of the semiconductor substrate or a semiconductor layer

Industry

CPC
H01L21/02233

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02233of the semiconductor substrate or a semiconductor layer

Industries

Patents Grantslast 30 patents

Information Patent Grant
Thin film transistor including a compositionally-graded gate dielec...
- Patent number 12,113,115
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Wu-Wei Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 11,949,002
- Issue date Apr 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- I-Hsieh Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method for random code generation
- Patent number 11,907,685
- Issue date Feb 20, 2024
- GLOBALFOUNDRIES U.S. Inc.
- Judson R. Holt
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
DC bias in plasma process
- Patent number 11,854,766
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate, substrate processing apparatus, rec...
- Patent number 11,810,781
- Issue date Nov 7, 2023
- Kokusai Electric Corporation
- Kiyohisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate, substrate processing apparatus, rec...
- Patent number 11,764,056
- Issue date Sep 19, 2023
- Kokusai Electric Corporation
- Kiyohisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor layers
- Patent number 11,735,418
- Issue date Aug 22, 2023
- Nippon Telegraph and Telephone Corporation
- Ryo Nakao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional semiconductor memory devices
- Patent number 11,711,920
- Issue date Jul 25, 2023
- Samsung Electronics Co., Ltd.
- Sunggil Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication process of vertical-channel, silicon, field-effect tran...
- Patent number 11,677,011
- Issue date Jun 13, 2023
- OmniVision Technologies, Inc.
- Yuanliang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory devices and methods for forming the same
- Patent number 11,665,916
- Issue date May 30, 2023
- Winbond Electronics Corp.
- Hao Chuan Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for performing depth-dependent oxidation modeling...
- Patent number 11,620,431
- Issue date Apr 4, 2023
- Coventor, Inc.
- Qing Peng Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Technique for reducing gate induced drain leakage in DRAM cells
- Patent number 11,610,972
- Issue date Mar 21, 2023
- Applied Materials, Inc.
- Sipeng Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve CMOS device performance
- Patent number 11,562,932
- Issue date Jan 24, 2023
- Semiconductor Manufacturing International (Shanghai) Corporation
- Guobin Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of forming the same
- Patent number 11,502,180
- Issue date Nov 15, 2022
- United Microelectronics Corp.
- Chia-Wei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-height finfet device by selective oxidation
- Patent number 11,456,372
- Issue date Sep 27, 2022
- Intel Corporation
- Seiyon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 11,437,231
- Issue date Sep 6, 2022
- Kabushiki Kaisha Toshiba
- Tatsuya Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC bias in plasma process
- Patent number 11,404,245
- Issue date Aug 2, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench-gate transistor with gate dielectric having a first thicknes...
- Patent number 11,404,551
- Issue date Aug 2, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Ning Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 11,362,199
- Issue date Jun 14, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- I-Hsieh Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for performing depth-dependent oxidation modeli...
- Patent number 11,301,613
- Issue date Apr 12, 2022
- Coventor, Inc.
- Qing Peng Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor devices and methods of manufacturing semiconductor de...
- Patent number 11,251,036
- Issue date Feb 15, 2022
- Imec VZW
- Shairfe Muhammad Salahuddin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing isolation area of gallium oxide device
- Patent number 11,244,821
- Issue date Feb 8, 2022
- THE 13TH RESEARCH INSTITUTE OF CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION
- Yuanjie Lv
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafers and semiconductor devices with barrier layer a...
- Patent number 11,239,384
- Issue date Feb 1, 2022
- INFINEON TECHNOLOGIESAG
- Francisco Javier Santos Rodriguez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Emitter oxidation uniformity within a wafer
- Patent number 11,239,638
- Issue date Feb 1, 2022
- Lumentum Operations LLC
- Benjamin Kesler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonplanar device and strain-generating channel dielectric
- Patent number 11,145,553
- Issue date Oct 12, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Cheng Ching
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor fabrication with electrochemical apparatus
- Patent number 11,101,149
- Issue date Aug 24, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Andrew Joseph Kelly
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,031,507
- Issue date Jun 8, 2021
- Comptek Solutions Oy
- Johnny Dahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for forming the same
- Patent number 10,879,061
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Company Limited
- Chun-Heng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafers and semiconductor devices with barrier layer a...
- Patent number 10,833,218
- Issue date Nov 10, 2020
- Infineon Technologies AG
- Francisco Javier Santos Rodriguez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective growth of SIO2 on dielectric surfaces in the presence of...
- Patent number 10,825,679
- Issue date Nov 3, 2020
- Lam Research Corporation
- Dennis M. Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Protection Layer Formation during Plasma Etching Conductive Materials
- Publication number 20240371655
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Yen-Tien Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-GRADED GATE DIELEC...
- Publication number 20240363716
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Wu-Wei TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20240304459
- Publication date Sep 12, 2024
- DENSO CORPORATION
- SHUHEI ICHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME, AND SEMI...
- Publication number 20240258321
- Publication date Aug 1, 2024
- ENKRIS SEMICONDUCTOR, INC.
- Kai CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR DEVICES
- Publication number 20240250155
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Hsieh Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING IMPROVED INTERFACES AND THIN FILM BY USING HIGH-D...
- Publication number 20240177989
- Publication date May 30, 2024
- EQ TECH PLUS CO., LTD.
- Dong Hwa SHIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FOR MEMORY ELEMENTS
- Publication number 20240170278
- Publication date May 23, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC Bias in Plasma Process
- Publication number 20240071722
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230395368
- Publication date Dec 7, 2023
- TOKYO ELECTRON LIMITED
- Kazumasa IGARASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-GRADED GATE DIELEC...
- Publication number 20230369439
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Wu-Wei TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20230369043
- Publication date Nov 16, 2023
- Kokusai Electric Corporation
- Kiyohisa ISHIBASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20230317509
- Publication date Oct 5, 2023
- SILERGY SEMICONDUCTOR TECHNOLOGY (HANGZHOU) LTD
- Huan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230307225
- Publication date Sep 28, 2023
- Kokusai Electric Corporation
- Masaya NISHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20230163213
- Publication date May 25, 2023
- Samsung Electronics Co., Ltd.
- SANGGIL LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR PERFORMING DEPTH-DEPENDENT OXIDATION MODELING...
- Publication number 20220366119
- Publication date Nov 17, 2022
- Coventor, Inc.
- Qing Peng Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DC Bias in Plasma Process
- Publication number 20220359158
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR REDUCING GATE INDUCED DRAIN LEAKAGE IN DRAM CELLS
- Publication number 20220359670
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Sipeng Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-GRADED GATE DIELEC...
- Publication number 20220254897
- Publication date Aug 11, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Wu-Wei TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH-GATE TRANSISTOR WITH GATE DIELECTRIC HAVING A FIRST THICKNES...
- Publication number 20220238675
- Publication date Jul 28, 2022
- Changxin Memory Technologies, Inc.
- Ning LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMITTER OXIDATION UNIFORMITY WITHIN A WAFER
- Publication number 20220140573
- Publication date May 5, 2022
- Lumentum Operations LLC
- Benjamin Kesler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING SEMICONDUCTOR STRUCTURE
- Publication number 20210335594
- Publication date Oct 28, 2021
- Changxin Memory Technologies, Inc.
- SHIN-HUNG LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICES
- Publication number 20210305276
- Publication date Sep 30, 2021
- Samsung Electronics Co., Ltd.
- Sunggil Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20210305044
- Publication date Sep 30, 2021
- Kokusai Electric Corporation
- Kiyohisa ISHIBASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMORY DEVICES AND METHODS FOR FORMING THE SAME
- Publication number 20210249414
- Publication date Aug 12, 2021
- WINBOND ELECTRONICS CORP.
- Hao Chuan CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PERFORMING DEPTH-DEPENDENT OXIDATION MODELI...
- Publication number 20210192120
- Publication date Jun 24, 2021
- Coventor, Inc.
- Qing Peng Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20210091231
- Publication date Mar 25, 2021
- Comptek Solutions Oy
- Johnny DAHL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20210074540
- Publication date Mar 11, 2021
- Kabushiki Kaisha Toshiba
- Tatsuya Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR, FORMING METHOD THEREOF, AND SEMICONDUCTOR DEVICE
- Publication number 20210050426
- Publication date Feb 18, 2021
- Changxin Memory Technologies, Inc.
- Ning LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANALOG INTEGRATED CIRCUIT WITH IMPROVED TRANSISTOR LIFETIME AND MET...
- Publication number 20210028167
- Publication date Jan 28, 2021
- AZ Power, Inc
- ZHENG ZUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR FORMATION USING HYBRID OXIDATION
- Publication number 20200365596
- Publication date Nov 19, 2020
- Micron Technology, Inc.
- Somik Mukherjee
- H01 - BASIC ELECTRIC ELEMENTS

