Means for controlling the discharge

Industry

CPC
H01J2237/04

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/04Means for controlling the discharge

Industries

Patents Grantslast 30 patents

Information Patent Grant
Multi-modal operations for multi-beam inspection system
- Patent number 12,183,543
- Issue date Dec 31, 2024
- ASML Netherlands B.V.
- Martinus Gerardus Johannes Maria Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom and middle edge rings
- Patent number 12,183,554
- Issue date Dec 31, 2024
- Lam Research Corporation
- Hiran Rajitha Rathnasinghe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission electron microscope and inspection method using transm...
- Patent number 12,170,184
- Issue date Dec 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Toshie Yaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,165,830
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Shichen Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of image-forming multi-electron beams
- Patent number 12,165,831
- Issue date Dec 10, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam pattern device having beam absorber structure
- Patent number 12,154,756
- Issue date Nov 26, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle emission device, system, method, and program
- Patent number 12,154,762
- Issue date Nov 26, 2024
- Shishido Electrostatic, Ltd.
- Katsuyuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for implanting particles into a substrate
- Patent number 12,125,670
- Issue date Oct 22, 2024
- MI2-FACTORY GMBH
- Constantin Csato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source charged particle illumination apparatus
- Patent number 12,125,671
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Stijn Wilem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and the use thereof for flexibly setting the c...
- Patent number 12,119,204
- Issue date Oct 15, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to correct first order astigmatism and first order distortio...
- Patent number 12,106,933
- Issue date Oct 1, 2024
- FEI Company
- Jan Stopka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom electrode assembly, plasma processing apparatus, and method...
- Patent number 12,094,693
- Issue date Sep 17, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Jiangtao Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 12,080,515
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for spatial charged particle bunching
- Patent number 12,068,130
- Issue date Aug 20, 2024
- NexGen Semi Holding, Inc.
- Mark Joseph Bennahmias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a multiple particle beam system while altering...
- Patent number 12,057,290
- Issue date Aug 6, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam irradiation apparatus and maintenance method for elec...
- Patent number 12,033,828
- Issue date Jul 9, 2024
- NHV CORPORATION
- Masahiro Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,033,830
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus
- Patent number 12,014,911
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Shota Ishibashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Drawing apparatus and deflector
- Patent number 12,009,174
- Issue date Jun 11, 2024
- NuFlare Technology, Inc.
- Kazuhiro Kishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for generating a diffraction image
- Patent number 12,009,176
- Issue date Jun 11, 2024
- FEI Company
- Bart Buijsse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,984,295
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RFSOI semiconductor structures including a nitrogen-doped charge-tr...
- Patent number 11,984,477
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear accelerator coil including multiple fluid channels
- Patent number 11,985,756
- Issue date May 14, 2024
- Applied Materials, Inc.
- Robert B. Vopat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam irradiation apparatus and maintenance method for elec...
- Patent number 11,984,293
- Issue date May 14, 2024
- NHV CORPORATION
- Masahiro Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam grid layout
- Patent number RE49952
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,961,697
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device for inspection of a specimen with a pl...
- Patent number 11,961,709
- Issue date Apr 16, 2024
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for real time stereo imaging using multiple ele...
- Patent number 11,942,303
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20240429022
- Publication date Dec 26, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME
- Publication number 20240412407
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Junghee Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BLANKING APERTURE ARRAY MECHANISM AND WRITING APPARATUS
- Publication number 20240395493
- Publication date Nov 28, 2024
- NuFlare Technology, Inc.
- Toshiki KUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS
- Publication number 20240395495
- Publication date Nov 28, 2024
- UChicago Argonne, LLC
- Brahim Mustapha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD
- Publication number 20240387151
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- BENJAMIN ALEXANDROVICH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE ELECTRON BEAM OPTICS
- Publication number 20240387140
- Publication date Nov 21, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Alon Litman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VOLTAGE CONTROL FOR ETCHING SYSTEMS
- Publication number 20240387139
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...
- Publication number 20240379325
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Frank Nan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20240379318
- Publication date Nov 14, 2024
- HITACHI HIGH-TECH CORPORATION
- Keigo KASUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...
- Publication number 20240379322
- Publication date Nov 14, 2024
- Carl Zeiss MultiSEM GmbH
- Alexander Wertz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...
- Publication number 20240371608
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Ryan Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS
- Publication number 20240355577
- Publication date Oct 24, 2024
- Eldico Scientific AG
- Gunther STEINFELD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING
- Publication number 20240347323
- Publication date Oct 17, 2024
- VELVETCH LLC
- David Irwin Margolese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...
- Publication number 20240347316
- Publication date Oct 17, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...
- Publication number 20240331968
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE OPTICAL DEVICE
- Publication number 20240321547
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ADJUSTING BEAM CURRENT USING A FEEDBACK LOOP...
- Publication number 20240312758
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Zheng FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES
- Publication number 20240304423
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Determining Focal Properties in a Target Beam Field of a...
- Publication number 20240304415
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM MICROSCOPE
- Publication number 20240304410
- Publication date Sep 12, 2024
- CARL ZEISS MICROSCOPY GMBH
- Erik Essers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS
- Publication number 20240297010
- Publication date Sep 5, 2024
- NuFlare Technology, Inc.
- Eita FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...
- Publication number 20240290571
- Publication date Aug 29, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...
- Publication number 20240282550
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Reducing Particle Formation in a Process Cham...
- Publication number 20240274404
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TR...
- Publication number 20240274659
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Apparatus
- Publication number 20240258062
- Publication date Aug 1, 2024
- HITACHI HIGH-TECH CORPORATION
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...
- Publication number 20240258065
- Publication date Aug 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Dirk Preikszas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Dose Cup Assembly for an Ion Implanter
- Publication number 20240249908
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Frank Sinclair
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20240249912
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS

Means for controlling the discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-modal operations for multi-beam inspection system

Bottom and middle edge rings

Transmission electron microscope and inspection method using transm...

Multiple charged-particle beam apparatus with low crosstalk

Method and system of image-forming multi-electron beams

Beam pattern device having beam absorber structure

Charged particle emission device, system, method, and program

Device and method for implanting particles into a substrate

Multi-source charged particle illumination apparatus

Particle beam system and the use thereof for flexibly setting the c...

Method to correct first order astigmatism and first order distortio...

Bottom electrode assembly, plasma processing apparatus, and method...

Apparatus of plural charged-particle beams

Energy filter element for ion implantation systems for the use in t...

Apparatus for multiple charged-particle beams

Method and device for spatial charged particle bunching

Method for operating a multiple particle beam system while altering...

Electron-beam irradiation apparatus and maintenance method for elec...

Multiple charged-particle beam apparatus with low crosstalk

Sputtering apparatus

Drawing apparatus and deflector

Method and system for generating a diffraction image

Charged particle assessment tool, inspection method

RFSOI semiconductor structures including a nitrogen-doped charge-tr...

Linear accelerator coil including multiple fluid channels

Electron-beam irradiation apparatus and maintenance method for elec...

Beam grid layout

Apparatus using charged particle beams

Charged particle beam device for inspection of a specimen with a pl...

Systems and methods for real time stereo imaging using multiple ele...

Patents Applicationslast 30 patents

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME

BLANKING APERTURE ARRAY MECHANISM AND WRITING APPARATUS

COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS

INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD

MULTIPLE ELECTRON BEAM OPTICS

VOLTAGE CONTROL FOR ETCHING SYSTEMS

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...

CHARGED PARTICLE BEAM DEVICE

MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...

SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...

CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS

COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING

METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...

CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...

CHARGED-PARTICLE OPTICAL DEVICE

SYSTEM AND METHOD FOR ADJUSTING BEAM CURRENT USING A FEEDBACK LOOP...

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES

Method for Determining Focal Properties in a Target Beam Field of a...

ELECTRON BEAM MICROSCOPE

CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS

CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...

BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...

System and Method for Reducing Particle Formation in a Process Cham...

RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TR...

Ion Milling Apparatus

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...

Dose Cup Assembly for an Ion Implanter

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD