Particle traps

Industry

CPC
H01J2237/028

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/028Particle traps

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Beam pattern device having beam absorber structure
- Patent number 12,154,756
- Issue date Nov 26, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of controlling an energy spread of a charg...
- Patent number 11,881,374
- Issue date Jan 23, 2024
- ASML Netherlands B.V.
- Shakeeb Bin Hasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam apparatus, charged-particle beam writing appa...
- Patent number 10,998,162
- Issue date May 4, 2021
- NuFlare Technology, Inc.
- Nobuo Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and control method thereof
- Patent number 10,784,074
- Issue date Sep 22, 2020
- Hitachi High-Technologies Corporation
- Takeshi Sunaoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for refilling cryogen in microscope cryogen holders
- Patent number 10,481,055
- Issue date Nov 19, 2019
- Simple Origin, Inc.
- Pushkarraj Deshmukh
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Grant
Anti-contamination trap, and vacuum application device
- Patent number 10,269,533
- Issue date Apr 23, 2019
- Hitachi High-Technologies Corporation
- Takashi Mizuo
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Grant
Textured silicon liners in substrate processing systems
- Patent number 9,799,492
- Issue date Oct 24, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chicane blanker assemblies for charged particle beam systems and me...
- Patent number 9,767,984
- Issue date Sep 19, 2017
- Kevin Kagarice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filters for blocking macroparticles in plasma deposition apparatus
- Patent number 9,683,285
- Issue date Jun 20, 2017
- The Regents of the University of California
- Andre Anders
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Light source apparatus
- Patent number 9,572,240
- Issue date Feb 14, 2017
- Ushio Denki Kabushiki Kaisha
- Gota Niimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Textured silicon liners in substrate processing systems
- Patent number 9,437,397
- Issue date Sep 6, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removing foreign substances in charged particle beam dev...
- Patent number 9,368,319
- Issue date Jun 14, 2016
- Hitachi High-Technologies Corporation
- Kazuma Tanii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for mass selective determination of an ion
- Patent number 9,035,245
- Issue date May 19, 2015
- Carl Zeiss Microscopy GmbH
- Albrecht Glasmachers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sharp scattering angle trap for electron beam apparatus
- Patent number 8,890,066
- Issue date Nov 18, 2014
- KLA-Tencor Corporation
- Yehiel Gotkis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam line system of ion implanter
- Patent number 8,558,198
- Issue date Oct 15, 2013
- United Microelectronics Corp.
- Boon-Chau Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnet for ion beam irradiation apparatus equipped with protective...
- Patent number 8,476,602
- Issue date Jul 2, 2013
- Nissin Ion Equipment Co., Ltd.
- Dan Nicolaescu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Particle beam microscope
- Patent number 8,476,589
- Issue date Jul 2, 2013
- Carl Zeiss Microscopy GmbH
- Gerd Benner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle filter
- Patent number 8,049,182
- Issue date Nov 1, 2011
- Oxford Instruments Nanotechnology Tools Limited
- Angus Bewick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle trap
- Patent number 8,000,080
- Issue date Aug 16, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Stephen E. Krause
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam processing apparatus
- Patent number 7,982,192
- Issue date Jul 19, 2011
- Sen Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam exposure apparatus
- Patent number 7,939,813
- Issue date May 10, 2011
- Hynix Semiconductor Inc.
- Dong S. Jang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion implanters
- Patent number 7,807,984
- Issue date Oct 5, 2010
- Applied Materials, Inc.
- Gregory Robert Alcott
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for blanking a charged particle beam
- Patent number 7,728,308
- Issue date Jun 1, 2010
- Nanobeam Limited
- Tao Zhang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Deposition reduction system for an ion implanter
- Patent number 7,629,597
- Issue date Dec 8, 2009
- Axcelis Technologies, Inc.
- Teng-Chao Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for improved ion beam transport
- Patent number 7,619,228
- Issue date Nov 17, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Victor Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam stop and beam tuning methods
- Patent number 7,579,604
- Issue date Aug 25, 2009
- Axcelis Technologies. Inc.
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particulate prevention in ion implantation
- Patent number 7,547,898
- Issue date Jun 16, 2009
- Axcelis Technologies, Inc.
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged beam dump and particle attractor
- Patent number 7,547,899
- Issue date Jun 16, 2009
- Axcelis Technologies, Inc.
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analyzing chamber including a leakage ion beam detector and mass an...
- Patent number 7,531,792
- Issue date May 12, 2009
- Samsung Electronics Co., Ltd.
- Hyun-Sub Earm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter with contaminant collecting surface
- Patent number 7,358,508
- Issue date Apr 15, 2008
- Axcelis Technologies, Inc.
- Philip J. Ring
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION
- Publication number 20250029831
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- Tommi Tynell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...
- Publication number 20240429019
- Publication date Dec 26, 2024
- SHINE Technologies, LLC
- Daniel Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL SYSTEM AND METHOD OF OPERATING AN ELECTRON-OPTICAL...
- Publication number 20240029995
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Stijn Wilem Herman Karel STEENBRINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam Pattern Device Having Beam Absorber Structure
- Publication number 20230052445
- Publication date Feb 16, 2023
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF CONTROLLING AN ENERGY SPREAD OF A CHARG...
- Publication number 20220148842
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Shakeeb Bin HASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNET USED WITH A PLASMA CLEANER
- Publication number 20180053638
- Publication date Feb 22, 2018
- FEI Company
- Viktor Svéda
- B08 - CLEANING
Information Patent Application
LIGHT SOURCE APPARATUS
- Publication number 20160330826
- Publication date Nov 10, 2016
- Ushio Denki Kabushiki Kaisha
- Gota NIIMI
- F21 - LIGHTING
Information Patent Application
Anti-Contamination Trap, and Vacuum Application Device
- Publication number 20160203940
- Publication date Jul 14, 2016
- Hitachi High-Technologies Corporation
- Takashi MIZUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Removing Foreign Substances in Charged Particle Beam Dev...
- Publication number 20150279609
- Publication date Oct 1, 2015
- Hitachi High-Technologies Corporation
- Kazuma Tanii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR MASS SELECTIVE DETERMINATION OF AN ION
- Publication number 20140339424
- Publication date Nov 20, 2014
- CARL ZEISS MICROSCOPY GMBH
- Albrecht Glasmachers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CONTAMINANTS BEING DEPOSITED THEREON
- Publication number 20130256558
- Publication date Oct 3, 2013
- Christian DIETL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM LINE SYSTEM OF ION IMPLANTER
- Publication number 20130009075
- Publication date Jan 10, 2013
- United Microelectronics Corp.
- Boon-Chau TONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Particle Beam Microscope
- Publication number 20120326032
- Publication date Dec 27, 2012
- CARL ZEISS MICROSCOPY GMBH
- Gerd Benner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Particle Beam Microscope
- Publication number 20120326030
- Publication date Dec 27, 2012
- CARL ZEISS NTS GMBH
- Gerd Benner
- G01 - MEASURING TESTING
Information Patent Application
MAGNET FOR ION BEAM IRRADIATION APPARATUS EQUIPPED WITH PROTECTIVE...
- Publication number 20110204250
- Publication date Aug 25, 2011
- NISSIN ION EQUIPMENT CO., LTD.
- Dan NICOLAESCU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CHARGED PARTICLE FILTER
- Publication number 20110168887
- Publication date Jul 14, 2011
- OXFORD INSTRUMENTS ANALYTICAL LIMITED
- Angus BEWICK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-Beam Exposure Apparatus
- Publication number 20090166552
- Publication date Jul 2, 2009
- Hynix Semiconductor Inc.
- Dong Sik Jang
- B82 - NANO-TECHNOLOGY
Information Patent Application
Ion implanters
- Publication number 20090166565
- Publication date Jul 2, 2009
- Gregory Robert Alcott
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE TRAP
- Publication number 20090147435
- Publication date Jun 11, 2009
- Stephen E. Krause
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM PROCESSING APPARATUS
- Publication number 20080258074
- Publication date Oct 23, 2008
- SEN Corporation, an SHI and Axcelis Company
- Mitsukuni TSUKIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanters
- Publication number 20080164427
- Publication date Jul 10, 2008
- APPLIED MATERIALS, INC.
- Erik J. H. Collart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for improved ion beam transport
- Publication number 20080078949
- Publication date Apr 3, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Victor Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition reduction system for an ion implanter
- Publication number 20080073576
- Publication date Mar 27, 2008
- Axcelis Technologies Inc.
- Teng-Chao Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Blanking a Charged Particle Beam
- Publication number 20080061246
- Publication date Mar 13, 2008
- Tao Zhang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Ion implanter with contaminant collecting surface
- Publication number 20070102652
- Publication date May 10, 2007
- Axcelis Technologies, Inc.
- Philip J. Ring
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Analyzing chamber including a leakage ion beam detector and mass an...
- Publication number 20070018093
- Publication date Jan 25, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Hyun-Sub Earm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged beam dump and particle attractor
- Publication number 20060284117
- Publication date Dec 21, 2006
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Particulate prevention in ion implantation
- Publication number 20060284116
- Publication date Dec 21, 2006
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam stop and beam tuning methods
- Publication number 20060284071
- Publication date Dec 21, 2006
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and method
- Publication number 20050189069
- Publication date Sep 1, 2005
- TOKYO ELECTRON LIMITED
- Audunn Ludviksson
- H01 - BASIC ELECTRIC ELEMENTS

