of silicon-containing layers

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H01L21/32132

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/32132of silicon-containing layers

Industries

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor structure and a manufacturing method thereof
- Patent number 12,166,133
- Issue date Dec 10, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Qiang Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flowable film formation and treatments
- Patent number 11,615,966
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Array substrate and manufacturing method thereof
- Patent number 11,448,932
- Issue date Sep 20, 2022
- WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Yuan Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gates and manufacturing methods thereof
- Patent number 11,404,555
- Issue date Aug 2, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jen-Hsiang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for patterning substrates using asymmetric ph...
- Patent number 10,927,450
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gates and manufacturing methods thereof
- Patent number 10,644,125
- Issue date May 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jen-Hsiang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Array substrate manufacturing method
- Patent number 10,453,963
- Issue date Oct 22, 2019
- HKC Corporation Limited
- Huailiang He
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing mold or optical element
- Patent number 10,353,119
- Issue date Jul 16, 2019
- Nalux Co., Ltd.
- Kazuya Yamamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of patterning an amorphous semiconductor layer
- Patent number 10,326,031
- Issue date Jun 18, 2019
- Imec VZW
- Menglei Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etching method
- Patent number 10,192,749
- Issue date Jan 29, 2019
- Hitachi High-Technologies Corporation
- Kenichi Kuwahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization process
- Patent number 10,068,803
- Issue date Sep 4, 2018
- Institute of Microelectronics, Chinese Academy of Sciences
- Huilong Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etching of amorphous silicon over epitaxial silicon
- Patent number 9,991,129
- Issue date Jun 5, 2018
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device and according semiconducto...
- Patent number 9,761,689
- Issue date Sep 12, 2017
- GLOBALFOUNDRIES Inc.
- Dominic Thurmer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of surface interface engineering
- Patent number 9,472,416
- Issue date Oct 18, 2016
- Applied Materials, Inc.
- Jim Zhongyi He
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a spacer for dual gate electronic memory ce...
- Patent number 9,437,705
- Issue date Sep 6, 2016
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Anthony De Luca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization process
- Patent number 9,406,549
- Issue date Aug 2, 2016
- Institute of Microelectronics, Chinese Academy of Sciences
- Huilong Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 9,048,191
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 8,741,166
- Issue date Jun 3, 2014
- Hitachi High-Technologies Corporation
- Tomoyuki Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 8,242,567
- Issue date Aug 14, 2012
- Panasonic Corporation
- Kenshi Kanegae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a sacrificial sandwich structure
- Patent number 8,163,655
- Issue date Apr 24, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 7,973,367
- Issue date Jul 5, 2011
- Panasonic Corporation
- Kenshi Kanegae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof with rounded...
- Patent number 7,663,191
- Issue date Feb 16, 2010
- Panasonic Corporation
- Kenshi Kanegae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and computer-readable storage medium
- Patent number 7,405,162
- Issue date Jul 29, 2008
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching with electrostatically attracted ions
- Patent number 7,183,215
- Issue date Feb 27, 2007
- Hewlett-Packard Development Company, L.P.
- Curtis L. Voss
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Semiconductor integrated circuit device and the process of the same
- Patent number 7,132,341
- Issue date Nov 7, 2006
- Renesas Technology Corp.
- Masashi Sahara
- G11 - INFORMATION STORAGE
Information Patent Grant
System and method for improving thin films by gas cluster ion beam...
- Patent number 6,537,606
- Issue date Mar 25, 2003
- Epion Corporation
- Lisa P. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing surface oxide in polysilicon processing
- Patent number 6,436,760
- Issue date Aug 20, 2002
- International Business Machines Corporation
- Kwong H. Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating ferroelectric integrated circuit using dry an...
- Patent number 6,207,465
- Issue date Mar 27, 2001
- Symetrix Corporation
- Joseph D. Cuchiaro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming an improved silicon-on-sapphire device
- Patent number 4,496,418
- Issue date Jan 29, 1985
- RCA Corporation
- William E. Ham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing submicron channel transistors
- Patent number 4,312,680
- Issue date Jan 26, 1982
- RCA Corporation
- Sheng T. Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Metal Gates And Manufacturing Methods Thereof
- Publication number 20220344489
- Publication date Oct 27, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Jen-Hsiang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gates and Manufacturing Methods Thereof
- Publication number 20200266282
- Publication date Aug 20, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Jen-Hsiang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF
- Publication number 20200209694
- Publication date Jul 2, 2020
- WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Yuan YAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PATTERNING SUBSTRATES USING ASYMMETRIC PH...
- Publication number 20200199741
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- BENCHERKI MEBARKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Metal Gates and Manufacturing Methods Thereof
- Publication number 20190386112
- Publication date Dec 19, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Jen-Hsiang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching Method
- Publication number 20140220785
- Publication date Aug 7, 2014
- Hitachi High-Technologies Corporation
- Tomoyuki WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20140113450
- Publication date Apr 24, 2014
- TOKYO ELECTRON LIMITED
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20130157470
- Publication date Jun 20, 2013
- Hitachi High-Technologies Corporation
- Tomoyuki WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20110227172
- Publication date Sep 22, 2011
- PANASONIC CORPORATION
- Kenshi Kanegae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20100102396
- Publication date Apr 29, 2010
- PANASONIC CORPORATION
- Kenshi Kanegae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A SACRIFICIAL SANDWICH STRUCTURE
- Publication number 20100068874
- Publication date Mar 18, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method and computer-readable storage medium
- Publication number 20060063385
- Publication date Mar 23, 2006
- TOKYO ELECTRON LIMITED
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching with electrostatically attracted ions
- Publication number 20060016784
- Publication date Jan 26, 2006
- Curtis L. Voss
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Semiconductor device and manufacturing method thereof
- Publication number 20060006478
- Publication date Jan 12, 2006
- Kenshi Kanegae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor integrated circuit device and the process of the same
- Publication number 20020048947
- Publication date Apr 25, 2002
- Masashi Sahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for improving thin films by gas cluster ion beam...
- Publication number 20020014407
- Publication date Feb 7, 2002
- Lisa P. Allen
- H01 - BASIC ELECTRIC ELEMENTS

of silicon-containing layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor structure and a manufacturing method thereof

Flowable film formation and treatments

Array substrate and manufacturing method thereof

Metal gates and manufacturing methods thereof

Methods and apparatus for patterning substrates using asymmetric ph...

Metal gates and manufacturing methods thereof

Array substrate manufacturing method

Method for manufacturing mold or optical element

Method of patterning an amorphous semiconductor layer

Dry-etching method

Planarization process

Selective etching of amorphous silicon over epitaxial silicon

Method of forming a semiconductor device and according semiconducto...

Methods of surface interface engineering

Method of manufacturing a spacer for dual gate electronic memory ce...

Planarization process

Plasma etching method

Plasma etching method

Semiconductor device and manufacturing method thereof

Method for forming a sacrificial sandwich structure

Semiconductor device and manufacturing method thereof

Semiconductor device and manufacturing method thereof with rounded...

Etching method and computer-readable storage medium

Etching with electrostatically attracted ions

Semiconductor integrated circuit device and the process of the same

System and method for improving thin films by gas cluster ion beam...

Method for reducing surface oxide in polysilicon processing

Method of fabricating ferroelectric integrated circuit using dry an...

Process for forming an improved silicon-on-sapphire device

Method of manufacturing submicron channel transistors

Patents Applicationslast 30 patents

Metal Gates And Manufacturing Methods Thereof

Metal Gates and Manufacturing Methods Thereof

ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF

METHODS AND APPARATUS FOR PATTERNING SUBSTRATES USING ASYMMETRIC PH...

Metal Gates and Manufacturing Methods Thereof

Plasma Etching Method

PLASMA ETCHING METHOD

PLASMA ETCHING METHOD

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

METHOD FOR FORMING A SACRIFICIAL SANDWICH STRUCTURE

Etching method and computer-readable storage medium

Etching with electrostatically attracted ions

Semiconductor device and manufacturing method thereof

Semiconductor integrated circuit device and the process of the same

System and method for improving thin films by gas cluster ion beam...