Means for protecting the vessel against plasma

Industry

CPC
H01J37/32495

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32495Means for protecting the vessel against plasma

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method to improve wafer edge uniformity
- Patent number 12,125,683
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Mingle Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite structure and semiconductor manufacturing apparatus inclu...
- Patent number 12,112,924
- Issue date Oct 8, 2024
- Toto Ltd.
- Hiroaki Ashizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reaction chamber lining
- Patent number 12,112,923
- Issue date Oct 8, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner, reaction chamber and semiconductor processing equipment
- Patent number 12,106,934
- Issue date Oct 1, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jinrong Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High conductance inner shield for process chamber
- Patent number 12,100,577
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarath Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide preclean chamber with improved selectivity and flow con...
- Patent number 12,100,576
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for cleaning a process chamber
- Patent number 12,087,555
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Kalyanjit Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating system having t...
- Patent number 12,087,554
- Issue date Sep 10, 2024
- Samsung Electronics Co., Ltd.
- Sungyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preclean chamber upper shield with showerhead
- Patent number 12,080,522
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Sarath Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having a variable coupling of low frequency RF power...
- Patent number 12,062,524
- Issue date Aug 13, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic coated quartz lid for processing chamber
- Patent number 12,009,178
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Bernard L. Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma shutter and substrate processing apparatus including the same
- Patent number 12,009,187
- Issue date Jun 11, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer plasma resistant coating by atomic layer deposition
- Patent number 12,002,657
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Xiaowei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrathin conformal coatings for electrostatic dissipation in semic...
- Patent number 12,004,337
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Gayatri Natu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method and inspection method of interior member of pl...
- Patent number 11,987,880
- Issue date May 21, 2024
- HITACHI HIGH-TECH CORPORATION
- Kazuhiro Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming a protective coating on processing chamber surf...
- Patent number 11,976,357
- Issue date May 7, 2024
- Applied Materials, Inc.
- Geetika Bajaj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for treatment of deposition reactor
- Patent number 11,967,488
- Issue date Apr 23, 2024
- ASM IP Holding B.V.
- Suvi Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming method of component and plasma processing apparatus
- Patent number 11,967,487
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,948,776
- Issue date Apr 2, 2024
- HITACHI HIGH-TECH CORPORATION
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Component for plasma processing apparatus and plasma processing app...
- Patent number 11,948,779
- Issue date Apr 2, 2024
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Yttrium oxide based coating composition
- Patent number 11,920,234
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Vahid Firouzdor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Detector for process kit ring wear
- Patent number 11,913,777
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for reducing defects in preclean chambers
- Patent number 11,881,385
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Yueh Sheng Ow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanical suppression of parasitic plasma in substrate processing...
- Patent number 11,862,435
- Issue date Jan 2, 2024
- Lam Research Corporation
- Douglas Keil
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ceramic showerheads with conductive electrodes
- Patent number 11,834,744
- Issue date Dec 5, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,832,373
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,830,758
- Issue date Nov 28, 2023
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Atsushi Harikai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge seal for lower electrode assembly
- Patent number 11,781,650
- Issue date Oct 10, 2023
- Lam Research Corporation
- David Schaefer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and power supply control method
- Patent number 11,776,795
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface coating for chamber components used in plasma systems
- Patent number 11,764,037
- Issue date Sep 19, 2023
- Entegris, Inc.
- Carlo Waldfried
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MICROWAVE PLASMA APPLICATOR WITH REPLACEABLE DIELECTRIC PLATE
- Publication number 20240379331
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED BARRIER NICKEL OXIDE (BNiO) COATING DEVELOPMENT FOR THE PR...
- Publication number 20240352589
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER COATING MATERIAL AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240328027
- Publication date Oct 3, 2024
- GREEN RESOURCE CO., LTD.
- Jong Beom LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
YTTRIA-ZIRCONIA SINTERED CERAMICS FOR PLASMA RESISTANT MATERIALS
- Publication number 20240308918
- Publication date Sep 19, 2024
- Heraeus Conamic North America LLC
- Luke WALKER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATED CERAMIC CHAMBER PARTS
- Publication number 20240308926
- Publication date Sep 19, 2024
- LAM RESEARCH CORPORATION
- Amir A. YASSERI
- B24 - GRINDING POLISHING
Information Patent Application
SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES
- Publication number 20240304423
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC FIBERS FOR SHIELDING IN VACUUM CHAMBER SYSTEMS AND METHODS...
- Publication number 20240304424
- Publication date Sep 12, 2024
- Helion Energy, Inc.
- Brian Campbell
- C01 - INORGANIC CHEMISTRY
Information Patent Application
ULTRATHIN CONFORMAL COATINGS FOR ELECTROSTATIC DISSIPATION IN SEMIC...
- Publication number 20240284650
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Gayatri Natu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...
- Publication number 20240274410
- Publication date Aug 15, 2024
- Hansol IONES Co., Ltd.
- Dae Gun Kim
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
RESTORING METHOD FOR INNER WALL MEMBER OF PLASMA PROCESSING APPARATUS
- Publication number 20240240300
- Publication date Jul 18, 2024
- Hitachi High-Tech Corporation
- Shoichiro Mizunashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA RESISTANT COATING, RELATED PRODUCTION METHOD AND USES
- Publication number 20240240310
- Publication date Jul 18, 2024
- Picosun Oy
- Jesse KALLIOMÄKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
- Publication number 20240234099
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD
- Publication number 20240222171
- Publication date Jul 4, 2024
- SEMES CO., LTD.
- Young Eun JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
YTTRIUM ALUMINUM PEROVSKITE (YAP) BASED COATINGS FOR SEMICONDUCTOR...
- Publication number 20240212991
- Publication date Jun 27, 2024
- LAM RESEARCH CORPORATION
- Eric A. PAPE
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
CLEANING METHOD OF FILM LAYER IN THE PLASMA PROCESSING APPARATUS
- Publication number 20240203708
- Publication date Jun 20, 2024
- Hitachi High-Tech Corporation
- Kazuhiro UEDA
- B08 - CLEANING
Information Patent Application
DETECTOR FOR PROCESS KIT RING WEAR
- Publication number 20240183656
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE STRUCTURE AND SEMICONDUCTOR MANUFACTURING DEVICE PROVIDED...
- Publication number 20240170264
- Publication date May 23, 2024
- TOTO LTD.
- Hiroaki ASHIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING COATING FILM AND INSPECTIO...
- Publication number 20240162012
- Publication date May 16, 2024
- SEMES CO., LTD.
- Ki Ryong LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MECHANICAL SUPPRESSION OF PARASITIC PLASMA IN SUBSTRATE PROCESSING...
- Publication number 20240162013
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Douglas KEIL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROTECTION TREATMENTS FOR SURFACES OF SEMICONDUCTOR FABRICATION EQU...
- Publication number 20240153745
- Publication date May 9, 2024
- Applied Materials, Inc.
- Katherine Woo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SHUTTER AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20240096606
- Publication date Mar 21, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY
- Publication number 20240077138
- Publication date Mar 7, 2024
- LAM RESEARCH CORPORATION
- David SCHAEFER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING PARTS USING SOLID-STATE ADDITIVE MANUFACTURING
- Publication number 20240062997
- Publication date Feb 22, 2024
- Lam Research Corporaton
- Pankaj Jyoti Hazarika
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240049379
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
YTTRIUM-FLUORIDE-BASED SPRAYED COATING, SPRAYED MEMBER, AND METHOD...
- Publication number 20240026515
- Publication date Jan 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Ryo Iwasaki
- C01 - INORGANIC CHEMISTRY
Information Patent Application
C-shroud Modification For Plasma Uniformity Without Impacting Mecha...
- Publication number 20240014015
- Publication date Jan 11, 2024
- LAM RESEARCH CORPORATION
- Pratik Mankidy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATMENT OF DEPOSITION REACTOR
- Publication number 20240014012
- Publication date Jan 11, 2024
- ASM IP HOLDING B.V.
- Suvi Haukka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINTERED YTTRIUM OXIDE BODY OF LARGE DIMENSION
- Publication number 20240010510
- Publication date Jan 11, 2024
- Heraeus Conamic North America LLC
- Luke WALKER
- C01 - INORGANIC CHEMISTRY
Information Patent Application
IMPROVED PLASMA RESISTANT COATINGS FOR ELECTROSTATIC CHUCKS
- Publication number 20240006216
- Publication date Jan 4, 2024
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Matthew Paul KIRK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SINTERED BODY
- Publication number 20230391676
- Publication date Dec 7, 2023
- NIPPON YTTRIUM CO., LTD.
- Kento MATSUKURA
- H01 - BASIC ELECTRIC ELEMENTS

Means for protecting the vessel against plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method to improve wafer edge uniformity

Composite structure and semiconductor manufacturing apparatus inclu...

Reaction chamber lining

Liner, reaction chamber and semiconductor processing equipment

High conductance inner shield for process chamber

Metal oxide preclean chamber with improved selectivity and flow con...

Method and system for cleaning a process chamber

Substrate treating apparatus and substrate treating system having t...

Preclean chamber upper shield with showerhead

Plasma reactor having a variable coupling of low frequency RF power...

Ceramic coated quartz lid for processing chamber

Plasma shutter and substrate processing apparatus including the same

Multi-layer plasma resistant coating by atomic layer deposition

Ultrathin conformal coatings for electrostatic dissipation in semic...

Manufacturing method and inspection method of interior member of pl...

Methods for forming a protective coating on processing chamber surf...

Method for treatment of deposition reactor

Forming method of component and plasma processing apparatus

Plasma processing apparatus

Component for plasma processing apparatus and plasma processing app...

Yttrium oxide based coating composition

Detector for process kit ring wear

Methods and apparatus for reducing defects in preclean chambers

Mechanical suppression of parasitic plasma in substrate processing...

Ceramic showerheads with conductive electrodes

Plasma processing apparatus

Plasma processing method

Edge seal for lower electrode assembly

Plasma processing apparatus and power supply control method

Surface coating for chamber components used in plasma systems

Patents Applicationslast 30 patents

MICROWAVE PLASMA APPLICATOR WITH REPLACEABLE DIELECTRIC PLATE

ADVANCED BARRIER NICKEL OXIDE (BNiO) COATING DEVELOPMENT FOR THE PR...

CHAMBER COATING MATERIAL AND METHOD FOR MANUFACTURING THE SAME

YTTRIA-ZIRCONIA SINTERED CERAMICS FOR PLASMA RESISTANT MATERIALS

TREATED CERAMIC CHAMBER PARTS

SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES

CERAMIC FIBERS FOR SHIELDING IN VACUUM CHAMBER SYSTEMS AND METHODS...

ULTRATHIN CONFORMAL COATINGS FOR ELECTROSTATIC DISSIPATION IN SEMIC...

PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...

RESTORING METHOD FOR INNER WALL MEMBER OF PLASMA PROCESSING APPARATUS

PLASMA RESISTANT COATING, RELATED PRODUCTION METHOD AND USES

FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS

SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD

YTTRIUM ALUMINUM PEROVSKITE (YAP) BASED COATINGS FOR SEMICONDUCTOR...

CLEANING METHOD OF FILM LAYER IN THE PLASMA PROCESSING APPARATUS

DETECTOR FOR PROCESS KIT RING WEAR

COMPOSITE STRUCTURE AND SEMICONDUCTOR MANUFACTURING DEVICE PROVIDED...

SUBSTRATE PROCESSING APPARATUS INCLUDING COATING FILM AND INSPECTIO...

MECHANICAL SUPPRESSION OF PARASITIC PLASMA IN SUBSTRATE PROCESSING...

PROTECTION TREATMENTS FOR SURFACES OF SEMICONDUCTOR FABRICATION EQU...

PLASMA SHUTTER AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY

PROCESSING PARTS USING SOLID-STATE ADDITIVE MANUFACTURING

PLASMA PROCESSING APPARATUS

YTTRIUM-FLUORIDE-BASED SPRAYED COATING, SPRAYED MEMBER, AND METHOD...

C-shroud Modification For Plasma Uniformity Without Impacting Mecha...

METHOD FOR TREATMENT OF DEPOSITION REACTOR

SINTERED YTTRIUM OXIDE BODY OF LARGE DIMENSION

IMPROVED PLASMA RESISTANT COATINGS FOR ELECTROSTATIC CHUCKS

SINTERED BODY