Patterning strategy

Industry

CPC
H01J2237/31761

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31761Patterning strategy

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam drawing device and method of controlling char...
- Patent number 11,694,875
- Issue date Jul 4, 2023
- Jeol Ltd.
- Masakazu Iwanaga
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Adapting the duration of exposure slots in multi-beam writers
- Patent number 11,099,482
- Issue date Aug 24, 2021
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,062,878
- Issue date Jul 13, 2021
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,937,628
- Issue date Mar 2, 2021
- HITACHI HIGH-TECH CORPORATION
- Chikako Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an integrated circuit with a pattern density-...
- Patent number 10,811,225
- Issue date Oct 20, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,784,081
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 10,748,744
- Issue date Aug 18, 2020
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflection scan speed adjustment during charged particle exposure
- Patent number 10,692,696
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,685,809
- Issue date Jun 16, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an integrated circuit with a pattern density-...
- Patent number 10,431,423
- Issue date Oct 1, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle lithography system
- Patent number 10,297,420
- Issue date May 21, 2019
- Mapper Lithography IP B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 10,256,074
- Issue date Apr 9, 2019
- Intel Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an integrated circuit with a pattern density-...
- Patent number 10,170,276
- Issue date Jan 1, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus, and multi charged pa...
- Patent number 10,134,562
- Issue date Nov 20, 2018
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,120,284
- Issue date Nov 6, 2018
- Nuflare Technology, Inc.
- Hiroshi Matsumoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam exposure method, and multi charged part...
- Patent number 10,062,540
- Issue date Aug 28, 2018
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for exposing a wafer
- Patent number 9,978,562
- Issue date May 22, 2018
- Mapper Lithography IP B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Selective processing of a workpiece using ion beam implantation and...
- Patent number 9,899,188
- Issue date Feb 20, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Mark R. Amato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual pass scanning
- Patent number 9,691,589
- Issue date Jun 27, 2017
- Mapper Lithography IP B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multiple charged particle beam lithography apparatus and multiple c...
- Patent number 9,601,315
- Issue date Mar 21, 2017
- NuFlare Technology, Inc.
- Ryoh Kawana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an integrated circuit with a pattern density-...
- Patent number 9,552,964
- Issue date Jan 24, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensation of dose inhomogeneity using overlapping exposure spots
- Patent number 9,495,499
- Issue date Nov 15, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Compensation of dose inhomogeneity using overlapping exposure spots
- Patent number 9,443,052
- Issue date Sep 13, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for E-beam lithography with multi-exposure
- Patent number 9,305,799
- Issue date Apr 5, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing apparatus utilizing multiple st...
- Patent number 9,299,533
- Issue date Mar 29, 2016
- Nuflare Technology, Inc.
- Hiroshi Matsumoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Drawing apparatus, and method of manufacturing article
- Patent number 9,293,292
- Issue date Mar 22, 2016
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus, and method of manufacturing article
- Patent number 9,245,715
- Issue date Jan 26, 2016
- Canon Kabushiki Kaisha
- Tomoyuki Morita
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20240429022
- Publication date Dec 26, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230124768
- Publication date Apr 20, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20210313143
- Publication date Oct 7, 2021
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20210241995
- Publication date Aug 5, 2021
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20200373122
- Publication date Nov 26, 2020
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20200266033
- Publication date Aug 20, 2020
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...
- Publication number 20200027699
- Publication date Jan 23, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20190362938
- Publication date Nov 28, 2019
- Hitachi High-Technologies Corporation
- Chikako ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...
- Publication number 20190214227
- Publication date Jul 11, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM EXPOSURE METHOD, AND MULTI CHARGED PART...
- Publication number 20170301506
- Publication date Oct 19, 2017
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...
- Publication number 20170186584
- Publication date Jun 29, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY METHOD AND CHARGED PARTICLE BEAM...
- Publication number 20160365226
- Publication date Dec 15, 2016
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for E-Beam Lithography with Multi-Exposure
- Publication number 20140367588
- Publication date Dec 18, 2014
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Application
DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20140322927
- Publication date Oct 30, 2014
- Canon Kabushiki Kaisha
- Tomoyuki MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20140319367
- Publication date Oct 30, 2014
- Canon Kabushiki Kaisha
- Masato MURAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS PROVIDING ELECTRON BEAM WRITING TO A MEDIUM
- Publication number 20140217305
- Publication date Aug 7, 2014
- Wen-Chuan Wang
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM D...
- Publication number 20140138527
- Publication date May 22, 2014
- NuFlare Technology, Inc.
- Yasuo KATO
- B82 - NANO-TECHNOLOGY
Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20140106279
- Publication date Apr 17, 2014
- Canon Kabushiki Kaisha
- Tomoyuki MORITA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, DRAWING APPARATUS, AND METHOD OF M...
- Publication number 20140065547
- Publication date Mar 6, 2014
- Canon Kabushiki Kaisha
- Keiichi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for E-Beam Lithography with Multi-Exposure
- Publication number 20140038107
- Publication date Feb 6, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Fast 3D Mask Model Based on Implicit Countors
- Publication number 20140032199
- Publication date Jan 30, 2014
- Synopsys, Inc.
- Zhijie Deng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EFFICIENT SCAN FOR E-BEAM LITHOGRAPHY
- Publication number 20130320243
- Publication date Dec 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Hung Chen
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20130252145
- Publication date Sep 26, 2013
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN DATA SYSTEM FOR HIGH-PERFORMANCE MASKLESS ELECTRON BEAM LIT...
- Publication number 20130205267
- Publication date Aug 8, 2013
- KLA-Tencor Corporation
- Allen CARROLL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED-PARTICLE BEAM DRAWING METHOD, COMPUTER-READABLE RECORDING M...
- Publication number 20130177855
- Publication date Jul 11, 2013
- NuFlare Technology, Inc.
- Sumito NAKADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
SYSTEMS AND METHODS PROVIDING ELECTRON BEAM WRITING TO A MEDIUM
- Publication number 20130146780
- Publication date Jun 13, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Chuan Wang
- B82 - NANO-TECHNOLOGY
Information Patent Application
SCANNING APPARATUS, DRAWING APPARATUS, AND METHOD OF MANUFACTURING...
- Publication number 20130137044
- Publication date May 30, 2013
- Canon Kabushiki Kaisha
- Hirohito Ito
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS, DRAWING DATA GENERATION ME...
- Publication number 20130078577
- Publication date Mar 28, 2013
- Canon Kabushiki Kaisha
- Toru Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Application
DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20130068962
- Publication date Mar 21, 2013
- Canon Kabushiki Kaisha
- Takayuki Kawamoto
- B82 - NANO-TECHNOLOGY

Patterning strategy

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and system for determining a charged particle beam exposure...

Charged particle beam writing apparatus, charged particle beam writ...

Method and system for determining a charged particle beam exposure...

Charged particle beam drawing device and method of controlling char...

Adapting the duration of exposure slots in multi-beam writers

Method and system for determining a charged particle beam exposure...

Charged particle beam device

Method of fabricating an integrated circuit with a pattern density-...

Charged particle beam lithography apparatus and charged particle be...

Method and system for determining a charged particle beam exposure...

Deflection scan speed adjustment during charged particle exposure

Charged particle beam lithography apparatus and charged particle be...

Method of fabricating an integrated circuit with a pattern density-...

Charged particle lithography system

Exposure apparatus and exposure method

Method of fabricating an integrated circuit with a pattern density-...

Multi charged particle beam writing apparatus, and multi charged pa...

Multi charged particle beam writing apparatus and multi charged par...

Multi charged particle beam exposure method, and multi charged part...

Method for exposing a wafer

Selective processing of a workpiece using ion beam implantation and...

Dual pass scanning

Multiple charged particle beam lithography apparatus and multiple c...

Method of fabricating an integrated circuit with a pattern density-...

Compensation of dose inhomogeneity using overlapping exposure spots

Compensation of dose inhomogeneity using overlapping exposure spots

Method and system for E-beam lithography with multi-exposure

Multi charged particle beam writing apparatus utilizing multiple st...

Drawing apparatus, and method of manufacturing article

Drawing apparatus, and method of manufacturing article

Patents Applicationslast 30 patents

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...

METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...

Charged Particle Beam Device

METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...

MULTI CHARGED PARTICLE BEAM EXPOSURE METHOD, AND MULTI CHARGED PART...

METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...

CHARGED PARTICLE BEAM LITHOGRAPHY METHOD AND CHARGED PARTICLE BEAM...

Method and System for E-Beam Lithography with Multi-Exposure

DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

SYSTEMS AND METHODS PROVIDING ELECTRON BEAM WRITING TO A MEDIUM

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM D...

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

CHARGED PARTICLE BEAM APPARATUS, DRAWING APPARATUS, AND METHOD OF M...

Method and System for E-Beam Lithography with Multi-Exposure

Fast 3D Mask Model Based on Implicit Countors

EFFICIENT SCAN FOR E-BEAM LITHOGRAPHY

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

PATTERN DATA SYSTEM FOR HIGH-PERFORMANCE MASKLESS ELECTRON BEAM LIT...

CHARGED-PARTICLE BEAM DRAWING METHOD, COMPUTER-READABLE RECORDING M...

SYSTEMS AND METHODS PROVIDING ELECTRON BEAM WRITING TO A MEDIUM

SCANNING APPARATUS, DRAWING APPARATUS, AND METHOD OF MANUFACTURING...

CHARGED PARTICLE BEAM DRAWING APPARATUS, DRAWING DATA GENERATION ME...

DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD