Mechanical X-Y scanning

Industry

CPC
H01J2237/20228

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/20228Mechanical X-Y scanning

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Scanned angled etching apparatus and techniques providing separate...
- Patent number 12,106,936
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate positioning device with remote temperature sensor
- Patent number 12,051,607
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Patriek Adrianus Alphonsus Maria Bruurs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer scanning apparatus and method for focused beam processing
- Patent number 11,915,906
- Issue date Feb 27, 2024
- TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Matthew Gwinn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for poling polymer thin films
- Patent number 11,910,715
- Issue date Feb 20, 2024
- CREESENSE MICROSYSTEMS INC.
- Albert Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real time photoresist outgassing control system and method
- Patent number 11,749,500
- Issue date Sep 5, 2023
- Applied Materials, Inc.
- Nevin Clay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanned angled etching apparatus and techniques providing separate...
- Patent number 11,715,621
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern enhancement using a gas cluster ion beam
- Patent number 11,694,872
- Issue date Jul 4, 2023
- TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film-forming apparatus, film-forming system, and film-forming method
- Patent number 11,664,207
- Issue date May 30, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scanning ion beam etch
- Patent number 11,646,171
- Issue date May 9, 2023
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate positioning device and electron beam inspection tool
- Patent number 11,621,142
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Marcel Koenraad Marie Baggen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer scanning apparatus and method for focused beam processing
- Patent number 11,587,760
- Issue date Feb 21, 2023
- TEL Manufacturing and Engineering of America, Inc.
- Matthew Gwinn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fill pattern to enhance ebeam process margin
- Patent number 11,581,162
- Issue date Feb 14, 2023
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern enhancement using a gas cluster ion beam
- Patent number 11,450,506
- Issue date Sep 20, 2022
- TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ angle measurement using channeling
- Patent number 11,387,073
- Issue date Jul 12, 2022
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition using a substrate scanning system
- Patent number 11,361,968
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Glen F R Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam blanking device and multi-charged-particle-beam writing...
- Patent number 11,355,302
- Issue date Jun 7, 2022
- NuFlare Technology, Inc.
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for depositing nanometric sized particles onto a substrate
- Patent number 11,345,989
- Issue date May 31, 2022
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Olivier Sublemontier
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering device
- Patent number 11,328,913
- Issue date May 10, 2022
- Nissin Electric Co., Ltd.
- Shigeaki Kishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection apparatus stage positioning
- Patent number 11,302,512
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Marcel Koenraad Marie Baggen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering device
- Patent number 11,289,314
- Issue date Mar 29, 2022
- Nissin Electric Co., Ltd.
- Shigeaki Kishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for poling polymer thin films
- Patent number 11,283,004
- Issue date Mar 22, 2022
- Areesys Technologies, Inc.
- Albert Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 11,251,012
- Issue date Feb 15, 2022
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,227,744
- Issue date Jan 18, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning ion beam etch
- Patent number 11,227,741
- Issue date Jan 18, 2022
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and beam profiler
- Patent number 11,205,560
- Issue date Dec 21, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- David Edward Potkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 11,145,488
- Issue date Oct 12, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 11,133,149
- Issue date Sep 28, 2021
- Hitachi High-Tech Science Corporation
- Toshihiro Mochizuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fill pattern to enhance e-beam process margin
- Patent number 11,107,658
- Issue date Aug 31, 2021
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device, interchangeable multi-aperture arrang...
- Patent number 10,978,270
- Issue date Apr 13, 2021
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Dieter Winkler
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS
- Publication number 20240412944
- Publication date Dec 12, 2024
- KLA Corporation
- Weijie Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...
- Publication number 20240371600
- Publication date Nov 7, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM
- Publication number 20240339290
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER FOR TRANSMISSION ELECTRON MICROSCOPE, SAMPLE ANALYSIS...
- Publication number 20240153734
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE...
- Publication number 20230335375
- Publication date Oct 19, 2023
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20230260741
- Publication date Aug 17, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tetsuya Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IMAGING A SAMPLE WITH A CHARGED PARTICLE BEAM DEVICE, MET...
- Publication number 20230253177
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Kulpreet Singh VIRDI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL TIME PHOTORESIST OUTGASSING CONTROL SYSTEM AND METHOD
- Publication number 20230238214
- Publication date Jul 27, 2023
- Applied Materials, Inc.
- Nevin Clay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Scanning Apparatus and Method for Focused Beam Processing
- Publication number 20230187168
- Publication date Jun 15, 2023
- TEL Manufacturing and Engineering of America, Inc.
- Matthew Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM PLASMA LINEAR ION SOURCE
- Publication number 20230083497
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Enhancement Using a Gas Cluster Ion Beam
- Publication number 20220277924
- Publication date Sep 1, 2022
- TEL Manufacturing and Engineering of America, Inc.
- Kazuya Dobashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS MODULE, SUBSTRATE PROCESSING SYSTEM, AND PROCESSING METHOD
- Publication number 20220213594
- Publication date Jul 7, 2022
- TOKYO ELECTRON LIMITED
- Takayuki YAMAGISHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SCANNING ION BEAM DEPOSITION AND ETCH
- Publication number 20220189727
- Publication date Jun 16, 2022
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Ion Beam Etch
- Publication number 20220084779
- Publication date Mar 17, 2022
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic Layer Deposition Using A Substrate Scanning System
- Publication number 20220068644
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Glen F R Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Poling Polymer Thin Films
- Publication number 20210376223
- Publication date Dec 2, 2021
- Areesys Technologies, Inc.
- Albert Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN
- Publication number 20210358713
- Publication date Nov 18, 2021
- Intel Corporation
- Shakul TANDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Enhancement Using a Gas Cluster Ion Beam
- Publication number 20210335568
- Publication date Oct 28, 2021
- TOKYO ELECTRON LIMITED
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20210305008
- Publication date Sep 30, 2021
- NuFlare Technology, Inc.
- Taku YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM BLANKING DEVICE AND MULTI-CHARGED-PARTICLE-BEAM WRITING...
- Publication number 20210296074
- Publication date Sep 23, 2021
- NuFlare Technology, Inc.
- Hiroshi YAMASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POSITIONING DEVICE WITH REMOTE TEMPERATURE SENSOR
- Publication number 20210272829
- Publication date Sep 2, 2021
- ASML NETHERLANDS B.V.
- Patriek Adrianus Alphonsus Maria BRUURS
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20210241995
- Publication date Aug 5, 2021
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND BEAM PROFILER
- Publication number 20210134559
- Publication date May 6, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- David Edward Potkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR DEPOSITING NANOMETRIC SIZED PARTICLES ONTO A SUBSTRATE
- Publication number 20210108305
- Publication date Apr 15, 2021
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Olivier SUBLEMONTIER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20210090854
- Publication date Mar 25, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Toshihiro MOCHIZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A Device for Extracting and Placing a Lamella
- Publication number 20210050180
- Publication date Feb 18, 2021
- TESCAN Brno, s.r.o.
- Andrey Denisyuk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20210043421
- Publication date Feb 11, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20210043474
- Publication date Feb 11, 2021
- Disco Corporation
- Masatoshi WAKAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POSITIONING DEVICE AND ELECTRON BEAM INSPECTION TOOL
- Publication number 20200373118
- Publication date Nov 26, 2020
- ASML NETHERLANDS B.V.
- Marcel Koenraad Marie BAGGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM INSPECTION APPARATUS STAGE POSITIONING
- Publication number 20200203118
- Publication date Jun 25, 2020
- ASML NETHERLANDS B.V.
- Marcel Koenraad Marie BAGGEN
- H01 - BASIC ELECTRIC ELEMENTS

