Particle-beam lithography

Industry

CPC
H01J2237/31715

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31715Particle-beam lithography

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Exposure method using control of settling times and methods of manu...
- Patent number 9,583,305
- Issue date Feb 28, 2017
- Samsung Electronics Co., Ltd.
- Yong-Seok Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blanking aperture array device for multi-beams, and fabrication met...
- Patent number 9,530,610
- Issue date Dec 27, 2016
- NuFlare Technology, Inc.
- Kazuhiro Chiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shot data generation method and multi charged particle beam writing...
- Patent number 9,514,914
- Issue date Dec 6, 2016
- NuFlare Technology, Inc.
- Hideo Inoue
- G11 - INFORMATION STORAGE
Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 9,275,824
- Issue date Mar 1, 2016
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- G11 - INFORMATION STORAGE
Information Patent Grant
Compensation of defective beamlets in a charged-particle multi-beam...
- Patent number 9,269,543
- Issue date Feb 23, 2016
- IMS Nanofabrication AG
- Rafael Reiter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion sources, systems and methods
- Patent number 9,236,225
- Issue date Jan 12, 2016
- Carl Zeiss Microscopy, LLC
- Billy W. Ward
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Proximity effect correction in a charged particle lithography system
- Patent number 9,184,026
- Issue date Nov 10, 2015
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion sources, systems and methods
- Patent number 8,748,845
- Issue date Jun 10, 2014
- Carl Zeiss Microscopy, LLC
- Billy W. Ward
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion sources, systems and methods
- Patent number 8,110,814
- Issue date Feb 7, 2012
- ALIS Corporation
- Billy W. Ward
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...
- Publication number 20160343535
- Publication date Nov 24, 2016
- NuFlare Technology, Inc.
- Hideki MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVATION CHAMBER AND KIT USED IN TREATMENT DEVICE FOR LOWERING EL...
- Publication number 20160172144
- Publication date Jun 16, 2016
- NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
- Tomohiro NISHITANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY DEVICE FOR MULTI-BEAMS, AND FABRICATION MET...
- Publication number 20160155600
- Publication date Jun 2, 2016
- NuFlare Technology, Inc.
- Kazuhiro CHIBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR GENERATING WRITING DATA
- Publication number 20160155609
- Publication date Jun 2, 2016
- NuFlare Technology, Inc.
- Shigehiro HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS SUITABLE FOR DRAWING ON LI...
- Publication number 20160133438
- Publication date May 12, 2016
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSTRUCTURE ARRAY DIFFRACTIVE OPTICS FOR RGB AND CMYK COLOR DISPLAYS
- Publication number 20160107471
- Publication date Apr 21, 2016
- IDIT TECHNOLOGIES CORP.
- Clinton K. LANDROCK
- B42 - BOOKBINDING ALBUMS FILES SPECIAL PRINTED MATTER
Information Patent Application
METHOD OF MEASURING BEAM POSITION OF MULTI CHARGED PARTICLE BEAM, A...
- Publication number 20160086764
- Publication date Mar 24, 2016
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM GRID LAYOUT
- Publication number 20160071696
- Publication date Mar 10, 2016
- MAPPER LITHOGRAPHY IP BV
- Vincent Sylvester KUIPER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING DEVICE FOR MULTI CHARGED PARTICLE BEAMS, MULTI CHARGED PAR...
- Publication number 20160064179
- Publication date Mar 3, 2016
- NuFlare Technology, Inc.
- Hiroshi YAMASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...
- Publication number 20150380213
- Publication date Dec 31, 2015
- NuFlare Technology, Inc.
- Hideyuki TSURUMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...
- Publication number 20150348741
- Publication date Dec 3, 2015
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...
- Publication number 20150340196
- Publication date Nov 26, 2015
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE METHOD USING CONTROL OF SETTLING TIMES AND METHODS OF MANU...
- Publication number 20150311032
- Publication date Oct 29, 2015
- Samsung Electronics Co., Ltd.
- Yong-Seok JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING AN ARTICLE
- Publication number 20150303025
- Publication date Oct 22, 2015
- Canon Kabushiki Kaisha
- Hirohito Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATION OF DEFECTIVE BEAMLETS IN A CHARGED-PARTICLE MULTI-BEAM...
- Publication number 20150248993
- Publication date Sep 3, 2015
- IMS Nanofabrication AG
- Rafael Reiter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROXIMITY EFFECT CORRECTION IN A CHARGED PARTICLE LITHOGRAPHY SYSTEM
- Publication number 20150243481
- Publication date Aug 27, 2015
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCES, SYSTEMS AND METHODS
- Publication number 20150213997
- Publication date Jul 30, 2015
- Carl Zeiss Microscopy, LLC
- Billy W. Ward
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Electron Beam Lithography
- Publication number 20150179403
- Publication date Jun 25, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRIVING APPARATUS, CHARGED PARTICLE BEAM IRRADIATION APPARATUS, MET...
- Publication number 20150034842
- Publication date Feb 5, 2015
- Canon Kabushiki Kaisha
- Shinji Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCES, SYSTEMS AND METHODS
- Publication number 20140306121
- Publication date Oct 16, 2014
- Carl Zeiss Microscopy, LLC
- Billy W. Ward
- B82 - NANO-TECHNOLOGY
Information Patent Application
ION SOURCES, SYSTEMS AND METHODS
- Publication number 20120141693
- Publication date Jun 7, 2012
- ALIS Corporation
- Billy W. Ward
- B82 - NANO-TECHNOLOGY
Information Patent Application
ION SOURCES, SYSTEMS AND METHODS
- Publication number 20090179161
- Publication date Jul 16, 2009
- ALIS Corporation
- BILLY W. WARD
- B82 - NANO-TECHNOLOGY

