Means for protecting the vessel against plasma

Industry

CPC
H01J37/32495

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32495Means for protecting the vessel against plasma

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Edge seal for lower electrode assembly
- Patent number 12,368,025
- Issue date Jul 22, 2025
- Lam Research Corporation
- David Schaefer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor chamber components with advanced coating techniques
- Patent number 12,362,150
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process chamber process kit with protective coating
- Patent number 12,354,843
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Jian Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,347,651
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Koki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for use in plasma processing device, and plasma processing d...
- Patent number 12,322,576
- Issue date Jun 3, 2025
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mechanical suppression of parasitic plasma in substrate processing...
- Patent number 12,308,216
- Issue date May 20, 2025
- Lam Research Corporation
- Douglas Keil
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing apparatus member and semiconductor manu...
- Patent number 12,308,215
- Issue date May 20, 2025
- Toto, Ltd.
- Ryunosuke Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, gas re...
- Patent number 12,293,904
- Issue date May 6, 2025
- Kioxia Corporation
- Horoyuki Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus including shower head and edge ring...
- Patent number 12,293,901
- Issue date May 6, 2025
- Samsung Electronics Co., Ltd.
- Woorim Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for use in plasma processing device, and plasma processing d...
- Patent number 12,283,466
- Issue date Apr 22, 2025
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for use with hydrogen radicals and method of using same
- Patent number 12,272,527
- Issue date Apr 8, 2025
- ASM IP Holding B.V.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multilayer coatings of component parts for a work piece processing...
- Patent number 12,266,509
- Issue date Apr 1, 2025
- Lam Researh Corporation
- Paul Konkola
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma apparatus and methods for processing materials usi...
- Patent number 12,261,023
- Issue date Mar 25, 2025
- 6K Inc.
- Richard K. Holman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution ring for process chamber
- Patent number 12,243,719
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Hsiang Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, and plasma processing method
- Patent number 12,217,941
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- B08 - CLEANING
Information Patent Grant
Laminated aerosol deposition coating for aluminum components for pl...
- Patent number 12,198,902
- Issue date Jan 14, 2025
- Lam Research Corporation
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma resistant arc preventative coatings for manufacturing equipm...
- Patent number 12,198,903
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Joseph Frederick Sommers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Multilayer coating for corrosion resistance
- Patent number 12,191,120
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Amir H. Tavakoli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve wafer edge uniformity
- Patent number 12,125,683
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Mingle Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite structure and semiconductor manufacturing apparatus inclu...
- Patent number 12,112,924
- Issue date Oct 8, 2024
- Toto Ltd.
- Hiroaki Ashizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reaction chamber lining
- Patent number 12,112,923
- Issue date Oct 8, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner, reaction chamber and semiconductor processing equipment
- Patent number 12,106,934
- Issue date Oct 1, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jinrong Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High conductance inner shield for process chamber
- Patent number 12,100,577
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarath Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide preclean chamber with improved selectivity and flow con...
- Patent number 12,100,576
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for cleaning a process chamber
- Patent number 12,087,555
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Kalyanjit Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating system having t...
- Patent number 12,087,554
- Issue date Sep 10, 2024
- Samsung Electronics Co., Ltd.
- Sungyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preclean chamber upper shield with showerhead
- Patent number 12,080,522
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Sarath Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having a variable coupling of low frequency RF power...
- Patent number 12,062,524
- Issue date Aug 13, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic coated quartz lid for processing chamber
- Patent number 12,009,178
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Bernard L. Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma shutter and substrate processing apparatus including the same
- Patent number 12,009,187
- Issue date Jun 11, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik Ko
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ETCHER WITH EDGE RING AND METHOD OF PROCESSING SEMICONDUCTOR...
- Publication number 20250226188
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Jung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-METAL OXIDE COATINGS, RELATED DEVICES AND METHODS
- Publication number 20250215548
- Publication date Jul 3, 2025
- Entegris, Inc.
- Baosheng Sang
- C01 - INORGANIC CHEMISTRY
Information Patent Application
PROTECTIVE LINER FOR PLASMA SOURCE
- Publication number 20250201530
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Ryan T. DOWNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING PHOTORESIST AND CARBON ETCH RATES IN AN ICP PR...
- Publication number 20250201573
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Sonam Dorje SHERPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device for Performing Plasma Treatment, and Method for Performing P...
- Publication number 20250188610
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Jianming HAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHIELDING PLASMA ETCHING DATA COLLECTION WINDOWS USING POSITIVELY C...
- Publication number 20250191890
- Publication date Jun 12, 2025
- International Business Machines Corporation
- Viswas Purohit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METALLIC ARTICLES, SEMICONDUCTOR PROCESSING SYSTEMS HAVING METALLIC...
- Publication number 20250183009
- Publication date Jun 5, 2025
- ASM IP HOLDING B.V.
- Amin Azimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
YTTRIUM-BASED PROTECTIVE FILM, METHOD FOR PRODUCING SAME, AND MEMBER
- Publication number 20250171886
- Publication date May 29, 2025
- AGC Inc.
- Shuhei OGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTI-PLASMA COATING
- Publication number 20250149302
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Kai Hu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
YTTRIA COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
- Publication number 20250140528
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Jeremiah Michael DEDERICK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE WAFER EDGE UNIFORMITY
- Publication number 20250118539
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITE STRUCTURE AND SEMICONDUCTOR MANUFACTURING APPARATUS INCLU...
- Publication number 20250101597
- Publication date Mar 27, 2025
- TOTO LTD.
- Hiroaki ASHIZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED DUAL LAYER NICKEL-CO...
- Publication number 20250095968
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Laksheswar Kalita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURAL MEMBER
- Publication number 20250079130
- Publication date Mar 6, 2025
- TOTO LTD.
- Ryunosuke NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURAL MEMBER
- Publication number 20250079131
- Publication date Mar 6, 2025
- TOTO LTD.
- Yasutaka NITTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER COATING FOR CORROSION RESISTANCE
- Publication number 20250069857
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Amir H. Tavakoli
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
GAS DISTRIBUTION ASSEMBLIES FOR SEMICONDUCTOR DEVICES
- Publication number 20250037978
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Sanjeev Baluja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA APPLICATOR WITH REPLACEABLE DIELECTRIC PLATE
- Publication number 20240379331
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED BARRIER NICKEL OXIDE (BNiO) COATING DEVELOPMENT FOR THE PR...
- Publication number 20240352589
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER COATING MATERIAL AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240328027
- Publication date Oct 3, 2024
- GREEN RESOURCE CO., LTD.
- Jong Beom LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
YTTRIA-ZIRCONIA SINTERED CERAMICS FOR PLASMA RESISTANT MATERIALS
- Publication number 20240308918
- Publication date Sep 19, 2024
- Heraeus Conamic North America LLC
- Luke WALKER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATED CERAMIC CHAMBER PARTS
- Publication number 20240308926
- Publication date Sep 19, 2024
- LAM RESEARCH CORPORATION
- Amir A. YASSERI
- B24 - GRINDING POLISHING
Information Patent Application
SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES
- Publication number 20240304423
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CERAMIC FIBERS FOR SHIELDING IN VACUUM CHAMBER SYSTEMS AND METHODS...
- Publication number 20240304424
- Publication date Sep 12, 2024
- Helion Energy, Inc.
- Brian Campbell
- C01 - INORGANIC CHEMISTRY
Information Patent Application
ULTRATHIN CONFORMAL COATINGS FOR ELECTROSTATIC DISSIPATION IN SEMIC...
- Publication number 20240284650
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Gayatri Natu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...
- Publication number 20240274410
- Publication date Aug 15, 2024
- Hansol IONES Co., Ltd.
- Dae Gun Kim
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
RESTORING METHOD FOR INNER WALL MEMBER OF PLASMA PROCESSING APPARATUS
- Publication number 20240240300
- Publication date Jul 18, 2024
- Hitachi High-Tech Corporation
- Shoichiro Mizunashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA RESISTANT COATING, RELATED PRODUCTION METHOD AND USES
- Publication number 20240240310
- Publication date Jul 18, 2024
- Picosun Oy
- Jesse KALLIOMÄKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
- Publication number 20240234099
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD
- Publication number 20240222171
- Publication date Jul 4, 2024
- SEMES CO., LTD.
- Young Eun JEON
- H01 - BASIC ELECTRIC ELEMENTS

Means for protecting the vessel against plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Edge seal for lower electrode assembly

Semiconductor chamber components with advanced coating techniques

Process chamber process kit with protective coating

Etching method and plasma processing apparatus

Member for use in plasma processing device, and plasma processing d...

