corporation
- Tsuyoshi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge seal for lower electrode assembly
- Patent number 11,781,650
- Issue date Oct 10, 2023
- Lam Research Corporation
- David Schaefer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,784,030
- Issue date Oct 10, 2023
- Canon Anelva Corporation
- Atsushi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intake plasma generator systems and methods
- Patent number 11,773,811
- Issue date Oct 3, 2023
- ThrivalTech, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for particle control in MRAM processing
- Patent number 11,776,796
- Issue date Oct 3, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Han Kuo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma source with ceramic electrode plate
- Patent number 11,776,793
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Robert B. Moore
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240429028
- Publication date Dec 26, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Kensuke WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING METHOD
- Publication number 20240420914
- Publication date Dec 19, 2024
- Jiangsu Favored Nanotechnology Co., Ltd.
- Jian ZONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...
- Publication number 20240339299
- Publication date Oct 10, 2024
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CCP GAS DELIVERY NOZZLE
- Publication number 20240339301
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION APPARATUS, SYSTEM, AND METHOD
- Publication number 20240312762
- Publication date Sep 19, 2024
- Matthew Steele
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM
- Publication number 20240304425
- Publication date Sep 12, 2024
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Othmar ZÜGER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240297024
- Publication date Sep 5, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Ren ARITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240249922
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
- Publication number 20240234099
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
METHODS FOR FORMING SEMICONDUCTOR DEVICES USING MODIFIED PHOTOMASK...
- Publication number 20240222118
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Peng WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20240212995
- Publication date Jun 27, 2024
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20240203704
- Publication date Jun 20, 2024
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE FIXING ASSEMBLY AND DRY ETCHING DEVICE
- Publication number 20240186120
- Publication date Jun 6, 2024
- Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Zhiyuan LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240170265
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOOLS AND METHODS FOR SUBTRACTIVE METAL PATTERNING
- Publication number 20240162058
- Publication date May 16, 2024
- Intel Corporation
- Christopher J. Jezewski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MECHANICAL SUPPRESSION OF PARASITIC PLASMA IN SUBSTRATE PROCESSING...
- Publication number 20240162013
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Douglas KEIL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20240153749
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CATALYTIC NANOFIBER MEMBRANE ASSEMBLY AND REDUCED PRESSURE PLASMA R...
- Publication number 20240128059
- Publication date Apr 18, 2024
- The UAB Research Foundation
- Andrei V. Stanishevsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY
- Publication number 20240077138
- Publication date Mar 7, 2024
- LAM RESEARCH CORPORATION
- David SCHAEFER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR GENERATING ATMOSPHERIC PRESSURE, LOW TEMP...
- Publication number 20240066161
- Publication date Feb 29, 2024
- TellaPure, LLC
- Edgar Bryan Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240062994
- Publication date Feb 22, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Kensuke WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYCRYSTALLINE SiC COMPACT AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240055236
- Publication date Feb 15, 2024
- Tokai Carbon Co., Ltd.
- Yohei Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND ME...
- Publication number 20240055237
- Publication date Feb 15, 2024
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HTCC ANTENNA FOR GENERATION OF MICROPLASMA
- Publication number 20240047178
- Publication date Feb 8, 2024
- Inficon, Inc.
- Shawn Briglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT DEVICE AND ELECTRODE MECHANISM
- Publication number 20230402263
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20230395354
- Publication date Dec 7, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR PARTICLE CONTROL IN MRAM PROCESSING
- Publication number 20230386806
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Tsung-Han KUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPOT TYPE ATMOSPHERIC PRESSURE PLASMA DEVICE
- Publication number 20230377847
- Publication date Nov 23, 2023
- CREATING NANO TECHNOLOGIES, INC.
- Yi-Ming HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIDE AREA ATMOSPHERIC PRESSURE PLASMA DEVICE
- Publication number 20230377846
- Publication date Nov 23, 2023
- CREATING NANO TECHNOLOGIES, INC.
- Yi-Ming HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20230343563
- Publication date Oct 26, 2023
- SEMES CO., LTD.
- Jin Hee HONG
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Laminated aerosol deposition coating for aluminum components for pl...

HTCC antenna for generation of microplasma

System and method for particle control in MRAM processing

Electrode for plasma processing apparatus and plasma processing app...

Spatial control of plasma processing environments

Control of plasma sheath with bias supplies

Interlocking fastening upper electrode assembly having improved fas...

Substrate processing apparatus

Thread profiles for semiconductor process chamber components

Deposition apparatus and deposition method using the same

Shower plate, lower dielectric member and plasma processing apparatus

Method for joining quartz pieces and quartz electrodes and other de...

Forming method of component and plasma processing apparatus

Plasma processing apparatus and semiconductor device manufacturing...

Plasma processing apparatus and plasma processing method

Stage and plasma processing apparatus

Vacuum processing apparatus and method of cleaning vacuum processin...

Sector shunts for plasma-based wafer processing systems

Plasma source utilizing a macro-particle reduction coating and meth...

Method and device for hydrogen sulfide dissociation in electric arc

Mechanical suppression of parasitic plasma in substrate processing...

Plasma processing apparatus and plasma processing method

Spatial monitoring and control of plasma processing environments

Ceramic showerheads with conductive electrodes

Substrate processing apparatus, plasma generating apparatus, and me...

Edge seal for lower electrode assembly

Plasma processing apparatus

Intake plasma generator systems and methods

System and method for particle control in MRAM processing

Plasma source with ceramic electrode plate

Patents Applicationslast 30 patents

ACTIVE GAS GENERATION APPARATUS

COATING METHOD

MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...

CCP GAS DELIVERY NOZZLE

PLASMA GENERATION APPARATUS, SYSTEM, AND METHOD

ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM

ACTIVE GAS GENERATION APPARATUS

PLASMA PROCESSING APPARATUS

FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS

METHODS FOR FORMING SEMICONDUCTOR DEVICES USING MODIFIED PHOTOMASK...

APPARATUS FOR TREATING SUBSTRATE

APPARATUS FOR TREATING SUBSTRATE

ELECTRODE FIXING ASSEMBLY AND DRY ETCHING DEVICE

PLASMA PROCESSING APPARATUS

TOOLS AND METHODS FOR SUBTRACTIVE METAL PATTERNING

MECHANICAL SUPPRESSION OF PARASITIC PLASMA IN SUBSTRATE PROCESSING...

STAGE AND PLASMA PROCESSING APPARATUS

CATALYTIC NANOFIBER MEMBRANE ASSEMBLY AND REDUCED PRESSURE PLASMA R...

EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY

METHODS AND APPARATUS FOR GENERATING ATMOSPHERIC PRESSURE, LOW TEMP...

ACTIVE GAS GENERATION APPARATUS

POLYCRYSTALLINE SiC COMPACT AND METHOD FOR MANUFACTURING THE SAME

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND ME...

HTCC ANTENNA FOR GENERATION OF MICROPLASMA

PLASMA TREATMENT DEVICE AND ELECTRODE MECHANISM

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

SYSTEM AND METHOD FOR PARTICLE CONTROL IN MRAM PROCESSING

SPOT TYPE ATMOSPHERIC PRESSURE PLASMA DEVICE

WIDE AREA ATMOSPHERIC PRESSURE PLASMA DEVICE

SUBSTRATE TREATING APPARATUS