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H01J2237/24585

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

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Patents Grantslast 30 patents

Information Patent Grant
Deposition system and method
- Patent number 12,211,756
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Measuring device and optical fiber strain measuring jig thereof
- Patent number 12,196,629
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Tong Wu
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus and gas switching method for substra...
- Patent number 12,191,119
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and interlock method thereof
- Patent number 12,170,188
- Issue date Dec 17, 2024
- Jusung Engineering Co., Ltd.
- Sang Kyo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature estimation apparatus, plasma processing system, tempera...
- Patent number 12,170,193
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Yuki Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for manufacturing semiconductor structure
- Patent number 12,165,851
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lun Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for automated processing of multiple samples in...
- Patent number 12,165,833
- Issue date Dec 10, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etalon thermometry for plasma environments
- Patent number 12,078,547
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Bruce E. Adams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for processing wafer
- Patent number 12,074,074
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Po-Ju Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for temperature monitoring in cryo-electron microscopy
- Patent number 12,070,753
- Issue date Aug 27, 2024
- FEI Company
- Jakub Drahotsky
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Advanced temperature monitoring system and methods for semiconducto...
- Patent number 12,068,180
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Xuesong Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Packaging design for a flow sensor and methods of manufacturing the...
- Patent number 12,061,103
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Srikanth Krishnamurthy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Progressive heating of components of substrate processing systems u...
- Patent number 12,062,554
- Issue date Aug 13, 2024
- Lam Research Corporation
- Ramesh Chandrasekharan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave resonator array for plasma diagnostics
- Patent number 12,062,529
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for substrate support temperature control
- Patent number 12,062,567
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Zubin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,051,575
- Issue date Jul 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Tsubasa Okamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Programmable electrostatic chuck to enhance aluminum film morphology
- Patent number 12,046,460
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Yaoying Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and wafer holding table for s...
- Patent number 12,046,488
- Issue date Jul 23, 2024
- Sumitomo Electric Industries, Ltd.
- Koichi Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analyzing a sidewall of hole milled in a sample to determine thickn...
- Patent number 12,033,831
- Issue date Jul 9, 2024
- Applied Materials Israel Ltd.
- Ilya Blayvas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image-based digital control of plasma processing
- Patent number 12,027,426
- Issue date Jul 2, 2024
- Applied Materials, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film, in-situ measurement through transparent crystal and tran...
- Patent number 12,009,191
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Patrick Tae
- G01 - MEASURING TESTING
Information Patent Grant
Ceramic susceptor
- Patent number 11,990,322
- Issue date May 21, 2024
- MiCo Ceramics Ltd.
- Haneum Bae
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature measurement system, temperature measurement method, and...
- Patent number 11,972,921
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Frequency tuning for modulated plasma systems
- Patent number 11,972,927
- Issue date Apr 30, 2024
- Advanced Energy Industries, Inc.
- Gideon van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow metrology calibration for improved processing chamber matching...
- Patent number 11,959,793
- Issue date Apr 16, 2024
- Lam Research Corporation
- Evangelos T. Spyropoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma state detection method, and pla...
- Patent number 11,935,731
- Issue date Mar 19, 2024
- Tokyo Electron Limited
- Daisuke Hayashi
- G08 - SIGNALLING
Information Patent Grant
Plasma processing method
- Patent number 11,915,951
- Issue date Feb 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Non-contact angle measuring apparatus
- Patent number 11,903,755
- Issue date Feb 20, 2024
- Weng-Dah Ken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and measurement method
- Patent number 11,908,665
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with optical fiber with bragg grating sensors
- Patent number 11,901,165
- Issue date Feb 13, 2024
- William J. O'Banion
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...
- Publication number 20250037968
- Publication date Jan 30, 2025
- CARL ZEISS MICROSCOPY GMBH
- Lucas Harmsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...
- Publication number 20240420935
- Publication date Dec 19, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tsunahiko NAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND FLUID SUPPLY UNIT
- Publication number 20240404793
- Publication date Dec 5, 2024
- SEMES CO., LTD.
- Wook Sang JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROGRESSIVE HEATING OF COMPONENTS OF SUBSTRATE PROCESSING SYSTEMS U...
- Publication number 20240395569
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Ramesh CHANDRASEKHARAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETALON THERMOMETRY FOR PLASMA ENVIRONMENTS
- Publication number 20240385048
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Bruce E. ADAMS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONFIRMING AND FINDING AN IONIZATION EDGE WITHIN A MEASU...
- Publication number 20240379324
- Publication date Nov 14, 2024
- FEI Company
- Wouter Rene J. VAN DEN BROEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME
- Publication number 20240377256
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Yunsong Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...
- Publication number 20240371608
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Ryan Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS
- Publication number 20240371615
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PACKAGING DESIGN FOR A FLOW SENSOR AND METHODS OF MANUFACTURING THE...
- Publication number 20240369389
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Srikanth Krishnamurthy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Concentrated Solar Irradiation of Targets in Plasmas
- Publication number 20240363308
- Publication date Oct 31, 2024
- National Technology & Engineering Solutions of Sandia, LLC
- Jeffrey Daniel ENGERER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE DE-CHUCKING VOLTAGE
- Publication number 20240363315
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Andrew NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CCP GAS DELIVERY NOZZLE
- Publication number 20240339301
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20240321558
- Publication date Sep 26, 2024
- Kokusai Electric Corporation
- Takeshi YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240290581
- Publication date Aug 29, 2024
- Hitachi High-Tech Corporation
- Shengnan Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM, IN-SITU MEASUREMENT THROUGH TRANSPARENT CRYSTAL AND TRAN...
- Publication number 20240290592
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Patrick Tae
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESS SIMULATION METHOD AND SEMICONDUCTOR DEVICE MANUFACTU...
- Publication number 20240274416
- Publication date Aug 15, 2024
- Samsung Electronics Co., Ltd.
- Jaesik An
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION SYSTEM AND METHODS OF OPERATING THE SAME
- Publication number 20240271271
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF OPERATING AN ION BEAM SOURCE, ION BEAM SOURCE AND COMPUTE...
- Publication number 20240266139
- Publication date Aug 8, 2024
- CARL ZEISS MICROSCOPY GMBH
- Ramu Pradip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240266201
- Publication date Aug 8, 2024
- Panasonic Intellectual Property Management Co., Ltd.
- Toshiyuki TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW METROLOGY CALIBRATION FOR IMPROVED PROCESSING CHAMBER MATCHING...
- Publication number 20240255341
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Evangelos T. SPYROPOULOS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240258082
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke OKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Apparatus
- Publication number 20240258062
- Publication date Aug 1, 2024
- HITACHI HIGH-TECH CORPORATION
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU FOCUS RING COATING
- Publication number 20240249921
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, MULTIPLE CHARGED...
- Publication number 20240242931
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240243019
- Publication date Jul 18, 2024
- Kokusai Electric Corporation
- Yuichiro TAKESHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF GENERATING TEM SADP IMAGE WITH HIGH DISCERNMENT
- Publication number 20240234082
- Publication date Jul 11, 2024
- LightVision Inc.
- Jin Ha JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER
- Publication number 20240229228
- Publication date Jul 11, 2024
- SOLERAS ADVANCED COATINGS BV
- Wilmert DE BOSSCHER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICES FOR PLASMA TREATMENT
- Publication number 20240222088
- Publication date Jul 4, 2024
- VOESTALPINE STAHL GMBH
- Pierre VANDEN BRANDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD FOR SUPPORT UNIT, SUBSTRATE TREATING METHOD AND SUBS...
- Publication number 20240222099
- Publication date Jul 4, 2024
- SEMES CO., LTD.
- Yun Sik JU
- H01 - BASIC ELECTRIC ELEMENTS

Other variables

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Deposition system and method

Measuring device and optical fiber strain measuring jig thereof

Substrate processing apparatus and gas switching method for substra...

Substrate processing apparatus and interlock method thereof

Temperature estimation apparatus, plasma processing system, tempera...

Plasma processing method for manufacturing semiconductor structure

System and methods for automated processing of multiple samples in...

Etalon thermometry for plasma environments

Method and system for processing wafer

Method for temperature monitoring in cryo-electron microscopy

Advanced temperature monitoring system and methods for semiconducto...

Packaging design for a flow sensor and methods of manufacturing the...

Progressive heating of components of substrate processing systems u...

Microwave resonator array for plasma diagnostics

Systems and methods for substrate support temperature control

Plasma processing apparatus and plasma processing method

Programmable electrostatic chuck to enhance aluminum film morphology

Semiconductor manufacturing apparatus and wafer holding table for s...

Analyzing a sidewall of hole milled in a sample to determine thickn...

Image-based digital control of plasma processing

Thin film, in-situ measurement through transparent crystal and tran...

Ceramic susceptor

Temperature measurement system, temperature measurement method, and...

Frequency tuning for modulated plasma systems

Flow metrology calibration for improved processing chamber matching...

Plasma processing apparatus, plasma state detection method, and pla...

Plasma processing method

Non-contact angle measuring apparatus

Plasma processing apparatus and measurement method

Processing chamber with optical fiber with bragg grating sensors

Patents Applicationslast 30 patents

METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...

SUBSTRATE TREATING APPARATUS AND FLUID SUPPLY UNIT

PROGRESSIVE HEATING OF COMPONENTS OF SUBSTRATE PROCESSING SYSTEMS U...

ETALON THERMOMETRY FOR PLASMA ENVIRONMENTS

METHOD FOR CONFIRMING AND FINDING AN IONIZATION EDGE WITHIN A MEASU...

SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME

SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...

MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS

PACKAGING DESIGN FOR A FLOW SENSOR AND METHODS OF MANUFACTURING THE...

Concentrated Solar Irradiation of Targets in Plasmas

ADJUSTABLE DE-CHUCKING VOLTAGE

CCP GAS DELIVERY NOZZLE

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

PLASMA PROCESSING APPARATUS

THIN FILM, IN-SITU MEASUREMENT THROUGH TRANSPARENT CRYSTAL AND TRAN...

PLASMA PROCESS SIMULATION METHOD AND SEMICONDUCTOR DEVICE MANUFACTU...

PHYSICAL VAPOR DEPOSITION SYSTEM AND METHODS OF OPERATING THE SAME

METHOD OF OPERATING AN ION BEAM SOURCE, ION BEAM SOURCE AND COMPUTE...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

FLOW METROLOGY CALIBRATION FOR IMPROVED PROCESSING CHAMBER MATCHING...

SUBSTRATE HOLDING METHOD AND SUBSTRATE PROCESSING APPARATUS

Ion Milling Apparatus

IN-SITU FOCUS RING COATING

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, MULTIPLE CHARGED...

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

SYSTEM AND METHOD OF GENERATING TEM SADP IMAGE WITH HIGH DISCERNMENT

DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER

METHOD AND DEVICES FOR PLASMA TREATMENT

CONTROL METHOD FOR SUPPORT UNIT, SUBSTRATE TREATING METHOD AND SUBS...