Mechanical suppression of parasitic plasma in substrate processing...

Semiconductor manufacturing apparatus member and semiconductor manu...

Substrate processing apparatus, substrate processing method, gas re...

Substrate processing apparatus including shower head and edge ring...

Member for use in plasma processing device, and plasma processing d...

Apparatus for use with hydrogen radicals and method of using same

Multilayer coatings of component parts for a work piece processing...

Microwave plasma apparatus and methods for processing materials usi...

Gas distribution ring for process chamber

Plasma processing apparatus, and plasma processing method

Laminated aerosol deposition coating for aluminum components for pl...

Plasma resistant arc preventative coatings for manufacturing equipm...

Multilayer coating for corrosion resistance

Method to improve wafer edge uniformity

Composite structure and semiconductor manufacturing apparatus inclu...

Reaction chamber lining

Liner, reaction chamber and semiconductor processing equipment

High conductance inner shield for process chamber

Metal oxide preclean chamber with improved selectivity and flow con...

Method and system for cleaning a process chamber

Substrate treating apparatus and substrate treating system having t...

Preclean chamber upper shield with showerhead

Plasma reactor having a variable coupling of low frequency RF power...

Ceramic coated quartz lid for processing chamber

Plasma shutter and substrate processing apparatus including the same

Patents Applicationslast 30 patents

PLASMA ETCHER WITH EDGE RING AND METHOD OF PROCESSING SEMICONDUCTOR...

MULTI-METAL OXIDE COATINGS, RELATED DEVICES AND METHODS

PROTECTIVE LINER FOR PLASMA SOURCE

METHODS FOR REDUCING PHOTORESIST AND CARBON ETCH RATES IN AN ICP PR...

Device for Performing Plasma Treatment, and Method for Performing P...

SHIELDING PLASMA ETCHING DATA COLLECTION WINDOWS USING POSITIVELY C...

METALLIC ARTICLES, SEMICONDUCTOR PROCESSING SYSTEMS HAVING METALLIC...

YTTRIUM-BASED PROTECTIVE FILM, METHOD FOR PRODUCING SAME, AND MEMBER

ANTI-PLASMA COATING

YTTRIA COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS

METHOD TO IMPROVE WAFER EDGE UNIFORMITY

COMPOSITE STRUCTURE AND SEMICONDUCTOR MANUFACTURING APPARATUS INCLU...

SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED DUAL LAYER NICKEL-CO...

STRUCTURAL MEMBER

STRUCTURAL MEMBER

MULTILAYER COATING FOR CORROSION RESISTANCE

GAS DISTRIBUTION ASSEMBLIES FOR SEMICONDUCTOR DEVICES

MICROWAVE PLASMA APPLICATOR WITH REPLACEABLE DIELECTRIC PLATE

ADVANCED BARRIER NICKEL OXIDE (BNiO) COATING DEVELOPMENT FOR THE PR...

CHAMBER COATING MATERIAL AND METHOD FOR MANUFACTURING THE SAME

YTTRIA-ZIRCONIA SINTERED CERAMICS FOR PLASMA RESISTANT MATERIALS

TREATED CERAMIC CHAMBER PARTS

SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES

CERAMIC FIBERS FOR SHIELDING IN VACUUM CHAMBER SYSTEMS AND METHODS...

ULTRATHIN CONFORMAL COATINGS FOR ELECTROSTATIC DISSIPATION IN SEMIC...

PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MA...

RESTORING METHOD FOR INNER WALL MEMBER OF PLASMA PROCESSING APPARATUS

PLASMA RESISTANT COATING, RELATED PRODUCTION METHOD AND USES

FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS

SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD