Means for controlling the discharge

Industry

CPC
H01J2237/04

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/04Means for controlling the discharge

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for inspecting a specimen and charged particle beam device
- Patent number 12,362,131
- Issue date Jul 15, 2025
- Applied Materials Israel Ltd.
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor chamber components with advanced coating techniques
- Patent number 12,362,150
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle beam column
- Patent number 12,362,129
- Issue date Jul 15, 2025
- Carl Zeiss Microscopy GmbH
- Erik Essers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple landing energy scanning electron microscopy systems and me...
- Patent number 12,354,833
- Issue date Jul 8, 2025
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor analysis system
- Patent number 12,347,707
- Issue date Jul 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Yudai Kubo
- G05 - CONTROLLING REGULATING
Information Patent Grant
Charged particle beam pattern forming device and charged particle b...
- Patent number 12,347,641
- Issue date Jul 1, 2025
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus and methods of operating t...
- Patent number 12,347,643
- Issue date Jul 1, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system including a multi-beam deflection device and a...
- Patent number 12,340,973
- Issue date Jun 24, 2025
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-leaf collimator and driving system
- Patent number 12,334,230
- Issue date Jun 17, 2025
- Shanghai United Imaging Healthcare Co., Ltd.
- Jian Zhang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Circuits for edge ring control in shaped dc pulsed plasma process d...
- Patent number 12,334,311
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam system and method of correcting deviation of field...
- Patent number 12,334,300
- Issue date Jun 17, 2025
- Jeol Ltd.
- Yuichiro Ohori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle blocking element, exposure apparatus comprising su...
- Patent number 12,327,707
- Issue date Jun 10, 2025
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three layer resonator coil for linear accelerator
- Patent number 12,308,206
- Issue date May 20, 2025
- Applied Materials, Inc.
- William Herron Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle beam system
- Patent number 12,293,896
- Issue date May 6, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam device having a deflection unit
- Patent number 12,288,664
- Issue date Apr 29, 2025
- Carl Zeiss Microscopy GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 12,283,452
- Issue date Apr 22, 2025
- HITACHI HIGH-TECH CORPORATION
- Hiroshi Morita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas reservoir, gas feed device having a gas reservoir, and particle...
- Patent number 12,283,456
- Issue date Apr 22, 2025
- Carl Zeiss Microscopy GmbH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating multiple electron beams with a photocathode film
- Patent number 12,283,453
- Issue date Apr 22, 2025
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection apparatus
- Patent number 12,261,015
- Issue date Mar 25, 2025
- NuFlare Technology, Inc.
- Atsushi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam particle beam system and method for operating same
- Patent number 12,255,040
- Issue date Mar 18, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system for azimuthal deflection of individual particl...
- Patent number 12,249,478
- Issue date Mar 11, 2025
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slit diaphragm
- Patent number 12,243,730
- Issue date Mar 4, 2025
- Singulus Technologies AG
- Peter Weipert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bottom and middle edge rings
- Patent number 12,237,154
- Issue date Feb 25, 2025
- Lam Research Corporation
- Hiran Rajitha Rathnasinghe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for determining the virtual source location of a liquid met...
- Patent number 12,237,142
- Issue date Feb 25, 2025
- FEI Company
- Sean M. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,237,143
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 12,237,144
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle emission device, system, method, and program
- Patent number 12,230,478
- Issue date Feb 18, 2025
- Shishido Electrostatic, Ltd.
- Katsuyuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of local control of a charged particle beam
- Patent number 12,230,469
- Issue date Feb 18, 2025
- ASML Netherlands B.V.
- Albertus Victor Gerardus Mangnus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,211,669
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 12,202,019
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE PARTICLE BEAM SYSTEM WITH PROLONGED MAINTENANCE INTERVAL
- Publication number 20250232943
- Publication date Jul 17, 2025
- Carl Zeiss MultiSEM GmbH
- Ticia Buhr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20250232945
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION EXTRACTION OPTICS FOR ION PROCESSING SYSTEM
- Publication number 20250232942
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Costel BILOIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM
- Publication number 20250232951
- Publication date Jul 17, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM TUBE
- Publication number 20250218719
- Publication date Jul 3, 2025
- Carl Zeiss MultiSEM GmbH
- Michael Kelp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STATIC ELECTRCITY CONTROL DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM
- Publication number 20250218745
- Publication date Jul 3, 2025
- NEXTIN, INC.
- Heung-Gyoon PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIMODE DOSE COMPENSATION SYSTEM
- Publication number 20250218722
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Klaus PETRY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION
- Publication number 20250208074
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR VOLTAGE CONTRAST IMAGING WITH A CORPUSCULAR MULTI-BEAM M...
- Publication number 20250210302
- Publication date Jun 26, 2025
- Carl Zeiss MultiSEM GmbH
- Gregor Frank Dellemann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250183004
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Hwasoo SEOK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Transmission electron microscopy with square beams
- Publication number 20250166956
- Publication date May 22, 2025
- New York Structural Biology Center
- Eugene Yue Dao Chau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE...
- Publication number 20250157789
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Jungwook SHON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20250157783
- Publication date May 15, 2025
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DETERMINING THE VIRTUAL SOURCE LOCATION OF A LIQUID MET...
- Publication number 20250157780
- Publication date May 15, 2025
- FEI Company
- Sean M. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
X-RAY IMAGING SYSTEM FOR RADIATION THERAPY
- Publication number 20250140515
- Publication date May 1, 2025
- Shanghai United Imaging Healthcare Co., Ltd.
- Buliang SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC ION BEAM SHAPE SELECTION
- Publication number 20250140510
- Publication date May 1, 2025
- Applied Materials, Inc.
- Richard Allen SPRENKLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PARAMETER IMPLANTATION FOR MANAGING WAFER DISTORTION
- Publication number 20250140567
- Publication date May 1, 2025
- Applied Materials, Inc.
- Stanislav S. TODOROV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM AND MIDDLE EDGE RINGS
- Publication number 20250132135
- Publication date Apr 24, 2025
- LAM RESEARCH CORPORATION
- Hiran Rajitha RATHNASINGHE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE MICROSCOPE DESIGN WITH MIRROR FOR FIELD...
- Publication number 20250132124
- Publication date Apr 24, 2025
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTOR DEVICE, ELECTRON BEAM APPARATUS, AND METHOD FOR INSPECTING...
- Publication number 20250125118
- Publication date Apr 17, 2025
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Birgit Schabinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR REMOVING STATIC ELECTRICITY OF SEMICONDUCTOR SUBSTRATE
- Publication number 20250125139
- Publication date Apr 17, 2025
- NEXTIN, INC.
- Seoung-Ju NA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM SYSTEM AND MULTI-BEAM FORMING UNIT WITH REDUCED SENSITIV...
- Publication number 20250125115
- Publication date Apr 17, 2025
- Carl Zeiss MultiSEM GmbH
- Christian Veit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR PLASMA PROCESSING
- Publication number 20250118532
- Publication date Apr 10, 2025
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION
- Publication number 20250112017
- Publication date Apr 3, 2025
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20250112023
- Publication date Apr 3, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTION SYSTEMS AND CHARGED PARTICLE MICROSCOPE SYSTE...
- Publication number 20250112016
- Publication date Apr 3, 2025
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ENERGY IMPLANTER WITH SMALL FOOTPRINT
- Publication number 20250104965
- Publication date Mar 27, 2025
- Axcelis Technologies, Inc.
- Wilhelm Platow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...
- Publication number 20250104980
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Changbae PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH IMPROVED IMAGING OF...
- Publication number 20250104966
- Publication date Mar 27, 2025
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL DEVICE
- Publication number 20250095950
- Publication date Mar 20, 2025
- ASML NETHERLANDS B.V.
- Paul IJmert SCHEFFERS
- H01 - BASIC ELECTRIC ELEMENTS

Means for controlling the discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for inspecting a specimen and charged particle beam device

Semiconductor chamber components with advanced coating techniques

Particle beam column

Multiple landing energy scanning electron microscopy systems and me...

Semiconductor analysis system

Charged particle beam pattern forming device and charged particle b...

Multiple charged-particle beam apparatus and methods of operating t...

Particle beam system including a multi-beam deflection device and a...

Multi-leaf collimator and driving system

Circuits for edge ring control in shaped dc pulsed plasma process d...

Focused ion beam system and method of correcting deviation of field...

Charged particle blocking element, exposure apparatus comprising su...

Three layer resonator coil for linear accelerator

Particle beam system

Particle beam device having a deflection unit

Charged particle beam apparatus

Gas reservoir, gas feed device having a gas reservoir, and particle...

Creating multiple electron beams with a photocathode film

Electron beam inspection apparatus

Multi-beam particle beam system and method for operating same

Particle beam system for azimuthal deflection of individual particl...

Slit diaphragm

Bottom and middle edge rings

Methods for determining the virtual source location of a liquid met...

Apparatus of plural charged-particle beams

Apparatus using multiple beams of charged particles

Charged particle emission device, system, method, and program

Apparatus for and method of local control of a charged particle beam

Multiple charged-particle beam apparatus with low crosstalk

Method and system for the removal and/or avoidance of contamination...

Patents Applicationslast 30 patents

MULTIPLE PARTICLE BEAM SYSTEM WITH PROLONGED MAINTENANCE INTERVAL

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

ION EXTRACTION OPTICS FOR ION PROCESSING SYSTEM

PARTICLE BEAM SYSTEM

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM TUBE

STATIC ELECTRCITY CONTROL DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM

MULTIMODE DOSE COMPENSATION SYSTEM

SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION

METHOD FOR VOLTAGE CONTRAST IMAGING WITH A CORPUSCULAR MULTI-BEAM M...

PLASMA PROCESSING APPARATUS

Transmission electron microscopy with square beams

E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE...

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

METHODS FOR DETERMINING THE VIRTUAL SOURCE LOCATION OF A LIQUID MET...

X-RAY IMAGING SYSTEM FOR RADIATION THERAPY

DYNAMIC ION BEAM SHAPE SELECTION

MULTI-PARAMETER IMPLANTATION FOR MANAGING WAFER DISTORTION

BOTTOM AND MIDDLE EDGE RINGS

MULTI-BEAM CHARGED PARTICLE MICROSCOPE DESIGN WITH MIRROR FOR FIELD...

DETECTOR DEVICE, ELECTRON BEAM APPARATUS, AND METHOD FOR INSPECTING...

APPARATUS FOR REMOVING STATIC ELECTRICITY OF SEMICONDUCTOR SUBSTRATE

MULTI-BEAM SYSTEM AND MULTI-BEAM FORMING UNIT WITH REDUCED SENSITIV...

SYSTEM AND METHOD FOR PLASMA PROCESSING

IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

ABERRATION CORRECTION SYSTEMS AND CHARGED PARTICLE MICROSCOPE SYSTE...

HIGH ENERGY IMPLANTER WITH SMALL FOOTPRINT

SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...

MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH IMPROVED IMAGING OF...

ELECTRON-OPTICAL DEVICE