Means for reducing recombination coefficient

Industry

CPC
H01J37/32486

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32486Means for reducing recombination coefficient

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Minimizing radical recombination using ALD silicon oxide surface co...
- Patent number 11,920,239
- Issue date Mar 5, 2024
- Lam Research Corporation
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for the reduction of impurities in films
- Patent number 11,001,926
- Issue date May 11, 2021
- Gallium Enterprises Pty Ltd.
- Ian Mann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Minimizing radical recombination using ALD silicon oxide surface co...
- Patent number 9,828,672
- Issue date Nov 28, 2017
- Lam Research Corporation
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE CO...
- Publication number 20240218509
- Publication date Jul 4, 2024
- LAM RESEARCH CORPORATION
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNIFORMITY CONTROL FOR PLASMA PROCESSING USING WALL RECOMBINATION
- Publication number 20230215702
- Publication date Jul 6, 2023
- Applied Materials, Inc.
- Vladimir Nagorny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Plasma Processing Apparatus with Tunable Electrical Characteristic
- Publication number 20220392749
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE CO...
- Publication number 20220145459
- Publication date May 12, 2022
- LAM RESEARCH CORPORATION
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE CO...
- Publication number 20180044791
- Publication date Feb 15, 2018
- LAM RESEARCH CORPORATION
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR THE REDUCTION OF IMPURITIES IN FILMS
- Publication number 20160326649
- Publication date Nov 10, 2016
- Gallium Enterprises Pty Ltd
- Ian MANN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER WALL OF A PLASMA PROCESSING APPARATUS INCLUDING A FLOWING P...
- Publication number 20140357092
- Publication date Dec 4, 2014
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20100037822
- Publication date Feb 18, 2010
- Canon ANELVA Corporation
- Keiji ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microwave plasma substrate processing device
- Publication number 20040250771
- Publication date Dec 16, 2004
- Shigenori Ozaki
- H01 - BASIC ELECTRIC ELEMENTS

Means for reducing recombination coefficient

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Minimizing radical recombination using ALD silicon oxide surface co...

Apparatus and method for the reduction of impurities in films

Minimizing radical recombination using ALD silicon oxide surface co...

Patents Applicationslast 30 patents

MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE CO...

UNIFORMITY CONTROL FOR PLASMA PROCESSING USING WALL RECOMBINATION

Plasma Processing Apparatus with Tunable Electrical Characteristic

MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE CO...

MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE CO...

APPARATUS AND METHOD FOR THE REDUCTION OF IMPURITIES IN FILMS

CHAMBER WALL OF A PLASMA PROCESSING APPARATUS INCLUDING A FLOWING P...

VACUUM PROCESSING APPARATUS

Microwave plasma substrate processing device