Means for coupling power to the plasma

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H01J37/32211

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32211Means for coupling power to the plasma

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 12,125,679
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition apparatus and method with EM radiation
- Patent number 12,110,587
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tze-Liang Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method of low temperature thin film deposition and in-si...
- Patent number 12,018,374
- Issue date Jun 25, 2024
- DSGI Technologies, Inc.
- Jeffrey Edward Kowalski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 11,972,930
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,908,666
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate supporting unit and a substrate processing device includi...
- Patent number 11,866,823
- Issue date Jan 9, 2024
- ASM IP Holding B.V.
- SeungHwan Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma source for spatial plasma enhanced atomic layer de...
- Patent number 11,823,871
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modular microwave plasma source
- Patent number 11,404,248
- Issue date Aug 2, 2022
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Uniform pumping dual-station vacuum processor
- Patent number 11,387,084
- Issue date Jul 12, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Yuejun Gong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generalized cylindrical cavity system for microwave rotation and im...
- Patent number 11,195,699
- Issue date Dec 7, 2021
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elementary device for producing a plasma, having a coaxial applicator
- Patent number 11,120,972
- Issue date Sep 14, 2021
- SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQU...
- Louis Latrasse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave output device and plasma processing device
- Patent number 11,031,213
- Issue date Jun 8, 2021
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave plasma source
- Patent number 10,748,745
- Issue date Aug 18, 2020
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Generalized cylindrical cavity system for microwave rotation and im...
- Patent number 10,340,124
- Issue date Jul 2, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source and plasma processing apparatus
- Patent number 10,319,567
- Issue date Jun 11, 2019
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for generating plasma by means of microwaves
- Patent number 10,290,471
- Issue date May 14, 2019
- MUEGGE GMBH
- Horst Muegge
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma source and plasma processing apparatus
- Patent number 10,211,032
- Issue date Feb 19, 2019
- Tokyo Electron Limited
- Tomohito Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chemical vapor deposition device
- Patent number 10,151,033
- Issue date Dec 11, 2018
- Toyota Jidosha Kabushiki Kaisha
- Yoji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 10,145,014
- Issue date Dec 4, 2018
- Tokyo Electron Limited
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave surface-wave plasma device
- Patent number 9,947,515
- Issue date Apr 17, 2018
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing insulating film laminated structure
- Patent number 9,887,081
- Issue date Feb 6, 2018
- Tokyo Electron Limited
- Junya Miyahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System of inspecting focus ring and method of inspecting focus ring
- Patent number 9,841,395
- Issue date Dec 12, 2017
- Tokyo Electron Limited
- Kippei Sugita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave surface-wave plasma device
- Patent number 9,793,095
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,691,591
- Issue date Jun 27, 2017
- Tokyo Electron Limited
- Masahide Iwasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus and microwave supplying method
- Patent number 9,633,821
- Issue date Apr 25, 2017
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma generation antenna
- Patent number 9,543,123
- Issue date Jan 10, 2017
- TOKYO ELECTRONICS LIMITED
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma generating device and method for operating same
- Patent number 9,431,217
- Issue date Aug 30, 2016
- Meyer Burger (Germany) AG
- Joachim Mai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Microwave plasma processing apparatus and microwave supplying method
- Patent number 9,305,751
- Issue date Apr 5, 2016
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma treatment and method for plasma treatment
- Patent number 9,277,637
- Issue date Mar 1, 2016
- Tokyo Electron Limited
- Toshihisa Nozawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Microwave waveguide apparatus, plasma processing apparatus and plas...
- Patent number 9,252,000
- Issue date Feb 2, 2016
- National University Corporation Nagoya University
- Hitoshi Itoh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DEPOSITION APPARATUS AND METHOD WITH EM RADIATION
- Publication number 20240384409
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tze-Liang Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH EFFICIENCY MICROWAVE PLASMA APPLICATOR
- Publication number 20240379329
- Publication date Nov 14, 2024
- Applied Materials, Inc,
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20240222084
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR PLASMA GENERATION IN A WIDE PRESSURE RANGE AN...
- Publication number 20240177979
- Publication date May 30, 2024
- INFICON AG
- Astrid WALDNER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240170259
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Hiroshi KONDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20240153749
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Bombardment with Ions having Targeted Mass using Pulsed B...
- Publication number 20240096600
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition Apparatus and Method with EM Radiation
- Publication number 20230383403
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co, LTD.
- Tze-Liang Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPINNING DISK PLASMA REACTOR FOR TREATMENT OF WATER
- Publication number 20230254963
- Publication date Aug 10, 2023
- Clarkson University
- Selma Mededovic-Thagard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS METHOD AND MULTI-CHAMBER APPARATUS THEREWITH
- Publication number 20230197413
- Publication date Jun 22, 2023
- HANGZHOU FULLSEMI SEMICONDUCTOR CO., LTD.
- Ke Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition Apparatus and Method
- Publication number 20230151489
- Publication date May 18, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tze-Liang Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230124217
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Takahiro SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20230094655
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ABNORMAL DISCHARGE CONTROL METHOD
- Publication number 20230060329
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Takehiro TANIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORTING UNIT AND A SUBSTRATE PROCESSING DEVICE INCLUDI...
- Publication number 20230052239
- Publication date Feb 16, 2023
- ASM IP HOLDING B.V.
- SeungHwan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20220384155
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220359160
- Publication date Nov 10, 2022
- Hitachi High-Tech Corporation
- Takahiro Ichikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE PLASMA SOURCE
- Publication number 20220344131
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Philip Allan KRAUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA JET SOLID ABLATION-BASED DIRECT ANALYSIS APPARATUS
- Publication number 20220208522
- Publication date Jun 30, 2022
- CHENGDU ALIEBN SCIENCE AND TECHNOLOGY CO., LTD
- Yanting YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT UNIT AND APPARATUS FOR TREATING SUBSTRATE
- Publication number 20220199368
- Publication date Jun 23, 2022
- SEMES CO., LTD.
- HYOUNGKYU SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20220093364
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...
- Publication number 20210327686
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Xiaopu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...
- Publication number 20210050187
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR MICROWAVE PLASMA SOURCE
- Publication number 20200381217
- Publication date Dec 3, 2020
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE OUTPUT DEVICE AND PLASMA PROCESSING DEVICE
- Publication number 20200013587
- Publication date Jan 9, 2020
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...
- Publication number 20190326099
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING AN ANNULAR THIN FILM OF SYNTHETIC MATERIAL...
- Publication number 20190267215
- Publication date Aug 29, 2019
- NEOCOAT SA
- David Rats
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microwave plasma generating device and method for operating same
- Publication number 20150091442
- Publication date Apr 2, 2015
- ROTH & RAU AG
- Joachim Mai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL
- Publication number 20140308461
- Publication date Oct 16, 2014
- ELEMENT SIX LIMITED
- Alexander Lamb Cullen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microwave Surface-Wave Plasma Device
- Publication number 20140262042
- Publication date Sep 18, 2014
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS

Means for coupling power to the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and processing method

Deposition apparatus and method with EM radiation

System and method of low temperature thin film deposition and in-si...

Cylindrical cavity with impedance shifting by irises in a power-sup...

Stage and plasma processing apparatus

Substrate supporting unit and a substrate processing device includi...

Microwave plasma source for spatial plasma enhanced atomic layer de...

Modular microwave plasma source

Uniform pumping dual-station vacuum processor

Generalized cylindrical cavity system for microwave rotation and im...

Elementary device for producing a plasma, having a coaxial applicator

Microwave output device and plasma processing device

Modular microwave plasma source

Generalized cylindrical cavity system for microwave rotation and im...

Microwave plasma source and plasma processing apparatus

Device for generating plasma by means of microwaves

Microwave plasma source and plasma processing apparatus

Plasma chemical vapor deposition device

Film forming apparatus

Microwave surface-wave plasma device

Method for manufacturing insulating film laminated structure

System of inspecting focus ring and method of inspecting focus ring

Microwave surface-wave plasma device

Plasma processing apparatus

Microwave plasma processing apparatus and microwave supplying method

Plasma processing apparatus and plasma generation antenna

Microwave plasma generating device and method for operating same

Microwave plasma processing apparatus and microwave supplying method

Apparatus for plasma treatment and method for plasma treatment

Microwave waveguide apparatus, plasma processing apparatus and plas...

Patents Applicationslast 30 patents

DEPOSITION APPARATUS AND METHOD WITH EM RADIATION

HIGH EFFICIENCY MICROWAVE PLASMA APPLICATOR

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

DEVICE AND METHOD FOR PLASMA GENERATION IN A WIDE PRESSURE RANGE AN...

PLASMA PROCESSING APPARATUS

STAGE AND PLASMA PROCESSING APPARATUS

Substrate Bombardment with Ions having Targeted Mass using Pulsed B...

Deposition Apparatus and Method with EM Radiation

SPINNING DISK PLASMA REACTOR FOR TREATMENT OF WATER

SEMICONDUCTOR PROCESS METHOD AND MULTI-CHAMBER APPARATUS THEREWITH

Deposition Apparatus and Method

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND ABNORMAL DISCHARGE CONTROL METHOD

SUBSTRATE SUPPORTING UNIT AND A SUBSTRATE PROCESSING DEVICE INCLUDI...

STAGE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MODULAR MICROWAVE PLASMA SOURCE

PLASMA JET SOLID ABLATION-BASED DIRECT ANALYSIS APPARATUS

SUPPORT UNIT AND APPARATUS FOR TREATING SUBSTRATE

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...

Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...

MODULAR MICROWAVE PLASMA SOURCE

MICROWAVE OUTPUT DEVICE AND PLASMA PROCESSING DEVICE

GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...

METHOD FOR MANUFACTURING AN ANNULAR THIN FILM OF SYNTHETIC MATERIAL...

Microwave plasma generating device and method for operating same

MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL

Microwave Surface-Wave Plasma Device