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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

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Patents Grantslast 30 patents

Information Patent Grant
Device for observing permeation and diffusion path of observation t...
- Patent number 12,315,696
- Issue date May 27, 2025
- National Institute for Materials Science
- Akiko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical emission spectroscopy for advanced process characterization
- Patent number 12,306,044
- Issue date May 20, 2025
- Tokyo Electron Limited
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Grant
RF immune sensor probe for monitoring a temperature of an electrost...
- Patent number 12,308,265
- Issue date May 20, 2025
- Lam Research Corporation
- Siyuan Tian
- G01 - MEASURING TESTING
Information Patent Grant
Station-to-station control of backside bow compensation deposition
- Patent number 12,272,608
- Issue date Apr 8, 2025
- Lam Research Corporation
- Yanhui Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for monitoring semiconductor processes
- Patent number 12,266,552
- Issue date Apr 1, 2025
- Inficon, Inc.
- Matan Lapidot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for revitalizing plasma processing tools
- Patent number 12,261,026
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for producing layers with improved uniformity in...
- Patent number 12,258,661
- Issue date Mar 25, 2025
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Michael Vergöhl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding method and substrate processing apparatus
- Patent number 12,243,728
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow metrology calibration for improved processing chamber matching...
- Patent number 12,241,772
- Issue date Mar 4, 2025
- Lam Research Corporation
- Evangelos T. Spyropoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-precision timing clock method
- Patent number 12,226,246
- Issue date Feb 18, 2025
- Weng-Dah Ken
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Effective temperature calculation method for multi-charged particle...
- Patent number 12,230,472
- Issue date Feb 18, 2025
- NuFlare Technology, Inc.
- Shingo Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sorption chamber walls for semiconductor equipment
- Patent number 12,217,945
- Issue date Feb 4, 2025
- Lam Research Corporation
- Hossein Sadeghi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized stress modulation by implant to back of wafer
- Patent number 12,217,974
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition system and method
- Patent number 12,211,756
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Measuring device and optical fiber strain measuring jig thereof
- Patent number 12,196,629
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Tong Wu
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus and gas switching method for substra...
- Patent number 12,191,119
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and interlock method thereof
- Patent number 12,170,188
- Issue date Dec 17, 2024
- Jusung Engineering Co., Ltd.
- Sang Kyo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature estimation apparatus, plasma processing system, tempera...
- Patent number 12,170,193
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Yuki Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for manufacturing semiconductor structure
- Patent number 12,165,851
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lun Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for automated processing of multiple samples in...
- Patent number 12,165,833
- Issue date Dec 10, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etalon thermometry for plasma environments
- Patent number 12,078,547
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Bruce E. Adams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for processing wafer
- Patent number 12,074,074
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Po-Ju Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for temperature monitoring in cryo-electron microscopy
- Patent number 12,070,753
- Issue date Aug 27, 2024
- FEI Company
- Jakub Drahotsky
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Advanced temperature monitoring system and methods for semiconducto...
- Patent number 12,068,180
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Xuesong Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Packaging design for a flow sensor and methods of manufacturing the...
- Patent number 12,061,103
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Srikanth Krishnamurthy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Progressive heating of components of substrate processing systems u...
- Patent number 12,062,554
- Issue date Aug 13, 2024
- Lam Research Corporation
- Ramesh Chandrasekharan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave resonator array for plasma diagnostics
- Patent number 12,062,529
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for substrate support temperature control
- Patent number 12,062,567
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Zubin Huang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FLOWRATE CONTROL UNIT FOR TEMPERATURE ADJUSTMENT AND SEMICONDUCTOR...
- Publication number 20250191895
- Publication date Jun 12, 2025
- CKD CORPORATION
- Yuko SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250191889
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ryutaro SUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARAMETER ESTIMATION SYSTEM, PARAMETER ESTIMATION METHOD, STORAGE M...
- Publication number 20250183018
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Wataru SUWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-INVASIVE MEASURING/DIAGNOSIS/TREATMENT APPARATUS AND METHOD
- Publication number 20250176925
- Publication date Jun 5, 2025
- Weng-Dah Ken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...
- Publication number 20250157798
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Ryohei TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250157799
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxidation-Reduction Adjustable Plasma
- Publication number 20250157800
- Publication date May 15, 2025
- Banqiu WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODEL-DRIVEN PRESSURE ESTIMATION
- Publication number 20250140538
- Publication date May 1, 2025
- Applied Materials, Inc.
- Devi Raghavee Veerappan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS AND METHOD
- Publication number 20250140522
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Chun-Wei Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER
- Publication number 20250140569
- Publication date May 1, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS CONTROL USING FLUORINE RADICAL CONCENTRATIONS
- Publication number 20250132139
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Hari Ponnekanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH WIRE FORM METAL DOPANT
- Publication number 20250125119
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Roger B. Fish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ASSESSING A SAMPLE, APPARATUS FOR ASSESSING A SAMPLE
- Publication number 20250116587
- Publication date Apr 10, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PEDESTAL HEATER WITH SUBSTRATE TEMPERATURE MEASUREMENT SYSTEM
- Publication number 20250118578
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Ajith Karonnan Ramapurath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM WITH COOLING SYSTEM
- Publication number 20250118525
- Publication date Apr 10, 2025
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF
- Publication number 20250112028
- Publication date Apr 3, 2025
- JUSUNG ENGINEERING CO., LTD.
- Sang Kyo KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CALCULATING EFFECTIVE TEMPERATURE OF MULTI-CHARGED PARTI...
- Publication number 20250104964
- Publication date Mar 27, 2025
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE
- Publication number 20250087451
- Publication date Mar 13, 2025
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IGNITION CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250079139
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST AND ACCURATE STRAIN MAPPING USING ELECTRON DIFFRACTION
- Publication number 20250076038
- Publication date Mar 6, 2025
- FEI Company
- Stefano Vespucci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20250069860
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Lun KE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, A...
- Publication number 20250069871
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MONITORING RADICAL SPECIES FLUX OF PLASMA
- Publication number 20250062107
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- Martin Hilkene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSTIC DEVICE, AND SEMICONDUCTOR PROCESSING EQUIPMENT US...
- Publication number 20250046587
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Taehyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC FOCUSING DEVICE LOW ENERGY ION BEAMS
- Publication number 20250046563
- Publication date Feb 6, 2025
- Axcelis Technologies, Inc.
- Wilhelm Peter Platow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...
- Publication number 20250037968
- Publication date Jan 30, 2025
- CARL ZEISS MICROSCOPY GMBH
- Lucas Harmsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...
- Publication number 20240420935
- Publication date Dec 19, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tsunahiko NAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND FLUID SUPPLY UNIT
- Publication number 20240404793
- Publication date Dec 5, 2024
- SEMES CO., LTD.
- Wook Sang JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROGRESSIVE HEATING OF COMPONENTS OF SUBSTRATE PROCESSING SYSTEMS U...
- Publication number 20240395569
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Ramesh CHANDRASEKHARAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETALON THERMOMETRY FOR PLASMA ENVIRONMENTS
- Publication number 20240385048
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Bruce E. ADAMS
- H01 - BASIC ELECTRIC ELEMENTS

Other variables

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Device for observing permeation and diffusion path of observation t...

Optical emission spectroscopy for advanced process characterization

RF immune sensor probe for monitoring a temperature of an electrost...

Station-to-station control of backside bow compensation deposition

System and method for monitoring semiconductor processes

Method and apparatus for revitalizing plasma processing tools

Plasma processing apparatus and plasma processing method

Device and method for producing layers with improved uniformity in...

Plasma generating device and process executing apparatus including...

Substrate holding method and substrate processing apparatus

Flow metrology calibration for improved processing chamber matching...

Ultra-precision timing clock method

Effective temperature calculation method for multi-charged particle...

Sorption chamber walls for semiconductor equipment

Localized stress modulation by implant to back of wafer

Deposition system and method

Measuring device and optical fiber strain measuring jig thereof

Substrate processing apparatus and gas switching method for substra...

Substrate processing apparatus and interlock method thereof

Temperature estimation apparatus, plasma processing system, tempera...

Plasma processing method for manufacturing semiconductor structure

System and methods for automated processing of multiple samples in...

Etalon thermometry for plasma environments

Method and system for processing wafer

Method for temperature monitoring in cryo-electron microscopy

Advanced temperature monitoring system and methods for semiconducto...

Packaging design for a flow sensor and methods of manufacturing the...

Progressive heating of components of substrate processing systems u...

Microwave resonator array for plasma diagnostics

Systems and methods for substrate support temperature control

Patents Applicationslast 30 patents

FLOWRATE CONTROL UNIT FOR TEMPERATURE ADJUSTMENT AND SEMICONDUCTOR...

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

PARAMETER ESTIMATION SYSTEM, PARAMETER ESTIMATION METHOD, STORAGE M...

NON-INVASIVE MEASURING/DIAGNOSIS/TREATMENT APPARATUS AND METHOD

CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...

MONITORING METHOD AND PLASMA PROCESSING APPARATUS

Oxidation-Reduction Adjustable Plasma

MODEL-DRIVEN PRESSURE ESTIMATION

SEMICONDUCTOR PROCESS APPARATUS AND METHOD

LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER

PLASMA PROCESS CONTROL USING FLUORINE RADICAL CONCENTRATIONS

ION SOURCE WITH WIRE FORM METAL DOPANT

METHOD OF ASSESSING A SAMPLE, APPARATUS FOR ASSESSING A SAMPLE

PEDESTAL HEATER WITH SUBSTRATE TEMPERATURE MEASUREMENT SYSTEM

PARTICLE BEAM SYSTEM WITH COOLING SYSTEM

SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF

METHOD FOR CALCULATING EFFECTIVE TEMPERATURE OF MULTI-CHARGED PARTI...

DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE

IGNITION CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS

FAST AND ACCURATE STRAIN MAPPING USING ELECTRON DIFFRACTION

PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, A...

METHOD AND SYSTEM FOR MONITORING RADICAL SPECIES FLUX OF PLASMA

PLASMA DIAGNOSTIC DEVICE, AND SEMICONDUCTOR PROCESSING EQUIPMENT US...

MAGNETIC FOCUSING DEVICE LOW ENERGY ION BEAMS

METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...

SUBSTRATE TREATING APPARATUS AND FLUID SUPPLY UNIT

PROGRESSIVE HEATING OF COMPONENTS OF SUBSTRATE PROCESSING SYSTEMS U...

ETALON THERMOMETRY FOR PLASMA ENVIRONMENTS