Patterning strategy

Industry

CPC
H01J37/3026

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3026Patterning strategy

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Pattern data processing for programmable direct-write apparatus
- Patent number 12,040,157
- Issue date Jul 16, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing method, charged particle beam writing...
- Patent number 11,804,361
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Proximity effect correcting method, master plate manufacturing meth...
- Patent number 11,742,179
- Issue date Aug 29, 2023
- Kioxia Corporation
- Yoshinori Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FIB delayering endpoint detection by monitoring sputtered materials...
- Patent number 11,694,934
- Issue date Jul 4, 2023
- Applied Materials Israel Ltd.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam drawing device and method of controlling char...
- Patent number 11,694,875
- Issue date Jul 4, 2023
- Jeol Ltd.
- Masakazu Iwanaga
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Procedural electron beam lithography
- Patent number 11,664,194
- Issue date May 30, 2023
- Magic Leap, Inc.
- Victor Kai Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter irradiating ion mean onto wafer and ion implantation...
- Patent number 11,603,590
- Issue date Mar 14, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for irradiating a target using restricted placement grids
- Patent number 11,569,064
- Issue date Jan 31, 2023
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,476,086
- Issue date Oct 18, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus and multi-charged par...
- Patent number 11,270,865
- Issue date Mar 8, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Settling time determination method and multi charged particle beam...
- Patent number 11,244,807
- Issue date Feb 8, 2022
- NuFlare Technology, Inc.
- Tomoo Motosugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
End-point detection for similar adjacent materials
- Patent number 11,199,401
- Issue date Dec 14, 2021
- Applied Materials Israel Ltd.
- Yehuda Zur
- G01 - MEASURING TESTING
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,170,976
- Issue date Nov 9, 2021
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bias correction for lithography
- Patent number 11,126,085
- Issue date Sep 21, 2021
- D2S, Inc.
- Harold Robert Zable
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 11,127,566
- Issue date Sep 21, 2021
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adapting the duration of exposure slots in multi-beam writers
- Patent number 11,099,482
- Issue date Aug 24, 2021
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,062,878
- Issue date Jul 13, 2021
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged particle beam writing method and apparatus using b...
- Patent number 10,978,273
- Issue date Apr 13, 2021
- NuFlare Technology, Inc.
- Hideo Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,937,629
- Issue date Mar 2, 2021
- NuFlare Technology, Inc.
- Hironori Teguri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for controlling additive manufacturing machinery
- Patent number 10,871,766
- Issue date Dec 22, 2020
- Honeywell Federal Manufacturing & Technologies, LLC
- Christian Barr
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Method of pattern data preparation and method of forming pattern in...
- Patent number 10,861,673
- Issue date Dec 8, 2020
- United Microelectronics Corp.
- Chien-Ying Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and optical examination device
- Patent number 10,832,976
- Issue date Nov 10, 2020
- HITACHI HIGH-TECH CORPORATION
- Koichi Taniguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,747,115
- Issue date Aug 18, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 10,748,744
- Issue date Aug 18, 2020
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bias correction for lithography
- Patent number 10,725,383
- Issue date Jul 28, 2020
- D25, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Data processing method, charged particle beam writing apparatus, an...
- Patent number 10,714,312
- Issue date Jul 14, 2020
- NuFlare Technology, Inc.
- Kenichi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflection scan speed adjustment during charged particle exposure
- Patent number 10,692,696
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Drawing data generating method
- Patent number 10,685,435
- Issue date Jun 16, 2020
- NuFlare Technology, Inc.
- Shigehiro Hara
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
DRAWING DEVICE AND DRAWING METHOD
- Publication number 20240312761
- Publication date Sep 19, 2024
- KIOXIA Corporation
- Yoshinori KAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD
- Publication number 20240087845
- Publication date Mar 14, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND IMAGING METHOD
- Publication number 20230420215
- Publication date Dec 28, 2023
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COVERAGE CALCULATING METHOD, CHARGED PARTICLE BEAM WRITING METHOD,...
- Publication number 20230369015
- Publication date Nov 16, 2023
- NuFlare Technology, Inc.
- Kenichi YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...
- Publication number 20230290608
- Publication date Sep 14, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230124768
- Publication date Apr 20, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20230107036
- Publication date Apr 6, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIB DELAYERING ENDPOINT DETECTION BY MONITORING SPUTTERED MATERIALS...
- Publication number 20230104390
- Publication date Apr 6, 2023
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20230029715
- Publication date Feb 2, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...
- Publication number 20220384142
- Publication date Dec 1, 2022
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Data Processing For Programmable Direct-Write Apparatus
- Publication number 20220384143
- Publication date Dec 1, 2022
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROXIMITY EFFECT CORRECTING METHOD, MASTER PLATE MANUFACTURING METH...
- Publication number 20220238303
- Publication date Jul 28, 2022
- KIOXIA Corporation
- Yoshinori KAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Drawing Device and Method of Controlling Char...
- Publication number 20220051869
- Publication date Feb 17, 2022
- JEOL Ltd.
- Masakazu Iwanaga
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20210313143
- Publication date Oct 7, 2021
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCEDURAL ELECTRON BEAM LITHOGRAPHY
- Publication number 20210265132
- Publication date Aug 26, 2021
- Magic Leap, Inc.
- Victor Kai Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20210241995
- Publication date Aug 5, 2021
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SETTLING TIME DETERMINATION METHOD AND MULTI CHARGED PARTICLE BEAM...
- Publication number 20210193436
- Publication date Jun 24, 2021
- NuFlare Technology, Inc.
- Tomoo MOTOSUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20210040604
- Publication date Feb 11, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS
- Publication number 20210027986
- Publication date Jan 28, 2021
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20200373122
- Publication date Nov 26, 2020
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20200328060
- Publication date Oct 15, 2020
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Optical Examination Device
- Publication number 20200161194
- Publication date May 21, 2020
- Koichi Taniguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20200118791
- Publication date Apr 16, 2020
- NuFlare Technology, Inc.
- Hironori TEGURI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dummy Insertion for Improving Throughput of Electron Beam Lithography
- Publication number 20200098545
- Publication date Mar 26, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PATTERN DATA PREPARATION AND METHOD OF FORMING PATTERN IN...
- Publication number 20200083020
- Publication date Mar 12, 2020
- UNITED MICROELECTRONICS CORP.
- Chien-Ying Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OBTAINING DOSE CORRECTION AMOUNT, CHARGED PARTICLE BEAM W...
- Publication number 20200013584
- Publication date Jan 9, 2020
- NuFlare Technology, Inc.
- Satoru HIROSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR CONTROLLING ADDITIVE MANUFACTURING MACHINERY
- Publication number 20190286105
- Publication date Sep 19, 2019
- HONEYWELL FEDERAL MANUFACTURING & TECHNOLOGIES, LLC
- Christian Barr
- B22 - CASTING POWDER METALLURGY
Information Patent Application
Non-linear Dose- and Blur-Dependent Edge Placement Correction
- Publication number 20190214226
- Publication date Jul 11, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND MULTIPLE CHARGED...
- Publication number 20190198294
- Publication date Jun 27, 2019
- NuFlare Technology, Inc.
- Hideo INOUE
- H01 - BASIC ELECTRIC ELEMENTS

