Microwaves

Industry

CPC
H01J2237/0817

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0817Microwaves

Industries

Patents Grantslast 30 patents

Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,670,489
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,049,694
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for plasma deposition and treatment
- Patent number 10,861,667
- Issue date Dec 8, 2020
- Peter F. Vandermeulen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for plasma deposition and treatment
- Patent number 10,861,669
- Issue date Dec 8, 2020
- Peter F. Vandermeulen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma source
- Patent number 10,798,810
- Issue date Oct 6, 2020
- Polygon Physics
- Pascal Sortais
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for plasma deposition and treatment
- Patent number 10,727,031
- Issue date Jul 28, 2020
- Peter F. Vandermeulen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for plasma deposition and treatment
- Patent number 10,490,386
- Issue date Nov 26, 2019
- Peter F. Vandermeulen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ion source of an ion implanter
- Patent number 9,852,887
- Issue date Dec 26, 2017
- Advanced Ion Beam Technology, Inc.
- Stephen Edward Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for plasma deposition and treatment
- Patent number 9,847,212
- Issue date Dec 19, 2017
- Peter F. Vandermeulen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for plasma deposition and treatment
- Patent number 9,653,265
- Issue date May 16, 2017
- Peter F. Vandermeulen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma ion source for use with a focused ion beam column with selec...
- Patent number 9,627,169
- Issue date Apr 18, 2017
- FEI Company
- Anthony Graupera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control using adjustable internal antennas
- Patent number 9,613,777
- Issue date Apr 4, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source for selectively providing positively or negatively charged p...
- Patent number 9,601,312
- Issue date Mar 21, 2017
- FEI Company
- Brian Roberts Routh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage isolation of an inductively coupled plasma ion source...
- Patent number 9,591,735
- Issue date Mar 7, 2017
- FEI Company
- Sean Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam systems and methods of operation
- Patent number 9,576,767
- Issue date Feb 21, 2017
- Indian Institute of Technology Kanpur
- Sudeep Bhattacharjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for plasma deposition and treatment
- Patent number 9,520,271
- Issue date Dec 13, 2016
- Peter F. Vandermeulen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 9,401,262
- Issue date Jul 26, 2016
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma potential modulated ion implantation system
- Patent number 9,297,063
- Issue date Mar 29, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Svetlana B. Radovanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Source for selectively providing positively or negatively charged p...
- Patent number 9,275,828
- Issue date Mar 1, 2016
- FEI Company
- Brian Roberts Routh
- G01 - MEASURING TESTING
Information Patent Grant
Automated ion beam idle
- Patent number 9,123,500
- Issue date Sep 1, 2015
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 9,029,812
- Issue date May 12, 2015
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Encapsulation of electrodes in solid media
- Patent number 8,987,678
- Issue date Mar 24, 2015
- FEI Company
- Sean Kellogg
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Inductively-coupled plasma ion source for use with a focused ion be...
- Patent number 8,822,913
- Issue date Sep 2, 2014
- FEI Company
- Anthony Graupera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for plasma deposition and treatment
- Patent number 8,800,483
- Issue date Aug 12, 2014
- Peter F. Vandermeulen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF-driven ion source with a back-streaming electron dump
- Patent number 8,729,806
- Issue date May 20, 2014
- The Regents of the University of California
- Joe Kwan
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Inductively coupled plasma source as an electron beam source for sp...
- Patent number 8,716,673
- Issue date May 6, 2014
- FEI Company
- Brian Roberts Routh
- G01 - MEASURING TESTING
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 8,692,217
- Issue date Apr 8, 2014
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-power gaseous plasma source
- Patent number 8,664,862
- Issue date Mar 4, 2014
- Centre National de la Recherche Scientifique
- Pascal Sortais
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Encapsulation of electrodes in solid media for use in conjunction w...
- Patent number 8,642,974
- Issue date Feb 4, 2014
- FEI Company
- Sean Kellogg
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Microplasma ion source for focused ion beam applications
- Patent number 8,481,966
- Issue date Jul 9, 2013
- Tiza Lab, LLC
- Vladimir V. Makarov
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND SYSTEMS FOR RECLAMATION OF LI-ION CATHODE MATERIALS USI...
