Oxidation of silicon-containing layers

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H01L21/32105

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/32105Oxidation of silicon-containing layers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Nonvolatile semiconductor memory device and method of manufacturing...
- Patent number 12,142,486
- Issue date Nov 12, 2024
- Kioxia Corporation
- Takeshi Sonehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device and method
- Patent number 12,002,718
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure with inner spacer layer and method f...
- Patent number 11,973,129
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuit devices with gate seals
- Patent number 11,830,930
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chou Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic self-limiting etch process
- Patent number 11,791,167
- Issue date Oct 17, 2023
- Tokyo Electron Limited
- Anthony R. Schepis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, method, and tool of manufacture
- Patent number 11,621,342
- Issue date Apr 4, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih Hung Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor device structure with inner spacer layer
- Patent number 11,605,728
- Issue date Mar 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor fins by differentially oxidizin...
- Patent number 11,581,190
- Issue date Feb 14, 2023
- TESSERA LLC
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device and method
- Patent number 11,527,447
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate interface engineering with doped layer
- Patent number 11,456,178
- Issue date Sep 27, 2022
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Split-gate flash memory cell and fabrication method thereof
- Patent number 11,437,475
- Issue date Sep 6, 2022
- United Microelectronics Corp.
- Chih-Haw Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device
- Patent number 11,404,430
- Issue date Aug 2, 2022
- Kioxia Corporation
- Ken Komiya
- G11 - INFORMATION STORAGE
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,387,097
- Issue date Jul 12, 2022
- Kokusai Electric Corporation
- Takeo Hanashima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device and non-transitory com...
- Patent number 11,189,483
- Issue date Nov 30, 2021
- Kokusai Electric Corporation
- Yuichiro Takeshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner structure in interlayer dielectric structure for semiconducto...
- Patent number 11,183,423
- Issue date Nov 23, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun Ting Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device structure with inner spacer...
- Patent number 11,152,491
- Issue date Oct 19, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuit devices with gate seals
- Patent number 11,011,618
- Issue date May 18, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chou Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming blocking silicon oxide film, and storage medium
- Patent number 10,964,530
- Issue date Mar 30, 2021
- Tokyo Electron Limited
- Kyungseok Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonvolatile semiconductor memory device and method of manufacturing...
- Patent number 10,957,556
- Issue date Mar 23, 2021
- TOSHIBA MEMORY CORPORATION
- Takeshi Sonehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Geometric control of bottom-up pillars for patterning applications
- Patent number 10,930,503
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Ziqing Duan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device suppressing electric field concentration and m...
- Patent number 10,923,571
- Issue date Feb 16, 2021
- Rohm Co., Ltd.
- Akihiro Hikasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device and method
- Patent number 10,872,826
- Issue date Dec 22, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming an array of elevationally-extending strings of m...
- Patent number 10,847,538
- Issue date Nov 24, 2020
- Micron Technology, Inc.
- Collin Howder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-forming spacers using oxidation
- Patent number 10,833,156
- Issue date Nov 10, 2020
- ELPIS TECHNOLOGIES INC.
- Kevin K. Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor fins by enhancing oxidation of...
- Patent number 10,825,689
- Issue date Nov 3, 2020
- Tessera, Inc.
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlled growth of thin silicon oxide film at low temperature
- Patent number 10,818,490
- Issue date Oct 27, 2020
- Applied Materials, Inc.
- Shishi Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, method, and tool of manufacture
- Patent number 10,804,370
- Issue date Oct 13, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of sealing openings, and methods of forming integrated asse...
- Patent number 10,790,185
- Issue date Sep 29, 2020
- Micron Technology, Inc.
- Guangjun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure for semiconductor device
- Patent number 10,741,672
- Issue date Aug 11, 2020
- Taiwan Semiconductor Manufacturing Co. LTD
- Kuo-Cheng Ching
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 10,707,216
- Issue date Jul 7, 2020
- Samsung Electronics Co., Ltd.
- Sungmi Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION
- Publication number 20240420952
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Bhaskar Soman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DENSIFIED SEAM-FREE SILICON-CONTAINING MATERIAL GAP FILL PROCESSES
- Publication number 20240420950
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Xiang Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240379377
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Tadahiro ISHIZAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD
- Publication number 20240282641
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER
- Publication number 20240234549
- Publication date Jul 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Han-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREPARING SILICON-ON-INSULATOR
- Publication number 20240153764
- Publication date May 9, 2024
- SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY, CHINESE ACADEMY...
- Xing WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING...
- Publication number 20240030040
- Publication date Jan 25, 2024
- KIOXIA Corporation
- Takeshi SONEHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUIT DEVICES WITH GATE SEALS
- Publication number 20230387256
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Sheng-Chou Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION OF FINS USING VARIABLE SPACERS
- Publication number 20230360923
- Publication date Nov 9, 2023
- Adeia Semiconductor Solutions LLC
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF
- Publication number 20230275130
- Publication date Aug 31, 2023
- Changxin Memory Technologies, Inc.
- SEMYEONG JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SILICON TRIM BY THERMAL ETCHING
- Publication number 20230268189
- Publication date Aug 24, 2023
- LAM RESEARCH CORPORATION
- Nathan Musselwhite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD
- Publication number 20230108214
- Publication date Apr 6, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPLIT-GATE FLASH MEMORY CELL AND FABRICATION METHOD THEREOF
- Publication number 20220216311
- Publication date Jul 7, 2022
- UNITED MICROELECTRONICS CORP.
- Chih-Haw Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER
- Publication number 20220045194
- Publication date Feb 10, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Han-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cyclic Self-Limiting Etch Process
- Publication number 20210305060
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Anthony R. Schepis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Circuit Devices with Gate Seals
- Publication number 20210280687
- Publication date Sep 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Chou Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING...
- Publication number 20210202263
- Publication date Jul 1, 2021
- Toshiba Memory Corporation
- Takeshi SONEHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION OF FINS USING VARIABLE SPACERS
- Publication number 20210111032
- Publication date Apr 15, 2021
- Tessera, Inc.
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fin Field-Effect Transistor Device and Method
- Publication number 20210104443
- Publication date Apr 8, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device, Method, and Tool of Manufacture
- Publication number 20210036129
- Publication date Feb 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih Hung Chen
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20210013032
- Publication date Jan 14, 2021
- Kokusai Electric Corporation
- Takeo HANASHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE
- Publication number 20200303406
- Publication date Sep 24, 2020
- Toshiba Memory Corporation
- Ken KOMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20200219761
- Publication date Jul 9, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- JONG-MOO CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20200203216
- Publication date Jun 25, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- DONGGEUN LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING...
- Publication number 20200203180
- Publication date Jun 25, 2020
- Toshiba Memory Corporation
- Takeshi SONEHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE SUPPRESSING ELECTRIC FIELD CONCENTRATION AND M...
- Publication number 20200194561
- Publication date Jun 18, 2020
- ROHM CO., LTD.
- Akihiro HIKASA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fin Field-Effect Transistor Device and Method
- Publication number 20200135588
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER...
- Publication number 20200066872
- Publication date Feb 27, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Han-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIELD-EFFECT TRANSISTORS WITH A GROWN SILICON-GERMANIUM CHANNEL
- Publication number 20200051808
- Publication date Feb 13, 2020
- GLOBALFOUNDRIES INC.
- Carsten Metze
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20190296025
- Publication date Sep 26, 2019
- Samsung Electronics Co., Ltd.
- Sungmi YOON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Oxidation of silicon-containing layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Nonvolatile semiconductor memory device and method of manufacturing...

Fin field-effect transistor device and method

Semiconductor device structure with inner spacer layer and method f...

Circuit devices with gate seals

Cyclic self-limiting etch process

Semiconductor device, method, and tool of manufacture

Semiconductor device structure with inner spacer layer

Method of fabricating semiconductor fins by differentially oxidizin...

Fin field-effect transistor device and method

Gate interface engineering with doped layer

Split-gate flash memory cell and fabrication method thereof

Semiconductor memory device

Method of manufacturing semiconductor device, substrate processing...

Method of manufacturing semiconductor device and non-transitory com...

Liner structure in interlayer dielectric structure for semiconducto...

Method for forming semiconductor device structure with inner spacer...

Circuit devices with gate seals

Method of forming blocking silicon oxide film, and storage medium

Nonvolatile semiconductor memory device and method of manufacturing...

Geometric control of bottom-up pillars for patterning applications

Semiconductor device suppressing electric field concentration and m...

Fin field-effect transistor device and method

Methods of forming an array of elevationally-extending strings of m...

Self-forming spacers using oxidation

Method of fabricating semiconductor fins by enhancing oxidation of...

Controlled growth of thin silicon oxide film at low temperature

Semiconductor device, method, and tool of manufacture

Methods of sealing openings, and methods of forming integrated asse...

Gate structure for semiconductor device

Semiconductor device and method for manufacturing the same

Patents Applicationslast 30 patents

NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION

DENSIFIED SEAM-FREE SILICON-CONTAINING MATERIAL GAP FILL PROCESSES

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD

SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER

METHOD FOR PREPARING SILICON-ON-INSULATOR

NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING...

CIRCUIT DEVICES WITH GATE SEALS

FABRICATION OF FINS USING VARIABLE SPACERS

SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF

SELECTIVE SILICON TRIM BY THERMAL ETCHING

FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD

SPLIT-GATE FLASH MEMORY CELL AND FABRICATION METHOD THEREOF

SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER

Cyclic Self-Limiting Etch Process

Circuit Devices with Gate Seals

NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING...

FABRICATION OF FINS USING VARIABLE SPACERS

Fin Field-Effect Transistor Device and Method

Semiconductor Device, Method, and Tool of Manufacture

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

SEMICONDUCTOR MEMORY DEVICE

METHOD OF FORMING SEMICONDUCTOR STRUCTURE

METHOD OF FORMING SEMICONDUCTOR STRUCTURE

NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING...

SEMICONDUCTOR DEVICE SUPPRESSING ELECTRIC FIELD CONCENTRATION AND M...

Fin Field-Effect Transistor Device and Method

METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER...

FIELD-EFFECT TRANSISTORS WITH A GROWN SILICON-GERMANIUM CHANNEL

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME