Means for position and/or orientation registration

Industry

CPC
H01J2237/20292

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/20292Means for position and/or orientation registration

Industries

Patents Grantslast 30 patents

Information Patent Grant
Self-differential confocal tilt sensor for measuring level variatio...
- Patent number 12,142,456
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Jinmei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample analyzing method and sample preparing method
- Patent number 11,946,945
- Issue date Apr 2, 2024
- Materials Analysis Technology Inc.
- Keng-Chieh Chu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for bare wafer inspection
- Patent number 11,791,127
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical system with compensation lens
- Patent number 11,682,538
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Jian Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Load lock device having optical measuring device for acquiring dist...
- Patent number 11,521,883
- Issue date Dec 6, 2022
- NANYA TECHNOLOGY CORPORATION
- Chia-Fu Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interferometric stage positioning apparatus
- Patent number 11,476,077
- Issue date Oct 18, 2022
- ASML Netherlands B.V.
- Marcel Koenraad Marie Baggen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,380,515
- Issue date Jul 5, 2022
- HITACHI HIGH-TECH CORPORATION
- Keiichiro Hosobuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical system with compensation lens
- Patent number 11,183,360
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Jian Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for dynamically compensating position errors of a sample
- Patent number 11,127,618
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Fangfu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for bare wafer inspection
- Patent number 11,087,954
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus and charged particle beam apparatus
- Patent number 11,049,687
- Issue date Jun 29, 2021
- HITACHI HIGH-TECH CORPORATION
- Motohiro Takahashi
- G01 - MEASURING TESTING
Information Patent Grant
Substrate support, substrate processing apparatus, substrate proces...
- Patent number 11,037,767
- Issue date Jun 15, 2021
- Tokyo Electron Limited
- Takehiro Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus, and charged particle beam apparatus
- Patent number 10,879,033
- Issue date Dec 29, 2020
- HITACHI HIGH-TECH CORPORATION
- Akira Nishioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Observation method and specimen observation apparatus
- Patent number 10,809,515
- Issue date Oct 20, 2020
- Jeol Ltd.
- Katsuyuki Suzuki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Cross section processing observation method and charged particle be...
- Patent number 10,692,695
- Issue date Jun 23, 2020
- Hitachi High-Tech Science Corporation
- Xin Man
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for pedestal configuration
- Patent number 10,672,642
- Issue date Jun 2, 2020
- Applied Materials, Inc.
- Paneendra Prakash Bhat
- G01 - MEASURING TESTING
Information Patent Grant
Load lock system for charged particle beam imaging
- Patent number 10,643,818
- Issue date May 5, 2020
- ASML Netherlands B.V.
- Hsuan-Bin Huang
- G01 - MEASURING TESTING
Information Patent Grant
Stage device and charged particle beam device
- Patent number 10,600,614
- Issue date Mar 24, 2020
- Hitachi High-Technologies Corporation
- Motohiro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nondestructive sample imaging
- Patent number 10,468,230
- Issue date Nov 5, 2019
- BAE Systems Information and Electronic Systems Integration Inc.
- Eugene M. Lavely
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Probe landing detection
- Patent number 10,373,799
- Issue date Aug 6, 2019
- FEI Company
- Yoav Neuman
- G01 - MEASURING TESTING
Information Patent Grant
Workpiece transport and positioning apparatus
- Patent number 10,361,060
- Issue date Jul 23, 2019
- Howard Hughes Medical Institute
- John H. Price
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, alignment method of charged partic...
- Patent number 10,312,053
- Issue date Jun 4, 2019
- Hitachi High-Technologies Corporation
- Kazuki Ishizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Position detecting system and processing apparatus
- Patent number 10,199,251
- Issue date Feb 5, 2019
- Tokyo Electron Limited
- Kippei Sugita
- G01 - MEASURING TESTING
Information Patent Grant
Workpiece holder for workpiece transport apparatus
- Patent number 10,186,397
- Issue date Jan 22, 2019
- Howard Hughes Medical Institute
- John H. Price
- G01 - MEASURING TESTING
Information Patent Grant
Sample positioning method and charged particle beam apparatus
- Patent number 10,186,398
- Issue date Jan 22, 2019
- Hitachi High-Tech Science Corporation
- Masahiro Kiyohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-stage/multi-chamber electron-beam inspection system
- Patent number 10,134,560
- Issue date Nov 20, 2018
- Dongfang Jingyuan Electron Limited
- Weimin Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography apparatus, and method of manufacturing an article
- Patent number 9,947,508
- Issue date Apr 17, 2018
- Canon Kabushiki Kaisha
- Daisuke Iwase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 9,934,935
- Issue date Apr 3, 2018
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling an interaction between droplet targets and a...
- Patent number 9,911,572
- Issue date Mar 6, 2018
- ETH Zurich
- Nadia Gambino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control unit for generating timing signal for imaging unit in inspe...
- Patent number 9,760,984
- Issue date Sep 12, 2017
- Ebara Corporation
- Kenichi Suematsu
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
STAGE DEVICE, CHARGED PARTICLE BEAM DEVICE, AND VACUUM DEVICE
- Publication number 20230369011
- Publication date Nov 16, 2023
- HITACHI HIGH-TECH CORPORATION
- Motohiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LEVELING SENSOR IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION
- Publication number 20230096657
- Publication date Mar 30, 2023
- ASML NETHERLANDS B.V.
- Jian ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR AUTOMATED GRID VALIDATION
- Publication number 20230093535
- Publication date Mar 23, 2023
- FEI Company
- Pavol KARLÍK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A PROCESS AND APPARATUS FOR THE PREPARATION OF A BONDED SUBSTRATE
- Publication number 20220340416
- Publication date Oct 27, 2022
- TOP TECHNOLOGY LTD
- Youngho LEE
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
SAMPLE ANALYZING METHOD AND SAMPLE PREPARING METHOD
- Publication number 20220334140
- Publication date Oct 20, 2022
- Materials Analysis Technology Inc.
- KENG-CHIEH CHU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF-DIFFERENTIAL CONFOCAL TILT SENSOR FOR MEASURING LEVEL VARIATIO...
- Publication number 20220328283
- Publication date Oct 13, 2022
- ASML NETHERLANDS B.V.
- Jinmei YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF TEACHING TRANSFER DEVICE, AND TRANSFER SYSTEM
- Publication number 20220324659
- Publication date Oct 13, 2022
- TOKYO ELECTRON LIMITED
- Takashi SUGIMOTO
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
Load Lock Device Having Optical Measuring Device for Acquiring Dist...
- Publication number 20220285195
- Publication date Sep 8, 2022
- NANYA TECHNOLOGY CORPORATION
- CHIA-FU CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DETECTION DEVICE, PROCESSING SYSTEM, AND TRANSFER METHOD
- Publication number 20220148857
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM WITH COMPENSATION LENS
- Publication number 20220084780
- Publication date Mar 17, 2022
- ASML NETHERLANDS B.V.
- Jian ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR BARE WAFER INSPECTION
- Publication number 20220068592
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR FOCUSING CHARGED -PARTICLE BEAMS
- Publication number 20220068590
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Ying LUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20210066025
- Publication date Mar 4, 2021
- HITACHI HIGH-TECH CORPORATION
- Keiichiro HOSOBUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM WITH COMPENSATION LENS
- Publication number 20200294762
- Publication date Sep 17, 2020
- ASML NETHERLANDS B.V.
- Jian ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERFEROMETRIC STAGE POSITIONING APPARATUS
- Publication number 20200234911
- Publication date Jul 23, 2020
- ASML NETHERLANDS B.V.
- Marcel Koenraad Marie BAGGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCES...
- Publication number 20200185204
- Publication date Jun 11, 2020
- TOKYO ELECTRON LIMITED
- Takehiro Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE APPARATUS AND CHARGED PARTICLE BEAM APPARATUS
- Publication number 20200176217
- Publication date Jun 4, 2020
- Hitachi High-Technologies Corporation
- Motohiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR BARE WAFER INSPECTION
- Publication number 20200027693
- Publication date Jan 23, 2020
- ASML Netherlands B.V.
- Wei FANG
- G01 - MEASURING TESTING
Information Patent Application
STAGE APPARATUS, AND CHARGED PARTICLE BEAM APPARATUS
- Publication number 20190378678
- Publication date Dec 12, 2019
- Hitachi High-Technologies Corporation
- Akira NISHIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NONDESTRUCTIVE SAMPLE IMAGING
- Publication number 20190311881
- Publication date Oct 10, 2019
- BAE SYSTEMS INFORMATION AND ELECTRONIC SYSTEMS INTEGRATION INC
- Eugene M. Lavely
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR DYNAMICALLY COMPENSATING POSITION ERRORS OF A SAMPLE
- Publication number 20190198372
- Publication date Jun 27, 2019
- ASML Netherlands B.V.
- Fangfu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS SECTION PROCESSING OBSERVATION METHOD AND CHARGED PARTICLE BE...
- Publication number 20190164722
- Publication date May 30, 2019
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Xin MAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron-Beam Inspection Systems with optimized throughput
- Publication number 20190088442
- Publication date Mar 21, 2019
- DONGFANG JINGYUAN ELECTRON LIMITED
- Weimin Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION DETECTING SYSTEM AND PROCESSING APPARATUS
- Publication number 20180301322
- Publication date Oct 18, 2018
- TOKYO ELECTRON LIMITED
- Kippei SUGITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Observation Method and Specimen Observation Apparatus
- Publication number 20180088306
- Publication date Mar 29, 2018
- JEOL Ltd.
- Katsuyuki Suzuki
- G02 - OPTICS
Information Patent Application
PROBE LANDING DETECTION
- Publication number 20180061612
- Publication date Mar 1, 2018
- FEI Company
- Yoav Neuman
- G01 - MEASURING TESTING
Information Patent Application
Multi-Stage/Multi-Chamber Electron-Beam Inspection System
- Publication number 20170301508
- Publication date Oct 19, 2017
- DONGFANG JINGYUAN ELECTRON LIMITED
- Weimin Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE POSITIONING METHOD AND CHARGED PARTICLE BEAM APPARATUS
- Publication number 20170092460
- Publication date Mar 30, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Masahiro KIYOHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20170047194
- Publication date Feb 16, 2017
- NuFlare Technology, Inc.
- Ryoichi YOSHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORKPIECE TRANSPORT AND POSITIONING APPARATUS
- Publication number 20160372302
- Publication date Dec 22, 2016
- HOWARD HUGHES MEDICAL INSTITUTE
- John H. Price
- H01 - BASIC ELECTRIC ELEMENTS

Means for position and/or orientation registration

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Self-differential confocal tilt sensor for measuring level variatio...

Sample analyzing method and sample preparing method

System and method for bare wafer inspection

Optical system with compensation lens

Load lock device having optical measuring device for acquiring dist...

Interferometric stage positioning apparatus

Charged particle beam device

Optical system with compensation lens

System for dynamically compensating position errors of a sample

System and method for bare wafer inspection

Stage apparatus and charged particle beam apparatus

Substrate support, substrate processing apparatus, substrate proces...

Stage apparatus, and charged particle beam apparatus

Observation method and specimen observation apparatus

Cross section processing observation method and charged particle be...

Systems and methods for pedestal configuration

Load lock system for charged particle beam imaging

Stage device and charged particle beam device

Nondestructive sample imaging

Probe landing detection

Workpiece transport and positioning apparatus

Charged particle beam apparatus, alignment method of charged partic...

Position detecting system and processing apparatus

Workpiece holder for workpiece transport apparatus

Sample positioning method and charged particle beam apparatus

Multi-stage/multi-chamber electron-beam inspection system

Lithography apparatus, and method of manufacturing an article

Multi charged particle beam writing apparatus and multi charged par...

Method for controlling an interaction between droplet targets and a...

Control unit for generating timing signal for imaging unit in inspe...

Patents Applicationslast 30 patents

STAGE DEVICE, CHARGED PARTICLE BEAM DEVICE, AND VACUUM DEVICE

LEVELING SENSOR IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION

APPARATUS AND METHOD FOR AUTOMATED GRID VALIDATION

A PROCESS AND APPARATUS FOR THE PREPARATION OF A BONDED SUBSTRATE

SAMPLE ANALYZING METHOD AND SAMPLE PREPARING METHOD

SELF-DIFFERENTIAL CONFOCAL TILT SENSOR FOR MEASURING LEVEL VARIATIO...

METHOD OF TEACHING TRANSFER DEVICE, AND TRANSFER SYSTEM

Load Lock Device Having Optical Measuring Device for Acquiring Dist...

DETECTION DEVICE, PROCESSING SYSTEM, AND TRANSFER METHOD

OPTICAL SYSTEM WITH COMPENSATION LENS

SYSTEM AND METHOD FOR BARE WAFER INSPECTION

SYSTEMS AND METHODS FOR FOCUSING CHARGED -PARTICLE BEAMS

Charged Particle Beam Device

OPTICAL SYSTEM WITH COMPENSATION LENS

INTERFEROMETRIC STAGE POSITIONING APPARATUS

SUBSTRATE SUPPORT, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCES...

STAGE APPARATUS AND CHARGED PARTICLE BEAM APPARATUS

SYSTEM AND METHOD FOR BARE WAFER INSPECTION

STAGE APPARATUS, AND CHARGED PARTICLE BEAM APPARATUS

NONDESTRUCTIVE SAMPLE IMAGING

SYSTEM FOR DYNAMICALLY COMPENSATING POSITION ERRORS OF A SAMPLE

CROSS SECTION PROCESSING OBSERVATION METHOD AND CHARGED PARTICLE BE...

Electron-Beam Inspection Systems with optimized throughput

POSITION DETECTING SYSTEM AND PROCESSING APPARATUS

Observation Method and Specimen Observation Apparatus

PROBE LANDING DETECTION

Multi-Stage/Multi-Chamber Electron-Beam Inspection System

SAMPLE POSITIONING METHOD AND CHARGED PARTICLE BEAM APPARATUS

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

WORKPIECE TRANSPORT AND POSITIONING APPARATUS