Matting or other surface reflectivity altering material

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CPC
Y10S430/151

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/151Matting or other surface reflectivity altering material

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photoimageable branched polymer
- Patent number 8,206,893
- Issue date Jun 26, 2012
- Brewer Science Inc.
- Hao Xu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Wet developable bottom antireflective coating composition and metho...
- Patent number 8,202,678
- Issue date Jun 19, 2012
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive conductive paste for transferring and photosensitive...
- Patent number 8,021,821
- Issue date Sep 20, 2011
- Noritake Co., Limited
- Atsushi Nagai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for forming anti-reflective coat
- Patent number 7,947,424
- Issue date May 24, 2011
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive hardmask for microlithography
- Patent number 7,939,244
- Issue date May 10, 2011
- Brewer Science Inc.
- Hao Xu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive paste and process for production of pattern using th...
- Patent number 7,887,992
- Issue date Feb 15, 2011
- E. I. Du Pont de Nemours and Company
- Kazushige Ito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor constructions
- Patent number 7,825,443
- Issue date Nov 2, 2010
- Micron Technology, Inc.
- Richard Holscher
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Heat-sensitive transfer image-receiving sheet and coating compositi...
- Patent number 7,820,359
- Issue date Oct 26, 2010
- FUJIFILM Corporation
- Toshihide Yoshitani
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Process of imaging a photoresist with multiple antireflective coatings
- Patent number 7,816,071
- Issue date Oct 19, 2010
- AZ Electronic Materials USA Corp.
- David J. Abdallah
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Heat-sensitive transfer image-receiving sheet and coating compositi...
- Patent number 7,807,330
- Issue date Oct 5, 2010
- FUJIFILM Corporation
- Toshihide Yoshitani
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Alkali-developable black photosensitive resin composition for formi...
- Patent number 7,749,682
- Issue date Jul 6, 2010
- Nippon Sheet Glass Co., Ltd.
- Hidekazu Miyabe
- G02 - OPTICS
Information Patent Grant
Composite photoresist structure
- Patent number 7,718,345
- Issue date May 18, 2010
- United Microelectronics Corp.
- Jui-Tsen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antireflective hardmask and uses thereof
- Patent number 7,648,820
- Issue date Jan 19, 2010
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices having antireflective material
- Patent number 7,626,238
- Issue date Dec 1, 2009
- Micron Technology, Inc.
- Richard Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin bowl compatible polyamic acids/imides as wet developable polym...
- Patent number 7,608,380
- Issue date Oct 27, 2009
- Brewer Science Inc.
- Robert Christian Cox
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Antireflection film, polarizing plate and display device
- Patent number 7,592,121
- Issue date Sep 22, 2009
- Fujifilm Corporation
- Yuuzou Muramatsu
- G02 - OPTICS
Information Patent Grant
Fabrication of semiconductor devices using anti-reflective coatings
- Patent number 7,589,015
- Issue date Sep 15, 2009
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photocurable and thermosetting resin composition, dry film using th...
- Patent number 7,585,611
- Issue date Sep 8, 2009
- Taiyo Ink Mfg. Co., Ltd.
- Kenji Kato
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Wet developable bottom antireflective coating composition and metho...
- Patent number 7,563,563
- Issue date Jul 21, 2009
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Nanocomposite photoresist composition for imaging thick films
- Patent number 7,524,606
- Issue date Apr 28, 2009
- AZ Electronic Materials USA Corp.
- Chunwei Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive working heat-sensitive lithographic printing plate precursor
- Patent number 7,455,953
- Issue date Nov 25, 2008
- Agfa Graphics, N.V.
- Veerle Verschueren
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pearlescent textured imaging supports
- Patent number 7,449,287
- Issue date Nov 11, 2008
- Eastman Kodak Company
- Narasimharao Dontula
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Fabrication of semiconductor devices using anti-reflective coatings
- Patent number 7,390,738
- Issue date Jun 24, 2008
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithography process using multiple anti-reflective coatings
- Patent number 7,387,866
- Issue date Jun 17, 2008
- Micron Technology, Inc.
- Philip J. Ireland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor device
- Patent number 7,384,728
- Issue date Jun 10, 2008
- United Microelectronics Corp.
- Jui-Tsen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silver salt photothermographic dry imaging material and image formi...
- Patent number 7,326,527
- Issue date Feb 5, 2008
- Konica Minolta Medical & Graphic, Inc.
- Narito Goto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor substrate process using a low temperature deposited c...
- Patent number 7,323,401
- Issue date Jan 29, 2008
- Applied Materials, Inc.
- Kartik Ramaswamy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrode-forming composition for field emission type of display de...
- Patent number 7,303,854
- Issue date Dec 4, 2007
- E. I. Du Pont de Nemours and Company
- Keiichiro Hayakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoacid generating polymer, its preparation method, top anti-refl...
- Patent number 7,303,858
- Issue date Dec 4, 2007
- Hynix Semiconductor Inc.
- Jae Chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for simulating spot varnish on a surprint proof
- Patent number 7,294,445
- Issue date Nov 13, 2007
- Eastman Kodak Company
- Eileen T. Henry
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE PASTE AND PROCESS FOR PRODUCTION OF PATTERN USING TH...
- Publication number 20100159391
- Publication date Jun 24, 2010
- E.I. Du Pont De Nemours and Company
- KAZUSHIGE ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN BOWL COMPATIBLE POLYAMIC ACIDS/IMIDES AS WET DEVELOPABLE POLYM...
- Publication number 20100040988
- Publication date Feb 18, 2010
- Robert Christian Cox
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive hardmask for microlithography
- Publication number 20090297784
- Publication date Dec 3, 2009
- Hao Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHO...
- Publication number 20090291392
- Publication date Nov 26, 2009
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FABRICATION OF SEMICONDUCTOR DEVICES USING ANTI-REFLECTIVE COATINGS
- Publication number 20090203206
- Publication date Aug 13, 2009
- GURTEJ S. SANDHU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive conductive paste for transferring and photosensitive...
- Publication number 20090197203
- Publication date Aug 6, 2009
- NORITAKE CO., LIMITED
- Atsushi Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALKALI-DEVELOPABLE BLACK PHOTOSENSITIVE RESIN COMPOSITION FOR FORMI...
- Publication number 20090111048
- Publication date Apr 30, 2009
- TAIYO INK MFG. CO., LTD.
- Hidekazu MIYABE
- G02 - OPTICS
Information Patent Application
PHOTOIMAGEABLE BRANCHED POLYMER
- Publication number 20090111057
- Publication date Apr 30, 2009
- Hao Xu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITE PHOTORESIST STRUCTURE
- Publication number 20080193875
- Publication date Aug 14, 2008
- Jui-Tsen Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HEAT-SENSITIVE TRANSFER IMAGE-RECEIVING SHEET AND COATING COMPOSITI...
- Publication number 20080090178
- Publication date Apr 17, 2008
- FUJIFILM CORPORATION
- Toshihide Yoshitani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HEAT-SENSITIVE TRANSFER IMAGE-RECEIVING SHEET AND COATING COMPOSITI...
- Publication number 20080081765
- Publication date Apr 3, 2008
- FUJIFILM CORPORATION
- Toshihide Yoshitani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Wet developable bottom antireflective coating composition and metho...
- Publication number 20070243484
- Publication date Oct 18, 2007
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Semiconductor constructions
- Publication number 20070238207
- Publication date Oct 11, 2007
- Richard Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILVER SALT PHOTOTHERMOGRAPHIC DRY IMAGING MATERIAL AND IMAGE FORMI...
- Publication number 20070202447
- Publication date Aug 30, 2007
- KONICA MINOLTA MEDICAL & GRAPHIC, INC.
- Narito GOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOCURABLE AND THERMOSETTING RESIN COMPOSITION, DRY FILM USING TH...
- Publication number 20070122742
- Publication date May 31, 2007
- Kenji KATO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Antireflective Hardmask and Uses Thereof
- Publication number 20070105363
- Publication date May 10, 2007
- International Business Machines Corporation
- Katherina E. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE FORMING METHOD USING PHOTOTHERMOGRAPHIC MATERIAL
- Publication number 20070105059
- Publication date May 10, 2007
- KONICA MINOLTA MEDICAL & GRAPHIC, INC.
- Narito Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for printing contacts on a substrate
- Publication number 20070102397
- Publication date May 10, 2007
- Uwe Paul Schroeder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor substrate process using a low temperature deposited c...
- Publication number 20070032054
- Publication date Feb 8, 2007
- APPLIED MATERIALS, INC.
- Kartik Ramaswamy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of fabricating a semiconductor device
- Publication number 20060286486
- Publication date Dec 21, 2006
- Jui-Tsen Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nanocomposite photoresist composition for imaging thick films
- Publication number 20060228644
- Publication date Oct 12, 2006
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor constructions
- Publication number 20060220186
- Publication date Oct 5, 2006
- Micron Technology, Inc.
- Richard Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Image forming method using photothermographic material
- Publication number 20060216657
- Publication date Sep 28, 2006
- KONICA MINOLTA MEDICAL & GRAPHIC, INC.
- Narito Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fabrication of semiconductor devices using anti-reflective coatings
- Publication number 20060199397
- Publication date Sep 7, 2006
- Gurtej S. Sandhu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for producing an image using a first minimum bottom antiref...
- Publication number 20060199103
- Publication date Sep 7, 2006
- Mark O. Neisser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for forming an ultra fine pattern using a bottom anti-refle...
- Publication number 20060183050
- Publication date Aug 17, 2006
- Hynix Semiconductor Inc.
- Sung Koo Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process of imaging a photoresist with multiple antireflective coatings
- Publication number 20060177774
- Publication date Aug 10, 2006
- David J. Abdallah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electrode-forming composition for field emission type of display de...
- Publication number 20060160018
- Publication date Jul 20, 2006
- Keiichiro Hayakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoacid generating polymer, its preparation method and top anti-r...
- Publication number 20060127804
- Publication date Jun 15, 2006
- HYNIX SEMICONDUCTOR INC.
- Jae Chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Apparatus and method to improve resist line roughness in semiconduc...
- Publication number 20060110685
- Publication date May 25, 2006
- IBM CORPORATION
- Wai-kin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Matting or other surface reflectivity altering material

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoimageable branched polymer

Wet developable bottom antireflective coating composition and metho...

Photosensitive conductive paste for transferring and photosensitive...

Composition for forming anti-reflective coat

Photosensitive hardmask for microlithography

Photosensitive paste and process for production of pattern using th...

Semiconductor constructions

Heat-sensitive transfer image-receiving sheet and coating compositi...

Process of imaging a photoresist with multiple antireflective coatings

Heat-sensitive transfer image-receiving sheet and coating compositi...

Alkali-developable black photosensitive resin composition for formi...

Composite photoresist structure

Antireflective hardmask and uses thereof

Semiconductor devices having antireflective material

Spin bowl compatible polyamic acids/imides as wet developable polym...

Antireflection film, polarizing plate and display device

Fabrication of semiconductor devices using anti-reflective coatings

Photocurable and thermosetting resin composition, dry film using th...

Wet developable bottom antireflective coating composition and metho...

Nanocomposite photoresist composition for imaging thick films

Positive working heat-sensitive lithographic printing plate precursor

Pearlescent textured imaging supports

Fabrication of semiconductor devices using anti-reflective coatings

Photolithography process using multiple anti-reflective coatings

Method of fabricating a semiconductor device

Silver salt photothermographic dry imaging material and image formi...

Semiconductor substrate process using a low temperature deposited c...

Electrode-forming composition for field emission type of display de...

Photoacid generating polymer, its preparation method, top anti-refl...

Method for simulating spot varnish on a surprint proof

Patents Applicationslast 30 patents

PHOTOSENSITIVE PASTE AND PROCESS FOR PRODUCTION OF PATTERN USING TH...

SPIN BOWL COMPATIBLE POLYAMIC ACIDS/IMIDES AS WET DEVELOPABLE POLYM...

Photosensitive hardmask for microlithography

WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHO...

FABRICATION OF SEMICONDUCTOR DEVICES USING ANTI-REFLECTIVE COATINGS

Photosensitive conductive paste for transferring and photosensitive...

ALKALI-DEVELOPABLE BLACK PHOTOSENSITIVE RESIN COMPOSITION FOR FORMI...

PHOTOIMAGEABLE BRANCHED POLYMER

COMPOSITE PHOTORESIST STRUCTURE

HEAT-SENSITIVE TRANSFER IMAGE-RECEIVING SHEET AND COATING COMPOSITI...

HEAT-SENSITIVE TRANSFER IMAGE-RECEIVING SHEET AND COATING COMPOSITI...

Wet developable bottom antireflective coating composition and metho...

Semiconductor constructions

SILVER SALT PHOTOTHERMOGRAPHIC DRY IMAGING MATERIAL AND IMAGE FORMI...

PHOTOCURABLE AND THERMOSETTING RESIN COMPOSITION, DRY FILM USING TH...

Antireflective Hardmask and Uses Thereof

IMAGE FORMING METHOD USING PHOTOTHERMOGRAPHIC MATERIAL

Method for printing contacts on a substrate

Semiconductor substrate process using a low temperature deposited c...

Method of fabricating a semiconductor device

Nanocomposite photoresist composition for imaging thick films

Semiconductor constructions

Image forming method using photothermographic material

Fabrication of semiconductor devices using anti-reflective coatings

Process for producing an image using a first minimum bottom antiref...

Process for forming an ultra fine pattern using a bottom anti-refle...

Process of imaging a photoresist with multiple antireflective coatings

Electrode-forming composition for field emission type of display de...

Photoacid generating polymer, its preparation method and top anti-r...

Apparatus and method to improve resist line roughness in semiconduc...