Means for moving the material to be treated

Industry

CPC
H01J37/32733

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32733Means for moving the material to be treated

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Electrostatic chuck
- Patent number 12,170,219
- Issue date Dec 17, 2024
- Kyocera Corporation
- Naoki Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus, system and method to reduce crazing
- Patent number 12,159,772
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Joshua B. Pankratz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alignment and transport of substrate and focus ring
- Patent number 12,131,936
- Issue date Oct 29, 2024
- Keisuke Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
L-motion slit door for substrate processing chamber
- Patent number 12,125,688
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Hamid Noorbakhsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic processing chamber baffle
- Patent number 12,119,209
- Issue date Oct 15, 2024
- Applied Materials, Inc.
- Udit S. Kotagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching apparatus and method
- Patent number 12,087,558
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition system with integrated cooling on a rotating drum
- Patent number 12,057,297
- Issue date Aug 6, 2024
- Richard DeVito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate processing system, and ma...
- Patent number 12,040,166
- Issue date Jul 16, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of low temperature thin film deposition and in-si...
- Patent number 12,018,374
- Issue date Jun 25, 2024
- DSGI Technologies, Inc.
- Jeffrey Edward Kowalski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 12,014,908
- Issue date Jun 18, 2024
- HITACHI HIGH-TECH CORPORATION
- Shengnan Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for adjusting location of a wafer and a top plate...
- Patent number 12,014,910
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Hsiang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Measuring device, measuring method, and vacuum processing apparatus
- Patent number 12,002,666
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Holding method of edge ring, plasma processing apparatus, and subst...
- Patent number 11,984,303
- Issue date May 14, 2024
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,978,654
- Issue date May 7, 2024
- Semes Co., Ltd.
- Min Sung Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for handling an implant
- Patent number 11,955,321
- Issue date Apr 9, 2024
- NOVA PLASMA LTD.
- Amnon Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ash rate recovery method in plasma strip chamber
- Patent number 11,955,318
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Yongkwan Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 11,891,685
- Issue date Feb 6, 2024
- ULVAC, Inc.
- Yukihito Tashiro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck
- Patent number 11,842,915
- Issue date Dec 12, 2023
- Kyocera Corporation
- Naoki Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system, substrate processing method, and contr...
- Patent number 11,823,877
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Koichi Miyashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-zone reactor, system including the reactor, and method of usi...
- Patent number 11,742,189
- Issue date Aug 29, 2023
- ASM IP Holding B.V.
- Carl Louis White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated cluster tool for selective area deposition
- Patent number 11,725,274
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Tobin Kaufman-Osborn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 11,710,619
- Issue date Jul 25, 2023
- HITACHI HIGH-TECH CORPORATION
- Kohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertically adjustable plasma source
- Patent number 11,705,312
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,694,882
- Issue date Jul 4, 2023
- Canon Anelva Corporation
- Yuji Takanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit fabrication system with adjustable gas injector
- Patent number 11,670,490
- Issue date Jun 6, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yung-Shun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,664,205
- Issue date May 30, 2023
- Kokusai Electric Corporation
- Naofumi Ohashi
- B08 - CLEANING
Information Patent Grant
Method and apparatus for coating plastic bottles
- Patent number 11,634,809
- Issue date Apr 25, 2023
- KHS GmbH
- Sebastian Kytzia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for processing a component, carriage for the device, and met...
- Patent number 11,628,459
- Issue date Apr 18, 2023
- SCIA SYSTEMS GMBH
- Daniel Haustein
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method, substrate processing apparatus and cle...
- Patent number 11,631,590
- Issue date Apr 18, 2023
- Tokyo Electron Limited
- Muneyuki Omi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of fabricating semiconductor device
- Patent number 11,600,776
- Issue date Mar 7, 2023
- Samsung Electronics Co., Ltd.
- Jaeho Jung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Ion Beam Etching Apparatus And Method
- Publication number 20240379333
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...
- Publication number 20240339306
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING DEVICE, MEASURING METHOD, AND VACUUM PROCESSING APPARATUS
- Publication number 20240290591
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240290609
- Publication date Aug 29, 2024
- Tokyo Electron Limited
- Tadahiro ISHIZAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240222095
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Takashi YAMAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE AREA MONITORING APPARATUS
- Publication number 20240179833
- Publication date May 30, 2024
- WIT CORPORATION
- Jae Hwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC SEMICONDUCTOR PROCESSING CHAMBER
- Publication number 20240170262
- Publication date May 23, 2024
- Applied Materials, Inc.
- Yogananda SARODE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS EQUIPMENT
- Publication number 20240150888
- Publication date May 9, 2024
- Applied Materials, Inc.
- Bhaskar PRASAD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240112892
- Publication date Apr 4, 2024
- Panasonic Intellectual Property Management Co., Ltd.
- Pei YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240087843
- Publication date Mar 14, 2024
- PSK INC.
- JONG CHAN LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240087854
- Publication date Mar 14, 2024
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20240063046
- Publication date Feb 22, 2024
- Kyocera Corporation
- Naoki FURUKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TRANSFER SYSTEM AND TRANSFER MODULE
- Publication number 20240030011
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Toshiaki TOYOMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR ADJUSTING LOCATION OF A WAFER AND A TOP PLATE...
- Publication number 20230395361
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hsiang CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SURFACE WAVE PROPAGATION FOR SEMICONDUCTOR CHAMBERS
- Publication number 20230335376
- Publication date Oct 19, 2023
- Yang YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICALLY ADJUSTABLE PLASMA SOURCE
- Publication number 20230307213
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...
- Publication number 20230298885
- Publication date Sep 21, 2023
- ASM IP HOLDING, B.V.
- Ranjit Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA TREATMENT DEVICE
- Publication number 20230290617
- Publication date Sep 14, 2023
- Clean Crop Technologies, Inc.
- Yaqoot Shaharyar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATMOSPHERIC PLASMA PROCESSING METHOD AND ATMOSPHERIC PLASMA PROCESS...
- Publication number 20230253194
- Publication date Aug 10, 2023
- FUJIFILM CORPORATION
- Akihisa YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARRIER RINGS WITH RADIALLY-VARIED PLASMA IMPEDANCE
- Publication number 20230238223
- Publication date Jul 27, 2023
- LAM RESEARCH CORPORATION
- Nick Ray Linebarger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20230230817
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MACHINE SYSTEM AND MANUFACTURING METHOD USING THEREOF
- Publication number 20230229133
- Publication date Jul 20, 2023
- TENGXI TECHNOLOGY CO. LTD.
- WEI-HAN LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD
- Publication number 20230215754
- Publication date Jul 6, 2023
- Tokyo Electron Limited
- Satoru KAWAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20230212735
- Publication date Jul 6, 2023
- Applied Materials, Inc.
- Nagabhushana NANJUNDAPPA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MID-CHAMBER FLOW OPTIMIZER
- Publication number 20230178342
- Publication date Jun 8, 2023
- LAM RESEARCH CORPORATION
- Craig Rosslee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING SYSTEM
- Publication number 20230131213
- Publication date Apr 27, 2023
- TOKYO ELECTRON LIMITED
- Isao GUNJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC PROCESSING CHAMBER BAFFLE
- Publication number 20230114104
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Udit S. Kotagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230114557
- Publication date Apr 13, 2023
- Panasonic Intellectual Property Management Co., Ltd.
- ATSUSHI HARIKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR ADJUSTING LOCATION OF A WAFER AND A TOP PLATE...
- Publication number 20230105279
- Publication date Apr 6, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hsiang CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Transfer Position for Workpieces and Replaceable Parts in a Vacuum...
- Publication number 20230091035
- Publication date Mar 23, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS

Means for moving the material to be treated

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Electrostatic chuck

Apparatus, system and method to reduce crazing

Alignment and transport of substrate and focus ring

L-motion slit door for substrate processing chamber

Dynamic processing chamber baffle

Ion beam etching apparatus and method

Deposition system with integrated cooling on a rotating drum

Substrate processing apparatus, substrate processing system, and ma...

System and method of low temperature thin film deposition and in-si...

Vacuum processing apparatus

Method and system for adjusting location of a wafer and a top plate...

Measuring device, measuring method, and vacuum processing apparatus

Holding method of edge ring, plasma processing apparatus, and subst...

Substrate processing apparatus

Method for handling an implant

Ash rate recovery method in plasma strip chamber

Vacuum processing apparatus

Electrostatic chuck

Substrate processing system, substrate processing method, and contr...

Multi-zone reactor, system including the reactor, and method of usi...

Integrated cluster tool for selective area deposition

Vacuum processing apparatus

Vertically adjustable plasma source

Substrate processing apparatus and substrate processing method

Integrated circuit fabrication system with adjustable gas injector

Substrate processing apparatus

Method and apparatus for coating plastic bottles

Device for processing a component, carriage for the device, and met...

Substrate processing method, substrate processing apparatus and cle...

Apparatus for and method of fabricating semiconductor device

Patents Applicationslast 30 patents

Ion Beam Etching Apparatus And Method

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...

MEASURING DEVICE, MEASURING METHOD, AND VACUUM PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

LARGE AREA MONITORING APPARATUS

SYMMETRIC SEMICONDUCTOR PROCESSING CHAMBER

SEMICONDUCTOR PROCESS EQUIPMENT

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

ELECTROSTATIC CHUCK

SUBSTRATE TRANSFER SYSTEM AND TRANSFER MODULE

METHOD AND SYSTEM FOR ADJUSTING LOCATION OF A WAFER AND A TOP PLATE...

REMOTE SURFACE WAVE PROPAGATION FOR SEMICONDUCTOR CHAMBERS

VERTICALLY ADJUSTABLE PLASMA SOURCE

METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...

PLASMA TREATMENT DEVICE

ATMOSPHERIC PLASMA PROCESSING METHOD AND ATMOSPHERIC PLASMA PROCESS...

CARRIER RINGS WITH RADIALLY-VARIED PLASMA IMPEDANCE

DEPOSITION METHOD AND DEPOSITION APPARATUS

SEMICONDUCTOR MACHINE SYSTEM AND MANUFACTURING METHOD USING THEREOF

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD

SUBSTRATE PROCESSING SYSTEM

MID-CHAMBER FLOW OPTIMIZER

FILM FORMING METHOD AND FILM FORMING SYSTEM

DYNAMIC PROCESSING CHAMBER BAFFLE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD AND SYSTEM FOR ADJUSTING LOCATION OF A WAFER AND A TOP PLATE...

Transfer Position for Workpieces and Replaceable Parts in a Vacuum...