Nitrogen compound containing

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CPC
Y10S430/12

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

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Y10S430/12Nitrogen compound containing

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Converter system
- Patent number 11,879,085
- Issue date Jan 23, 2024
- Seaborough IP I B.V.
- Michael Krames
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Converter system
- Patent number 11,162,026
- Issue date Nov 2, 2021
- Seaborough IP I B.V.
- Michael Krames
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoacid generators and lithographic resists comprising the same
- Patent number 10,310,375
- Issue date Jun 4, 2019
- Kenneth E Gonsalves
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacturing micro-structure and optically patternable...
- Patent number 9,606,435
- Issue date Mar 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Photoresist overcoat compositions and methods of forming electronic...
- Patent number 9,458,348
- Issue date Oct 4, 2016
- Rohm and Haas Electronic Materials LLC
- Young Cheol Bae
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Exposure photolithography methods
- Patent number 9,235,119
- Issue date Jan 12, 2016
- GLOBALFOUNDRIES Inc.
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonium salt-containing polymer, resist composition, patterning p...
- Patent number 9,233,919
- Issue date Jan 12, 2016
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist overcoat compositions and methods of forming electronic...
- Patent number 9,212,293
- Issue date Dec 15, 2015
- Rohm and Haas Electronic Materials LLC
- Young Cheol Bae
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Coating compositions
- Patent number 9,146,467
- Issue date Sep 29, 2015
- Merck Patent GmbH
- Francis Houlihan
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,040,220
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,034,556
- Issue date May 19, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,029,070
- Issue date May 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition, and compound
- Patent number 9,023,584
- Issue date May 5, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive polymer, resist composition including the photosensi...
- Patent number 9,023,582
- Issue date May 5, 2015
- Samsung Display Co., Ltd.
- Sang-Jun Choi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,023,585
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition and patterning process
- Patent number 9,023,587
- Issue date May 5, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,023,581
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Film, method for manufacturing the film and masking method using th...
- Patent number 9,017,920
- Issue date Apr 28, 2015
- Shenzhen Futaihong Precision Industry Co., Ltd.
- Quan Zhou
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified resist composition and patterning process
- Patent number 9,017,922
- Issue date Apr 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 9,012,129
- Issue date Apr 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium derivatives and the use therof as latent acids
- Patent number 9,005,871
- Issue date Apr 14, 2015
- BASF SE
- Hitoshi Yamato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, polymeric compound, acid generator, resist composition, a...
- Patent number 9,005,874
- Issue date Apr 14, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,005,872
- Issue date Apr 14, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Developable bottom antireflective coating composition and pattern f...
- Patent number 8,999,624
- Issue date Apr 7, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,993,210
- Issue date Mar 31, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing sulfonic acid salts, photo-acid generator and r...
- Patent number 8,993,212
- Issue date Mar 31, 2015
- Central Glass Company, Limited
- Ryozo Takihana
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Hybrid photoresist composition and pattern forming method using the...
- Patent number 8,986,918
- Issue date Mar 24, 2015
- International Business Machines Corporation
- Gregory Breyta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming process and resist compostion
- Patent number 8,980,527
- Issue date Mar 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,980,524
- Issue date Mar 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition for immersion exposure and pattern form...
- Patent number 8,975,002
- Issue date Mar 10, 2015
- FUJIFILM Corporation
- Kei Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
PERFLUORINATED AMIDE SALTS AND THEIR USES AS IONIC CONDUCTING MATER...
- Publication number 20240253023
- Publication date Aug 1, 2024
- Christophe Michot
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...
- Publication number 20140356790
- Publication date Dec 4, 2014
- Yoshinori HIRANO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
EXPOSURE PHOTOLITHOGRAPHY METHODS
- Publication number 20140349237
- Publication date Nov 27, 2014
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photoacid Generators And Lithographic Resists Comprising The Same
- Publication number 20140315130
- Publication date Oct 23, 2014
- University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...
- Publication number 20140296561
- Publication date Oct 2, 2014
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20140212810
- Publication date Jul 31, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PHOTOSENSITIVE POLYMER, RESIST COMPOSITION INCLUDING THE PHOTOSENSI...
- Publication number 20140141372
- Publication date May 22, 2014
- Sang-Jun Choi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20140120472
- Publication date May 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20140080055
- Publication date Mar 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...
- Publication number 20140072916
- Publication date Mar 13, 2014
- International Business Machines Corporation
- Gregory Breyta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
NEW COMPOUND, PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME AND PH...
- Publication number 20140065543
- Publication date Mar 6, 2014
- LG CHEM, LTD.
- Keon Woo Lee
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130344436
- Publication date Dec 26, 2013
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORM...
- Publication number 20130337384
- Publication date Dec 19, 2013
- FUJIFILM CORPORATION
- Kei Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISI...
- Publication number 20130309607
- Publication date Nov 21, 2013
- DAI NIPPON PRINTING CO., LTD.
- Mami Katayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, AND COMPOUND
- Publication number 20130280658
- Publication date Oct 24, 2013
- JSR Corporation
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID...
- Publication number 20130260316
- Publication date Oct 3, 2013
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST OVERCOAT COMPOSITIONS AND METHODS OF FORMING ELECTRONIC...
- Publication number 20130244180
- Publication date Sep 19, 2013
- Rohm and Haas Electronic Material LLC
- Young Cheol Bae
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COATING COMPOSITIONS
- Publication number 20130236833
- Publication date Sep 12, 2013
- AZ Electronic Materials USA Corp.
- Francis HOULIHAN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And R...
- Publication number 20130209938
- Publication date Aug 15, 2013
- CENTRAL GLASS COMPANY, LTD
- Ryozo Takihana
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130202999
- Publication date Aug 8, 2013
- FUJIFILM CORPORATION
- Kaoru IWATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130183624
- Publication date Jul 18, 2013
- JSR Corporation
- Ken MARUYAMA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING PROCESS AND RESIST COMPOSTION
- Publication number 20130183621
- Publication date Jul 18, 2013
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
FILM, METHOD FOR MANUFACTURING THE FILM AND MASKING METHOD USING TH...
- Publication number 20130160939
- Publication date Jun 27, 2013
- FIH (HONG KONG) LIMITED
- QUAN ZHOU
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...
- Publication number 20130122421
- Publication date May 16, 2013
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130115555
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photosensitive Resin Composition And Cured Product Thereof
- Publication number 20130108961
- Publication date May 2, 2013
- NIPPON KAYAKU KABUSHIKI KAISHA
- Misato Oonishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...
- Publication number 20130108964
- Publication date May 2, 2013
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20130089819
- Publication date Apr 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022917
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130022926
- Publication date Jan 24, 2013
- JSR Corporation
- Hiroshi Tomioka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Nitrogen compound containing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Converter system

Converter system

Photoacid generators and lithographic resists comprising the same

Method for manufacturing micro-structure and optically patternable...

Photoresist overcoat compositions and methods of forming electronic...

Exposure photolithography methods

Sulfonium salt-containing polymer, resist composition, patterning p...

Photoresist overcoat compositions and methods of forming electronic...

Coating compositions

Compound and method of producing the same, acid generator, resist c...

Compound and method of producing the same, acid generator, resist c...

Resist composition and method of forming resist pattern

Radiation-sensitive composition, and compound

Photosensitive polymer, resist composition including the photosensi...

Resist composition and method of forming resist pattern

Negative resist composition and patterning process

Resist composition, method of forming resist pattern, polymeric com...

Film, method for manufacturing the film and masking method using th...

Chemically amplified resist composition and patterning process

Resist composition, method of forming resist pattern, novel compoun...

Sulfonium derivatives and the use therof as latent acids

Compound, polymeric compound, acid generator, resist composition, a...

Resist composition and method of forming resist pattern

Developable bottom antireflective coating composition and pattern f...

Salt and photoresist composition containing the same

Fluorine-containing sulfonic acid salts, photo-acid generator and r...

Hybrid photoresist composition and pattern forming method using the...

Pattern forming process and resist compostion

Positive resist composition and method of forming resist pattern

Positive resist composition for immersion exposure and pattern form...

Patents Applicationslast 30 patents

PERFLUORINATED AMIDE SALTS AND THEIR USES AS IONIC CONDUCTING MATER...

METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...

EXPOSURE PHOTOLITHOGRAPHY METHODS

Photoacid Generators And Lithographic Resists Comprising The Same

SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

PHOTOSENSITIVE POLYMER, RESIST COMPOSITION INCLUDING THE PHOTOSENSI...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...

NEW COMPOUND, PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME AND PH...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORM...

PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISI...

RADIATION-SENSITIVE COMPOSITION, AND COMPOUND

RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID...

PHOTORESIST OVERCOAT COMPOSITIONS AND METHODS OF FORMING ELECTRONIC...

COATING COMPOSITIONS

Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And R...

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

RADIATION-SENSITIVE RESIN COMPOSITION

PATTERN FORMING PROCESS AND RESIST COMPOSTION

FILM, METHOD FOR MANUFACTURING THE FILM AND MASKING METHOD USING TH...

HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Photosensitive Resin Composition And Cured Product Thereof

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION