Particle-beam lithography

Industry

CPC
H01J37/3174

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3174Particle-beam lithography

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Stage apparatus and electron beam lithography system
- Patent number 12,222,658
- Issue date Feb 11, 2025
- Jeol Ltd.
- Hirofumi Miyao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced spatial/temporal overlaps to increase temporal overlaps to...
- Patent number 12,191,110
- Issue date Jan 7, 2025
- The University of Liverpool
- Nigel D Browning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum apparatus
- Patent number 12,142,512
- Issue date Nov 12, 2024
- NuFlare Technology, Inc.
- Yoshiaki Shinohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices and methods for examining and/or processing an element for...
- Patent number 12,135,540
- Issue date Nov 5, 2024
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for beam processing of substrates
- Patent number 12,105,423
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for spatial charged particle bunching
- Patent number 12,068,130
- Issue date Aug 20, 2024
- NexGen Semi Holding, Inc.
- Mark Joseph Bennahmias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus and deflector
- Patent number 12,009,174
- Issue date Jun 11, 2024
- NuFlare Technology, Inc.
- Kazuhiro Kishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus
- Patent number 12,009,175
- Issue date Jun 11, 2024
- NuFlare Technology, Inc.
- Hirofumi Morita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam apparatus, defect repair method, lithographic exposur...
- Patent number 11,996,267
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Ruben Cornelis Maas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Proximity effect correction in electron beam lithography
- Patent number 11,899,373
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-voltage electron beam control of conductive state at a complex-...
- Patent number 11,894,162
- Issue date Feb 6, 2024
- University of Pittsburgh—Of the Commonwealth System, of Higher Education
- Jeremy Levy
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle beam writing device and charged particle beam writ...
- Patent number 11,854,764
- Issue date Dec 26, 2023
- NuFlare Technology, Inc.
- Junpei Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma flood gun for charged particle apparatus
- Patent number 11,830,705
- Issue date Nov 28, 2023
- Ximan Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing method, charged particle beam writing...
- Patent number 11,804,361
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template, manufacturing method of template
- Patent number 11,796,910
- Issue date Oct 24, 2023
- Kioxia Corporation
- Kosuke Takai
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Grant
Height measuring device, charged particle beam apparatus, and heigh...
- Patent number 11,754,388
- Issue date Sep 12, 2023
- Jeol Ltd.
- Yukinori Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam writing apparatus and cathode life span prediction me...
- Patent number 11,749,491
- Issue date Sep 5, 2023
- NuFlare Technology, Inc.
- Satoshi Nakahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 11,747,736
- Issue date Sep 5, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Grant
Plasma flood gun for charged particle apparatus
- Patent number 11,735,398
- Issue date Aug 22, 2023
- Ximan Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light modulated electron source
- Patent number 11,715,615
- Issue date Aug 1, 2023
- KLA Corporation
- Edgardo Garcia Berrios
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam manipulation device and method for manipulati...
- Patent number 11,705,301
- Issue date Jul 18, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for spatial charged particle bunching
- Patent number 11,699,568
- Issue date Jul 11, 2023
- NextGen Semi Holding, Inc.
- Mark Joseph Bennahmias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing photo masks
- Patent number 11,687,006
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of charged-particle beam such as scanning electron micros...
- Patent number 11,664,189
- Issue date May 30, 2023
- BORRIES PTE. LTD.
- Zhongwei Chen
- B08 - CLEANING
Information Patent Grant
Beam steering correction for attenuating the degradation of positio...
- Patent number 11,664,187
- Issue date May 30, 2023
- Intel Corporation
- Amir Raveh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Procedural electron beam lithography
- Patent number 11,664,194
- Issue date May 30, 2023
- Magic Leap, Inc.
- Victor Kai Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of electron beam comprising pinnacle limiting plate and m...
- Patent number 11,664,186
- Issue date May 30, 2023
- BORRIES PTE. LTD.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...
- Publication number 20250037969
- Publication date Jan 30, 2025
- NuFlare Technology, Inc.
- Tatsuya MUROFUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...
- Publication number 20250021014
- Publication date Jan 16, 2025
- TSINGHUA UNIVERSITY
- Zhen ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOW-VOLTAGE ELECTRON BEAM CONTROL OF CONDUCTIVE STATE AT A COMPLEX-...
- Publication number 20240412889
- Publication date Dec 12, 2024
- University of Pittsburgh of the Commonwealth System of Higher Education
- Jeremy Levy
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...
- Publication number 20240412945
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY MECHANISM AND WRITING APPARATUS
- Publication number 20240395493
- Publication date Nov 28, 2024
- NuFlare Technology, Inc.
- Toshiki KUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20240371598
- Publication date Nov 7, 2024
- V TECHNOLOGY CO., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...
- Publication number 20240363307
- Publication date Oct 31, 2024
- NuFlare Technology, Inc.
- Hiroshi SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240321545
- Publication date Sep 26, 2024
- Kabushiki Kaisha Toshiba
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING DEVICE AND DRAWING METHOD
- Publication number 20240312761
- Publication date Sep 19, 2024
- KIOXIA Corporation
- Yoshinori KAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242922
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...
- Publication number 20240234083
- Publication date Jul 11, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM LITHOGRAPHY AND NANOENGINEERING
- Publication number 20240222073
- Publication date Jul 4, 2024
- Intel Corporation
- Shida Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY
- Publication number 20240161998
- Publication date May 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Hsien Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...
- Publication number 20240145212
- Publication date May 2, 2024
- NIPPON CONTROL SYSTEM CORPORATION
- Masakazu HAMAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...
- Publication number 20240136148
- Publication date Apr 25, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR SPATIAL CHARGED PARTICLE BUNCHING
- Publication number 20240112882
- Publication date Apr 4, 2024
- NEXGEN SEMI HOLDING, INC.
- Mark Joseph Bennahmias
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA GENERATION APPARATUS, DATA GENERATION METHOD, AND COMPUTER-REA...
- Publication number 20240105420
- Publication date Mar 28, 2024
- KIOXIA Corporation
- Katsuyoshi KODERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20240096590
- Publication date Mar 21, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240055218
- Publication date Feb 15, 2024
- NuFlare Technology, Inc.
- Yasuo SENGOKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECT METAL NANO PATTERNING
- Publication number 20240014004
- Publication date Jan 11, 2024
- QATAR FOUNDATION FOR EDUCATION, SCIENCE AND COMMUNITY DEVELOPMENT
- Hicham Hamoudi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY
- Publication number 20230375941
- Publication date Nov 23, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Wen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED CHARGED PARTICLE BEAM APPARATUS
- Publication number 20230335369
- Publication date Oct 19, 2023
- V Technology Co., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20230288813
- Publication date Sep 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...
- Publication number 20230290608
- Publication date Sep 14, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE...
- Publication number 20230238209
- Publication date Jul 27, 2023
- Carl Zeiss SMT GMBH
- Nicole Auth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY
- Publication number 20230168589
- Publication date Jun 1, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-VOLTAGE ELECTRON BEAM CONTROL OF CONDUCTIVE STATE AT A COMPLEX-...
- Publication number 20230154639
- Publication date May 18, 2023
- University of Pittsburgh of the Commonwealth System of Higher Education
- Jeremy Levy
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20230143407
- Publication date May 11, 2023
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING

Particle-beam lithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Stage apparatus and electron beam lithography system

Charged particle beam writing apparatus, charged particle beam writ...

Reduced spatial/temporal overlaps to increase temporal overlaps to...

Vacuum apparatus

Devices and methods for examining and/or processing an element for...

Apparatus and methods for beam processing of substrates

Method and device for spatial charged particle bunching

Method of manufacturing photo masks

Drawing apparatus and deflector

Charged particle beam writing apparatus

Particle beam apparatus, defect repair method, lithographic exposur...

Charged particle beam writing apparatus, charged particle beam writ...

Proximity effect correction in electron beam lithography

Low-voltage electron beam control of conductive state at a complex-...

Charged particle beam writing device and charged particle beam writ...

Plasma flood gun for charged particle apparatus

Charged particle beam writing method, charged particle beam writing...

Template, manufacturing method of template

Height measuring device, charged particle beam apparatus, and heigh...

Electron beam writing apparatus and cathode life span prediction me...

Exposure apparatus and exposure method, and device manufacturing me...

Plasma flood gun for charged particle apparatus

Light modulated electron source

Charged particle beam manipulation device and method for manipulati...

Method and device for spatial charged particle bunching

Method of manufacturing photo masks

Apparatus of charged-particle beam such as scanning electron micros...

Beam steering correction for attenuating the degradation of positio...

Procedural electron beam lithography

Apparatus of electron beam comprising pinnacle limiting plate and m...

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD...

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

LOW-VOLTAGE ELECTRON BEAM CONTROL OF CONDUCTIVE STATE AT A COMPLEX-...

ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...

BLANKING APERTURE ARRAY MECHANISM AND WRITING APPARATUS

FOCUSED ION BEAM SYSTEM

MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...

METHOD OF MANUFACTURING PHOTO MASKS

SEMICONDUCTOR DEVICE

DRAWING DEVICE AND DRAWING METHOD

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...

ION BEAM LITHOGRAPHY AND NANOENGINEERING

DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY

ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...

BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, A...

METHOD AND DEVICE FOR SPATIAL CHARGED PARTICLE BUNCHING

DATA GENERATION APPARATUS, DATA GENERATION METHOD, AND COMPUTER-REA...

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

DIRECT METAL NANO PATTERNING

PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY

FOCUSED CHARGED PARTICLE BEAM APPARATUS

METHOD OF MANUFACTURING PHOTO MASKS

CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...

APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE...

PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY

LOW-VOLTAGE ELECTRON BEAM CONTROL OF CONDUCTIVE STATE AT A COMPLEX-...

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...