Mechanical X-Y scanning

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Scanned angled etching apparatus and techniques providing separate...

Substrate positioning device with remote temperature sensor

Charged particle beam writing apparatus, charged particle beam writ...

Wafer scanning apparatus and method for focused beam processing

Method and apparatus for poling polymer thin films

Real time photoresist outgassing control system and method

Scanned angled etching apparatus and techniques providing separate...

Pattern enhancement using a gas cluster ion beam

Film-forming apparatus, film-forming system, and film-forming method

Scanning ion beam etch

Substrate positioning device and electron beam inspection tool

Wafer scanning apparatus and method for focused beam processing

Fill pattern to enhance ebeam process margin

Pattern enhancement using a gas cluster ion beam

In situ angle measurement using channeling

Atomic layer deposition using a substrate scanning system

Multi-beam blanking device and multi-charged-particle-beam writing...

Device for depositing nanometric sized particles onto a substrate

Sputtering device

Electron beam inspection apparatus stage positioning

Sputtering device

Method and apparatus for poling polymer thin films

Charged particle beam writing apparatus and charged particle beam w...

Multi-beam writing method and multi-beam writing apparatus

Scanning ion beam etch

Ion implanter and beam profiler

Ion implanter and ion implantation method

Focused ion beam apparatus

Fill pattern to enhance e-beam process margin

Charged particle beam device, interchangeable multi-aperture arrang...

Patents Applicationslast 30 patents

AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS

METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...

METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM

SAMPLE HOLDER FOR TRANSMISSION ELECTRON MICROSCOPE, SAMPLE ANALYSIS...

SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE...

ION IMPLANTER AND ION IMPLANTATION METHOD

METHOD OF IMAGING A SAMPLE WITH A CHARGED PARTICLE BEAM DEVICE, MET...

REAL TIME PHOTORESIST OUTGASSING CONTROL SYSTEM AND METHOD

Wafer Scanning Apparatus and Method for Focused Beam Processing

UNIFORM PLASMA LINEAR ION SOURCE

Pattern Enhancement Using a Gas Cluster Ion Beam

PROCESS MODULE, SUBSTRATE PROCESSING SYSTEM, AND PROCESSING METHOD

SCANNING ION BEAM DEPOSITION AND ETCH

Scanning Ion Beam Etch

Atomic Layer Deposition Using A Substrate Scanning System

Method and Apparatus for Poling Polymer Thin Films

FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN

Pattern Enhancement Using a Gas Cluster Ion Beam

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

MULTI-BEAM BLANKING DEVICE AND MULTI-CHARGED-PARTICLE-BEAM WRITING...

SUBSTRATE POSITIONING DEVICE WITH REMOTE TEMPERATURE SENSOR

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...

ION IMPLANTER AND BEAM PROFILER

DEVICE FOR DEPOSITING NANOMETRIC SIZED PARTICLES ONTO A SUBSTRATE

FOCUSED ION BEAM APPARATUS

A Device for Extracting and Placing a Lamella

ION IMPLANTER AND ION IMPLANTATION METHOD

PLASMA ETCHING APPARATUS

SUBSTRATE POSITIONING DEVICE AND ELECTRON BEAM INSPECTION TOOL

ELECTRON BEAM INSPECTION APPARATUS STAGE POSITIONING