Means for controlling or selecting resonance mode

Industry

CPC
H01J37/32284

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32284Means for controlling or selecting resonance mode

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Bias supply with resonant switching
- Patent number 11,942,309
- Issue date Mar 26, 2024
- Advanced Energy Industries, Inc.
- Maneesh Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma reactor for manufacturing synthetic diamond material
- Patent number 11,488,805
- Issue date Nov 1, 2022
- Element Six Technologies Limited
- John Robert Brandon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resonator coil having an asymmetrical profile
- Patent number 11,094,504
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma reactor for manufacturing synthetic diamond material
- Patent number 10,734,198
- Issue date Aug 4, 2020
- Element Six Technologies Limited
- John Robert Brandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma systems and methods of processing using thereof
- Patent number 10,490,425
- Issue date Nov 26, 2019
- Infineon Technologies AG
- Manfred Engelhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma reactor for manufacturing synthetic diamond material
- Patent number 10,403,477
- Issue date Sep 3, 2019
- Element Six Technologies Limited
- John Robert Brandon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for large area plasma processing
- Patent number 10,242,843
- Issue date Mar 26, 2019
- HELYSSEN Sàrl
- Philippe Guittienne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,096,454
- Issue date Oct 9, 2018
- Tokyo Electron Limited
- Naohiko Okunishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma reactors and substrates for synthetic diamond manu...
- Patent number 9,738,970
- Issue date Aug 22, 2017
- Element Six Limited
- Carlton Nigel Dodge
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Microwave plasma processing method
- Patent number 7,170,027
- Issue date Jan 30, 2007
- Toyo Seikan Kaisha Ltd.
- Hideo Kurashima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment apparatus and method of producing semiconductor de...
- Patent number 6,797,112
- Issue date Sep 28, 2004
- Hitachi, Ltd.
- Naoshi Itabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for treating the inside surface of plastic bot...
- Patent number 6,565,791
- Issue date May 20, 2003
- Tetra Laval Holdings & Finance S.A.
- Jacques Laurent
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma treatment apparatus
- Patent number 6,390,018
- Issue date May 21, 2002
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangement for producing plasma
- Patent number 6,191,532
- Issue date Feb 20, 2001
- Leybold Systems GmbH
- Michael Liehr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,158,383
- Issue date Dec 12, 2000
- Hitachi, Ltd.
- Seiichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treating device
- Patent number 6,087,614
- Issue date Jul 11, 2000
- Tokyo Electron Limited
- Shuichi Ishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma discharge device with dynamic tuning by a movable microwave...
- Patent number 6,057,645
- Issue date May 2, 2000
- Eaton Corporation
- Aseem K. Srivastava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generator with mode restricting means
- Patent number 5,646,489
- Issue date Jul 8, 1997
- Hitachi, Ltd.
- Yutaka Kakehi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for plasma treatment of a surface
- Patent number 5,645,645
- Issue date Jul 8, 1997
- Board of Trustees operating Michigan State University
- Jie Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for plasma vapor chemical deposition of homogeneo...
- Patent number 5,643,365
- Issue date Jul 1, 1997
- Ceram Optec Industries Inc.
- L. M. Blinov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for plasma treatment of a surface
- Patent number 5,571,577
- Issue date Nov 5, 1996
- Board of Trustees operating Michigan State University
- Jie Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for generating plasma, and semiconductor proc...
- Patent number 5,433,789
- Issue date Jul 18, 1995
- Hitachi, Ltd.
- Yutaka Kakehi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma processing apparatus
- Patent number 5,172,083
- Issue date Dec 15, 1992
- Nippon Steel Corporation
- Ryota Hidaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for coupling a microwave source in an electron...
- Patent number 5,111,111
- Issue date May 5, 1992
- Consortium for Surface Processing, Inc.
- James E. Stevens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus with layered microwave window used in microwave plasma ch...
- Patent number 5,038,712
- Issue date Aug 13, 1991
- Canon Kabushiki Kaisha
- Yasutomo Fujiyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave traveling-wave diamond production device and method
- Patent number 4,958,590
- Issue date Sep 25, 1990
- General Atomics
- Robert R. Goforth
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor for diamond synthesis
- Patent number 4,940,015
- Issue date Jul 10, 1990
- Kabushiki Kaisha Kobe Seiko Sho
- Koji Kobashi
- C30 - CRYSTAL GROWTH
Information Patent Grant
Plasma generating apparatus using magnets and method
- Patent number 4,727,293
- Issue date Feb 23, 1988
- Board of Trustees operating Michigan State University
- Jes Asmussen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual plasma microwave apparatus and method for treating a surface
- Patent number 4,691,662
- Issue date Sep 8, 1987
- Michigan State University
- Thaddeus A. Roppel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave or UHF plasma improved apparatus
- Patent number 4,630,566
- Issue date Dec 23, 1986
- Board of Trustees operating Michigan State University
- Jes Asmussen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD
- Publication number 20240203692
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Shin OOWADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIAS SUPPLY WITH RESONANT SWITCHING
- Publication number 20240194452
- Publication date Jun 13, 2024
- Advanced Energy Industries, Inc.
- Maneesh Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIAS SUPPLY WITH RESONANT SWITCHING
- Publication number 20230253187
- Publication date Aug 10, 2023
- Advanced Energy Industries, Inc.
- Maneesh Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESONATOR COIL HAVING AN ASYMMETRICAL PROFILE
- Publication number 20210343500
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL
- Publication number 20190318917
- Publication date Oct 17, 2019
- ELEMENT SIX TECHNOLOGIES LIMITED
- JOHN ROBERT BRANDON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING AN ANNULAR THIN FILM OF SYNTHETIC MATERIAL...
- Publication number 20190267215
- Publication date Aug 29, 2019
- NEOCOAT SA
- David Rats
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150262793
- Publication date Sep 17, 2015
- TOKYO ELECTRON LIMITED
- Naohiko OKUNISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA REACTORS AND SUBSTRATES FOR SYNTHETIC DIAMOND MANU...
- Publication number 20140234556
- Publication date Aug 21, 2014
- ELEMENT SIX LIMITED
- Carlton Nigel Dodge
- C30 - CRYSTAL GROWTH
Information Patent Application
MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL
- Publication number 20140230729
- Publication date Aug 21, 2014
- ELEMENT SIX LIMITED
- John Robert Brandon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120186747
- Publication date Jul 26, 2012
- Shinji OBAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave plasma processing method
- Publication number 20070000879
- Publication date Jan 4, 2007
- Hideo Kurashima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma treatment apparatus and method of producing semiconductor de...
- Publication number 20030203641
- Publication date Oct 30, 2003
- Hitachi, Ltd.
- Naoshi Itabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treatment apparatus and method of producing semiconductor de...
- Publication number 20020129904
- Publication date Sep 19, 2002
- Hitachi, Ltd.
- Naoshi Itabashi
- H01 - BASIC ELECTRIC ELEMENTS

