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of phenols or of alcohols containing two or more carbon atoms
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C08F220/16
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C08
Organic compounds
C08F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
C08F220/00
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
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C08F220/16
of phenols or of alcohols containing two or more carbon atoms
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last 30 patents
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Crosslinkable nonlinear-optical chromophore system
Patent number
12,187,827
Issue date
Jan 7, 2025
University of Washington
Delwin Elder
G02 - OPTICS
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Radiation-sensitive resin composition, method for forming pattern,...
Patent number
11,709,428
Issue date
Jul 25, 2023
JSR Corporation
Natsuko Kinoshita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Resin, resist composition and method for producing resist pattern
Patent number
11,681,224
Issue date
Jun 20, 2023
Sumitomo Chemical Company, Limited
Mutsuko Higo
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Resist composition and method for producing resist pattern
Patent number
11,681,220
Issue date
Jun 20, 2023
Sumitomo Chemical Company, Limited
Yukako Anryu
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Polymerization process for liquid copolymers of ethylene and hydrox...
Patent number
11,608,393
Issue date
Mar 21, 2023
BASF SE
Ivette Garcia Castro
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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Air void control composition for carbonyl-containing monomer polyme...
Patent number
11,578,159
Issue date
Feb 14, 2023
Arkema France
Alaaeddin Alsbaiee
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Material for intraocular lens
Patent number
11,578,158
Issue date
Feb 14, 2023
Menicon Co., Ltd.
Yuya Suganuma
A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
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Thermo-sensitive cell culture substrate having block copolymer
Patent number
11,505,633
Issue date
Nov 22, 2022
QINGDAO AMA CO., LTD
Pei-Yen Wu
C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
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Treatment liquid and pattern forming method
Patent number
11,453,734
Issue date
Sep 27, 2022
FUJIFILM Corporation
Tetsuya Kamimura
H01 - BASIC ELECTRIC ELEMENTS
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Iodonium salt, resist composition, and pattern forming process
Patent number
11,448,961
Issue date
Sep 20, 2022
Shin-Etsu Chemical Co., Ltd.
Takayuki Fujiwara
C07 - ORGANIC CHEMISTRY
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Cell culture substrate
Patent number
11,441,120
Issue date
Sep 13, 2022
FUJIFILM Corporation
Hirohide Nakaguma
C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
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Reactive surfactant composition for emulsion polymerization
Patent number
11,345,764
Issue date
May 31, 2022
Kao Corporation
Shogo Kamenoue
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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Resist composition and method of forming resist pattern
Patent number
11,333,973
Issue date
May 17, 2022
Tokyo Ohka Kogyo Co., Ltd.
Kazuishi Tanno
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Photoresist composition and process for producing photoresist pattern
Patent number
11,327,399
Issue date
May 10, 2022
Sumitomo Chemical Company, Limited
Tatsuro Masuyama
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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Cell culture substrate
Patent number
11,306,286
Issue date
Apr 19, 2022
DIC Corporation
Hirohide Nakaguma
C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
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Radiation-sensitive resin composition, resist pattern-forming metho...
Patent number
11,300,877
Issue date
Apr 12, 2022
JSR Corporation
Natsuko Kinoshita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Pattern forming method, method for manufacturing electronic device,...
Patent number
11,249,395
Issue date
Feb 15, 2022
FUJIFILM Corporation
Naoki Inoue
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Pattern forming material, composition for pattern formation, patter...
Patent number
11,192,971
Issue date
Dec 7, 2021
TOSHIBA MEMORY CORPORATION
Norikatsu Sasao
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Resist composition and patterning process
Patent number
11,181,823
Issue date
Nov 23, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
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Olefin-acrylate copolymers with pendant hydroxyl functionality and...
Patent number
11,078,313
Issue date
Aug 3, 2021
Henkel IP & Holding GmbH
Laxmisha Sridhar
B32 - LAYERED PRODUCTS
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Composition having excellent adhesiveness to polyolefins
Patent number
11,072,730
Issue date
Jul 27, 2021
DENKA COMPANY LIMITED
Takako Hoshino
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,029,600
Issue date
Jun 8, 2021
Tokyo Ohka Kogyo Co., Ltd.
Takehito Seo
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Patent Grant
Resist composition and patterning process
Patent number
11,022,883
Issue date
Jun 1, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Patent Grant
Adhesive for flexible optical film
Patent number
11,021,637
Issue date
Jun 1, 2021
BENQ MATERIALS CORPORATION
Wen-Hsin Yang
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Overcoat compositions and methods for photolithography
Patent number
11,016,388
Issue date
May 25, 2021
Rohm and Haas Electronic Materials Korea Ltd.
Chang-Young Hong
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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Patent Grant
Composition having excellent adhesiveness to polyolefins
Patent number
11,008,486
Issue date
May 18, 2021
DENKA COMPANY LIMITED
Takako Hoshino
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Patent Grant
Resist composition and patterning process
Patent number
10,948,822
Issue date
Mar 16, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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Patent Grant
Resist composition and method of forming resist pattern
Patent number
10,921,711
Issue date
Feb 16, 2021
Tokyo Ohka Kogyo Co., Ltd.
Masafumi Fujisaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Patent Grant
Resist composition and pattern forming process
Patent number
10,921,710
Issue date
Feb 16, 2021
Shin-Etsu Chemical Co., Ltd.
Teppei Adachi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Patent Grant
Radiation-sensitive resin composition and resist pattern-forming me...
Patent number
10,824,073
Issue date
Nov 3, 2020
JSR Corporation
Katsuaki Nishikori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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last 30 patents
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Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...
Publication number
20230280652
Publication date
Sep 7, 2023
JSR CORPORATION
Natsuko KINOSHITA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ADDITION CURABLE SILICONE ADHESIVE COMPOSITIONS
Publication number
20230047848
Publication date
Feb 16, 2023
Momentive Performance Materials Inc.
Mandal SUBRATA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Publication number
20210286260
Publication date
Sep 16, 2021
Sumitomo Chemical Company, Limited
Yukako ANRYU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
RESIN COMPOSITION, HEAT STORAGE MATERIAL, AND ARTICLE
Publication number
20210261706
Publication date
Aug 26, 2021
Showa Denko Materials Co., Ltd.
Naoki FURUKAWA
F28 - HEAT EXCHANGE IN GENERAL
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REACTIVE SURFACTANT COMPOSITION FOR EMULSION POLYMERIZATION
Publication number
20200339711
Publication date
Oct 29, 2020
KAO CORPORATION
Shogo KAMENOUE
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PATTERN FORMING MATERIAL, COMPOSITION FOR PATTERN FORMATION, PATTER...
Publication number
20200291155
Publication date
Sep 17, 2020
Toshiba Memory Corporation
Norikatsu SASAO
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20200089112
Publication date
Mar 19, 2020
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
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Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200081345
Publication date
Mar 12, 2020
Tokyo Ohka Kogyo Co., Ltd.
Takehito SEO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
Publication number
20200081341
Publication date
Mar 12, 2020
Shin-Etsu Chemical Co., Ltd.
Takayuki Fujiwara
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Publication number
20200064735
Publication date
Feb 27, 2020
Sumitomo Chemical Company, Limited
Mutsuko HIGO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Coating Compositions for Aluminum Beverage Cans and Methods of Coat...
Publication number
20200032096
Publication date
Jan 30, 2020
The Sherwin Williams Company
Robert M. O'Brien
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200004142
Publication date
Jan 2, 2020
Tokyo Ohka Kogyo Co., Ltd.
Junichi TSUCHIYA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
FORMALDEHYDE-FREE THERMALLY CURABLE POLYMERS
Publication number
20190375867
Publication date
Dec 12, 2019
Organik Kimya Sanayi Ve Tic. A.S.
Miray Goektas
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20190285984
Publication date
Sep 19, 2019
Tokyo Ohka Kogyo Co., Ltd.
Kazuishi TANNO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
METHOD FOR PRODUCING RESIN AND METHOD FOR PRODUCING ACTINIC RAY-SEN...
Publication number
20190276575
Publication date
Sep 12, 2019
FUJIFILM CORPORATION
Akihiro KANEKO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
Publication number
20190258168
Publication date
Aug 22, 2019
FUJIFILM CORPORATION
Tetsuya KAMIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
Stretchable Ink Composition
Publication number
20190241755
Publication date
Aug 8, 2019
Xerox Corporation
Yiliang Wu
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20190033715
Publication date
Jan 31, 2019
Shin-Etsu Chemical Co., Ltd.
Teppei Adachi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20180373150
Publication date
Dec 27, 2018
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20180373148
Publication date
Dec 27, 2018
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20180364574
Publication date
Dec 20, 2018
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN
Publication number
20180348632
Publication date
Dec 6, 2018
Sumitomo Chemical Company, Limited
Tatsuro MASUYAMA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20180335696
Publication date
Nov 22, 2018
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
Publication number
20180329298
Publication date
Nov 15, 2018
JSR Corporation
Katsuaki NISHIKORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
Publication number
20180321585
Publication date
Nov 8, 2018
JSR Corporation
Natsuko KINOSHITA
C07 - ORGANIC CHEMISTRY
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Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Publication number
20180321589
Publication date
Nov 8, 2018
FUJIFILM CORPORATION
Tomotaka TSUCHIMURA
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
PHOTOSENSITIVE RESIN COMPOSITION FOR BIOCHIP AND METHOD FOR FORMING...
Publication number
20180307140
Publication date
Oct 25, 2018
Asahi Glass Company, Limited
Masaki OBI
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20180292751
Publication date
Oct 11, 2018
FUJIFILM CORPORATION
Daisuke ASAKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20180284611
Publication date
Oct 4, 2018
Tokyo Ohka Kogyo Co., Ltd.
Masafumi FUJISAKI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20180284612
Publication date
Oct 4, 2018
Tokyo Ohka Kogyo Co., Ltd.
Junichi TSUCHIYA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...