Particular magnets or magnet arrangements for controlling the discharge

Industry

CPC
H01J37/32669

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32669Particular magnets or magnet arrangements for controlling the discharge

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus, calculation method, and calculation pr...
- Patent number 12,300,469
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reaction device
- Patent number 12,283,464
- Issue date Apr 22, 2025
- New Power Plasma Co., Ltd.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,266,512
- Issue date Apr 1, 2025
- Semes Co., Ltd.
- Dukhyun Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic shielding for plasma sources
- Patent number 12,237,155
- Issue date Feb 25, 2025
- Lam Research Corporation
- Hema Swaroop Mopidevi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi racetrack cathodic arc
- Patent number 12,198,905
- Issue date Jan 14, 2025
- Vapor Technologies, Inc.
- Zachary Zembower
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum deposition into trenches and vias
- Patent number 12,154,770
- Issue date Nov 26, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,068,136
- Issue date Aug 20, 2024
- Kokusai Electric Corporation
- Tsuyoshi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method of processing substrate
- Patent number 12,020,898
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Akihiro Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method fabricating semiconductor device
- Patent number 12,014,905
- Issue date Jun 18, 2024
- Samsung Electronics Co., Ltd.
- Nam Kyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film-forming method, manufacturing method of electronic device, and...
- Patent number 12,009,183
- Issue date Jun 11, 2024
- The Japan Steel Works, Ltd.
- Keisuke Washio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing apparatus
- Patent number 11,996,270
- Issue date May 28, 2024
- Samsung Electronics Co., Ltd.
- Eunhee Jeang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic-material shield around plasma chambers near pedestal
- Patent number 11,984,302
- Issue date May 14, 2024
- Applied Materials, Inc.
- Job George Konnoth Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shunt door for magnets in plasma process chamber
- Patent number 11,959,174
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for controlling stress variation in a material...
- Patent number 11,961,722
- Issue date Apr 16, 2024
- SPTS Technologies Limited
- Anthony Wilby
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Magnet arrangement for a plasma source for performing plasma treatm...
- Patent number 11,942,311
- Issue date Mar 26, 2024
- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
- Jörg Vetter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering system with a plurality of cathode assemblies
- Patent number 11,932,932
- Issue date Mar 19, 2024
- Alluxa, Inc.
- Michael A. Scobey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for generating magnetic fields during semiconductor proce...
- Patent number 11,915,915
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Suhas Bangalore Umesh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multipactor plasma ignition devices and techniques
- Patent number 11,915,916
- Issue date Feb 27, 2024
- Eric Benjamin Frederick Gilbert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for depositing a material
- Patent number 11,875,980
- Issue date Jan 16, 2024
- Stephen R Burgess
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, calculation method, and calculation pr...
- Patent number 11,862,438
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,823,876
- Issue date Nov 21, 2023
- ASM IP Holding B.V.
- ChangMin Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and processing method, and gas cluster generat...
- Patent number 11,772,138
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Grant
Modular microwave source with local lorentz force
- Patent number 11,721,532
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple frequency electron cyclotron resonance thruster
- Patent number 11,699,575
- Issue date Jul 11, 2023
- The Regents of the University of Michigan
- Benjamin Alexander Jorns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Depositing apparatus
- Patent number 11,646,180
- Issue date May 9, 2023
- Samsung Display Co., Ltd.
- Kwanyong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma so...
- Patent number 11,640,900
- Issue date May 2, 2023
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arc source with confined magnetic field
- Patent number 11,578,401
- Issue date Feb 14, 2023
- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
- Siegfried Krassnitzer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tuneable uniformity control utilizing rotational magnetic housing
- Patent number 11,557,466
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Samuel E. Gottheim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotary plasma reactor
- Patent number 11,545,343
- Issue date Jan 3, 2023
- Board of Trustees of Michigan State University
- Qi Hua Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modifiable magnet configuration for arc vaporization sources
- Patent number 11,535,928
- Issue date Dec 27, 2022
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Siegfried Krassnitzer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...
- Publication number 20250104980
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- Samsung Electronics Co., Ltd.
- Changbae PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES
- Publication number 20250087472
- Publication date Mar 13, 2025
- INTEVAC, INC.
- Samuel D. Harkness
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION APPARATUS AND METHOD OF OPERATING THE SAME
- Publication number 20250079135
- Publication date Mar 6, 2025
- SAMSUNG DISPLAY CO., LTD.
- Jun Hyeuk KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC ELEMENT ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUD...
- Publication number 20250069861
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Myeongsoo Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20250037977
- Publication date Jan 30, 2025
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240420930
- Publication date Dec 19, 2024
- Pusan National University Industry-University Cooperation Foundation
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240395510
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Plasma Control Method
- Publication number 20240339304
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE
- Publication number 20240331980
- Publication date Oct 3, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Honoka WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM
- Publication number 20240304425
- Publication date Sep 12, 2024
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Othmar ZÜGER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF...
- Publication number 20240301546
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Thomas Werner Zilbauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER
- Publication number 20240271284
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Kallol BERA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240177973
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Koki HIDAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOOLS AND METHODS FOR SUBTRACTIVE METAL PATTERNING
- Publication number 20240162058
- Publication date May 16, 2024
- Intel Corporation
- Christopher J. Jezewski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND METHO...
- Publication number 20240120177
- Publication date Apr 11, 2024
- Samsung Electronics Co., Ltd.
- Ji Mo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, CALCULATION METHOD, AND CALCULATION PR...
- Publication number 20240087855
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke OKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20240047180
- Publication date Feb 8, 2024
- Kokusai Electric Corporation
- Daisuke HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing with Magnetic Ring X Point
- Publication number 20240038506
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM DEPOSITION INTO TRENCHES AND VIAS
- Publication number 20240021421
- Publication date Jan 18, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230420228
- Publication date Dec 28, 2023
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230386800
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SYSTEMS AND PROCESSES WITH PULSED MAGNETIC FIELD
- Publication number 20230377853
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230360893
- Publication date Nov 9, 2023
- SEMES CO., LTD.
- DUKHYUN SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR USE IN GENERATING PLASMA
- Publication number 20230352270
- Publication date Nov 2, 2023
- Dyson Technology Limited
- Sven GAUTER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230317428
- Publication date Oct 5, 2023
- SEMES CO., LTD.
- Dukhyun SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD USING MAGNETI...
- Publication number 20230317427
- Publication date Oct 5, 2023
- SEMES CO., LTD.
- Duk Hyun SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREDICTION METHOD AND INFORMATION PROCESSING APPARATUS
- Publication number 20230298867
- Publication date Sep 21, 2023
- TOKYO ELECTRON LIMITED
- Keita YAEGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL USING A STATIC MAGNETIC FIELD
- Publication number 20230298866
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS, PLASMA TREATMENT METHOD, AND ORIGINAL P...
- Publication number 20230290619
- Publication date Sep 14, 2023
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS

Particular magnets or magnet arrangements for controlling the discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus, calculation method, and calculation pr...

Plasma reaction device

Plasma processing apparatus

Magnetic shielding for plasma sources

Multi racetrack cathodic arc

Vacuum deposition into trenches and vias

Substrate processing apparatus, method of manufacturing semiconduct...

Plasma processing system and method of processing substrate

Apparatus and method fabricating semiconductor device

Film-forming method, manufacturing method of electronic device, and...

Wafer processing apparatus

Magnetic-material shield around plasma chambers near pedestal

Shunt door for magnets in plasma process chamber

Method and apparatus for controlling stress variation in a material...

Magnet arrangement for a plasma source for performing plasma treatm...

Sputtering system with a plurality of cathode assemblies

Apparatus for generating magnetic fields during semiconductor proce...

Multipactor plasma ignition devices and techniques

Method and apparatus for depositing a material

Plasma processing apparatus, calculation method, and calculation pr...

Substrate processing apparatus

Processing apparatus and processing method, and gas cluster generat...

Modular microwave source with local lorentz force

Multiple frequency electron cyclotron resonance thruster

Depositing apparatus

Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma so...

Arc source with confined magnetic field

Tuneable uniformity control utilizing rotational magnetic housing

Rotary plasma reactor

Modifiable magnet configuration for arc vaporization sources

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...

SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES

DEPOSITION APPARATUS AND METHOD OF OPERATING THE SAME

MAGNETIC ELEMENT ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUD...

APPARATUS AND METHOD FOR PLASMA PROCESSING

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

Plasma Processing Apparatus and Plasma Control Method

PLASMA SOURCE

ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF...

SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER

PLASMA PROCESSING APPARATUS

TOOLS AND METHODS FOR SUBTRACTIVE METAL PATTERNING

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND METHO...

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

PLASMA PROCESSING APPARATUS, CALCULATION METHOD, AND CALCULATION PR...

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

Plasma Processing with Magnetic Ring X Point

VACUUM DEPOSITION INTO TRENCHES AND VIAS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA SYSTEMS AND PROCESSES WITH PULSED MAGNETIC FIELD

PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR USE IN GENERATING PLASMA

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD USING MAGNETI...

PREDICTION METHOD AND INFORMATION PROCESSING APPARATUS

PLASMA UNIFORMITY CONTROL USING A STATIC MAGNETIC FIELD

PLASMA TREATMENT APPARATUS, PLASMA TREATMENT METHOD, AND ORIGINAL P...