Multiple chambers

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CPC
H01J37/32899

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32899Multiple chambers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 12,354,871
- Issue date Jul 8, 2025
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate processing system, and ma...
- Patent number 12,347,660
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter box for a substrate processing system
- Patent number 12,347,648
- Issue date Jul 1, 2025
- Lam Research Corporation
- Miguel Benjamin Vasquez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ring carrier and substrate treating system
- Patent number 12,340,988
- Issue date Jun 24, 2025
- Semes Co., Ltd.
- Mun Gi Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection and location of anomalous plasma events in fabrication ch...
- Patent number 12,340,992
- Issue date Jun 24, 2025
- Lam Research Corporation
- Yukinori Sakiyama
- G01 - MEASURING TESTING
Information Patent Grant
Batch-type apparatus for atomic layer etching (ALE), and ALE method...
- Patent number 12,334,308
- Issue date Jun 17, 2025
- Samsung Electronics Co., Ltd.
- Hanjin Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma preclean system for cluster tool
- Patent number 12,334,318
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Songjae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing substrate
- Patent number 12,325,919
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power adjustment method of upper electrode power supply and semicon...
- Patent number 12,300,460
- Issue date May 13, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jing Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for low temperature selective epitaxy in a dee...
- Patent number 12,297,559
- Issue date May 13, 2025
- Applied Materials, Inc.
- Abhishek Dube
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing gap filling fluids and related systems and d...
- Patent number 12,293,942
- Issue date May 6, 2025
- ASM IP Holding B.V.
- Timothee Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Station-to-station control of backside bow compensation deposition
- Patent number 12,272,608
- Issue date Apr 8, 2025
- Lam Research Corporation
- Yanhui Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple process semiconductor processing system
- Patent number 12,266,550
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- Nitin Pathak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and support for coating eyeglass lenses
- Patent number 12,261,031
- Issue date Mar 25, 2025
- Schneider GmbH & Co. KG
- Gunter Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-layer hardmask for defect reduction in EUV patterning
- Patent number 12,261,044
- Issue date Mar 25, 2025
- Lam Research Corporation
- Bhaskar Nagabhirava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ PECVD cap layer
- Patent number 12,252,782
- Issue date Mar 18, 2025
- Lam Research Corporation
- Jeremy David Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holding method and substrate processing apparatus
- Patent number 12,243,728
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having array of coaxial multiple pins and processing...
- Patent number 12,230,481
- Issue date Feb 18, 2025
- HANGZHOU CITY UNIVERSITY
- Qi Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power generator having multiple output ports
- Patent number 12,205,796
- Issue date Jan 21, 2025
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,198,909
- Issue date Jan 14, 2025
- Semes Co., Ltd.
- Duk Hyun Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cover with a sensor system for a configurable measuring system for...
- Patent number 12,183,561
- Issue date Dec 31, 2024
- SOLERAS ADVANCED COATINGS BV
- Ivan Van De Putte
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,546
- Issue date Dec 31, 2024
- ASM IP Holding B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Treatment unit for a facility for treating the surface of a substra...
- Patent number 12,165,847
- Issue date Dec 10, 2024
- Coating Plasma Innovation
- Julien Vallade
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus, system and method to reduce crazing
- Patent number 12,159,772
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Joshua B. Pankratz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer dicing using femtosecond-based laser and plasma etch
- Patent number 12,131,952
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Method to improve wafer edge uniformity
- Patent number 12,125,683
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Mingle Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotating biasable pedestal and electrostatic chuck in semiconductor...
- Patent number 12,112,972
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,112,927
- Issue date Oct 8, 2024
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD apparatus
- Patent number 12,112,928
- Issue date Oct 8, 2024
- GUANGZHOU AIFO LIGHT COMMUNICATION TECHNOLOGY COMPANY LTD.
- Guoqiang Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250239440
- Publication date Jul 24, 2025
- SEMES CO., LTD.
- Yo Han BANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUSES FOR FILLING A GAP
- Publication number 20250226214
- Publication date Jul 10, 2025
- ASM IP HOLDING B.V.
- Ranjit Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD, PROCESS MODULE MATCHING METHOD, AND SUBSTRATE...
- Publication number 20250210310
- Publication date Jun 26, 2025
- SEMES CO., LTD.
- Sang Moon YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSTALLATION, METHOD, AND CARRIER FOR COATING EYEGLASS LENSES
- Publication number 20250191900
- Publication date Jun 12, 2025
- SCHNEIDER GMBH & CO. KG
- Gunter SCHNEIDER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS COMPRISING T...
- Publication number 20250191886
- Publication date Jun 12, 2025
- SEMES CO., LTD.
- Sun Il KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAULT EVENT RECOVERY IN MULTI-SLOT PROCESSING CHAMBERS
- Publication number 20250181067
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Mitesh Harshad Sanghvi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM AND METHOD TO REDUCE CRAZING
- Publication number 20250166979
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Joshua B. Pankratz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RADIO FREQUENCY POWER GENERATOR HAVING MULTIPLE OUTPUT PORTS
- Publication number 20250118533
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE WAFER EDGE UNIFORMITY
- Publication number 20250118539
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250104979
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Toshiki AKAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES
- Publication number 20250095967
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES
- Publication number 20250087472
- Publication date Mar 13, 2025
- INTEVAC, INC.
- Samuel D. Harkness
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250087460
- Publication date Mar 13, 2025
- ASM IP HOLDING B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL
- Publication number 20250079199
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Shiyu YUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY ARRANGEMENT, PLASMA GENERATING DEVICE AND METHOD FOR C...
- Publication number 20250079125
- Publication date Mar 6, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Jan Peter Engelstaedter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE-AREA DOUBLE-FREQUENCY THIN FILM DEPOSITION METHOD AND APPARAT...
- Publication number 20250066919
- Publication date Feb 27, 2025
- SUZHOU MAXWELL TECHNOLOGIES CO., LTD.
- Dengzhi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...
- Publication number 20250052272
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Rohit Ode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250046583
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Tatsuru OKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING
- Publication number 20250046574
- Publication date Feb 6, 2025
- UVAT TECHNOLOGY CO.,LTD.
- YUAN-CHI LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED PLASMA CLEAN AND DIELECTRIC PASSIVATION DEPOSITION PROCE...
- Publication number 20250029835
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Ryan Ley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH
- Publication number 20250022755
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Wei-Sheng Lei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUSES AND TECHNIQUES FOR CLEANING A MULTI-STATION SEMICONDUCT...
- Publication number 20250022696
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Xin Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...
- Publication number 20250022745
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER
- Publication number 20250014914
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Rahul Rajeev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS
- Publication number 20250006474
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Naomi YOSHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION SYSTEM WITH INTEGRATED CARRIER CLEANING MODULES
- Publication number 20240425973
- Publication date Dec 26, 2024
- VEECO INSTRUMENTS INC.
- Alexander I. Gurary
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODIFICATION OF METAL-CONTAINING SURFACES IN HIGH ASPECT RATIO PLAS...
- Publication number 20240420963
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- He Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20240395515
- Publication date Nov 28, 2024
- SPP TECHNOLOGIES CO., LTD.
- Kazuya OTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT
- Publication number 20240395514
- Publication date Nov 28, 2024
- Prashant AGARWAL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Multiple chambers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ultrathin atomic layer deposition film accuracy thickness control

