of objects being observed or treated

Industry

CPC
H01J2237/0044

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0044of objects being observed or treated

Industries

Patents Grantslast 30 patents

Information Patent Grant
System for inspecting and grounding a mask in a charged particle sy...
- Patent number 12,142,451
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Tianming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, apparatus, and system for wafer grounding
- Patent number 12,051,562
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Yixiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus, ion implantation apparatus, and ion i...
- Patent number 11,961,695
- Issue date Apr 16, 2024
- Semes Co., Ltd.
- Doyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for charged particle flooding to enhance voltag...
- Patent number 11,929,232
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Frank Nan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 11,662,323
- Issue date May 30, 2023
- ASML Netherlands B.V.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam inspection of ungrounded samples
- Patent number 11,448,607
- Issue date Sep 20, 2022
- ASML Netherlands B.V.
- Chiyan Kuan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for charged particle microscopy with improved ima...
- Patent number 11,120,969
- Issue date Sep 14, 2021
- KLA Corporation
- Doug K. Masnaghetti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge neutralizer and plasma generator
- Patent number 10,984,989
- Issue date Apr 20, 2021
- KASUGA DENKI, INC.
- Nobuo Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling an implanter operating in plasma immersion
- Patent number 10,923,325
- Issue date Feb 16, 2021
- Ion Beam Services
- Frank Gilbert Torregrosa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam system and method
- Patent number 10,896,800
- Issue date Jan 19, 2021
- Carl Zeiss MultiSEM GmbH
- Christoph Riedesel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Additive layer manufacture using charged particle beams
- Patent number 10,879,039
- Issue date Dec 29, 2020
- RELIANCE PRECISION LIMITED
- Jakob Albert Van Den Berg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for charged particle flooding to enhance voltag...
- Patent number 10,784,077
- Issue date Sep 22, 2020
- ASML Netherlands B.V.
- Frank Nan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 10,775,325
- Issue date Sep 15, 2020
- ASML Netherlands B.V.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for charged particle microscopy with improved ima...
- Patent number 10,643,819
- Issue date May 5, 2020
- KLA-Tencor Corporation
- Doug K. Masnaghetti
- G01 - MEASURING TESTING
Information Patent Grant
Method of operating a charged particle beam specimen inspection system
- Patent number 10,522,327
- Issue date Dec 31, 2019
- Applied Materials Israel Ltd.
- Gilad Erel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for charge control for imaging floating metal str...
- Patent number 10,460,903
- Issue date Oct 29, 2019
- KLA-Tencor Corporation
- Arjun Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and devices for charge compensation
- Patent number 10,115,558
- Issue date Oct 30, 2018
- Carl Zeiss Microscopy GmbH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 10,088,438
- Issue date Oct 2, 2018
- Hermes-Microvision, Inc.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for processing substrate using ion beam
- Patent number 10,062,545
- Issue date Aug 28, 2018
- Canon Anelva Corporation
- Yasushi Kamiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam specimen inspection system and method for ope...
- Patent number 10,056,228
- Issue date Aug 21, 2018
- Applied Materials Israel Ltd.
- Gilad Erel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure electron beam inspection system for inspecting extreme ul...
- Patent number 10,054,556
- Issue date Aug 21, 2018
- Hermes Microvision Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer grounding and biasing method, apparatus, and application
- Patent number 9,991,147
- Issue date Jun 5, 2018
- Hermes Microvision, Inc.
- Yi-Xiang Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for inspecting and grounding an EUV mask
- Patent number 9,859,089
- Issue date Jan 2, 2018
- Hermes Microvision Inc.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus for measuring surface potential of...
- Patent number 9,799,486
- Issue date Oct 24, 2017
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure electron beam inspection system for inspecting extreme ul...
- Patent number 9,572,237
- Issue date Feb 14, 2017
- Hermes Microvision Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 9,485,846
- Issue date Nov 1, 2016
- Hermes Microvision Inc.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Discharging method for charged particle beam imaging
- Patent number 9,460,887
- Issue date Oct 4, 2016
- Hermes Microvision, Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate using ion beam
- Patent number 9,312,102
- Issue date Apr 12, 2016
- Canon Anelva Corporation
- Yasushi Kamiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus for removing charges developed on a...
- Patent number 9,202,665
- Issue date Dec 1, 2015
- Hitachi High-Technologies Corporation
- Hiroyuki Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Observation specimen for use in electron microscopy, electron micro...
- Patent number 9,202,668
- Issue date Dec 1, 2015
- Hitachi High-Technologies Corporation
- Takafumi Miwa
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...
- Publication number 20240379325
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Frank Nan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, APPARATUS, AND SYSTEM FOR WAFER GROUNDING
- Publication number 20240371599
- Publication date Nov 7, 2024
- ASML Netheriands B. V.
- Yixiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING
- Publication number 20240347323
- Publication date Oct 17, 2024
- VELVETCH LLC
- David Irwin Margolese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20240321543
- Publication date Sep 26, 2024
- Hitachi High-Tech Corporation
- Hideyuki Kotsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE ENHANCEMENT BASED ON CHARGE ACCUMULATION REDUCTION IN CHARGED...
- Publication number 20230162944
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Xiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION
- Publication number 20220375712
- Publication date Nov 24, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, APPARATUS, AND SYSTEM FOR WAFER GROUNDING
- Publication number 20220277926
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Yixiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS, ION IMPLANTATION APPARATUS, AND ION I...
- Publication number 20220059309
- Publication date Feb 24, 2022
- SEMES CO., LTD.
- DOYEON KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, SEMICONDUCTIVE MEMBER, AND SEMICONDUCT...
- Publication number 20210280397
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Yoichi KUROSAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20210172891
- Publication date Jun 10, 2021
- ASML NETHERLANDS B.V.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...
- Publication number 20210142979
- Publication date May 13, 2021
- ASML NETHERLANDS B.V.
- Frank Nan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGE NEUTRALIZER AND PLASMA GENERATOR
- Publication number 20200279722
- Publication date Sep 3, 2020
- KASUGA DENKI, INC.
- Nobuo NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Charged Particle Microscopy with Improved Ima...
- Publication number 20200227232
- Publication date Jul 16, 2020
- KLA-Tencor Corporation
- Doug K. Masnaghetti
- G01 - MEASURING TESTING
Information Patent Application
IMPROVEMENTS RELATING TO ADDITIVE LAYER MANUFACTURE USING CHARGED P...
- Publication number 20190362936
- Publication date Nov 28, 2019
- Reliance Precision Limited
- Jakob Albert Van Den Berg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM AND METHOD
- Publication number 20190355544
- Publication date Nov 21, 2019
- CARL ZEISS MICROSCOPY GMBH
- Christoph Riedesel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20190170671
- Publication date Jun 6, 2019
- HERMES MICROVISION, INC.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHOD FOR REDUCING...
- Publication number 20190096632
- Publication date Mar 28, 2019
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A METHOD OF CONTROLLING AN IMPLANTER OPERATING IN PLASMA IMMERSION
- Publication number 20180358207
- Publication date Dec 13, 2018
- ION BEAM SERVICES
- Frank Torregrosa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF OPERATING A CHARGED PARTICLE BEAM SPECIMEN INSPECTION SYSTEM
- Publication number 20180330919
- Publication date Nov 15, 2018
- Applied Materials Isarael Ltd.
- Gilad Erel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20170052129
- Publication date Feb 23, 2017
- HERMES MICROVISION, INC.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
STRUCTURE ELECTRON BEAM INSPECTION SYSTEM FOR INSPECTING EXTREME UL...
- Publication number 20170053774
- Publication date Feb 23, 2017
- HERMES MICROVISION INC.
- You-Jin WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Charged Particle Microscopy with Improved Ima...
- Publication number 20160372304
- Publication date Dec 22, 2016
- KLA-Tencor Corporation
- Doug K. Masnaghetti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND DEVICES FOR CHARGE COMPENSATION
- Publication number 20160260574
- Publication date Sep 8, 2016
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Inspecting an EUV Mask
- Publication number 20150325402
- Publication date Nov 12, 2015
- HERMES MICROVISION INC.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE PLASMA PROBE AND METHODS OF USE THEREOF
- Publication number 20140299764
- Publication date Oct 9, 2014
- Purdue Research Foundation
- Zheng Ouyang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBSERVATION SPECIMEN FOR USE IN ELECTRON MICROSCOPY, ELECTRON MICRO...
- Publication number 20140264018
- Publication date Sep 18, 2014
- Hitachi High-Technologies Corporation
- Takafumi Miwa
- G01 - MEASURING TESTING
Information Patent Application
IN-SITU ACTIVE WAFER CHARGE SCREENING BY CONFORMAL GROUNDING
- Publication number 20140073114
- Publication date Mar 13, 2014
- GLOBALFOUNDRIES INC.
- Cheng Cen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Environmental SEM Gas Injection System
- Publication number 20140034830
- Publication date Feb 6, 2014
- FEI Company
- Marc Castagna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE FOR DISCHARGING EXTREME ULTRAVIOLET MASK
- Publication number 20140027634
- Publication date Jan 30, 2014
- HERMES MICROVISION, INC.
- You-Jin WANG
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20140027635
- Publication date Jan 30, 2014
- Hiroyuki Matsui
- H01 - BASIC ELECTRIC ELEMENTS

of objects being observed or treated

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

System for inspecting and grounding a mask in a charged particle sy...

Method, apparatus, and system for wafer grounding

Substrate treating apparatus, ion implantation apparatus, and ion i...

Systems and methods for charged particle flooding to enhance voltag...

Method and system for inspecting an EUV mask

Charged particle beam inspection of ungrounded samples

Method and system for charged particle microscopy with improved ima...

Charge neutralizer and plasma generator

Method of controlling an implanter operating in plasma immersion

Charged particle beam system and method

Additive layer manufacture using charged particle beams

Systems and methods for charged particle flooding to enhance voltag...

Method and system for inspecting an EUV mask

Method and system for charged particle microscopy with improved ima...

Method of operating a charged particle beam specimen inspection system

Method and system for charge control for imaging floating metal str...

Methods and devices for charge compensation

Method and system for inspecting an EUV mask

Apparatus and method for processing substrate using ion beam

Charged particle beam specimen inspection system and method for ope...

Structure electron beam inspection system for inspecting extreme ul...

Wafer grounding and biasing method, apparatus, and application

Method and system for inspecting and grounding an EUV mask

Charged particle beam apparatus for measuring surface potential of...

Structure electron beam inspection system for inspecting extreme ul...

Method and system for inspecting an EUV mask

Discharging method for charged particle beam imaging

Apparatus and method for processing substrate using ion beam

Charged particle beam apparatus for removing charges developed on a...

Observation specimen for use in electron microscopy, electron micro...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...

METHOD, APPARATUS, AND SYSTEM FOR WAFER GROUNDING

COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING

Charged Particle Beam Device

IMAGE ENHANCEMENT BASED ON CHARGE ACCUMULATION REDUCTION IN CHARGED...

SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION

METHOD, APPARATUS, AND SYSTEM FOR WAFER GROUNDING

SUBSTRATE TREATING APPARATUS, ION IMPLANTATION APPARATUS, AND ION I...

PLASMA PROCESSING APPARATUS, SEMICONDUCTIVE MEMBER, AND SEMICONDUCT...

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...

CHARGE NEUTRALIZER AND PLASMA GENERATOR

Method and System for Charged Particle Microscopy with Improved Ima...

IMPROVEMENTS RELATING TO ADDITIVE LAYER MANUFACTURE USING CHARGED P...

CHARGED PARTICLE BEAM SYSTEM AND METHOD

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHOD FOR REDUCING...

A METHOD OF CONTROLLING AN IMPLANTER OPERATING IN PLASMA IMMERSION

METHOD OF OPERATING A CHARGED PARTICLE BEAM SPECIMEN INSPECTION SYSTEM

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

STRUCTURE ELECTRON BEAM INSPECTION SYSTEM FOR INSPECTING EXTREME UL...

Method and System for Charged Particle Microscopy with Improved Ima...

METHODS AND DEVICES FOR CHARGE COMPENSATION

Method and System for Inspecting an EUV Mask

LOW TEMPERATURE PLASMA PROBE AND METHODS OF USE THEREOF

OBSERVATION SPECIMEN FOR USE IN ELECTRON MICROSCOPY, ELECTRON MICRO...

IN-SITU ACTIVE WAFER CHARGE SCREENING BY CONFORMAL GROUNDING

Environmental SEM Gas Injection System

STRUCTURE FOR DISCHARGING EXTREME ULTRAVIOLET MASK

CHARGED PARTICLE BEAM APPARATUS