of the semiconductor substrate or a semiconductor layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Thin film transistor including a compositionally-graded gate dielec...

Semiconductor device and method

Structure and method for random code generation

DC bias in plasma process

Method of processing substrate, substrate processing apparatus, rec...

Method of processing substrate, substrate processing apparatus, rec...

Method for forming semiconductor layers

Three-dimensional semiconductor memory devices

Fabrication process of vertical-channel, silicon, field-effect tran...

Memory devices and methods for forming the same

System and method for performing depth-dependent oxidation modeling...

Technique for reducing gate induced drain leakage in DRAM cells

Method to improve CMOS device performance

Semiconductor device and method of forming the same

Multi-height finfet device by selective oxidation

Method for manufacturing semiconductor device

DC bias in plasma process

Trench-gate transistor with gate dielectric having a first thicknes...

Semiconductor device and method

Systems and methods for performing depth-dependent oxidation modeli...

Semiconductor devices and methods of manufacturing semiconductor de...

Method for preparing isolation area of gallium oxide device

Semiconductor wafers and semiconductor devices with barrier layer a...

Emitter oxidation uniformity within a wafer

Nonplanar device and strain-generating channel dielectric

Semiconductor fabrication with electrochemical apparatus

Semiconductor device and method of manufacture

Semiconductor device and method for forming the same

Semiconductor wafers and semiconductor devices with barrier layer a...

Selective growth of SIO2 on dielectric surfaces in the presence of...

Patents Applicationslast 30 patents

Protection Layer Formation during Plasma Etching Conductive Materials

THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-GRADED GATE DIELEC...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

COMPOSITE SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME, AND SEMI...

METHODS OF FORMING SEMICONDUCTOR DEVICES

METHOD OF FORMING IMPROVED INTERFACES AND THIN FILM BY USING HIGH-D...

METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FOR MEMORY ELEMENTS

DC Bias in Plasma Process

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-GRADED GATE DIELEC...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

SEMICONDUCTOR DEVICE

SYSTEM AND METHOD FOR PERFORMING DEPTH-DEPENDENT OXIDATION MODELING...

DC Bias in Plasma Process

TECHNIQUE FOR REDUCING GATE INDUCED DRAIN LEAKAGE IN DRAM CELLS

THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-GRADED GATE DIELEC...

TRENCH-GATE TRANSISTOR WITH GATE DIELECTRIC HAVING A FIRST THICKNES...

EMITTER OXIDATION UNIFORMITY WITHIN A WAFER

METHOD FOR PROCESSING SEMICONDUCTOR STRUCTURE

THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICES

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

MEMORY DEVICES AND METHODS FOR FORMING THE SAME

SYSTEMS AND METHODS FOR PERFORMING DEPTH-DEPENDENT OXIDATION MODELI...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

TRANSISTOR, FORMING METHOD THEREOF, AND SEMICONDUCTOR DEVICE

ANALOG INTEGRATED CIRCUIT WITH IMPROVED TRANSISTOR LIFETIME AND MET...

SEMICONDUCTOR FORMATION USING HYBRID OXIDATION