Means for controlling or selecting resonance mode

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Bias supply with resonant switching

Microwave plasma reactor for manufacturing synthetic diamond material

Resonator coil having an asymmetrical profile

Microwave plasma reactor for manufacturing synthetic diamond material

Plasma systems and methods of processing using thereof

Microwave plasma reactor for manufacturing synthetic diamond material

Apparatus for large area plasma processing

Plasma processing apparatus

Microwave plasma reactors and substrates for synthetic diamond manu...

Microwave plasma processing method

Plasma treatment apparatus and method of producing semiconductor de...

Method and apparatus for treating the inside surface of plastic bot...

Microwave plasma treatment apparatus

Arrangement for producing plasma

Plasma processing method and apparatus

Plasma treating device

Plasma discharge device with dynamic tuning by a movable microwave...

Plasma generator with mode restricting means

Method and apparatus for plasma treatment of a surface

Method and device for plasma vapor chemical deposition of homogeneo...

Method and apparatus for plasma treatment of a surface

Methods and apparatus for generating plasma, and semiconductor proc...

Microwave plasma processing apparatus

Method and apparatus for coupling a microwave source in an electron...

Apparatus with layered microwave window used in microwave plasma ch...

Microwave traveling-wave diamond production device and method

Plasma reactor for diamond synthesis

Plasma generating apparatus using magnets and method

Dual plasma microwave apparatus and method for treating a surface

Microwave or UHF plasma improved apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD

BIAS SUPPLY WITH RESONANT SWITCHING

BIAS SUPPLY WITH RESONANT SWITCHING

RESONATOR COIL HAVING AN ASYMMETRICAL PROFILE

MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL

METHOD FOR MANUFACTURING AN ANNULAR THIN FILM OF SYNTHETIC MATERIAL...

PLASMA PROCESSING APPARATUS

MICROWAVE PLASMA REACTORS AND SUBSTRATES FOR SYNTHETIC DIAMOND MANU...

MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL

PLASMA PROCESSING APPARATUS

Microwave plasma processing method

Plasma treatment apparatus and method of producing semiconductor de...

Plasma treatment apparatus and method of producing semiconductor de...