Object or beam position registration

Industry

CPC
H01J37/3045

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3045Object or beam position registration

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for cross-sectioning a sample with a preset thick...
- Patent number RE50001
- Issue date Jun 4, 2024
- FIBICS INCORPORATED
- Michael William Phaneuf
Information Patent Grant
Wafer positioning method and apparatus
- Patent number 11,978,677
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microscopy imaging method for 3D tomography with predictive drift t...
- Patent number 11,923,168
- Issue date Mar 5, 2024
- FIBICS INCORPORATED
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Massive overlay metrology sampling with multiple measurement columns
- Patent number 11,899,375
- Issue date Feb 13, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing apparatus and multi-charged-par...
- Patent number 11,901,156
- Issue date Feb 13, 2024
- NuFlare Technology, Inc.
- Ryosuke Ueba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,869,746
- Issue date Jan 9, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable attenuation optical unit
- Patent number 11,835,769
- Issue date Dec 5, 2023
- Applied Materials Israel Ltd.
- Eitam Yitzchak Vinegrad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle lithography system with alignment sensor and beam...
- Patent number RE49732
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Paul IJmert Scheffers
Information Patent Grant
System using pixelated faraday sensor
- Patent number 11,810,754
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Eric D. Hermanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source for optical device fabrication using a segmented io...
- Patent number 11,810,755
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam writing method, charged particle beam writing...
- Patent number 11,804,361
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aperture array with integrated current measurement
- Patent number 11,791,132
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Albertus Victor Gerardus Mangnus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,747,736
- Issue date Sep 5, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus and control method thereof
- Patent number 11,742,177
- Issue date Aug 29, 2023
- Hitachi High-Tech Science Corporation
- Ayana Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number RE49602
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Pieter Kruit
Information Patent Grant
Operating a particle beam apparatus with an object holder
- Patent number 11,688,583
- Issue date Jun 27, 2023
- Carl Zeiss Microscopy GmbH
- Alexander Orchowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of optical device fabrication using an ion beam source
- Patent number 11,640,898
- Issue date May 2, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for determining a beamlet position and method for determinin...
- Patent number RE49483
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Paul IJmert Scheffers
Information Patent Grant
Analyzing a buried layer of a sample
- Patent number 11,598,633
- Issue date Mar 7, 2023
- Applied Materials Israel Ltd.
- Alexander Mairov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system, switching timing creation support devi...
- Patent number 11,587,763
- Issue date Feb 21, 2023
- Tokyo Electron Limited
- Takeshi Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,579,532
- Issue date Feb 14, 2023
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling operation of electron emission source, elect...
- Patent number 11,562,878
- Issue date Jan 24, 2023
- NuFlare Technology, Inc.
- Nobuo Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced electron beam generation
- Patent number 11,517,975
- Issue date Dec 6, 2022
- Arcam AB
- Mattias Fager
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Displacement detection device
- Patent number 11,512,942
- Issue date Nov 29, 2022
- DMG MORI CO., LTD.
- Akinori Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,476,078
- Issue date Oct 18, 2022
- Hitachi High-Tech Science Corporation
- Masahiro Kiyohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system and method for processing a target, such as a wafer
- Patent number RE49241
- Issue date Oct 11, 2022
- ASML Netherlands B.V.
- Niels Vergeer
Information Patent Grant
Method and system for iteratively cross-sectioning a sample to corr...
- Patent number 11,462,383
- Issue date Oct 4, 2022
- Fibics Incorporated
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron beam apparatus for optical device fabrication
- Patent number 11,462,386
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Kartik Ramaswamy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of optical device fabrication using an electron beam apparatus
- Patent number 11,430,634
- Issue date Aug 30, 2022
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...
- Publication number 20240412945
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM
- Publication number 20240339290
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...
- Publication number 20240281952
- Publication date Aug 22, 2024
- Carl Zeiss SMT GMBH
- Thomas Korb
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
WAFER POSITIONING METHOD AND APPARATUS
- Publication number 20240274478
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING A POSITION OF AN OBJECT IN A BEAM APPARATUS,...
- Publication number 20240258068
- Publication date Aug 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Josef Biberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20240242932
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processor System, Correction Method, and Correction Program
- Publication number 20240222064
- Publication date Jul 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Mayuka OSAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A SAMPLE USING A FOC...
- Publication number 20240186109
- Publication date Jun 6, 2024
- Carl Zeiss SMT GMBH
- Nicole Auth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROSCOPY IMAGING METHOD AND SYSTEM
- Publication number 20240177966
- Publication date May 30, 2024
- Fibics Incorporated
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20240096590
- Publication date Mar 21, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20240055220
- Publication date Feb 15, 2024
- Hitachi High-Tech Corporation
- Yuka II
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20240027919
- Publication date Jan 25, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Image Acquisition Method
- Publication number 20230402252
- Publication date Dec 14, 2023
- JEOL Ltd.
- Nobuyuki Ikeo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...
- Publication number 20230386785
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20230359129
- Publication date Nov 9, 2023
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT DETERMINATION METHOD AND COMPUTER PROGRAM
- Publication number 20230207259
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20230187172
- Publication date Jun 15, 2023
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM USING PIXELATED FARADAY SENSOR
- Publication number 20230187171
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Eric D. Hermanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20230143407
- Publication date May 11, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20230102923
- Publication date Mar 30, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-CHARGED-PARTICLE-BEAM WRITING METHOD, MULTI-CHARGED-PARTICLE-...
- Publication number 20230078311
- Publication date Mar 16, 2023
- NuFlare Technology, Inc.
- Taku YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...
- Publication number 20230081240
- Publication date Mar 16, 2023
- NuFlare Technology, Inc.
- Ryosuke UEBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Drawing Apparatus and Control Method for Char...
- Publication number 20230075825
- Publication date Mar 9, 2023
- JEOL Ltd.
- Yukinori Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE ATTENUATION OPTICAL UNIT
- Publication number 20230055035
- Publication date Feb 23, 2023
- APPLIED MATERIALS ISRAEL LTD.
- Eitam Yitzchak Vinegrad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROSCOPY IMAGING METHOD AND SYSTEM
- Publication number 20230044598
- Publication date Feb 9, 2023
- Fibics Incorporated
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Wafer Positioning Method and Apparatus
- Publication number 20220415719
- Publication date Dec 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Positioning Method and Apparatus
- Publication number 20220415606
- Publication date Dec 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...
- Publication number 20220384142
- Publication date Dec 1, 2022
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR POSITIONING OBJECTS IN A PARTICLE BEAM MICROSCOPE WITH T...
- Publication number 20220375714
- Publication date Nov 24, 2022
- CARL ZEISS MICROSCOPY GMBH
- Josef Biberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...
- Publication number 20220359156
- Publication date Nov 10, 2022
- NuFlare Technology, Inc.
- Tsubasa NANAO
- H01 - BASIC ELECTRIC ELEMENTS

Object or beam position registration

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-charged-particle-beam writing method, multi-charged-particle-...

Method and system for cross-sectioning a sample with a preset thick...

Wafer positioning method and apparatus

Microscopy imaging method for 3D tomography with predictive drift t...

Massive overlay metrology sampling with multiple measurement columns

Multi-charged-particle-beam writing apparatus and multi-charged-par...

Multi-beam writing method and multi-beam writing apparatus

Adjustable attenuation optical unit

Charged particle lithography system with alignment sensor and beam...

System using pixelated faraday sensor

Ion beam source for optical device fabrication using a segmented io...

Charged particle beam writing method, charged particle beam writing...

Aperture array with integrated current measurement

Exposure apparatus and exposure method, and device manufacturing me...

Charged particle beam apparatus and control method thereof

Lithography system, sensor and measuring method

Operating a particle beam apparatus with an object holder

Methods of optical device fabrication using an ion beam source

Method for determining a beamlet position and method for determinin...

Analyzing a buried layer of a sample

Substrate processing system, switching timing creation support devi...

Exposure apparatus and exposure method, and device manufacturing me...

Method for controlling operation of electron emission source, elect...

Enhanced electron beam generation

Displacement detection device

Charged particle beam apparatus

Lithography system and method for processing a target, such as a wafer

Method and system for iteratively cross-sectioning a sample to corr...

Electron beam apparatus for optical device fabrication

Methods of optical device fabrication using an electron beam apparatus

Patents Applicationslast 30 patents

ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...

METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM

3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...

WAFER POSITIONING METHOD AND APPARATUS

METHOD FOR DETERMINING A POSITION OF AN OBJECT IN A BEAM APPARATUS,...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

Processor System, Correction Method, and Correction Program

METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A SAMPLE USING A FOC...

MICROSCOPY IMAGING METHOD AND SYSTEM

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...

Charged Particle Beam Device

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

Charged Particle Beam Device and Image Acquisition Method

SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

ALIGNMENT DETERMINATION METHOD AND COMPUTER PROGRAM

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

SYSTEM USING PIXELATED FARADAY SENSOR

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

MULTI-CHARGED-PARTICLE-BEAM WRITING METHOD, MULTI-CHARGED-PARTICLE-...

MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...

Charged Particle Beam Drawing Apparatus and Control Method for Char...

ADJUSTABLE ATTENUATION OPTICAL UNIT

MICROSCOPY IMAGING METHOD AND SYSTEM

Wafer Positioning Method and Apparatus

Wafer Positioning Method and Apparatus

CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...

METHOD FOR POSITIONING OBJECTS IN A PARTICLE BEAM MICROSCOPE WITH T...

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...