only involving supercritical fluids

Industry

CPC
H01L21/02101

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02101only involving supercritical fluids

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 12,183,613
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,159,784
- Issue date Dec 3, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating substrate
- Patent number 12,154,796
- Issue date Nov 26, 2024
- Semes Co., Ltd.
- Joo Jib Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,138,670
- Issue date Nov 12, 2024
- Semes Co., Ltd.
- Junyoung Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate drying device and method of drying substrate using the sa...
- Patent number 12,119,240
- Issue date Oct 15, 2024
- Samsung Electronics Co., Ltd.
- Ansook Sul
- B08 - CLEANING
Information Patent Grant
Apparatus for fabricating semiconductor device having upper and low...
- Patent number 12,110,593
- Issue date Oct 8, 2024
- Samsung Electronics Co., Ltd.
- Yong-Jhin Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate treating method and substrate treating apparatus
- Patent number 12,094,705
- Issue date Sep 17, 2024
- Semes Co., Ltd.
- Jin Woo Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,094,706
- Issue date Sep 17, 2024
- Semes Co., Ltd.
- Myung Chan Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate using liquid and method for contro...
- Patent number 12,074,040
- Issue date Aug 27, 2024
- Semes Co., Ltd.
- Ji Ho Kim
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,057,326
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Shota Umezaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,057,327
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Masataka Gosho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for treating substrate
- Patent number 12,046,466
- Issue date Jul 23, 2024
- Semes Co., Ltd.
- Yong-Jun Seo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate
- Patent number 12,014,938
- Issue date Jun 18, 2024
- Semes Co., Ltd.
- Yong Hee Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 11,978,644
- Issue date May 7, 2024
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,955,350
- Issue date Apr 9, 2024
- SCREEN Holdings Co., Ltd.
- Noritake Sumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for cleaning semiconductor wafer
- Patent number 11,955,328
- Issue date Apr 9, 2024
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate
- Patent number 11,908,710
- Issue date Feb 20, 2024
- Semes Co., Ltd.
- Jin Woo Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,901,197
- Issue date Feb 13, 2024
- Tokyo Electron Limited
- Masataka Gosho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and apparatus for manufacturing inte...
- Patent number 11,887,868
- Issue date Jan 30, 2024
- Samsung Electronics Co., Ltd.
- Young-hoo Kim
- B08 - CLEANING
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 11,862,491
- Issue date Jan 2, 2024
- Semes Co., Ltd.
- Dohyeon Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,769,663
- Issue date Sep 26, 2023
- SCREEN Holdings Co., Ltd.
- Masayuki Otsuji
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate drying method
- Patent number 11,715,648
- Issue date Aug 1, 2023
- Tokyo Electron Limited
- Katsuya Nakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,688,613
- Issue date Jun 27, 2023
- Tokyo Electron Limited
- Shota Umezaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and safety valve applied thereto
- Patent number 11,655,907
- Issue date May 23, 2023
- Semes Co., Ltd.
- Yong-Hyun Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning substrate and cleaning device
- Patent number 11,651,953
- Issue date May 16, 2023
- Kioxia Corporation
- Minako Inukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating substrate
- Patent number 11,621,159
- Issue date Apr 4, 2023
- Semes Co., Ltd.
- Do Heon Kim
- B08 - CLEANING
Information Patent Grant
Condenser system for high pressure processing system
- Patent number 11,610,773
- Issue date Mar 21, 2023
- Applied Materials, Inc.
- Jean Delmas
- F22 - STEAM GENERATION
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,594,427
- Issue date Feb 28, 2023
- Tokyo Electron Limited
- Toru Ihara
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and control method thereof
- Patent number 11,557,492
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Satoshi Biwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning compositions, substrate cleaning method and subs...
- Patent number 11,530,375
- Issue date Dec 20, 2022
- Semes Co., Ltd.
- Hae-Won Choi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF CONTROLLING SUBSTRATE PRO...
- Publication number 20250006517
- Publication date Jan 2, 2025
- SEMES CO., LTD.
- Sang Min LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250001467
- Publication date Jan 2, 2025
- TES CO., LTD.
- In-Il JUNG
- B08 - CLEANING
Information Patent Application
APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE HAVING UPPER AND LOW...
- Publication number 20240425988
- Publication date Dec 26, 2024
- Samsung Electronics Co., Ltd.
- Yong-Jhin CHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240410650
- Publication date Dec 12, 2024
- TES CO., LTD.
- Hee-Jeon MA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE DRYING DEVICE AND METHOD OF DRYING SUBSTRATE USING THE SAME
- Publication number 20240412984
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Ansook Sul
- B08 - CLEANING
Information Patent Application
METHOD FOR PROCESSING SUBSTRATE, CHEMICAL SOLUTION, AND METHOD FOR...
- Publication number 20240395538
- Publication date Nov 28, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takumi NAMIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CLEANING A SEMICONDUCTOR FABRICATION CHAMBER
- Publication number 20240379345
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Jeongmin Hwang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240371661
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240339339
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Shota Umezaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20240242975
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC SOLVENT SUPPLYING APPARATUS, SUBSTRATE PROCESSING METHOD, A...
- Publication number 20240203726
- Publication date Jun 20, 2024
- SEMES CO., LTD.
- Myung Seok CHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING SUPERCRITICAL F...
- Publication number 20240186135
- Publication date Jun 6, 2024
- SEMES CO., LTD.
- Hae Won CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240173754
- Publication date May 30, 2024
- SCREEN Holdings Co., Ltd.
- Kei SUZUKI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240170275
- Publication date May 23, 2024
- SCREEN Holdings Co., Ltd.
- Noritake SUMI
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
- Publication number 20240170305
- Publication date May 23, 2024
- SEMES CO., LTD.
- Jin Woo JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240162034
- Publication date May 16, 2024
- SCREEN Holdings Co., Ltd.
- Noritake SUMI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240162053
- Publication date May 16, 2024
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240149312
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Sangjine Park
- B08 - CLEANING
Information Patent Application
REPLACEMENT END TIME DETERMINATION METHOD, SUBSTRATE PROCESSING MET...
- Publication number 20240105442
- Publication date Mar 28, 2024
- SCREEN Holdings Co., Ltd.
- Noritake SUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20230420280
- Publication date Dec 28, 2023
- SCREEN Holdings Co., Ltd.
- Tadashi MAEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20230402303
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Tsunenaga Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR SUPPLYING GAS, FACILITY FOR PROCESSING SUB...
- Publication number 20230369074
- Publication date Nov 16, 2023
- SEMES CO., LTD.
- Hae Won CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE
- Publication number 20230260780
- Publication date Aug 17, 2023
- KIOXIA Corporation
- Minako INUKAI
- B08 - CLEANING
Information Patent Application
Supercritical Fluid Cleaning for Components in Optical or Electron...
- Publication number 20230191461
- Publication date Jun 22, 2023
- KLA Corporation
- Jiulong Sun
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20230187233
- Publication date Jun 15, 2023
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE DRYING DEVICE AND METHOD OF DRYING SUBSTRATE USING THE SAME
- Publication number 20230187231
- Publication date Jun 15, 2023
- Samsung Electronics Co., Ltd.
- Ansook Sul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20230162994
- Publication date May 25, 2023
- SEMES CO., LTD.
- JAE SEONG LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS
- Publication number 20230081833
- Publication date Mar 16, 2023
- SEMES CO., LTD.
- Jin Woo JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20230071737
- Publication date Mar 9, 2023
- SEMES CO., LTD.
- Myung Chan CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20230074202
- Publication date Mar 9, 2023
- SCREEN Holdings Co., Ltd.
- Yuji YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS

only involving supercritical fluids

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing system and substrate processing method

Substrate processing apparatus and substrate processing method

Method for treating substrate

Substrate treating apparatus and substrate treating method

Substrate drying device and method of drying substrate using the sa...

Apparatus for fabricating semiconductor device having upper and low...

Substrate treating method and substrate treating apparatus

Substrate treating apparatus and substrate treating method

Apparatus for treating substrate using liquid and method for contro...

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Method and apparatus for treating substrate

Apparatus and method for processing substrate

Substrate processing system and substrate processing method

Substrate processing apparatus

Method and apparatus for cleaning semiconductor wafer

Apparatus and method for processing substrate

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and apparatus for manufacturing inte...

Apparatus and method for treating substrate

Substrate processing method and substrate processing apparatus

Substrate processing apparatus and substrate drying method

Substrate processing apparatus and substrate processing method

Substrate treating apparatus and safety valve applied thereto

Method for cleaning substrate and cleaning device

Method for treating substrate

Condenser system for high pressure processing system

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and control method thereof

Substrate cleaning compositions, substrate cleaning method and subs...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, METHOD OF CONTROLLING SUBSTRATE PRO...

SUBSTRATE PROCESSING METHOD

APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE HAVING UPPER AND LOW...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE DRYING DEVICE AND METHOD OF DRYING SUBSTRATE USING THE SAME

METHOD FOR PROCESSING SUBSTRATE, CHEMICAL SOLUTION, AND METHOD FOR...

APPARATUS FOR CLEANING A SEMICONDUCTOR FABRICATION CHAMBER

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

ORGANIC SOLVENT SUPPLYING APPARATUS, SUBSTRATE PROCESSING METHOD, A...

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING SUPERCRITICAL F...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

REPLACEMENT END TIME DETERMINATION METHOD, SUBSTRATE PROCESSING MET...

SUBSTRATE TREATING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

APPARATUS AND METHOD FOR SUPPLYING GAS, FACILITY FOR PROCESSING SUB...

METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE

Supercritical Fluid Cleaning for Components in Optical or Electron...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE DRYING DEVICE AND METHOD OF DRYING SUBSTRATE USING THE SAME

APPARATUS FOR TREATING SUBSTRATE

SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD