Measurements of non-electric or non-magnetic variables

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CPC
H01J2237/24571

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/24571Measurements of non-electric or non-magnetic variables

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Patents Grantslast 30 patents

Information Patent Grant
Non-contact angle measuring apparatus
- Patent number 11,903,755
- Issue date Feb 20, 2024
- Weng-Dah Ken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,658,012
- Issue date May 23, 2023
- Tokyo Electron Limited
- Toshiyuki Arakane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscopy system and pattern depth measurement m...
- Patent number 11,545,336
- Issue date Jan 3, 2023
- HITACHI HIGH-TECH CORPORATION
- Takahiro Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for focusing an electron beam on a wafer having a transparen...
- Patent number 11,378,531
- Issue date Jul 5, 2022
- Applied Materials Israel Ltd.
- Arie Bader
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for measuring thickness of r...
- Patent number 11,315,766
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Atsushi Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measurement device and non-transitory computer readable med...
- Patent number 11,177,112
- Issue date Nov 16, 2021
- HITACHI HIGH-TECH CORPORATION
- Satoru Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-stage/multi-chamber electron-beam inspection system
- Patent number 10,134,560
- Issue date Nov 20, 2018
- Dongfang Jingyuan Electron Limited
- Weimin Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Range-based real-time scanning electron microscope non-visual binner
- Patent number 9,947,596
- Issue date Apr 17, 2018
- KLA-Tencor Corporation
- Hemanta Kumar Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 9,330,883
- Issue date May 3, 2016
- Hitachi High-Technologies Corporation
- Terutaka Nanri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Orientation imaging using wide angle convergent beam diffraction in...
- Patent number 9,171,696
- Issue date Oct 27, 2015
- Vineet Kumar
- G01 - MEASURING TESTING
Information Patent Grant
Scanning electron microscope
- Patent number 9,110,384
- Issue date Aug 18, 2015
- Hitachi High-Technologies Corporation
- Seiko Omori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle detectors
- Patent number 9,000,396
- Issue date Apr 7, 2015
- Carl Zeiss Microscopy, LLC
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measurement apparatus
- Patent number 8,788,242
- Issue date Jul 22, 2014
- Hitachi High-Technologies Corporation
- Ryoichi Matsuoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Orientation imaging using wide angle convergent beam diffraction in...
- Patent number 8,748,817
- Issue date Jun 10, 2014
- Vineet Kumar
- G01 - MEASURING TESTING
Information Patent Grant
Surface contamination analyzer for semiconductor wafers
- Patent number 7,795,593
- Issue date Sep 14, 2010
- Topcon Corporation
- Takeo Ushiki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Surface contamination analyzer for semiconductor wafers, method use...
- Patent number 7,700,380
- Issue date Apr 20, 2010
- Topcon Corporation
- Takeo Ushiki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electron anti-fogging baffle used as a detector
- Patent number 7,514,682
- Issue date Apr 7, 2009
- Applied Materials, Inc.
- Benyamin Buller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam monitoring in an ion implanter using an imaging device
- Patent number 7,423,277
- Issue date Sep 9, 2008
- Axcelis Technologies, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface contamination analyzer for semiconductor wafers, method use...
- Patent number 6,943,043
- Issue date Sep 13, 2005
- Fab Solutions, Inc.
- Takeo Ushiki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Surface contamination analyzer for semiconductor wafers, method use...
- Patent number 6,753,194
- Issue date Jun 22, 2004
- Fab Solutions, Inc.
- Takeo Ushiki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
ULTRA-PRECISION TIMING CLOCK METHOD AND APPARATUS
- Publication number 20240115222
- Publication date Apr 11, 2024
- Weng-Dah Ken
- G04 - HOROLOGY
Information Patent Application
SURFACE MODIFYING APPARATUS AND BONDING STRENGTH DETERMINATION METHOD
- Publication number 20240079222
- Publication date Mar 7, 2024
- TOKYO ELECTRON LIMITED
- Takashi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210183625
- Publication date Jun 17, 2021
- TOKYO ELECTRON LIMITED
- Toshiyuki ARAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPY SYSTEM AND PATTERN DEPTH MEASUREMENT M...
- Publication number 20210027983
- Publication date Jan 28, 2021
- Hitachi High-Tech Corporation
- Takahiro Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Measurement Device and Non-Transitory Computer Readable Med...
- Publication number 20200411281
- Publication date Dec 31, 2020
- Hitachi High-Tech Corporation
- Satoru YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR MEASURING THICKNESS OF R...
- Publication number 20200111648
- Publication date Apr 9, 2020
- TOKYO ELECTRON LIMITED
- Atsushi OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron-Beam Inspection Systems with optimized throughput
- Publication number 20190088442
- Publication date Mar 21, 2019
- DONGFANG JINGYUAN ELECTRON LIMITED
- Weimin Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-Stage/Multi-Chamber Electron-Beam Inspection System
- Publication number 20170301508
- Publication date Oct 19, 2017
- DONGFANG JINGYUAN ELECTRON LIMITED
- Weimin Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Stage/Multi-Chamber Electron-Beam Inspection System
- Publication number 20170301509
- Publication date Oct 19, 2017
- DONGFANG JINGYUAN ELECTRON LIMITED
- Weimin Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-CONTACT ANGLE MEASURING APPARATUS, MISSION CRITICAL INSPECTION...
- Publication number 20170281102
- Publication date Oct 5, 2017
- Weng-Dah Ken
- G01 - MEASURING TESTING
Information Patent Application
Range-Based Real-Time Scanning Electron Microscope Non-Visual Binner
- Publication number 20170040142
- Publication date Feb 9, 2017
- KLA-Tencor Corporation
- Hemanta Kumar Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CHARACTERISING PARTICLES BY IMAGE ANALYSIS
- Publication number 20150300941
- Publication date Oct 22, 2015
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Emmanuelle Brackx
- G01 - MEASURING TESTING
Information Patent Application
Systems and Methods for Material Texture Analysis
- Publication number 20150109431
- Publication date Apr 23, 2015
- EDAX, MATERIALS ANALYSIS DIVISION OF AMETEK INC.
- Stuart I. Wright
- G01 - MEASURING TESTING
Information Patent Application
ORIENTATION IMAGING USING WIDE ANGLE CONVERGENT BEAM DIFFRACTION IN...
- Publication number 20140346351
- Publication date Nov 27, 2014
- Vineet Kumar
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR MEASURING ANGULAR LUMINESCENCE IN A CHARGED P...
- Publication number 20140027632
- Publication date Jan 30, 2014
- GATAN, INC.
- David Stowe
- G01 - MEASURING TESTING
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20120298865
- Publication date Nov 29, 2012
- Seiko Omori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE DETECTORS
- Publication number 20120068068
- Publication date Mar 22, 2012
- CARL ZEISS NTS, LLC.
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN MEASUREMENT APPARATUS
- Publication number 20120053892
- Publication date Mar 1, 2012
- Hitachi High-Technologies Corporation
- Ryoichi Matsuoka
- B82 - NANO-TECHNOLOGY
Information Patent Application
ORIENTATION IMAGING USING WIDE ANGLE CONVERGENT BEAM DIFFRACTION IN...
- Publication number 20120025073
- Publication date Feb 2, 2012
- Vineet Kumar
- G01 - MEASURING TESTING
Information Patent Application
ATOM PROBE DATA AND ASSOCIATED SYSTEMS AND METHODS
- Publication number 20100288926
- Publication date Nov 18, 2010
- Scott A. Wiener
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOM PROBE DATA PROCESSES AND ASSOCIATED SYSTEMS
- Publication number 20100204927
- Publication date Aug 12, 2010
- Imago Scientific Instruments Corporation
- Brian P. Geiser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE CONTAMINATION ANALYZER FOR SEMICONDUCTOR WAFERS, METHOD USE...
- Publication number 20090039274
- Publication date Feb 12, 2009
- TOPCON CORPORATION
- Takeo USHIKI
- G01 - MEASURING TESTING
Information Patent Application
Ion beam monitoring in an ion implanter using an imaging device
- Publication number 20080061250
- Publication date Mar 13, 2008
- Axcelis Technologies, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN INSPECTION AND MEASUREMENT APPARATUS
- Publication number 20080017797
- Publication date Jan 24, 2008
- Zhaohui CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Spectroscope With Emission Induced By A Monochromatic Elec...
- Publication number 20070210249
- Publication date Sep 13, 2007
- STMicroelectronics S.r.I
- Stefano Giovanni Alberici
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON ANTI-FOGGING BAFFLE USED AS A DETECTOR
- Publication number 20070145269
- Publication date Jun 28, 2007
- APPLIED MATERIALS, INC.
- BENYAMIN BULLER
- B82 - NANO-TECHNOLOGY
Information Patent Application
Surface contamination analyzer for semiconductor wafers, method use...
- Publication number 20050230622
- Publication date Oct 20, 2005
- Takeo Ushiki
- G01 - MEASURING TESTING
Information Patent Application
Surface contamination analyzer for semiconductor wafers, method use...
- Publication number 20040206903
- Publication date Oct 21, 2004
- Takeo Ushiki
- G01 - MEASURING TESTING
Information Patent Application
Surface contamination analyzer for semiconductor wafers, method use...
- Publication number 20020123161
- Publication date Sep 5, 2002
- Takeo Ushiki
- G01 - MEASURING TESTING

Measurements of non-electric or non-magnetic variables

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Non-contact angle measuring apparatus

Control method and plasma processing apparatus

Scanning electron microscopy system and pattern depth measurement m...

Method for focusing an electron beam on a wafer having a transparen...

Plasma processing apparatus and method for measuring thickness of r...

Pattern measurement device and non-transitory computer readable med...

Multi-stage/multi-chamber electron-beam inspection system

Range-based real-time scanning electron microscope non-visual binner

Charged particle beam device

Orientation imaging using wide angle convergent beam diffraction in...

Scanning electron microscope

Charged particle detectors

Pattern measurement apparatus

Orientation imaging using wide angle convergent beam diffraction in...

Surface contamination analyzer for semiconductor wafers

Surface contamination analyzer for semiconductor wafers, method use...

Electron anti-fogging baffle used as a detector

Ion beam monitoring in an ion implanter using an imaging device

Surface contamination analyzer for semiconductor wafers, method use...

Surface contamination analyzer for semiconductor wafers, method use...

Patents Applicationslast 30 patents

ULTRA-PRECISION TIMING CLOCK METHOD AND APPARATUS

SURFACE MODIFYING APPARATUS AND BONDING STRENGTH DETERMINATION METHOD

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

SCANNING ELECTRON MICROSCOPY SYSTEM AND PATTERN DEPTH MEASUREMENT M...

Pattern Measurement Device and Non-Transitory Computer Readable Med...

PLASMA PROCESSING APPARATUS AND METHOD FOR MEASURING THICKNESS OF R...

Electron-Beam Inspection Systems with optimized throughput

Multi-Stage/Multi-Chamber Electron-Beam Inspection System

Multi-Stage/Multi-Chamber Electron-Beam Inspection System

NON-CONTACT ANGLE MEASURING APPARATUS, MISSION CRITICAL INSPECTION...

Range-Based Real-Time Scanning Electron Microscope Non-Visual Binner

METHOD FOR CHARACTERISING PARTICLES BY IMAGE ANALYSIS

Systems and Methods for Material Texture Analysis

ORIENTATION IMAGING USING WIDE ANGLE CONVERGENT BEAM DIFFRACTION IN...

SYSTEM AND METHOD FOR MEASURING ANGULAR LUMINESCENCE IN A CHARGED P...

SCANNING ELECTRON MICROSCOPE

CHARGED PARTICLE DETECTORS

PATTERN MEASUREMENT APPARATUS

ORIENTATION IMAGING USING WIDE ANGLE CONVERGENT BEAM DIFFRACTION IN...

ATOM PROBE DATA AND ASSOCIATED SYSTEMS AND METHODS

ATOM PROBE DATA PROCESSES AND ASSOCIATED SYSTEMS

SURFACE CONTAMINATION ANALYZER FOR SEMICONDUCTOR WAFERS, METHOD USE...

Ion beam monitoring in an ion implanter using an imaging device

PATTERN INSPECTION AND MEASUREMENT APPARATUS

Electron Spectroscope With Emission Induced By A Monochromatic Elec...

ELECTRON ANTI-FOGGING BAFFLE USED AS A DETECTOR

Surface contamination analyzer for semiconductor wafers, method use...

Surface contamination analyzer for semiconductor wafers, method use...

Surface contamination analyzer for semiconductor wafers, method use...