part or whole of the electrode is a sidewall spacer or made by a similar technique

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/2815part or whole of the electrode is a sidewall spacer or made by a similar technique

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Patents Grantslast 30 patents

Information Patent Grant
Method for forming source/drain contacts utilizing an inhibitor
- Patent number 12,166,092
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Lin-Yu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuning threshold voltage through meta stable plasma treatment
- Patent number 12,148,620
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage three-dimensional devices having dielectric liners
- Patent number 12,136,628
- Issue date Nov 5, 2024
- Intel Corporation
- Walid M. Hafez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,125,706
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Yen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strained gate semiconductor device having an interlayer dielectric...
- Patent number 12,100,767
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a metal silicate film on a substrate in a react...
- Patent number 12,094,936
- Issue date Sep 17, 2024
- ASM IP Holding B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor structure and semiconductor...
- Patent number 12,062,702
- Issue date Aug 13, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Mengmeng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing thereof
- Patent number 12,020,940
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ching-Hung Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming circuit-protection devices
- Patent number 12,015,026
- Issue date Jun 18, 2024
- Micron Technology, Inc.
- Michael A. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Display device and method of fabricating the same
- Patent number 12,015,088
- Issue date Jun 18, 2024
- Samsung Display Co., Ltd.
- Sang Sub Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with embedded Schottky diode and manufacturing...
- Patent number 12,002,892
- Issue date Jun 4, 2024
- Alpha Power Solutions Limited
- Wing Kit Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
P-type dipole for P-FET
- Patent number 11,996,455
- Issue date May 28, 2024
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal cut patterning and etching to minimize interlayer dielectric...
- Patent number 11,990,342
- Issue date May 21, 2024
- International Business Machines Corporation
- Kisup Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate fixing device
- Patent number 11,961,754
- Issue date Apr 16, 2024
- Shinko Electric Industries Co., Ltd.
- Hiroki Oguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quantum dot devices with overlapping gates
- Patent number 11,942,516
- Issue date Mar 26, 2024
- Intel Corporation
- Nicole K. Thomas
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Device of dielectric layer
- Patent number 11,935,752
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine incorporation method for nanosheet
- Patent number 11,915,937
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage three-dimensional devices having dielectric liners
- Patent number 11,881,486
- Issue date Jan 23, 2024
- Intel Corporation
- Walid M. Hafez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic devices and methods of manufacturing the same
- Patent number 11,862,705
- Issue date Jan 2, 2024
- Samsung Electronics Co., Ltd.
- Jinseong Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory devices and methods of manufacturing thereof
- Patent number 11,856,796
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic device and method of manufacturing the same
- Patent number 11,848,366
- Issue date Dec 19, 2023
- Samsung Electronics Co., Ltd.
- Taehwan Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of a high temperature silicon carbide transistor device
- Patent number 11,823,899
- Issue date Nov 21, 2023
- CoolCAD Electronics, LLC
- Neil Goldsman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and related apparatus for integrating electronic memory in a...
- Patent number 11,817,488
- Issue date Nov 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tung Ying Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate spacer structure of FinFET device
- Patent number 11,810,963
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a metal silicate film on a substrate in a react...
- Patent number 11,798,999
- Issue date Oct 24, 2023
- ASM IP Holding B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-threshold voltage gate-all-around transistors
- Patent number 11,756,960
- Issue date Sep 12, 2023
- International Business Machines Corporation
- Jingyun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming multiple-Vt FETS for CMOS circuit applications
- Patent number 11,749,739
- Issue date Sep 5, 2023
- Samsung Electronics Co., Ltd.
- Wei-E Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with programmable unit and method for fabricat...
- Patent number 11,710,696
- Issue date Jul 25, 2023
- NANYA TECHNOLOGY CORPORATION
- Hsih-Yang Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,710,665
- Issue date Jul 25, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Yen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid fine line spacing architecture for bump pitch scaling
- Patent number 11,694,898
- Issue date Jul 4, 2023
- Intel Corporation
- Suddhasattwa Nad
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR MEMORY DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240389360
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT
- Publication number 20240387178
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming of Slope Liners in Trench Based Semiconductor Devices
- Publication number 20240363728
- Publication date Oct 31, 2024
- NEXPERIA B.V.
- Fan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240312785
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Hung Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20240304726
- Publication date Sep 12, 2024
- SAMSUNG DISPLAY CO., LTD.
- Sang Sub KIM
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Application
DEVICE OF DIELECTRIC LAYER
- Publication number 20240249947
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE INCORPORATION METHOD FOR NANOSHEET
- Publication number 20240177996
- Publication date May 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240162301
- Publication date May 16, 2024
- SK HYNIX INC.
- Jun Sik KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE THREE-DIMENSIONAL DEVICES HAVING DIELECTRIC LINERS
- Publication number 20240113128
- Publication date Apr 4, 2024
- Intel Corporation
- Walid M. HAFEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240099024
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Han Lin
- G11 - INFORMATION STORAGE
Information Patent Application
ELECTRONIC DEVICES AND METHODS OF MANUFACTURING THE SAME
- Publication number 20240088256
- Publication date Mar 14, 2024
- Samsung Electronics Co., Ltd.
- Jinseong HEO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Volume-less Fluorine Incorporation Method
- Publication number 20240071767
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsueh-Ju Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...
- Publication number 20240030296
- Publication date Jan 25, 2024
- ASM IP HOLDING B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND RELATED APPARATUS FOR INTEGRATING ELECTRONIC MEMORY IN A...
- Publication number 20240021692
- Publication date Jan 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tung Ying Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING MULTIPLE-VT FETS FOR CMOS CIRCUIT APPLICATIONS
- Publication number 20230361194
- Publication date Nov 9, 2023
- Samsung Electronics Co., Ltd.
- Wei-E Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING IMPROVED GATE STACKS AND METHODS OF FAB...
- Publication number 20230352546
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SOURCE/DRAIN CONTACTS UTILIZING AN INHIBITOR
- Publication number 20230326983
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Lin-Yu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20230317524
- Publication date Oct 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tuning Threshold Voltage Through Meta Stable Plasma Treatment
- Publication number 20230282484
- Publication date Sep 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GATE STACK TREATMENT
- Publication number 20230268231
- Publication date Aug 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chandrashekhar Prakash Savant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
P-TYPE DIPOLE FOR P-FET
- Publication number 20230253466
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING SAME
- Publication number 20230207658
- Publication date Jun 29, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Yutong SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE THREE-DIMENSIONAL DEVICES HAVING DIELECTRIC LINERS
- Publication number 20230207569
- Publication date Jun 29, 2023
- Intel Corporation
- Walid M. HAFEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE FIXING DEVICE
- Publication number 20230060253
- Publication date Mar 2, 2023
- Shinko Electric Industries Co., Ltd.
- Hiroki OGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20230016468
- Publication date Jan 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Hung Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20230012701
- Publication date Jan 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Han Lin
- G11 - INFORMATION STORAGE
Information Patent Application
SEMICONDUCTOR DEVICE WITH EMBEDDED SCHOTTKY DIODE AND MANUFACTURING...
- Publication number 20220416093
- Publication date Dec 29, 2022
- Alpha Power Solutions Limited
- Wing Kit CHEUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20220376077
- Publication date Nov 24, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Wei Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...
- Publication number 20220367647
- Publication date Nov 17, 2022
- ASM IP HOLDING B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Fluorine Incorporation Method for Nanosheet
- Publication number 20220351976
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS

part or whole of the electrode is a sidewall spacer or made by a similar technique

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for forming source/drain contacts utilizing an inhibitor

Tuning threshold voltage through meta stable plasma treatment

High voltage three-dimensional devices having dielectric liners

Semiconductor device and method of manufacture

Strained gate semiconductor device having an interlayer dielectric...

Methods for forming a metal silicate film on a substrate in a react...

Method for manufacturing semiconductor structure and semiconductor...

Semiconductor devices and methods of manufacturing thereof

Methods of forming circuit-protection devices

Display device and method of fabricating the same

Semiconductor device with embedded Schottky diode and manufacturing...

P-type dipole for P-FET

Metal cut patterning and etching to minimize interlayer dielectric...

Substrate fixing device

Quantum dot devices with overlapping gates

Device of dielectric layer

Fluorine incorporation method for nanosheet

High voltage three-dimensional devices having dielectric liners

Electronic devices and methods of manufacturing the same

Semiconductor memory devices and methods of manufacturing thereof

Electronic device and method of manufacturing the same

Fabrication of a high temperature silicon carbide transistor device

Method and related apparatus for integrating electronic memory in a...

Gate spacer structure of FinFET device

Methods for forming a metal silicate film on a substrate in a react...

Multi-threshold voltage gate-all-around transistors

Method of forming multiple-Vt FETS for CMOS circuit applications

Semiconductor device with programmable unit and method for fabricat...

Semiconductor device and method of manufacture

Hybrid fine line spacing architecture for bump pitch scaling

Patents Applicationslast 30 patents

SEMICONDUCTOR MEMORY DEVICES AND METHODS OF MANUFACTURING THEREOF

TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT

Forming of Slope Liners in Trench Based Semiconductor Devices

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF

DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME

DEVICE OF DIELECTRIC LAYER

FLUORINE INCORPORATION METHOD FOR NANOSHEET

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

HIGH VOLTAGE THREE-DIMENSIONAL DEVICES HAVING DIELECTRIC LINERS

SEMICONDUCTOR MEMORY DEVICES AND METHODS OF MANUFACTURING THEREOF

ELECTRONIC DEVICES AND METHODS OF MANUFACTURING THE SAME

Volume-less Fluorine Incorporation Method

METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...

METHOD AND RELATED APPARATUS FOR INTEGRATING ELECTRONIC MEMORY IN A...

METHOD OF FORMING MULTIPLE-VT FETS FOR CMOS CIRCUIT APPLICATIONS

SEMICONDUCTOR DEVICE HAVING IMPROVED GATE STACKS AND METHODS OF FAB...

METHOD FOR FORMING SOURCE/DRAIN CONTACTS UTILIZING AN INHIBITOR

Semiconductor Device and Method of Manufacture

Tuning Threshold Voltage Through Meta Stable Plasma Treatment

GATE STACK TREATMENT

P-TYPE DIPOLE FOR P-FET

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING SAME

HIGH VOLTAGE THREE-DIMENSIONAL DEVICES HAVING DIELECTRIC LINERS

SUBSTRATE FIXING DEVICE

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF

SEMICONDUCTOR MEMORY DEVICES AND METHODS OF MANUFACTURING THEREOF

SEMICONDUCTOR DEVICE WITH EMBEDDED SCHOTTKY DIODE AND MANUFACTURING...

Semiconductor Device and Method of Manufacture

METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...

Fluorine Incorporation Method for Nanosheet