Multiple chambers

Industry

CPC
H01J37/32899

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32899Multiple chambers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
In-situ PECVD cap layer
- Patent number 12,252,782
- Issue date Mar 18, 2025
- Lam Research Corporation
- Jeremy David Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holding method and substrate processing apparatus
- Patent number 12,243,728
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having array of coaxial multiple pins and processing...
- Patent number 12,230,481
- Issue date Feb 18, 2025
- HANGZHOU CITY UNIVERSITY
- Qi Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power generator having multiple output ports
- Patent number 12,205,796
- Issue date Jan 21, 2025
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,198,909
- Issue date Jan 14, 2025
- Semes Co., Ltd.
- Duk Hyun Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cover with a sensor system for a configurable measuring system for...
- Patent number 12,183,561
- Issue date Dec 31, 2024
- SOLERAS ADVANCED COATINGS BV
- Ivan Van De Putte
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,546
- Issue date Dec 31, 2024
- ASM IP Holding B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Treatment unit for a facility for treating the surface of a substra...
- Patent number 12,165,847
- Issue date Dec 10, 2024
- Coating Plasma Innovation
- Julien Vallade
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus, system and method to reduce crazing
- Patent number 12,159,772
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Joshua B. Pankratz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer dicing using femtosecond-based laser and plasma etch
- Patent number 12,131,952
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Method to improve wafer edge uniformity
- Patent number 12,125,683
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Mingle Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotating biasable pedestal and electrostatic chuck in semiconductor...
- Patent number 12,112,972
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,112,927
- Issue date Oct 8, 2024
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD apparatus
- Patent number 12,112,928
- Issue date Oct 8, 2024
- GUANGZHOU AIFO LIGHT COMMUNICATION TECHNOLOGY COMPANY LTD.
- Guoqiang Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system with integrated carrier cleaning modules
- Patent number 12,104,242
- Issue date Oct 1, 2024
- Veeco Instruments Inc.
- Alexander I. Gurary
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Focus ring replacement method and plasma processing system
- Patent number 12,094,696
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Shigeru Ishizawa
- B08 - CLEANING
Information Patent Grant
Atomic layer etch and ion beam etch patterning
- Patent number 12,080,562
- Issue date Sep 3, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced temperature monitoring system and methods for semiconducto...
- Patent number 12,068,180
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Xuesong Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave resonator array for plasma diagnostics
- Patent number 12,062,529
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gasbox for semiconductor processing chamber
- Patent number 12,057,325
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Rahul Rajeev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for manufacturing metal gate structures
- Patent number 12,054,823
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF current measurement in semiconductor processing tool
- Patent number 12,051,630
- Issue date Jul 30, 2024
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber body design architecture for next generation advanced plasm...
- Patent number 12,049,961
- Issue date Jul 30, 2024
- Applied Materials, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing system, and ma...
- Patent number 12,040,166
- Issue date Jul 16, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable mode plasma chamber utilizing tunable plasma potential
- Patent number 12,002,652
- Issue date Jun 4, 2024
- Mattson Technology, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF signal parameter measurement in an integrated circuit fabricatio...
- Patent number 11,994,542
- Issue date May 28, 2024
- Lam Research Corporation
- Sunil Kapoor
- G01 - MEASURING TESTING
Information Patent Grant
Focus ring replacement method and plasma processing system
- Patent number 11,990,323
- Issue date May 21, 2024
- Tokyo Electron Limited
- Shigeru Ishizawa
- B08 - CLEANING
Information Patent Grant
Thin film manufacturing apparatus
- Patent number 11,967,492
- Issue date Apr 23, 2024
- AP SYSTEMS INC.
- Byoung Il Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition method
- Patent number 11,961,716
- Issue date Apr 16, 2024
- Industrial Technology Research Institute
- Hsuan-Fu Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES
- Publication number 20250095967
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250087460
- Publication date Mar 13, 2025
- ASM IP HOLDING B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES
- Publication number 20250087472
- Publication date Mar 13, 2025
- INTEVAC, INC.
- Samuel D. Harkness
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL
- Publication number 20250079199
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Shiyu YUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY ARRANGEMENT, PLASMA GENERATING DEVICE AND METHOD FOR C...
- Publication number 20250079125
- Publication date Mar 6, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Jan Peter Engelstaedter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE-AREA DOUBLE-FREQUENCY THIN FILM DEPOSITION METHOD AND APPARAT...
- Publication number 20250066919
- Publication date Feb 27, 2025
- SUZHOU MAXWELL TECHNOLOGIES CO., LTD.
- Dengzhi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...
- Publication number 20250052272
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Rohit Ode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250046583
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Tatsuru OKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING
- Publication number 20250046574
- Publication date Feb 6, 2025
- UVAT TECHNOLOGY CO.,LTD.
- YUAN-CHI LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED PLASMA CLEAN AND DIELECTRIC PASSIVATION DEPOSITION PROCE...
- Publication number 20250029835
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Ryan Ley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH
- Publication number 20250022755
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUSES AND TECHNIQUES FOR CLEANING A MULTI-STATION SEMICONDUCT...
- Publication number 20250022696
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Xin Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...
- Publication number 20250022745
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER
- Publication number 20250014914
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Rahul Rajeev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS
- Publication number 20250006474
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Naomi YOSHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION SYSTEM WITH INTEGRATED CARRIER CLEANING MODULES
- Publication number 20240425973
- Publication date Dec 26, 2024
- VEECO INSTRUMENTS INC.
- Alexander I. Gurary
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODIFICATION OF METAL-CONTAINING SURFACES IN HIGH ASPECT RATIO PLAS...
- Publication number 20240420963
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- He Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20240395515
- Publication date Nov 28, 2024
- SPP TECHNOLOGIES CO., LTD.
- Kazuya OTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT
- Publication number 20240395514
- Publication date Nov 28, 2024
- Prashant AGARWAL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER PROCESSING APPARATUS AND WAFER PROCESSING METHOD
- Publication number 20240395512
- Publication date Nov 28, 2024
- Disco Corporation
- Kazuma SEKIYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA POWER SUPPLY SYSTEM AND METHOD
- Publication number 20240371616
- Publication date Nov 7, 2024
- TRUMPF Huettinger GmbH + Co. KG
- Wojciech Gajewski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS
- Publication number 20240371615
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING SUBSTRATE
- Publication number 20240355615
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Tadahiro ISHIZAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF CURRENT MEASUREMENT IN SEMICONDUCTOR PROCESSING TOOL
- Publication number 20240347400
- Publication date Oct 17, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES
- Publication number 20240337012
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Yu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...
- Publication number 20240339306
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20240321563
- Publication date Sep 26, 2024
- SHIBAURA MECHATRONICS CORPORATION
- Shigeki MATSUNAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20240312801
- Publication date Sep 19, 2024
- KIOXIA Corporation
- Shohei ARAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Mode Plasma Chamber Utilizing Tunable Plasma Potential
- Publication number 20240297019
- Publication date Sep 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS

Multiple chambers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

In-situ PECVD cap layer

Substrate holding method and substrate processing apparatus

Plasma reactor having array of coaxial multiple pins and processing...

Radio frequency power generator having multiple output ports

Apparatus for treating substrate

Cover with a sensor system for a configurable measuring system for...

Substrate processing apparatus

Treatment unit for a facility for treating the surface of a substra...

Apparatus, system and method to reduce crazing

Wafer dicing using femtosecond-based laser and plasma etch

Integrated epitaxy and preclean system

Method to improve wafer edge uniformity

Rotating biasable pedestal and electrostatic chuck in semiconductor...

Substrate processing apparatus and method

PECVD apparatus

Deposition system with integrated carrier cleaning modules

Focus ring replacement method and plasma processing system

Atomic layer etch and ion beam etch patterning

Advanced temperature monitoring system and methods for semiconducto...

Microwave resonator array for plasma diagnostics

Gasbox for semiconductor processing chamber

Apparatus and method for manufacturing metal gate structures

RF current measurement in semiconductor processing tool

Chamber body design architecture for next generation advanced plasm...

Substrate processing apparatus, substrate processing system, and ma...

Variable mode plasma chamber utilizing tunable plasma potential

RF signal parameter measurement in an integrated circuit fabricatio...

Focus ring replacement method and plasma processing system

Thin film manufacturing apparatus

Atomic layer deposition method

Patents Applicationslast 30 patents

PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES

SUBSTRATE PROCESSING APPARATUS

SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES

ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL

POWER SUPPLY ARRANGEMENT, PLASMA GENERATING DEVICE AND METHOD FOR C...

LARGE-AREA DOUBLE-FREQUENCY THIN FILM DEPOSITION METHOD AND APPARAT...

MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...

SUBSTRATE PROCESSING SYSTEM

CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

INTEGRATED PLASMA CLEAN AND DIELECTRIC PASSIVATION DEPOSITION PROCE...

WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH

APPARATUSES AND TECHNIQUES FOR CLEANING A MULTI-STATION SEMICONDUCT...

Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...

GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER

INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS

DEPOSITION SYSTEM WITH INTEGRATED CARRIER CLEANING MODULES

MODIFICATION OF METAL-CONTAINING SURFACES IN HIGH ASPECT RATIO PLAS...

Substrate Processing Apparatus

MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT

WAFER PROCESSING APPARATUS AND WAFER PROCESSING METHOD

PLASMA POWER SUPPLY SYSTEM AND METHOD

MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS

METHOD AND APPARATUS FOR PROCESSING SUBSTRATE

RF CURRENT MEASUREMENT IN SEMICONDUCTOR PROCESSING TOOL

APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...

FILM FORMING APPARATUS

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

Variable Mode Plasma Chamber Utilizing Tunable Plasma Potential