Particle-beam lithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Exposure method using control of settling times and methods of manu...

Blanking aperture array device for multi-beams, and fabrication met...

Shot data generation method and multi charged particle beam writing...

Multi charged particle beam writing method, and multi charged parti...

Compensation of defective beamlets in a charged-particle multi-beam...

Ion sources, systems and methods

Proximity effect correction in a charged particle lithography system

Ion sources, systems and methods

Ion sources, systems and methods

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...

ACTIVATION CHAMBER AND KIT USED IN TREATMENT DEVICE FOR LOWERING EL...

BLANKING APERTURE ARRAY DEVICE FOR MULTI-BEAMS, AND FABRICATION MET...

METHOD FOR GENERATING WRITING DATA

CHARGED PARTICLE BEAM EXPOSURE APPARATUS SUITABLE FOR DRAWING ON LI...

NANOSTRUCTURE ARRAY DIFFRACTIVE OPTICS FOR RGB AND CMYK COLOR DISPLAYS

METHOD OF MEASURING BEAM POSITION OF MULTI CHARGED PARTICLE BEAM, A...

BEAM GRID LAYOUT

BLANKING DEVICE FOR MULTI CHARGED PARTICLE BEAMS, MULTI CHARGED PAR...

CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...

MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...

MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...

EXPOSURE METHOD USING CONTROL OF SETTLING TIMES AND METHODS OF MANU...

LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING AN ARTICLE

COMPENSATION OF DEFECTIVE BEAMLETS IN A CHARGED-PARTICLE MULTI-BEAM...

PROXIMITY EFFECT CORRECTION IN A CHARGED PARTICLE LITHOGRAPHY SYSTEM

ION SOURCES, SYSTEMS AND METHODS

Method and Apparatus for Electron Beam Lithography

DRIVING APPARATUS, CHARGED PARTICLE BEAM IRRADIATION APPARATUS, MET...

ION SOURCES, SYSTEMS AND METHODS

ION SOURCES, SYSTEMS AND METHODS

ION SOURCES, SYSTEMS AND METHODS