Substrate processing apparatus, substrate processing system, and ma...

Filter box for a substrate processing system

Ring carrier and substrate treating system

Detection and location of anomalous plasma events in fabrication ch...

Batch-type apparatus for atomic layer etching (ALE), and ALE method...

Plasma preclean system for cluster tool

Apparatus for processing substrate

Power adjustment method of upper electrode power supply and semicon...

Method and apparatus for low temperature selective epitaxy in a dee...

Methods for depositing gap filling fluids and related systems and d...

Station-to-station control of backside bow compensation deposition

Multiple process semiconductor processing system

System, method and support for coating eyeglass lenses

Multi-layer hardmask for defect reduction in EUV patterning

In-situ PECVD cap layer

Substrate holding method and substrate processing apparatus

Plasma reactor having array of coaxial multiple pins and processing...

Radio frequency power generator having multiple output ports

Apparatus for treating substrate

Cover with a sensor system for a configurable measuring system for...

Substrate processing apparatus

Treatment unit for a facility for treating the surface of a substra...

Apparatus, system and method to reduce crazing

Wafer dicing using femtosecond-based laser and plasma etch

Integrated epitaxy and preclean system

Method to improve wafer edge uniformity

Rotating biasable pedestal and electrostatic chuck in semiconductor...

Substrate processing apparatus and method

PECVD apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS

METHODS AND APPARATUSES FOR FILLING A GAP

MANUFACTURING METHOD, PROCESS MODULE MATCHING METHOD, AND SUBSTRATE...

INSTALLATION, METHOD, AND CARRIER FOR COATING EYEGLASS LENSES

SHOWERHEAD ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS COMPRISING T...

FAULT EVENT RECOVERY IN MULTI-SLOT PROCESSING CHAMBERS

APPARATUS, SYSTEM AND METHOD TO REDUCE CRAZING

RADIO FREQUENCY POWER GENERATOR HAVING MULTIPLE OUTPUT PORTS

METHOD TO IMPROVE WAFER EDGE UNIFORMITY

SUBSTRATE PROCESSING SYSTEM

PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES

SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES

SUBSTRATE PROCESSING APPARATUS

ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL

POWER SUPPLY ARRANGEMENT, PLASMA GENERATING DEVICE AND METHOD FOR C...

LARGE-AREA DOUBLE-FREQUENCY THIN FILM DEPOSITION METHOD AND APPARAT...

MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...

SUBSTRATE PROCESSING SYSTEM

CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

INTEGRATED PLASMA CLEAN AND DIELECTRIC PASSIVATION DEPOSITION PROCE...

WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH

APPARATUSES AND TECHNIQUES FOR CLEANING A MULTI-STATION SEMICONDUCT...

Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...

GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER

INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS

DEPOSITION SYSTEM WITH INTEGRATED CARRIER CLEANING MODULES

MODIFICATION OF METAL-CONTAINING SURFACES IN HIGH ASPECT RATIO PLAS...

Substrate Processing Apparatus

MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT