Multi-aperture

Industry

CPC
H01J2237/0435

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0435Multi-aperture

Industries

Patents Grantslast 30 patents

Information Patent Grant
Drawing apparatus and deflector
- Patent number 12,009,174
- Issue date Jun 11, 2024
- NuFlare Technology, Inc.
- Kazuhiro Kishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam grid layout
- Patent number RE49952
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Multi charged particle beam writing apparatus
- Patent number 11,908,659
- Issue date Feb 20, 2024
- NuFlare Technology, Inc.
- Toshiki Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing apparatus and multi-charged-par...
- Patent number 11,901,156
- Issue date Feb 13, 2024
- NuFlare Technology, Inc.
- Ryosuke Ueba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,804,356
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam adjustment method, multi charged partic...
- Patent number 11,804,360
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aperture array with integrated current measurement
- Patent number 11,791,132
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Albertus Victor Gerardus Mangnus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 11,756,766
- Issue date Sep 12, 2023
- NuFlare Technology, Inc.
- Takahito Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Electron beam irradiation apparatus and electron beam irradiation m...
- Patent number 11,664,191
- Issue date May 30, 2023
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam adjustment method, charged particle beam draw...
- Patent number 11,658,002
- Issue date May 23, 2023
- NuFlare Technology, Inc.
- Ryoichi Kakehi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple electron beam writing apparatus and multiple electron beam...
- Patent number 11,621,140
- Issue date Apr 4, 2023
- NuFlare Technology, Inc.
- Kota Iwasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fill pattern to enhance ebeam process margin
- Patent number 11,581,162
- Issue date Feb 14, 2023
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple-charged particle-beam irradiation apparatus and multiple-c...
- Patent number 11,574,797
- Issue date Feb 7, 2023
- NuFlare Technology, Inc.
- Mitsuhiro Okazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling operation of electron emission source, elect...
- Patent number 11,562,878
- Issue date Jan 24, 2023
- NuFlare Technology, Inc.
- Nobuo Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Digital detector, apparatus of charged-particle beam such as electr...
- Patent number 11,328,898
- Issue date May 10, 2022
- BORRIES PTE. LTD.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,289,304
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method, lithography method, and dev...
- Patent number 11,276,558
- Issue date Mar 15, 2022
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus and multi-charged par...
- Patent number 11,270,865
- Issue date Mar 8, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,217,423
- Issue date Jan 4, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus
- Patent number 11,217,428
- Issue date Jan 4, 2022
- NuFlare Technology, Inc.
- Mitsuhiro Okazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam evaluation method and multi charged par...
- Patent number 11,211,227
- Issue date Dec 28, 2021
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fill pattern to enhance e-beam process margin
- Patent number 11,107,658
- Issue date Aug 31, 2021
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for charged particle beam modulation
- Patent number 11,049,689
- Issue date Jun 29, 2021
- ASML Netherlands B.V.
- Ehud Shaked
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 10,987,705
- Issue date Apr 27, 2021
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Multiple charged particle beam writing method and apparatus using b...
- Patent number 10,978,273
- Issue date Apr 13, 2021
- NuFlare Technology, Inc.
- Hideo Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Writing data generation method, computer-readable recording medium...
- Patent number 10,971,331
- Issue date Apr 6, 2021
- NuFlare Technology, Inc.
- Shinji Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflector for multiple electron beams and multiple beam image acqui...
- Patent number 10,937,623
- Issue date Mar 2, 2021
- NuFlare Technology, Inc.
- John Hartley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Studying dynamic specimens in a transmission charged particle micro...
- Patent number 10,825,648
- Issue date Nov 3, 2020
- FEI Company
- Bastiaan Lambertus Martinus Hendriksen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming an optical fiber array
- Patent number RE48287
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Guido De Boer

Patents Applicationslast 30 patents

Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Determining Focal Properties in a Target Beam Field of a...
- Publication number 20240304415
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS
- Publication number 20240297010
- Publication date Sep 5, 2024
- NuFlare Technology, Inc.
- Eita FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...
- Publication number 20240282550
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL
- Publication number 20240203687
- Publication date Jun 20, 2024
- Carl Zeiss MultiSEM GmbH
- Gero Storeck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTI-BEAM PARTICLE MICROSCOPE WITH FAST CLO...
- Publication number 20240128048
- Publication date Apr 18, 2024
- Carl Zeiss MultiSEM GmbH
- Ingo Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE BEAM SYSTEM WITH ANISOTROPIC FILTERING...
- Publication number 20240128051
- Publication date Apr 18, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20240071711
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...
- Publication number 20240029999
- Publication date Jan 25, 2024
- NuFlare Technology, Inc.
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
METHOD FOR ESTIMATING CATHODE LIFETIME OF ELECTRON GUN, AND ELECTRO...
- Publication number 20230154720
- Publication date May 18, 2023
- NuFlare Technology, Inc.
- Nobuo MIYAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS
- Publication number 20230111566
- Publication date Apr 13, 2023
- NuFlare Technology, Inc.
- Eita FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM
- Publication number 20230086984
- Publication date Mar 23, 2023
- ASML NETHERLANDS B.V.
- Te-Yu CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...
- Publication number 20230081240
- Publication date Mar 16, 2023
- NuFlare Technology, Inc.
- Ryosuke UEBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-MODAL OPERATIONS FOR MULTI-BEAM INSPECTION SYSTEM
- Publication number 20230019113
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Martinus Gerardus Johannes Maria MAASSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20220399181
- Publication date Dec 15, 2022
- NuFlare Technology, Inc.
- Toshiki KIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20220319807
- Publication date Oct 6, 2022
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM INCLUDING A MULTI-BEAM DEFLECTION DEVICE AND A...
- Publication number 20220277927
- Publication date Sep 1, 2022
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR VOLTAGE CONTRAST IMAGING WITH A CORPUSCULAR MULTI-BEAM M...
- Publication number 20220254600
- Publication date Aug 11, 2022
- Carl Zeiss MultiSEM GmbH
- Gregor Frank Dellemann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20220223366
- Publication date Jul 14, 2022
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM IRRADIATION M...
- Publication number 20220189734
- Publication date Jun 16, 2022
- NuFlare Technology, Inc.
- Taku YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONTROLLING OPERATION OF ELECTRON EMISSION SOURCE, ELECT...
- Publication number 20220157553
- Publication date May 19, 2022
- NuFlare Technology, Inc.
- Nobuo MIYAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIGITAL DETECTOR, APPARATUS OF CHARGED-PARTICLE BEAM SUCH AS ELECTR...
- Publication number 20220108867
- Publication date Apr 7, 2022
- BORRIES PTE. LTD.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE-CHARGED PARTICLE-BEAM IRRADIATION APPARATUS AND MULTIPLE-C...
- Publication number 20220102113
- Publication date Mar 31, 2022
- NuFlare Technology, Inc.
- Mitsuhiro OKAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM ADJUSTMENT METHOD, CHARGED PARTICLE BEAM DRAW...
- Publication number 20220068591
- Publication date Mar 3, 2022
- NuFlare Technology, Inc.
- Ryoichi KAKEHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE ELECTRON BEAM WRITING APPARATUS AND MULTIPLE ELECTRON BEAM...
- Publication number 20220059310
- Publication date Feb 24, 2022
- NuFlare Technology, Inc.
- Kota IWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN
- Publication number 20210358713
- Publication date Nov 18, 2021
- Intel Corporation
- Shakul TANDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20210237129
- Publication date Aug 5, 2021
- ASML NETHERLANDS B.V.
- Marc SMITS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM EVALUATION METHOD AND MULTI CHARGED PAR...
- Publication number 20210074510
- Publication date Mar 11, 2021
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS OF OPERATING T...
- Publication number 20200381212
- Publication date Dec 3, 2020
- ASML Netherlands B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS

Multi-aperture

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Drawing apparatus and deflector

Beam grid layout

Multi charged particle beam writing apparatus

Multi-charged-particle-beam writing apparatus and multi-charged-par...

Apparatus using multiple beams of charged particles

Multi charged particle beam adjustment method, multi charged partic...

Aperture array with integrated current measurement

Charged particle beam writing apparatus and charged particle beam w...

Method and system for the removal and/or avoidance of contamination...

Electron beam irradiation apparatus and electron beam irradiation m...

Charged particle beam adjustment method, charged particle beam draw...

Multiple electron beam writing apparatus and multiple electron beam...

Fill pattern to enhance ebeam process margin

Multiple-charged particle-beam irradiation apparatus and multiple-c...

Method for controlling operation of electron emission source, elect...

Digital detector, apparatus of charged-particle beam such as electr...

Apparatus using multiple beams of charged particles

Exposure apparatus and exposure method, lithography method, and dev...

Multi-charged particle beam writing apparatus and multi-charged par...

Apparatus of plural charged-particle beams

Multi charged particle beam writing apparatus

Multi charged particle beam evaluation method and multi charged par...

Fill pattern to enhance e-beam process margin

Systems and methods for charged particle beam modulation

Method and system for the removal and/or avoidance of contamination...

Multiple charged particle beam writing method and apparatus using b...

Writing data generation method, computer-readable recording medium...

Deflector for multiple electron beams and multiple beam image acqui...

Studying dynamic specimens in a transmission charged particle micro...

Method for forming an optical fiber array

Patents Applicationslast 30 patents

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

Method for Determining Focal Properties in a Target Beam Field of a...

CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS

BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL

METHOD FOR OPERATING A MULTI-BEAM PARTICLE MICROSCOPE WITH FAST CLO...

MULTI-BEAM CHARGED PARTICLE BEAM SYSTEM WITH ANISOTROPIC FILTERING...

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

METHOD FOR ESTIMATING CATHODE LIFETIME OF ELECTRON GUN, AND ELECTRO...

CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS

BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM

MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...

MULTI-MODAL OPERATIONS FOR MULTI-BEAM INSPECTION SYSTEM

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

PARTICLE BEAM SYSTEM INCLUDING A MULTI-BEAM DEFLECTION DEVICE AND A...

METHOD FOR VOLTAGE CONTRAST IMAGING WITH A CORPUSCULAR MULTI-BEAM M...

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM IRRADIATION M...

METHOD FOR CONTROLLING OPERATION OF ELECTRON EMISSION SOURCE, ELECT...

DIGITAL DETECTOR, APPARATUS OF CHARGED-PARTICLE BEAM SUCH AS ELECTR...

MULTIPLE-CHARGED PARTICLE-BEAM IRRADIATION APPARATUS AND MULTIPLE-C...

CHARGED PARTICLE BEAM ADJUSTMENT METHOD, CHARGED PARTICLE BEAM DRAW...

MULTIPLE ELECTRON BEAM WRITING APPARATUS AND MULTIPLE ELECTRON BEAM...

FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

MULTI CHARGED PARTICLE BEAM EVALUATION METHOD AND MULTI CHARGED PAR...

MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS OF OPERATING T...