Microwave reflectors

Industry

CPC
H01J37/32275

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32275Microwave reflectors

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,887,816
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 11,646,178
- Issue date May 9, 2023
- Tokyo Electron Limited
- Yuji Onuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave output device and plasma processing apparatus
- Patent number 11,587,769
- Issue date Feb 21, 2023
- Tokyo Electron Limited
- Yohei Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,569,068
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,527,386
- Issue date Dec 13, 2022
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma density monitor, plasma processing apparatus, and plasma pro...
- Patent number 11,410,835
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gasification device and plasma shutter with a microwave plazma slow...
- Patent number 11,393,660
- Issue date Jul 19, 2022
- INING S.RO.
- Anton Danylenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave output device and plasma processing apparatus
- Patent number 10,971,337
- Issue date Apr 6, 2021
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,761,418
- Issue date Sep 12, 2017
- Tokyo Electron Limited
- Masayuki Shintaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputter device
- Patent number 9,147,557
- Issue date Sep 29, 2015
- Samsung Display Co., Ltd.
- Yong-Sup Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma processing device and gate valve for microwave pla...
- Patent number 8,293,067
- Issue date Oct 23, 2012
- Tokyo Electron Limited
- Sunao Muraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing device and gate valve for microwave pla...
- Patent number 7,993,488
- Issue date Aug 9, 2011
- Tokyo Electron Limited
- Sunao Muraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for wall film monitoring
- Patent number 7,732,227
- Issue date Jun 8, 2010
- Tokyo Electron Limited
- Eric J. Strang
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for electron density measurement
- Patent number 7,544,269
- Issue date Jun 9, 2009
- Tokyo Electron Limited
- Eric J. Strang
- G01 - MEASURING TESTING
Information Patent Grant
System for generating a local electron-cyclotron microwave low-pres...
- Patent number 7,506,609
- Issue date Mar 24, 2009
- Forschungszentrum Karlsruhe GmbH
- Sven Ulrich
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for electron density measurement and verifying...
- Patent number 7,263,447
- Issue date Aug 28, 2007
- Tokyo Electron Limited
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for monitoring and verifying equipment status
- Patent number 7,260,500
- Issue date Aug 21, 2007
- Tokyo Electron Limited
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for wall film monitoring
- Patent number 7,214,289
- Issue date May 8, 2007
- Tokyo Electron Limited
- Eric J. Strang
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for improving microwave coupling to a resonant...
- Patent number 6,954,077
- Issue date Oct 11, 2005
- Tokyo Electron Limited
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus
- Patent number 5,700,326
- Issue date Dec 23, 1997
- Canon Kabushiki Kaisha
- Kazumasa Takatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating method and apparatus and plasma processing method...
- Patent number 5,580,420
- Issue date Dec 3, 1996
- Hitachi, Ltd.
- Katsuya Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma asher with microwave trap
- Patent number 5,498,308
- Issue date Mar 12, 1996
- Fusion Systems Corp.
- Mohammad Kamarehi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-speed film forming method by microwave plasma chemical vapor d...
- Patent number 5,310,426
- Issue date May 10, 1994
- Uha Mikakuto Precision Engineering Research Institute Co., Ltd.
- Yuzo Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processor
- Patent number 5,146,138
- Issue date Sep 8, 1992
- Mitsubishi Denki Kabushiki Kaisha
- Hiroki Ootera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processor
- Patent number 5,115,167
- Issue date May 19, 1992
- Mitsubishi Denki Kabushiki Kaisha
- Hiroki Ootera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for depositing silicon oxide on a substrate
- Patent number 5,053,244
- Issue date Oct 1, 1991
- Leybold Aktiengesellschaft
- Jorg Kieser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-speed film forming method by microwave plasma chemical vapor d...
- Patent number 5,037,666
- Issue date Aug 6, 1991
- Uha Mikakuto Precision Engineering Research Institute Co., Ltd.
- Yuzo Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma processing method and apparatus
- Patent number 4,971,651
- Issue date Nov 20, 1990
- Hitachi, Ltd.
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for producing a plasma and for the treatment of substrates
- Patent number 4,939,424
- Issue date Jul 3, 1990
- Leybold Aktiengesellschaft
- Jorg Kieser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating electrostatic drums using microwave energy
- Patent number 4,745,000
- Issue date May 17, 1988
- Energy Conversion Devices, Inc.
- Stanford R. Ovshinsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR OPERATING THEREOF
- Publication number 20230120716
- Publication date Apr 20, 2023
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220130643
- Publication date Apr 28, 2022
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GASIFICATION DEVICE AND PLASMA SHUTTER WITH A MICROWAVE PLAZMA SLOW...
- Publication number 20220044910
- Publication date Feb 10, 2022
- INING S.R.O.
- Anton DANYLENKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE OUTPUT DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20220028661
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Yohei Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210280390
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DENSITY MONITOR, PLASMA PROCESSING APPARATUS, AND PLASMA PRO...
- Publication number 20200381224
- Publication date Dec 3, 2020
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave output device and plasma processing apparatus
- Publication number 20190057844
- Publication date Feb 21, 2019
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180151332
- Publication date May 31, 2018
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTER DEVICE
- Publication number 20130026035
- Publication date Jan 31, 2013
- Yong-Sup CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110303363
- Publication date Dec 15, 2011
- TOKYO ELECTRON LIMITED
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA PROCESSING DEVICE AND GATE VALVE FOR MICROWAVE PLA...
- Publication number 20110265952
- Publication date Nov 3, 2011
- TOKYO ELECTRON LIMITED
- Sunao MURAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma generation apparatus and workpiece processing apparatus usin...
- Publication number 20080053988
- Publication date Mar 6, 2008
- Noritsu Koki Co., Ltd.
- Kiyotaka Arai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MICROWAVE PLASMA PROCESSING DEVICE AND GATE VALVE FOR MICROWAVE PLA...
- Publication number 20080006371
- Publication date Jan 10, 2008
- TOKYO ELECTRON LIMITED
- Sunao MURAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for wall film monitoring
- Publication number 20070020776
- Publication date Jan 25, 2007
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for improving microwave coupling to a resonant...
- Publication number 20050046427
- Publication date Mar 3, 2005
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for electron density measurement and verifying...
- Publication number 20050030003
- Publication date Feb 10, 2005
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for monitoring and verifying equipment status
- Publication number 20040267547
- Publication date Dec 30, 2004
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System for generating a local electron-cyclotron microwave low-pres...
- Publication number 20040255867
- Publication date Dec 23, 2004
- Sven Ulrich
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and apparatus for wall film monitoring
- Publication number 20040232920
- Publication date Nov 25, 2004
- Eric J Strang
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for electron density measurement
- Publication number 20040189325
- Publication date Sep 30, 2004
- Eric J Strang
- G01 - MEASURING TESTING

Microwave reflectors

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus

Apparatus for plasma processing

Microwave output device and plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Plasma density monitor, plasma processing apparatus, and plasma pro...

Gasification device and plasma shutter with a microwave plazma slow...

Microwave output device and plasma processing apparatus

Plasma processing apparatus

Sputter device

Microwave plasma processing device and gate valve for microwave pla...

Microwave plasma processing device and gate valve for microwave pla...

Method and apparatus for wall film monitoring

Method and apparatus for electron density measurement

System for generating a local electron-cyclotron microwave low-pres...

Method and apparatus for electron density measurement and verifying...

Method and apparatus for monitoring and verifying equipment status

Method and apparatus for wall film monitoring

Apparatus and method for improving microwave coupling to a resonant...

Microwave plasma processing apparatus

Plasma generating method and apparatus and plasma processing method...

Plasma asher with microwave trap

High-speed film forming method by microwave plasma chemical vapor d...

Plasma processor

Plasma processor

Process for depositing silicon oxide on a substrate

High-speed film forming method by microwave plasma chemical vapor d...

Microwave plasma processing method and apparatus

Apparatus for producing a plasma and for the treatment of substrates

Method of fabricating electrostatic drums using microwave energy

Patents Applicationslast 30 patents

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR OPERATING THEREOF

PLASMA PROCESSING APPARATUS

GASIFICATION DEVICE AND PLASMA SHUTTER WITH A MICROWAVE PLAZMA SLOW...

MICROWAVE OUTPUT DEVICE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA DENSITY MONITOR, PLASMA PROCESSING APPARATUS, AND PLASMA PRO...

Microwave output device and plasma processing apparatus

PLASMA PROCESSING APPARATUS

SPUTTER DEVICE

PLASMA PROCESSING APPARATUS

MICROWAVE PLASMA PROCESSING DEVICE AND GATE VALVE FOR MICROWAVE PLA...

Plasma generation apparatus and workpiece processing apparatus usin...

MICROWAVE PLASMA PROCESSING DEVICE AND GATE VALVE FOR MICROWAVE PLA...

Method and apparatus for wall film monitoring

Apparatus and method for improving microwave coupling to a resonant...

Method and apparatus for electron density measurement and verifying...

Method and apparatus for monitoring and verifying equipment status

System for generating a local electron-cyclotron microwave low-pres...

Method and apparatus for wall film monitoring

Method and apparatus for electron density measurement