Microlenses

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CPC
H01J2237/1205

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/1205Microlenses

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,237,143
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,961,697
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 11,804,355
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,705,304
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic devices to influence beams of charged particles
- Patent number 11,699,566
- Issue date Jul 11, 2023
- ViaMEMS Technologies, Inc.
- David Xuan-Qi Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,670,477
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,587,758
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection methods and systems
- Patent number 11,462,380
- Issue date Oct 4, 2022
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,217,423
- Issue date Jan 4, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nano vacuum tube
- Patent number 11,152,188
- Issue date Oct 19, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsien-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,107,657
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,062,877
- Issue date Jul 13, 2021
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micro stigmator array for multi electron beam system
- Patent number 11,056,312
- Issue date Jul 6, 2021
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,879,031
- Issue date Dec 29, 2020
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for focus adjustment of a multi-beam scanning ele...
- Patent number 10,861,671
- Issue date Dec 8, 2020
- KLA Corporation
- Doug K. Masnaghetti
- G02 - OPTICS
Information Patent Grant
Multi-column scanning electron microscopy system
- Patent number 10,840,056
- Issue date Nov 17, 2020
- KLA Corporation
- Robert Haynes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflection array apparatus for multi-electron beam system
- Patent number 10,748,739
- Issue date Aug 18, 2020
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,643,820
- Issue date May 5, 2020
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an imaging system
- Patent number 10,614,993
- Issue date Apr 7, 2020
- Frederick A. Flitsch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nano vacuum tube
- Patent number 10,566,173
- Issue date Feb 18, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsien-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,541,110
- Issue date Jan 21, 2020
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,395,886
- Issue date Aug 27, 2019
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,276,347
- Issue date Apr 30, 2019
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,236,156
- Issue date Mar 19, 2019
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,109,456
- Issue date Oct 23, 2018
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Digital pattern generator having charge drain coating
- Patent number 10,072,334
- Issue date Sep 11, 2018
- KLA-Tencor Corporation
- William M. Tong
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 9,922,799
- Issue date Mar 20, 2018
- Hermes-Microvision, Inc.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for charged particle lithography system
- Patent number 9,911,575
- Issue date Mar 6, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Chi Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...
- Publication number 20240379322
- Publication date Nov 14, 2024
- Carl Zeiss MultiSEM GmbH
- Alexander Wertz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
- Publication number 20240170252
- Publication date May 23, 2024
- Carl Zeiss MultiSEM GmbH
- Yanko Sarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240128044
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSESSMENT SYSTEM, METHOD OF ASSESSING
- Publication number 20240079205
- Publication date Mar 7, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING CHARGED PARTICLE BEAMS
- Publication number 20230411110
- Publication date Dec 21, 2023
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20230282441
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM
- Publication number 20230086984
- Publication date Mar 23, 2023
- ASML NETHERLANDS B.V.
- Te-Yu CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC DEVICES TO INFLUENCE BEAMS OF CHARGED PARTICLES
- Publication number 20230071331
- Publication date Mar 9, 2023
- ViaMEMS Technologies, Inc.
- David Xuan-Qi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LENS DESIGNS
- Publication number 20220406563
- Publication date Dec 22, 2022
- ASML NETHERLANDS B.V.
- Laura DEL TIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20220148851
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS
- Publication number 20220068587
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM INSPECTION METHODS AND SYSTEMS
- Publication number 20210343497
- Publication date Nov 4, 2021
- ASML NETHERLANDS B.V.
- Pieter Willem Herman DE JAGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20210233736
- Publication date Jul 29, 2021
- ASML Netherlands B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-COLUMN SCANNING ELECTRON MICROSCOPY SYSTEM
- Publication number 20210090844
- Publication date Mar 25, 2021
- Robert Haynes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20200388464
- Publication date Dec 10, 2020
- ASML Netherlands B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AN APPARATUS USING CHARGED PARTICLE BEAMS
- Publication number 20200303155
- Publication date Sep 24, 2020
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANO VACUUM TUBE
- Publication number 20200161085
- Publication date May 21, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Hsien-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20200152412
- Publication date May 14, 2020
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deflection Array Apparatus for Multi-Electron Beam System
- Publication number 20200118784
- Publication date Apr 16, 2020
- KLA-Tencor Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20190279842
- Publication date Sep 12, 2019
- ASML Netherlands B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20190259573
- Publication date Aug 22, 2019
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20190057837
- Publication date Feb 21, 2019
- HERMES MICROVISION, INC.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20180350555
- Publication date Dec 6, 2018
- HERMES MICROVISION, INC.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIGITAL PATTERN GENERATOR HAVING CHARGE DRAIN COATING
- Publication number 20180037993
- Publication date Feb 8, 2018
- William M. Tong
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20170309449
- Publication date Oct 26, 2017
- HERMES MICROVISION, INC.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PILLAR-SUPPORTED ARRAY OF MICRO ELECTRON LENSES
- Publication number 20150340195
- Publication date Nov 26, 2015
- KLA-Tencor Corporation
- Alan D. BRODIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICRO-COLUMN WITH DOUBLE ALIGNER
- Publication number 20140239190
- Publication date Aug 28, 2014
- Industry-University Cooperation Foundation Sunmoon University
- Tae Sik OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-MINIATURIZED ELECTRON OPTICAL MICROCOLUMN
- Publication number 20140224997
- Publication date Aug 14, 2014
- Industry-University Cooperation Foundation Sunmoon University
- Tae Sik OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC LENS AND CHARGED PARTICLE BEAM APPARATUS USING THE SAME
- Publication number 20140224999
- Publication date Aug 14, 2014
- KYOCERA CORPORATION
- Yukio Noguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged Particle Lithography System With a Long Shape Illumination...
- Publication number 20140212815
- Publication date Jul 31, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jimmy Hsiao
- H01 - BASIC ELECTRIC ELEMENTS

Microlenses

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Apparatus using charged particle beams

Apparatus of plural charged-particle beams

Apparatus for multiple charged-particle beams

Apparatus of plural charged-particle beams

Electrostatic devices to influence beams of charged particles

Apparatus using charged particle beams

Apparatus of plural charged-particle beams

Multi-beam inspection methods and systems

Apparatus of plural charged-particle beams

Nano vacuum tube

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Micro stigmator array for multi electron beam system

Apparatus of plural charged-particle beams

Method and system for focus adjustment of a multi-beam scanning ele...

Multi-column scanning electron microscopy system

Deflection array apparatus for multi-electron beam system

Apparatus of plural charged-particle beams

Method and apparatus for an imaging system

Nano vacuum tube

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Digital pattern generator having charge drain coating

Apparatus of plural charged-particle beams

Apparatus for charged particle lithography system

Patents Applicationslast 30 patents

MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...

MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

ASSESSMENT SYSTEM, METHOD OF ASSESSING

APPARATUS USING CHARGED PARTICLE BEAMS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM

ELECTROSTATIC DEVICES TO INFLUENCE BEAMS OF CHARGED PARTICLES

LENS DESIGNS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS

MULTI-BEAM INSPECTION METHODS AND SYSTEMS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

MULTI-COLUMN SCANNING ELECTRON MICROSCOPY SYSTEM

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

AN APPARATUS USING CHARGED PARTICLE BEAMS

NANO VACUUM TUBE

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

Deflection Array Apparatus for Multi-Electron Beam System

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

DIGITAL PATTERN GENERATOR HAVING CHARGE DRAIN COATING

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

PILLAR-SUPPORTED ARRAY OF MICRO ELECTRON LENSES

MICRO-COLUMN WITH DOUBLE ALIGNER

ULTRA-MINIATURIZED ELECTRON OPTICAL MICROCOLUMN

ELECTROSTATIC LENS AND CHARGED PARTICLE BEAM APPARATUS USING THE SAME

Charged Particle Lithography System With a Long Shape Illumination...