of phenols or of alcohols containing two or more carbon atoms

Industry

CPC
C08F220/16

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Parent Industries

CCHEMISTRY METALLURGY C08Organic compounds C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof

Current Industry

C08F220/16of phenols or of alcohols containing two or more carbon atoms

Industries

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition, method for forming pattern,...
- Patent number 11,709,428
- Issue date Jul 25, 2023
- JSR Corporation
- Natsuko Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 11,681,224
- Issue date Jun 20, 2023
- Sumitomo Chemical Company, Limited
- Mutsuko Higo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 11,681,220
- Issue date Jun 20, 2023
- Sumitomo Chemical Company, Limited
- Yukako Anryu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerization process for liquid copolymers of ethylene and hydrox...
- Patent number 11,608,393
- Issue date Mar 21, 2023
- BASF SE
- Ivette Garcia Castro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Air void control composition for carbonyl-containing monomer polyme...
- Patent number 11,578,159
- Issue date Feb 14, 2023
- Arkema France
- Alaaeddin Alsbaiee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material for intraocular lens
- Patent number 11,578,158
- Issue date Feb 14, 2023
- Menicon Co., Ltd.
- Yuya Suganuma
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Thermo-sensitive cell culture substrate having block copolymer
- Patent number 11,505,633
- Issue date Nov 22, 2022
- QINGDAO AMA CO., LTD
- Pei-Yen Wu
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 11,453,734
- Issue date Sep 27, 2022
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iodonium salt, resist composition, and pattern forming process
- Patent number 11,448,961
- Issue date Sep 20, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Cell culture substrate
- Patent number 11,441,120
- Issue date Sep 13, 2022
- FUJIFILM Corporation
- Hirohide Nakaguma
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Reactive surfactant composition for emulsion polymerization
- Patent number 11,345,764
- Issue date May 31, 2022
- Kao Corporation
- Shogo Kamenoue
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,333,973
- Issue date May 17, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuishi Tanno
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition and process for producing photoresist pattern
- Patent number 11,327,399
- Issue date May 10, 2022
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cell culture substrate
- Patent number 11,306,286
- Issue date Apr 19, 2022
- DIC Corporation
- Hirohide Nakaguma
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
- Patent number 11,300,877
- Issue date Apr 12, 2022
- JSR Corporation
- Natsuko Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 11,249,395
- Issue date Feb 15, 2022
- FUJIFILM Corporation
- Naoki Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming material, composition for pattern formation, patter...
- Patent number 11,192,971
- Issue date Dec 7, 2021
- TOSHIBA MEMORY CORPORATION
- Norikatsu Sasao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Resist composition and patterning process
- Patent number 11,181,823
- Issue date Nov 23, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Olefin-acrylate copolymers with pendant hydroxyl functionality and...
- Patent number 11,078,313
- Issue date Aug 3, 2021
- Henkel IP & Holding GmbH
- Laxmisha Sridhar
- B32 - LAYERED PRODUCTS
Information Patent Grant
Composition having excellent adhesiveness to polyolefins
- Patent number 11,072,730
- Issue date Jul 27, 2021
- DENKA COMPANY LIMITED
- Takako Hoshino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,029,600
- Issue date Jun 8, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takehito Seo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,022,883
- Issue date Jun 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Adhesive for flexible optical film
- Patent number 11,021,637
- Issue date Jun 1, 2021
- BENQ MATERIALS CORPORATION
- Wen-Hsin Yang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Overcoat compositions and methods for photolithography
- Patent number 11,016,388
- Issue date May 25, 2021
- Rohm and Haas Electronic Materials Korea Ltd.
- Chang-Young Hong
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition having excellent adhesiveness to polyolefins
- Patent number 11,008,486
- Issue date May 18, 2021
- DENKA COMPANY LIMITED
- Takako Hoshino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 10,948,822
- Issue date Mar 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,921,711
- Issue date Feb 16, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Masafumi Fujisaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and pattern forming process
- Patent number 10,921,710
- Issue date Feb 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and resist pattern-forming me...
- Patent number 10,824,073
- Issue date Nov 3, 2020
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,802,400
- Issue date Oct 13, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...
- Publication number 20230280652
- Publication date Sep 7, 2023
- JSR CORPORATION
- Natsuko KINOSHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ADDITION CURABLE SILICONE ADHESIVE COMPOSITIONS
- Publication number 20230047848
- Publication date Feb 16, 2023
- Momentive Performance Materials Inc.
- Mandal SUBRATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20210286260
- Publication date Sep 16, 2021
- Sumitomo Chemical Company, Limited
- Yukako ANRYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, HEAT STORAGE MATERIAL, AND ARTICLE
- Publication number 20210261706
- Publication date Aug 26, 2021
- Showa Denko Materials Co., Ltd.
- Naoki FURUKAWA
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
REACTIVE SURFACTANT COMPOSITION FOR EMULSION POLYMERIZATION
- Publication number 20200339711
- Publication date Oct 29, 2020
- KAO CORPORATION
- Shogo KAMENOUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING MATERIAL, COMPOSITION FOR PATTERN FORMATION, PATTER...
- Publication number 20200291155
- Publication date Sep 17, 2020
- Toshiba Memory Corporation
- Norikatsu SASAO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200089112
- Publication date Mar 19, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200081345
- Publication date Mar 12, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Takehito SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20200081341
- Publication date Mar 12, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20200064735
- Publication date Feb 27, 2020
- Sumitomo Chemical Company, Limited
- Mutsuko HIGO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Coating Compositions for Aluminum Beverage Cans and Methods of Coat...
- Publication number 20200032096
- Publication date Jan 30, 2020
- The Sherwin Williams Company
- Robert M. O'Brien
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200004142
- Publication date Jan 2, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMALDEHYDE-FREE THERMALLY CURABLE POLYMERS
- Publication number 20190375867
- Publication date Dec 12, 2019
- Organik Kimya Sanayi Ve Tic. A.S.
- Miray Goektas
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190285984
- Publication date Sep 19, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuishi TANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING RESIN AND METHOD FOR PRODUCING ACTINIC RAY-SEN...
- Publication number 20190276575
- Publication date Sep 12, 2019
- FUJIFILM CORPORATION
- Akihiro KANEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20190258168
- Publication date Aug 22, 2019
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stretchable Ink Composition
- Publication number 20190241755
- Publication date Aug 8, 2019
- Xerox Corporation
- Yiliang Wu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20190033715
- Publication date Jan 31, 2019
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20180373150
- Publication date Dec 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20180373148
- Publication date Dec 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20180364574
- Publication date Dec 20, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN
- Publication number 20180348632
- Publication date Dec 6, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20180335696
- Publication date Nov 22, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20180329298
- Publication date Nov 15, 2018
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20180321585
- Publication date Nov 8, 2018
- JSR Corporation
- Natsuko KINOSHITA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20180321589
- Publication date Nov 8, 2018
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION FOR BIOCHIP AND METHOD FOR FORMING...
- Publication number 20180307140
- Publication date Oct 25, 2018
- Asahi Glass Company, Limited
- Masaki OBI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20180292751
- Publication date Oct 11, 2018
- FUJIFILM CORPORATION
- Daisuke ASAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180284611
- Publication date Oct 4, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Masafumi FUJISAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180284612
- Publication date Oct 4, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

of phenols or of alcohols containing two or more carbon atoms

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Radiation-sensitive resin composition, method for forming pattern,...

Resin, resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Polymerization process for liquid copolymers of ethylene and hydrox...

Air void control composition for carbonyl-containing monomer polyme...

Material for intraocular lens

Thermo-sensitive cell culture substrate having block copolymer

Treatment liquid and pattern forming method

Iodonium salt, resist composition, and pattern forming process

Cell culture substrate

Reactive surfactant composition for emulsion polymerization

Resist composition and method of forming resist pattern

Photoresist composition and process for producing photoresist pattern

Cell culture substrate

Radiation-sensitive resin composition, resist pattern-forming metho...

Pattern forming method, method for manufacturing electronic device,...

Pattern forming material, composition for pattern formation, patter...

Resist composition and patterning process

Olefin-acrylate copolymers with pendant hydroxyl functionality and...

Composition having excellent adhesiveness to polyolefins

Resist composition and method of forming resist pattern

Resist composition and patterning process

Adhesive for flexible optical film

Overcoat compositions and methods for photolithography

Composition having excellent adhesiveness to polyolefins

Resist composition and patterning process

Resist composition and method of forming resist pattern

Resist composition and pattern forming process

Radiation-sensitive resin composition and resist pattern-forming me...

Resist composition and patterning process

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...

ADDITION CURABLE SILICONE ADHESIVE COMPOSITIONS

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIN COMPOSITION, HEAT STORAGE MATERIAL, AND ARTICLE

REACTIVE SURFACTANT COMPOSITION FOR EMULSION POLYMERIZATION

PATTERN FORMING MATERIAL, COMPOSITION FOR PATTERN FORMATION, PATTER...

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Coating Compositions for Aluminum Beverage Cans and Methods of Coat...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

FORMALDEHYDE-FREE THERMALLY CURABLE POLYMERS

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD FOR PRODUCING RESIN AND METHOD FOR PRODUCING ACTINIC RAY-SEN...

TREATMENT LIQUID AND PATTERN FORMING METHOD

Stretchable Ink Composition

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN

RESIST COMPOSITION AND PATTERNING PROCESS

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

PHOTOSENSITIVE RESIN COMPOSITION FOR BIOCHIP AND METHOD FOR FORMING...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN