Mounting, supporting, spacing or insulating electrodes

Industry

CPC
H01J2237/03

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/03Mounting, supporting, spacing or insulating electrodes

Industries

Patents Grantslast 30 patents

Information Patent Grant
Device and method for substrate transport in vacuum processing systems
- Patent number 12,142,463
- Issue date Nov 12, 2024
- VON ARDENNE Asset GmbH & Co. KG
- Falk Milde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cathode mechanism of electron emission source, and method for manuf...
- Patent number 12,106,928
- Issue date Oct 1, 2024
- NuFlare Technology, Inc.
- Ryoei Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interlocking fastening upper electrode assembly having improved fas...
- Patent number 12,104,638
- Issue date Oct 1, 2024
- TEM CO., LTD.
- Jin Kyung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chucking process
- Patent number 12,100,609
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Active gas generation apparatus
- Patent number 12,074,012
- Issue date Aug 27, 2024
- TMEIC Corporation
- Kensuke Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulator for an ion implantation source
- Patent number 12,020,896
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsung-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Systems, devices, and methods for contaminant resistant insulative...
- Patent number 11,894,212
- Issue date Feb 6, 2024
- TAE TECHNOLOGIES, INC.
- Christopher J. Killer
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Corona/plasma treatment machine
- Patent number 11,848,175
- Issue date Dec 19, 2023
- 3DT LLC
- Donald J. Weyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,804,356
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multistage-connected multipole, multistage multipole unit, and char...
- Patent number 11,769,650
- Issue date Sep 26, 2023
- HITACHI HIGH-TECH CORPORATION
- Hideto Dohi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Height measuring device, charged particle beam apparatus, and heigh...
- Patent number 11,754,388
- Issue date Sep 12, 2023
- Jeol Ltd.
- Yukinori Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Plasma processing apparatus
- Patent number 11,664,198
- Issue date May 30, 2023
- Tokyo Electron Limited
- Hirofumi Ohta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography system
- Patent number 11,610,758
- Issue date Mar 21, 2023
- KKT HOLDINGS SYNDICATE
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aberration corrector and multiple electron beam irradiation apparatus
- Patent number 11,605,523
- Issue date Mar 14, 2023
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 11,587,770
- Issue date Feb 21, 2023
- Semes Co., Ltd.
- Jamyung Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector and multiple electron beam irradiation apparatus
- Patent number 11,574,793
- Issue date Feb 7, 2023
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector and method of aligning aberration corrector
- Patent number 11,501,947
- Issue date Nov 15, 2022
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Matthias Firnkes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation detector and radiation detection apparatus
- Patent number 11,444,213
- Issue date Sep 13, 2022
- Fondazione Bruno Kessler
- Antonino Picciotto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems, devices, and methods for contaminant resistant insulative...
- Patent number 11,355,303
- Issue date Jun 7, 2022
- TAE TECHNOLOGIES, INC.
- Christopher J. Killer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,289,304
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detecting method and detecting equipment therefor
- Patent number 11,237,414
- Issue date Feb 1, 2022
- HKC CORPORATION LIMITED
- Chung-Kuang Chien
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Anode, and x-ray generating tube, x-ray generating apparatus, and r...
- Patent number 10,998,161
- Issue date May 4, 2021
- Canon Kabushiki Kaisha
- Yasuo Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 10,991,551
- Issue date Apr 27, 2021
- Tokyo Electron Limited
- Mohd Fairuz Bin Budiman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle device, structure manufacturing method, and struct...
- Patent number 10,879,029
- Issue date Dec 29, 2020
- Nikon Corporation
- Atsushi Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low conductance self-shielding insulator for ion implantation systems
- Patent number 10,679,818
- Issue date Jun 9, 2020
- Axcelis Technologies, Inc.
- John F. Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monochromator and charged particle beam apparatus comprising the same
- Patent number 10,622,183
- Issue date Apr 14, 2020
- Korea Research Institute of Standards and Science
- Takashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 10,586,625
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
AFE (ACTIVE FAR EDGE) HEATER/BIPOLAR ESC WITH SIMPLIFIED AND OPTIMI...
- Publication number 20240387154
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Juan Carlos ROCHA-ALVAREZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION
- Publication number 20240387148
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Che Wei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE
- Publication number 20240355592
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Vladimir Nagorny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LIQUID METAL ION SOURCE DEVICE FOR USING BISMUTH AND ALLOY OF BISMUTH
- Publication number 20240331967
- Publication date Oct 3, 2024
- KOREA BASIC SCIENCE INSTITUTE
- Myoung Choul Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240297024
- Publication date Sep 5, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Ren ARITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATING STRUCTURE, ELECTROSTATIC LENS, AND CHARGED PARTICLE BEAM...
- Publication number 20240274394
- Publication date Aug 15, 2024
- EBARA CORPORATION
- Yasushi TOMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATOR FOR AN ION IMPLANTATION SOURCE
- Publication number 20240274405
- Publication date Aug 15, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMAPNY, LTD.
- Tsung-Min LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Structure for Particle Acceleration And Charged Particle Beam Appar...
- Publication number 20240242918
- Publication date Jul 18, 2024
- Hitachi High-Tech Corporation
- RYO SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IRRADIATION DEVICE
- Publication number 20240186099
- Publication date Jun 6, 2024
- NHV CORPORATION
- Tomonori SHIRAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE FIXING ASSEMBLY AND DRY ETCHING DEVICE
- Publication number 20240186120
- Publication date Jun 6, 2024
- Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Zhiyuan LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240177973
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Koki HIDAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lattice Based Voltage Standoff
- Publication number 20240177960
- Publication date May 30, 2024
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE DEVICE AND METHOD
- Publication number 20240087835
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20240071711
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER INSULATION PLATE AND SUBSTRATE PROCESSING APPARATUS INCLUDI...
- Publication number 20230411126
- Publication date Dec 21, 2023
- SEMES CO., LTD.
- Dongmok LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR SUBSTRATE TRANSPORT IN VACUUM PROCESSING SYSTEMS
- Publication number 20230402266
- Publication date Dec 14, 2023
- VON ARDENNE Asset GmbH & Co. KG
- Falk MILDE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230402258
- Publication date Dec 14, 2023
- Samsung Electronics Co., Ltd.
- Yunhwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION
- Publication number 20230369023
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Che Wei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING...
- Publication number 20230335380
- Publication date Oct 19, 2023
- Tokyo Electron Limited
- Takaaki KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF NUCLEAR REPROGRAMMING
- Publication number 20230282445
- Publication date Sep 7, 2023
- KYOTO UNIVERSITY
- Shinya Yamanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING
- Publication number 20230238221
- Publication date Jul 27, 2023
- Applied Materials, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20230223239
- Publication date Jul 13, 2023
- Satoru KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Arcing Reduction in Wafer Bevel Edge Plasma Processing
- Publication number 20230215692
- Publication date Jul 6, 2023
- LAM RESEARCH CORPORATION
- Xuefeng Hua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND PLA...
- Publication number 20230207265
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- Shant ARAKELYAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS SUPPLYING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDI...
- Publication number 20230197415
- Publication date Jun 22, 2023
- SEMES CO., LTD.
- In Seong LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CATHODE MECHANISM OF ELECTRON EMISSION SOURCE, AND METHOD FOR MANUF...
- Publication number 20230132046
- Publication date Apr 27, 2023
- NuFlare Technology, Inc.
- Ryoei KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimization of Radiofrequency Signal Ground Return in Plasma Proce...
- Publication number 20230059495
- Publication date Feb 23, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERLOCKING FASTENING UPPER ELECTRODE ASSEMBLY HAVING IMPROVED FAS...
- Publication number 20230032767
- Publication date Feb 2, 2023
- TEM CO., LTD.
- Jin Kyung PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORKPIECE SUPPORT SYSTEM FOR PLASMA TREATMENT AND METHOD OF USING T...
- Publication number 20230018842
- Publication date Jan 19, 2023
- Nordson Corporation
- Zhao JIANGANG
- H01 - BASIC ELECTRIC ELEMENTS

Mounting, supporting, spacing or insulating electrodes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Device and method for substrate transport in vacuum processing systems

Cathode mechanism of electron emission source, and method for manuf...

Interlocking fastening upper electrode assembly having improved fas...

Electrostatic chucking process

Active gas generation apparatus

Insulator for an ion implantation source

Vacuum chamber arrangement for charged particle beam generator

Systems, devices, and methods for contaminant resistant insulative...

Corona/plasma treatment machine

Apparatus using multiple beams of charged particles

Multistage-connected multipole, multistage multipole unit, and char...

Height measuring device, charged particle beam apparatus, and heigh...

Vacuum chamber arrangement for charged particle beam generator

Plasma processing apparatus

Charged particle beam lithography system

Aberration corrector and multiple electron beam irradiation apparatus

Apparatus and method for treating substrate

Aberration corrector and multiple electron beam irradiation apparatus

Aberration corrector and method of aligning aberration corrector

Radiation detector and radiation detection apparatus

Systems, devices, and methods for contaminant resistant insulative...

Apparatus using multiple beams of charged particles

Detecting method and detecting equipment therefor

Vacuum chamber arrangement for charged particle beam generator

Anode, and x-ray generating tube, x-ray generating apparatus, and r...

Cleaning method and plasma processing apparatus

Charged particle device, structure manufacturing method, and struct...

Low conductance self-shielding insulator for ion implantation systems

Monochromator and charged particle beam apparatus comprising the same

Vacuum chamber arrangement for charged particle beam generator

Patents Applicationslast 30 patents

AFE (ACTIVE FAR EDGE) HEATER/BIPOLAR ESC WITH SIMPLIFIED AND OPTIMI...

TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION

UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE

LIQUID METAL ION SOURCE DEVICE FOR USING BISMUTH AND ALLOY OF BISMUTH

ACTIVE GAS GENERATION APPARATUS

INSULATING STRUCTURE, ELECTROSTATIC LENS, AND CHARGED PARTICLE BEAM...

INSULATOR FOR AN ION IMPLANTATION SOURCE

Structure for Particle Acceleration And Charged Particle Beam Appar...

ELECTRON BEAM IRRADIATION DEVICE

ELECTRODE FIXING ASSEMBLY AND DRY ETCHING DEVICE

PLASMA PROCESSING APPARATUS

Lattice Based Voltage Standoff

CHARGED PARTICLE DEVICE AND METHOD

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

CHAMBER INSULATION PLATE AND SUBSTRATE PROCESSING APPARATUS INCLUDI...

DEVICE AND METHOD FOR SUBSTRATE TRANSPORT IN VACUUM PROCESSING SYSTEMS

PLASMA PROCESSING APPARATUS

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION

PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING...

METHOD OF NUCLEAR REPROGRAMMING

PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

Arcing Reduction in Wafer Bevel Edge Plasma Processing

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND PLA...

PROCESS GAS SUPPLYING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDI...

CATHODE MECHANISM OF ELECTRON EMISSION SOURCE, AND METHOD FOR MANUF...

Optimization of Radiofrequency Signal Ground Return in Plasma Proce...

INTERLOCKING FASTENING UPPER ELECTRODE ASSEMBLY HAVING IMPROVED FAS...

WORKPIECE SUPPORT SYSTEM FOR PLASMA TREATMENT AND METHOD OF USING T...