Multi-cusp fields

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CPC
H01J37/32688

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32688Multi-cusp fields

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for depositing a material
- Patent number 11,875,980
- Issue date Jan 16, 2024
- Stephen R Burgess
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,450,515
- Issue date Sep 20, 2022
- Tokyo Electron Limited
- Kazuya Nagaseki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 10,957,519
- Issue date Mar 23, 2021
- IonQuest Corp.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for depositing a material
- Patent number 10,900,114
- Issue date Jan 26, 2021
- Stephen R Burgess
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,825,663
- Issue date Nov 3, 2020
- Tokyo Electron Limited
- Kazuya Nagaseki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical generator and molecular beam epitaxy apparatus
- Patent number 10,577,719
- Issue date Mar 3, 2020
- National University Corporation Nagoya University
- Masaru Hori
- C30 - CRYSTAL GROWTH
Information Patent Grant
Inductively coupled RF plasma source with magnetic confinement and...
- Patent number 10,049,861
- Issue date Aug 14, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 9,390,943
- Issue date Jul 12, 2016
- Tokyo Electron Limited
- Kazuya Nagaseki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 9,349,574
- Issue date May 24, 2016
- Tokyo Electron Limited
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for shaping a magnetic field in a magnetic fie...
- Patent number 8,936,696
- Issue date Jan 20, 2015
- Applied Materials, Inc.
- Roger Alan Lindley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromagnet array in a sputter reactor
- Patent number 8,871,064
- Issue date Oct 28, 2014
- Applied Materials, Inc.
- Tza-Jing Gung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma flood gun using an immersed low inductan...
- Patent number 8,847,496
- Issue date Sep 30, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma flood gun using an immersed low inductan...
- Patent number 8,471,476
- Issue date Jun 25, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for shaping a magnetic field in a magnetic field-enhanced pl...
- Patent number 8,048,328
- Issue date Nov 1, 2011
- Applied Materials, Inc.
- Roger A. Lindley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing apparatus
- Patent number 8,007,633
- Issue date Aug 30, 2011
- Canon Anelva Corporation
- Akihiro Egami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for shaping a magnetic field in a magnetic field-enhanced pl...
- Patent number 7,883,633
- Issue date Feb 8, 2011
- Applied Materials, Inc.
- Roger A. Lindley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for shaping a magnetic field in a magnetic fie...
- Patent number 7,879,186
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Roger Alan Lindley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 7,749,914
- Issue date Jul 6, 2010
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step process for forming a metal barrier in a sputter reactor
- Patent number 7,686,926
- Issue date Mar 30, 2010
- Applied Materials, Inc.
- Tza-Jing Gung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Variable quadruple electromagnet array in plasma processing
- Patent number 7,527,713
- Issue date May 5, 2009
- Applied Materials, Inc.
- Tza-Jing Gung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,438,783
- Issue date Oct 21, 2008
- Shin-Etsu Chemical Co., Ltd.
- Koji Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for shaping a magnetic field in a magnetic fie...
- Patent number 7,422,654
- Issue date Sep 9, 2008
- Applied Materials, Inc.
- Roger Alan Lindley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for plasma-etching organic material film
- Patent number 7,419,613
- Issue date Sep 2, 2008
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device
- Patent number 7,338,576
- Issue date Mar 4, 2008
- Tokyo Electron Limited
- Hiroo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for confinement of a plasma within a volume
- Patent number 7,304,435
- Issue date Dec 4, 2007
- Centre National de la Recherche Scientifique (Cnrs)
- Ana Lacoste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma forming inner magnetic bucket to co...
- Patent number 7,067,034
- Issue date Jun 27, 2006
- Lam Research Corporation
- Andrew D. Bailey III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Neutral particle beam processing apparatus
- Patent number 6,861,643
- Issue date Mar 1, 2005
- Ebara Corporation
- Katsunori Ichiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low ceiling temperature process for a plasma reactor with heated so...
- Patent number 6,818,140
- Issue date Nov 16, 2004
- Jian Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor having RF power applicator and a dual-purpose window
- Patent number 6,790,311
- Issue date Sep 14, 2004
- Kenneth S Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled RF plasma reactor and plasma chamber enclosure...
- Patent number 6,736,931
- Issue date May 18, 2004
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND DEVICES FOR PLASMA TREATMENT
- Publication number 20240222088
- Publication date Jul 4, 2024
- VOESTALPINE STAHL GMBH
- Pierre VANDEN BRANDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Depositing a Material
- Publication number 20210123130
- Publication date Apr 29, 2021
- SPTS TECHNOLOGIES LIMITED
- STEPHEN R. BURGESS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210013015
- Publication date Jan 14, 2021
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETICALLY ENHANCED HIGH DENSITY PLASMA-CHEMICAL VAPOR DEPOSITION...
- Publication number 20180374688
- Publication date Dec 27, 2018
- IonQuest LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180174806
- Publication date Jun 21, 2018
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-BASED MATERIAL MODIFICATION WITH NEUTRAL BEAM
- Publication number 20160233047
- Publication date Aug 11, 2016
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Daniel TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED RF PLASMA SOURCE WITH MAGNETIC CONFINEMENT AND...
- Publication number 20160071704
- Publication date Mar 10, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA FLOOD GUN USING AN IMMERSED LOW INDUCTAN...
- Publication number 20130320854
- Publication date Dec 5, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20130220547
- Publication date Aug 29, 2013
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETRON SPUTTERING APPARATUS AND METHOD
- Publication number 20130081938
- Publication date Apr 4, 2013
- Shigeru MIZUNO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED RF PLASMA SOURCE WITH MAGNETIC CONFINEMENT AND...
- Publication number 20130015053
- Publication date Jan 17, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA FLOOD GUN USING AN IMMERSED LOW INDUCTAN...
- Publication number 20120085917
- Publication date Apr 12, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC FIELD GENERATOR FOR MAGNETRON PLASMA
- Publication number 20110232846
- Publication date Sep 29, 2011
- Shin-Etsu Chemical Co., Ltd.
- Koji MIYATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface processing apparatus
- Publication number 20110174221
- Publication date Jul 21, 2011
- CANON ANELVA CORPORATION
- Akihiro Egami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIE...
- Publication number 20110115589
- Publication date May 19, 2011
- Applied Materials, Inc.
- Roger Alan Lindley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND APPARATUS FOR FABRICATING MAGNETIC DEVICE
- Publication number 20100301008
- Publication date Dec 2, 2010
- Canon ANELVA Corporation
- Sanjay Shinde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electromagnet array in a sputter reactor
- Publication number 20100155223
- Publication date Jun 24, 2010
- Applied Materials, Inc.
- Tza-Jing GUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIE...
- Publication number 20090008033
- Publication date Jan 8, 2009
- Applied Materials, Inc.
- Roger Alan Lindley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface processing apparatus
- Publication number 20080113149
- Publication date May 15, 2008
- ANELVA CORPORATION
- Akihiro Egami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIELD-ENHANCED PL...
- Publication number 20070113980
- Publication date May 24, 2007
- Applied Materials, Inc.
- Roger Alan Lindley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIELD-ENHANCED PL...
- Publication number 20070108042
- Publication date May 17, 2007
- Applied Materials, Inc.
- Scott A. Hogenson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ICP source for iPVD for uniform plasma in combination high pressure...
- Publication number 20070074968
- Publication date Apr 5, 2007
- Mirko Vukovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and device for plasma-etching organic material film
- Publication number 20060213865
- Publication date Sep 28, 2006
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductive plasma system with sidewall magnet
- Publication number 20060177600
- Publication date Aug 10, 2006
- Applied Materials, Inc.
- Siqing Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20060081559
- Publication date Apr 20, 2006
- Shin-Etsu Chemical Co., Ltd.
- Koji Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable quadruple electromagnet array in plasma processing
- Publication number 20050263389
- Publication date Dec 1, 2005
- Tza-Jing Gung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-step process for forming a metal barrier in a sputter reactor
- Publication number 20050263390
- Publication date Dec 1, 2005
- APPLIED MATERIALS, INC.
- Tza-Jing Gung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetron plasma-use magnetic field generation device
- Publication number 20050211383
- Publication date Sep 29, 2005
- Koji Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device for confinement of a plasma within a volume
- Publication number 20050184670
- Publication date Aug 25, 2005
- Ana Lacoste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20050082256
- Publication date Apr 21, 2005
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS

Multi-cusp fields

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for depositing a material

Plasma processing apparatus

Magnetically enhanced high density plasma-chemical vapor deposition...

Method and apparatus for depositing a material

Plasma processing apparatus

Radical generator and molecular beam epitaxy apparatus

Inductively coupled RF plasma source with magnetic confinement and...

Substrate processing apparatus

Plasma etching method and plasma etching apparatus

Method and apparatus for shaping a magnetic field in a magnetic fie...

Electromagnet array in a sputter reactor

Inductively coupled plasma flood gun using an immersed low inductan...

Inductively coupled plasma flood gun using an immersed low inductan...

Method for shaping a magnetic field in a magnetic field-enhanced pl...

Surface processing apparatus

Method for shaping a magnetic field in a magnetic field-enhanced pl...

Method and apparatus for shaping a magnetic field in a magnetic fie...

Plasma etching method

Multi-step process for forming a metal barrier in a sputter reactor

Variable quadruple electromagnet array in plasma processing

Plasma processing apparatus and plasma processing method

Method and apparatus for shaping a magnetic field in a magnetic fie...

Method and device for plasma-etching organic material film

Plasma processing device

Device for confinement of a plasma within a volume

Method and apparatus for plasma forming inner magnetic bucket to co...

Neutral particle beam processing apparatus

Low ceiling temperature process for a plasma reactor with heated so...

Plasma reactor having RF power applicator and a dual-purpose window

Inductively coupled RF plasma reactor and plasma chamber enclosure...

Patents Applicationslast 30 patents

METHOD AND DEVICES FOR PLASMA TREATMENT

Method and Apparatus for Depositing a Material

PLASMA PROCESSING APPARATUS

MAGNETICALLY ENHANCED HIGH DENSITY PLASMA-CHEMICAL VAPOR DEPOSITION...

PLASMA PROCESSING APPARATUS

PLASMA-BASED MATERIAL MODIFICATION WITH NEUTRAL BEAM

INDUCTIVELY COUPLED RF PLASMA SOURCE WITH MAGNETIC CONFINEMENT AND...

INDUCTIVELY COUPLED PLASMA FLOOD GUN USING AN IMMERSED LOW INDUCTAN...

SUBSTRATE PROCESSING APPARATUS

MAGNETRON SPUTTERING APPARATUS AND METHOD

INDUCTIVELY COUPLED RF PLASMA SOURCE WITH MAGNETIC CONFINEMENT AND...

INDUCTIVELY COUPLED PLASMA FLOOD GUN USING AN IMMERSED LOW INDUCTAN...

MAGNETIC FIELD GENERATOR FOR MAGNETRON PLASMA

Surface processing apparatus

METHOD AND APPARATUS FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIE...

PROCESS AND APPARATUS FOR FABRICATING MAGNETIC DEVICE

Electromagnet array in a sputter reactor

METHOD AND APPARATUS FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIE...

Surface processing apparatus

METHOD FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIELD-ENHANCED PL...

METHOD FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIELD-ENHANCED PL...

ICP source for iPVD for uniform plasma in combination high pressure...

Method and device for plasma-etching organic material film

Inductive plasma system with sidewall magnet

Plasma processing apparatus and plasma processing method

Variable quadruple electromagnet array in plasma processing

Multi-step process for forming a metal barrier in a sputter reactor

Magnetron plasma-use magnetic field generation device

Device for confinement of a plasma within a volume

Plasma etching method