Particle traps

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Beam pattern device having beam absorber structure

Apparatus for and method of controlling an energy spread of a charg...

Charged-particle beam apparatus, charged-particle beam writing appa...

Charged particle beam apparatus and control method thereof

System and method for refilling cryogen in microscope cryogen holders

Anti-contamination trap, and vacuum application device

Textured silicon liners in substrate processing systems

Chicane blanker assemblies for charged particle beam systems and me...

Filters for blocking macroparticles in plasma deposition apparatus

Light source apparatus

Textured silicon liners in substrate processing systems

Method for removing foreign substances in charged particle beam dev...

Device for mass selective determination of an ion

Sharp scattering angle trap for electron beam apparatus

Beam line system of ion implanter

Magnet for ion beam irradiation apparatus equipped with protective...

Particle beam microscope

Charged particle filter

Particle trap

Beam processing apparatus

E-beam exposure apparatus

Ion implanters

Apparatus for blanking a charged particle beam

Deposition reduction system for an ion implanter

Technique for improved ion beam transport

Beam stop and beam tuning methods

Particulate prevention in ion implantation

Charged beam dump and particle attractor

Analyzing chamber including a leakage ion beam detector and mass an...

Ion implanter with contaminant collecting surface

Patents Applicationslast 30 patents

PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION

MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...

ELECTRON-OPTICAL SYSTEM AND METHOD OF OPERATING AN ELECTRON-OPTICAL...

Beam Pattern Device Having Beam Absorber Structure

APPARATUS FOR AND METHOD OF CONTROLLING AN ENERGY SPREAD OF A CHARG...

MAGNET USED WITH A PLASMA CLEANER

LIGHT SOURCE APPARATUS

Anti-Contamination Trap, and Vacuum Application Device

Method for Removing Foreign Substances in Charged Particle Beam Dev...

DEVICE FOR MASS SELECTIVE DETERMINATION OF AN ION

APPARATUS FOR CONTAMINANTS BEING DEPOSITED THEREON

BEAM LINE SYSTEM OF ION IMPLANTER

Particle Beam Microscope

Particle Beam Microscope

MAGNET FOR ION BEAM IRRADIATION APPARATUS EQUIPPED WITH PROTECTIVE...

CHARGED PARTICLE FILTER

E-Beam Exposure Apparatus

Ion implanters

PARTICLE TRAP

BEAM PROCESSING APPARATUS

Ion implanters

Technique for improved ion beam transport

Deposition reduction system for an ion implanter

Apparatus for Blanking a Charged Particle Beam

Ion implanter with contaminant collecting surface

Analyzing chamber including a leakage ion beam detector and mass an...

Charged beam dump and particle attractor

Particulate prevention in ion implantation

Beam stop and beam tuning methods

Plasma processing system and method