- Publication number 20220223379
- Publication date Jul 14, 2022
- 6K Inc.
- Richard K. Holman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA JET SOLID ABLATION-BASED DIRECT ANALYSIS APPARATUS
- Publication number 20220208522
- Publication date Jun 30, 2022
- CHENGDU ALIEBN SCIENCE AND TECHNOLOGY CO., LTD
- Yanting YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE
- Publication number 20210313153
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT
- Publication number 20200090898
- Publication date Mar 19, 2020
- Peter F. Vandermeulen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT
- Publication number 20200058463
- Publication date Feb 20, 2020
- Peter F. Vandermeulen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma Source
- Publication number 20190394866
- Publication date Dec 26, 2019
- Polygon Physics
- Pascal SORTAIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT
- Publication number 20180076009
- Publication date Mar 15, 2018
- Peter F. Vandermeulen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT
- Publication number 20150021473
- Publication date Jan 22, 2015
- Peter F. Vandermeulen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Source for Selectively Providing Positively or Negatively Charged P...
- Publication number 20140326877
- Publication date Nov 6, 2014
- FEI Company
- Brian Roberts Routh
- G01 - MEASURING TESTING
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20140312245
- Publication date Oct 23, 2014
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED PLASMA ION SOURCE WITH MULTIPLE ANTENNAS FOR WI...
- Publication number 20140042337
- Publication date Feb 13, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20130309421
- Publication date Nov 21, 2013
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Potential Modulated ION Implantation System
- Publication number 20130287964
- Publication date Oct 31, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Svetlana B. Radovanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Automated Ion Beam Idle
- Publication number 20130256553
- Publication date Oct 3, 2013
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROPLASMA ION SOURCE FOR FOCUSED ION BEAM APPLICATIONS
- Publication number 20130221232
- Publication date Aug 29, 2013
- Vladimir V. Makarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20130203260
- Publication date Aug 8, 2013
- TOKYO ELECTRON LIMITED
- Kenichi Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inductively-Coupled Plasma Ion Source for Use with a Focused Ion Be...
- Publication number 20130140450
- Publication date Jun 6, 2013
- FEI Company
- Anthony Graupera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Source as an Electron Beam Source for Sp...
- Publication number 20130134307
- Publication date May 30, 2013
- FEI Company
- Brian Roberts Routh
- G01 - MEASURING TESTING
Information Patent Application
Encapsulation of Electrodes in Solid Media for use in conjunction w...
- Publication number 20120261587
- Publication date Oct 18, 2012
- FEI Company
- Sean Kellogg
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Multi-Source Plasma Focused Ion Beam System
- Publication number 20120080407
- Publication date Apr 5, 2012
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR DOPING
- Publication number 20120021592
- Publication date Jan 26, 2012
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Encapsulation of Electrodes in Solid Media for use in conjunction w...
- Publication number 20110272592
- Publication date Nov 10, 2011
- FEI Company
- Sean Kellogg
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LOW-POWER GASEOUS PLASMA SOURCE
- Publication number 20110260621
- Publication date Oct 27, 2011
- Pascal Sortais
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS FOR CONTROLLING THE TEMPERATURE OF AN RF ION SOURCE WINDOW
- Publication number 20110240876
- Publication date Oct 6, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF-DRIVEN ION SOURCE WITH A BACK-STREAMING ELECTRON DUMP
- Publication number 20110226422
- Publication date Sep 22, 2011
- The Regents of the University of California
- Joe Kwan
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Electron Cyclotron Ion Source and Manufacturing Method Thereof
- Publication number 20110140641
- Publication date Jun 16, 2011
- KOREA BASIC SCIENCE INSTITUTE
- Mi-Sook Won
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT
- Publication number 20110005461
- Publication date Jan 13, 2011
- Peter F. Vandermeulen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITE FOCUSED ION BEAM DEVICE, PROCESS OBSERVATION METHOD USING...
- Publication number 20100288924
- Publication date Nov 18, 2010
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Application
TECHNIQUES FOR PROVIDING A MULTIMODE ION SOURCE
- Publication number 20100148088
- Publication date Jun 17, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Svetlana Radovanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DENSITY HELICON PLASMA SOURCE FOR WIDE RIBBON ION BEAM GENERATION
- Publication number 20100055345
- Publication date Mar 4, 2010
- Costel Biloiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Modular microwave source with embedded ground surface

Modular microwave source with embedded ground surface

Methods and systems for plasma deposition and treatment

Methods and systems for plasma deposition and treatment

Plasma source

Methods and systems for plasma deposition and treatment

Methods and systems for plasma deposition and treatment

Ion source of an ion implanter

Methods and systems for plasma deposition and treatment

Methods and systems for plasma deposition and treatment

Plasma ion source for use with a focused ion beam column with selec...

Uniformity control using adjustable internal antennas

Source for selectively providing positively or negatively charged p...

High voltage isolation of an inductively coupled plasma ion source...

Focused ion beam systems and methods of operation

Methods and systems for plasma deposition and treatment

Multi-source plasma focused ion beam system

Plasma potential modulated ion implantation system

Source for selectively providing positively or negatively charged p...

Automated ion beam idle

Multi-source plasma focused ion beam system

Encapsulation of electrodes in solid media

Inductively-coupled plasma ion source for use with a focused ion be...

Methods and systems for plasma deposition and treatment

RF-driven ion source with a back-streaming electron dump

Inductively coupled plasma source as an electron beam source for sp...

Multi-source plasma focused ion beam system

Low-power gaseous plasma source

Encapsulation of electrodes in solid media for use in conjunction w...

Microplasma ion source for focused ion beam applications

Patents Applicationslast 30 patents

METHODS AND SYSTEMS FOR RECLAMATION OF LI-ION CATHODE MATERIALS USI...

PLASMA JET SOLID ABLATION-BASED DIRECT ANALYSIS APPARATUS

MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE

METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT

METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT

Plasma Source

METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT

METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT

Source for Selectively Providing Positively or Negatively Charged P...

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

INDUCTIVELY COUPLED PLASMA ION SOURCE WITH MULTIPLE ANTENNAS FOR WI...

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

Plasma Potential Modulated ION Implantation System

Automated Ion Beam Idle

MICROPLASMA ION SOURCE FOR FOCUSED ION BEAM APPLICATIONS

ETCHING METHOD AND ETCHING APPARATUS

Inductively-Coupled Plasma Ion Source for Use with a Focused Ion Be...

Inductively Coupled Plasma Source as an Electron Beam Source for Sp...

Encapsulation of Electrodes in Solid Media for use in conjunction w...

Multi-Source Plasma Focused Ion Beam System

APPARATUS AND METHOD FOR DOPING

Encapsulation of Electrodes in Solid Media for use in conjunction w...

LOW-POWER GASEOUS PLASMA SOURCE

APPARATUS FOR CONTROLLING THE TEMPERATURE OF AN RF ION SOURCE WINDOW

RF-DRIVEN ION SOURCE WITH A BACK-STREAMING ELECTRON DUMP

Electron Cyclotron Ion Source and Manufacturing Method Thereof

METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT

COMPOSITE FOCUSED ION BEAM DEVICE, PROCESS OBSERVATION METHOD USING...

TECHNIQUES FOR PROVIDING A MULTIMODE ION SOURCE

HIGH DENSITY HELICON PLASMA SOURCE FOR WIDE RIBBON ION BEAM GENERATION