Means for adjusting the focus

Industry

CPC
H01J37/21

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/21Means for adjusting the focus

Industries

Patents Grantslast 30 patents

Information Patent Grant
Mechanism for adjusting angle of incidence on charged particle beam...
- Patent number 12,119,202
- Issue date Oct 15, 2024
- HITACHI HIGH-TECH CORPORATION
- Shunichi Motomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection apparatus and method
- Patent number 12,072,181
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Yan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and axis adjustment method thereof
- Patent number 12,027,342
- Issue date Jul 2, 2024
- HITACHI HIGH-TECH CORPORATION
- Yuta Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for examining a beam of charged particles
- Patent number 11,961,705
- Issue date Apr 16, 2024
- Carl Zeiss SMT GmbH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conduction inspection method for multipole aberration corrector, an...
- Patent number 11,915,902
- Issue date Feb 27, 2024
- NuFlare Technology, Inc.
- Atsushi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a particle beam microscope
- Patent number 11,915,907
- Issue date Feb 27, 2024
- Carl Zeiss Microscopy GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope device and electron beam inspection ap...
- Patent number 11,908,657
- Issue date Feb 20, 2024
- Zhongke Jingyuan Electron Limited
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filament-less electron source
- Patent number 11,887,805
- Issue date Jan 30, 2024
- FEI Company
- John Stiller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring a sample and microscope implementing the method
- Patent number 11,848,172
- Issue date Dec 19, 2023
- Carl Zeiss SMT GmbH
- Dmitry Klochkov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, and systems and methods for operat...
- Patent number 11,798,777
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Martinus Gerardus Maria Johannes Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus adjustment method for charged particle beam device and charge...
- Patent number 11,776,786
- Issue date Oct 3, 2023
- Jeol Ltd.
- Kazunori Tsukamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and axis adjustment method thereof
- Patent number 11,764,028
- Issue date Sep 19, 2023
- HITACHI HIGH-TECH CORPORATION
- Yuta Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam processing apparatus
- Patent number 11,721,517
- Issue date Aug 8, 2023
- Hitachi High-Tech Science Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and method of adjusting focus of electron micro...
- Patent number 11,670,479
- Issue date Jun 6, 2023
- HITACHI HIGH-TECH CORPORATION
- Takeyoshi Ohashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam adjustment method, charged particle beam draw...
- Patent number 11,658,002
- Issue date May 23, 2023
- NuFlare Technology, Inc.
- Ryoichi Kakehi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of creating multiple electron beams
- Patent number 11,651,934
- Issue date May 16, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Time-dependent defect inspection apparatus
- Patent number 11,651,935
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Chih-Yu Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,626,266
- Issue date Apr 11, 2023
- HITACHI HIGH-TECH CORPORATION
- Keiichiro Hitomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of automatically focusing a charged particle beam on a surfa...
- Patent number 11,610,755
- Issue date Mar 21, 2023
- Applied Materials, Inc.
- Robert Trauner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ion focusing device
- Patent number 11,605,531
- Issue date Mar 14, 2023
- Battelle Memorial Institute
- Yehia M. Ibrahim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for determining a property of a sample that is to...
- Patent number 11,587,762
- Issue date Feb 21, 2023
- FEI Company
- Maarten Kuijper
- G01 - MEASURING TESTING
Information Patent Grant
Scanning electron microscope
- Patent number 11,562,882
- Issue date Jan 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system
- Patent number 11,562,881
- Issue date Jan 24, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,557,457
- Issue date Jan 17, 2023
- HITACHI HIGH-TECH CORPORATION
- Kosuke Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for learning-guided electron microscopy
- Patent number 11,557,459
- Issue date Jan 17, 2023
- Massachusetts Institute of Technology
- Nir Shavit
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam device, autofocus processing method of charge...
- Patent number 11,538,659
- Issue date Dec 27, 2022
- HITACHI HIGH-TECH CORPORATION
- Mitsuhiro Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Objective lens arrangement usable in particle-optical systems
- Patent number 11,527,379
- Issue date Dec 13, 2022
- Carl Zeiss Microscopy GmbH
- Rainer Knippelmeyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,521,836
- Issue date Dec 6, 2022
- Samsung Electronics Co., Ltd.
- Eun-Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resolution electron beam apparatus with dual-aperture schemes
- Patent number 11,508,591
- Issue date Nov 22, 2022
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, scanning electron microscope, and...
- Patent number 11,469,072
- Issue date Oct 11, 2022
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Pavel Adamec
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR OPERATING AN ELECTRON BEAM SYSTEM
- Publication number 20240379326
- Publication date Nov 14, 2024
- CARL ZEISS MICROSCOPY GMBH
- Bjoern Gamm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION APPARATUS AND METHOD
- Publication number 20240369356
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Yan WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS
- Publication number 20240355577
- Publication date Oct 24, 2024
- Eldico Scientific AG
- Gunther STEINFELD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE ELECTRON AND PHOTON RADIO FREQUENCY TIMER
- Publication number 20240274422
- Publication date Aug 15, 2024
- Amur Margaryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RESOLUTION, LOW ENERGY ELECTRON MICROSCOPE FOR PROVIDING TOPOG...
- Publication number 20240272099
- Publication date Aug 15, 2024
- Carl Zeiss SMT GMBH
- Daniel Schwarz
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...
- Publication number 20240258065
- Publication date Aug 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Dirk Preikszas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20240242924
- Publication date Jul 18, 2024
- V TECHNOLOGY CO., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242920
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20240186108
- Publication date Jun 6, 2024
- Hitachi High-Tech Corporation
- Hirokazu TAMAKI
- G01 - MEASURING TESTING
Information Patent Application
USING LASER BEAM FOR SEM BASE TOOLS, WORKING DISTANCE MEASUREMENT A...
- Publication number 20240177962
- Publication date May 30, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Ofer Dudovitch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Adjusting Charged Particle Optical System and Charged Par...
- Publication number 20240145211
- Publication date May 2, 2024
- JEOL Ltd.
- Shigeyuki Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE DEVICE AND METHOD
- Publication number 20240087835
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTO-FOCUS SENSOR IMPLEMENTATION FOR MULTI-COLUMN MICROSCOPES
- Publication number 20240079203
- Publication date Mar 7, 2024
- KLA Corporation
- Nicholas Petrone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL AUTO-FOCUS UNIT AND A METHOD FOR AUTO-FOCUS
- Publication number 20240071715
- Publication date Feb 29, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Sissi Lachmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MACHINE VISION-BASED AUTOMATIC FOCUSING AND AUTOMATIC CENTERING MET...
- Publication number 20240062988
- Publication date Feb 22, 2024
- East China University of Science and Technology
- Yabin YAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mechanism for Adjusting Angle of Incidence on Charged Particle Beam...
- Publication number 20240029992
- Publication date Jan 25, 2024
- Hitachi High-Tech Corporation
- Shunichi MOTOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM AND METHOD
- Publication number 20230420213
- Publication date Dec 28, 2023
- FEI Company
- Alexander HENSTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20230411111
- Publication date Dec 21, 2023
- HITACHI HIGH-TECH CORPORATION
- Tetsuro KADOWAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Axis Adjustment Method Thereof
- Publication number 20230377829
- Publication date Nov 23, 2023
- HITACHI HIGH-TECH CORPORATION
- Yuta IMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SCANNING OPERATION MODE OF SECONDARY-ELECTRON PROJECTION IMAGI...
- Publication number 20230377831
- Publication date Nov 23, 2023
- ASML NETHERLANDS B.V.
- Oleg KRUPIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Permanent Magnetic Lens Having Shunting Device
- Publication number 20230360878
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Dietmar Puchberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF DETERMINING ABERRATIONS OF A CHARGED PARTICLE BEAM, AND...
- Publication number 20230352268
- Publication date Nov 2, 2023
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Dominik Ehberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR DIRECTING CHARGED PARTICLE BEAM TOWARDS A...
- Publication number 20230326706
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20230317406
- Publication date Oct 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Yuto KAWASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IMAGING A SAMPLE WITH A CHARGED PARTICLE BEAM DEVICE, MET...
- Publication number 20230253177
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Kulpreet Singh VIRDI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PARTICLE BEAM MICROSCOPE AND ASSOCIATED METHOD WITH FAST A...
- Publication number 20230245852
- Publication date Aug 3, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus and Focus Adjusting Method Therefor
- Publication number 20230230798
- Publication date Jul 20, 2023
- Hitachi High-Tech Corporation
- Keisuke IGARASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR ADJUSTING IMAGE CAPTUR...
- Publication number 20230230796
- Publication date Jul 20, 2023
- HITACHI HIGH-TECH CORPORATION
- Tomohito NAKANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam System and Method of Correcting Deviation of Field...
- Publication number 20230230801
- Publication date Jul 20, 2023
- JEOL Ltd.
- Yuichiro Ohori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Milling Sample
- Publication number 20230197401
- Publication date Jun 22, 2023
- JEOL Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS

Means for adjusting the focus

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mechanism for adjusting angle of incidence on charged particle beam...

Inspection apparatus and method

Charged particle beam device and axis adjustment method thereof

Method and apparatus for examining a beam of charged particles

Conduction inspection method for multipole aberration corrector, an...

Method for operating a particle beam microscope

Scanning electron microscope device and electron beam inspection ap...

Filament-less electron source

Method for measuring a sample and microscope implementing the method

Charged particle beam apparatus, and systems and methods for operat...

Focus adjustment method for charged particle beam device and charge...

Charged particle beam device and axis adjustment method thereof

Focused ion beam processing apparatus

Electron microscope and method of adjusting focus of electron micro...

Charged particle beam adjustment method, charged particle beam draw...

Systems and methods of creating multiple electron beams

Time-dependent defect inspection apparatus

Charged particle beam device

Method of automatically focusing a charged particle beam on a surfa...

Ion focusing device

Device and method for determining a property of a sample that is to...

Scanning electron microscope

Charged particle beam system

Charged particle beam apparatus

System and method for learning-guided electron microscopy

Charged particle beam device, autofocus processing method of charge...

Objective lens arrangement usable in particle-optical systems

Plasma processing apparatus

High resolution electron beam apparatus with dual-aperture schemes

Charged particle beam apparatus, scanning electron microscope, and...

Patents Applicationslast 30 patents

METHOD FOR OPERATING AN ELECTRON BEAM SYSTEM

INSPECTION APPARATUS AND METHOD

CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS

SINGLE ELECTRON AND PHOTON RADIO FREQUENCY TIMER

HIGH RESOLUTION, LOW ENERGY ELECTRON MICROSCOPE FOR PROVIDING TOPOG...

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...

FOCUSED ION BEAM SYSTEM

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

Charged Particle Beam System

USING LASER BEAM FOR SEM BASE TOOLS, WORKING DISTANCE MEASUREMENT A...

Method of Adjusting Charged Particle Optical System and Charged Par...

CHARGED PARTICLE DEVICE AND METHOD

AUTO-FOCUS SENSOR IMPLEMENTATION FOR MULTI-COLUMN MICROSCOPES

OPTICAL AUTO-FOCUS UNIT AND A METHOD FOR AUTO-FOCUS

MACHINE VISION-BASED AUTOMATIC FOCUSING AND AUTOMATIC CENTERING MET...

Mechanism for Adjusting Angle of Incidence on Charged Particle Beam...

FOCUSED ION BEAM SYSTEM AND METHOD

Charged Particle Beam Apparatus

Charged Particle Beam Device and Axis Adjustment Method Thereof

ANTI-SCANNING OPERATION MODE OF SECONDARY-ELECTRON PROJECTION IMAGI...

Adjustable Permanent Magnetic Lens Having Shunting Device

METHODS OF DETERMINING ABERRATIONS OF A CHARGED PARTICLE BEAM, AND...

APPARATUS AND METHOD FOR DIRECTING CHARGED PARTICLE BEAM TOWARDS A...

Charged Particle Beam System

METHOD OF IMAGING A SAMPLE WITH A CHARGED PARTICLE BEAM DEVICE, MET...

MULTIPLE PARTICLE BEAM MICROSCOPE AND ASSOCIATED METHOD WITH FAST A...

Charged Particle Beam Apparatus and Focus Adjusting Method Therefor

CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR ADJUSTING IMAGE CAPTUR...

Focused Ion Beam System and Method of Correcting Deviation of Field...

Apparatus and Method for Milling Sample