Patterning strategy

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Pattern data processing for programmable direct-write apparatus

Charged particle beam writing apparatus, charged particle beam writ...

Charged particle beam writing method, charged particle beam writing...

Method and system for determining a charged particle beam exposure...

Proximity effect correcting method, master plate manufacturing meth...

FIB delayering endpoint detection by monitoring sputtered materials...

Charged particle beam drawing device and method of controlling char...

Procedural electron beam lithography

Ion implanter irradiating ion mean onto wafer and ion implantation...

Method for irradiating a target using restricted placement grids

Multi-beam writing method and multi-beam writing apparatus

Multi-charged particle beam writing apparatus and multi-charged par...

Settling time determination method and multi charged particle beam...

End-point detection for similar adjacent materials

Multi-beam writing method and multi-beam writing apparatus

Bias correction for lithography

Multi charged particle beam writing apparatus and multi charged par...

Adapting the duration of exposure slots in multi-beam writers

Method and system for determining a charged particle beam exposure...

Multiple charged particle beam writing method and apparatus using b...

Multi charged particle beam writing apparatus and multi charged par...

Device for controlling additive manufacturing machinery

Method of pattern data preparation and method of forming pattern in...

Charged particle beam device and optical examination device

Cross scan proximity correction with ebeam universal cutter

Method and system for determining a charged particle beam exposure...

Bias correction for lithography

Data processing method, charged particle beam writing apparatus, an...

Deflection scan speed adjustment during charged particle exposure

Drawing data generating method

Patents Applicationslast 30 patents

DRAWING DEVICE AND DRAWING METHOD

ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD

CHARGED PARTICLE BEAM DEVICE AND IMAGING METHOD

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

COVERAGE CALCULATING METHOD, CHARGED PARTICLE BEAM WRITING METHOD,...

CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

FIB DELAYERING ENDPOINT DETECTION BY MONITORING SPUTTERED MATERIALS...

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...

Pattern Data Processing For Programmable Direct-Write Apparatus

PROXIMITY EFFECT CORRECTING METHOD, MASTER PLATE MANUFACTURING METH...

Charged Particle Beam Drawing Device and Method of Controlling Char...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

PROCEDURAL ELECTRON BEAM LITHOGRAPHY

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...

SETTLING TIME DETERMINATION METHOD AND MULTI CHARGED PARTICLE BEAM...

ION IMPLANTER AND ION IMPLANTATION METHOD

MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

Charged Particle Beam Device and Optical Examination Device

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

Dummy Insertion for Improving Throughput of Electron Beam Lithography

METHOD OF PATTERN DATA PREPARATION AND METHOD OF FORMING PATTERN IN...

METHOD OF OBTAINING DOSE CORRECTION AMOUNT, CHARGED PARTICLE BEAM W...

DEVICE FOR CONTROLLING ADDITIVE MANUFACTURING MACHINERY

Non-linear Dose- and Blur-Dependent Edge Placement Correction

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND MULTIPLE CHARGED...