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CPC
C23C16/4558

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CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

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C23C16/4558Perforated rings

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Patents Grantslast 30 patents

Information Patent Grant
Processing apparatus and processing method
- Patent number 12,173,405
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Hiroki Iriuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, reaction container, method of manuf...
- Patent number 12,163,226
- Issue date Dec 10, 2024
- Kokusai Electric Corporation
- Kazuki Nonomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for manufacturing semiconductor film
- Patent number 12,146,220
- Issue date Nov 19, 2024
- PIOTECH INC.
- Huaqiang Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Showerhead faceplates with angled gas distribution passages for sem...
- Patent number 12,139,791
- Issue date Nov 12, 2024
- Lam Research Corporation
- Pratik Mankidy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing system and method of delivering a reactant gas
- Patent number 12,139,790
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 12,116,666
- Issue date Oct 15, 2024
- Kokusai Electric Corporation
- Daigi Kamimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 12,068,208
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber architecture for epitaxial deposition and advanced epitaxia...
- Patent number 12,060,651
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system and reactor system including same
- Patent number 12,024,775
- Issue date Jul 2, 2024
- ASM IP Holding B.V.
- Sonti Sreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of using high density plasma chemical vapor deposition chamber
- Patent number 12,020,905
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Ching Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injector for epitaxy and CVD chamber
- Patent number 12,018,372
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactor system including a gas distribution assembly for use with a...
- Patent number 12,006,572
- Issue date Jun 11, 2024
- ASM IP Holding B.V.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Asymmetric injection for better wafer uniformity
- Patent number 11,959,169
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition apparatus
- Patent number 11,926,896
- Issue date Mar 12, 2024
- Beneq Oy
- Johannes Wesslin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for manufacturing semiconductor
- Patent number 11,929,263
- Issue date Mar 12, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yu-Hsiang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,913,115
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Yoshitaka Miura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,804,366
- Issue date Oct 31, 2023
- Tokyo Electron Limited
- Yuki Hosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid vaporizer
- Patent number 11,788,190
- Issue date Oct 17, 2023
- ASM IP Holding B.V.
- Jereld Lee Winkler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ALD apparatus, method and valve
- Patent number 11,761,082
- Issue date Sep 19, 2023
- Picosun Oy
- Marko Pudas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for controlling concentration of precursors t...
- Patent number 11,753,715
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Kenric Choi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Gas hub for plasma reactor
- Patent number 11,728,141
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for conducting plasma surface treatment, board treatment...
- Patent number 11,728,142
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Junyoung Oh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated cluster tool for selective area deposition
- Patent number 11,725,274
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Tobin Kaufman-Osborn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Suppression of parasitic deposition in a substrate processing syste...
- Patent number 11,725,282
- Issue date Aug 15, 2023
- Novellus Systems, Inc.
- Chunguang Xia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system and reactor system including same
- Patent number 11,718,913
- Issue date Aug 8, 2023
- ASM IP Holding B.V.
- Sonti Sreeram
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for improving chemical utilization rate in de...
- Patent number 11,713,508
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Kevin Griffin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus
- Patent number 11,680,316
- Issue date Jun 20, 2023
- Industrial Technology Research Institute
- Kuan-Chou Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote plasma oxidation chamber
- Patent number 11,615,944
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Christopher S. Olsen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition apparatus with cleaning gas flow guiding...
- Patent number 11,532,459
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Hung Yeh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum systems in semiconductor fabrication facilities
- Patent number 11,525,185
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Fa Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SHOWERHEAD ASSEMBLY AND SHOWERHEAD PLATE
- Publication number 20240425987
- Publication date Dec 26, 2024
- ASM IP HOLDING B.V.
- Qi Qi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD SYSTEM AND APPARATUS FOR REMOTE SOLID REFILL
- Publication number 20240401194
- Publication date Dec 5, 2024
- ASM IP HOLDING B.V.
- Shuaidi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITING APPARATUS AND ATOMIC LAYER DEPOSITING METHO...
- Publication number 20240352581
- Publication date Oct 24, 2024
- NEXUSBE CO., LTD
- Hag Young CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INJECTOR FOR EPITAXY AND CVD CHAMBER
- Publication number 20240337020
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Tetsuya ISHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PROCESS VESSEL, METHOD OF PROCESSIN...
- Publication number 20240337021
- Publication date Oct 10, 2024
- KOKUSAI ELECTRONIC CORPORATION
- Yusaku OKAJIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR...
- Publication number 20240327980
- Publication date Oct 3, 2024
- Suzhou Everbright Photonics Co., Ltd.
- Yang CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS CHAMBER VOLUME ADJUSTMENT
- Publication number 20240218514
- Publication date Jul 4, 2024
- ASM IP HOLDING B.V.
- Christopher Falcone
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNABLE HARDWARE TO CONTROL RADIAL FLOW DISTRIBUTION IN A PROCESSIN...
- Publication number 20240209506
- Publication date Jun 27, 2024
- Applied Materials, Inc.
- Sanjeev Baluja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER ARCHITECTURE FOR EPITAXIAL DEPOSITION AND ADVANCED EPITAXIA...
- Publication number 20240209544
- Publication date Jun 27, 2024
- Applied Materials, Inc.
- Tetsuya ISHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD
- Publication number 20240087916
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION APPARATUSES FOR IMPROVING MIXING UNIFORMITY
- Publication number 20240068095
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Youngki Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRECURSOR SUPPLY SYSTEM
- Publication number 20240035159
- Publication date Feb 1, 2024
- Samsung Electronics Co., Ltd.
- Kyungrim KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIQUID VAPORIZER
- Publication number 20240026538
- Publication date Jan 25, 2024
- ASM IP HOLDING B.V.
- Jereld Lee Winkler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION APPARATUS
- Publication number 20240018652
- Publication date Jan 18, 2024
- BENEQ OY
- Johannes WESSLIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING IMPROVED EXHAUST STRUCTURE
- Publication number 20230407477
- Publication date Dec 21, 2023
- ASM IP Holding B.V.
- Wei Chen Liao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALD APPARATUS, METHOD AND VALVE
- Publication number 20230383404
- Publication date Nov 30, 2023
- Picosun Oy
- Marko PUDAS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR CONDUCTING PLASMA SURFACE TREATMENT, BOARD TREATMENT...
- Publication number 20230343560
- Publication date Oct 26, 2023
- New Power Plasma Co., Ltd.
- Junyoung Oh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INLET ELEMENT OF A CVD REACTOR WITH TWO INFEED POINTS
- Publication number 20230323537
- Publication date Oct 12, 2023
- AIXTRON SE
- Adam BOYD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION SYSTEM AND REACTOR SYSTEM INCLUDING SAME
- Publication number 20230313377
- Publication date Oct 5, 2023
- ASM IP HOLDING B.V.
- Sonti Sreeram
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MPCVD DEVICE CAPABLE OF REALIZING EFFECTIVE DOPING
- Publication number 20230279549
- Publication date Sep 7, 2023
- Nanjing University
- Shulin Gu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20230272523
- Publication date Aug 31, 2023
- TOKYO ELECTRON LIMITED
- Yuichi FURUYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AUTOMATED SHOWERHEAD TILT ADJUSTMENT
- Publication number 20230272533
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Sam Jafarian Tehrani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR MANUFACTURING A SEMICONDUCTOR WAFER USING A PREHEAT RIN...
- Publication number 20230243065
- Publication date Aug 3, 2023
- GLOBALWAFERS CO., LTD.
- Chieh Hu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL VAPOR INFILTRATION APPARATUS AND ASSEMBLY FOR GAS INFLOW I...
- Publication number 20230235456
- Publication date Jul 27, 2023
- Zimmer, Inc.
- Akshay Vinayak Dhamankar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230203651
- Publication date Jun 29, 2023
- TOKYO ELECTRON LIMITED
- Kiyoshi MORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS AND THE METHOD THEREOF
- Publication number 20230203654
- Publication date Jun 29, 2023
- ASM IP HOLDING, B.V.
- Paridhi Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING GAS SU...
- Publication number 20230203656
- Publication date Jun 29, 2023
- ASM IP HOLDING B.V.
- Jun Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD DESIGNS FOR CONTROLLING DEPOSITION ON WAFER BEVEL/EDGE
- Publication number 20230167552
- Publication date Jun 1, 2023
- LAM RESEARCH CORPORATION
- Michael J. JANICKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GACHEMICAL VAPOR DEPOSITION APPARATUS WITH CLEANING GAS FLOW GUIDIN...
- Publication number 20230098570
- Publication date Mar 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hung YEH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEPOSITION METHOD AND SEMICONDUCTOR DEPOSITION SYSTEM
- Publication number 20230054190
- Publication date Feb 23, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Lifeng QIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Perforated rings

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Processing apparatus and processing method

Substrate processing apparatus, reaction container, method of manuf...

Apparatus and method for manufacturing semiconductor film

Showerhead faceplates with angled gas distribution passages for sem...

Processing system and method of delivering a reactant gas

Substrate processing apparatus and method of manufacturing semicond...

Plasma processing apparatus and control method

Chamber architecture for epitaxial deposition and advanced epitaxia...

Gas distribution system and reactor system including same

Method of using high density plasma chemical vapor deposition chamber

Gas injector for epitaxy and CVD chamber

Reactor system including a gas distribution assembly for use with a...

Asymmetric injection for better wafer uniformity

Atomic layer deposition apparatus

Method and system for manufacturing semiconductor

Substrate processing apparatus and substrate processing method

Plasma processing apparatus

Liquid vaporizer

ALD apparatus, method and valve

Apparatus and methods for controlling concentration of precursors t...

Gas hub for plasma reactor

Apparatus for conducting plasma surface treatment, board treatment...

Integrated cluster tool for selective area deposition

Suppression of parasitic deposition in a substrate processing syste...

Gas distribution system and reactor system including same

Apparatus and methods for improving chemical utilization rate in de...

Deposition apparatus

Remote plasma oxidation chamber

Chemical vapor deposition apparatus with cleaning gas flow guiding...

Vacuum systems in semiconductor fabrication facilities

Patents Applicationslast 30 patents

SHOWERHEAD ASSEMBLY AND SHOWERHEAD PLATE

METHOD SYSTEM AND APPARATUS FOR REMOTE SOLID REFILL

ATOMIC LAYER DEPOSITING APPARATUS AND ATOMIC LAYER DEPOSITING METHO...

GAS INJECTOR FOR EPITAXY AND CVD CHAMBER

SUBSTRATE PROCESSING APPARATUS, PROCESS VESSEL, METHOD OF PROCESSIN...

METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR...

PROCESS CHAMBER VOLUME ADJUSTMENT

TUNABLE HARDWARE TO CONTROL RADIAL FLOW DISTRIBUTION IN A PROCESSIN...

CHAMBER ARCHITECTURE FOR EPITAXIAL DEPOSITION AND ADVANCED EPITAXIA...

VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD

GAS DISTRIBUTION APPARATUSES FOR IMPROVING MIXING UNIFORMITY

PRECURSOR SUPPLY SYSTEM

LIQUID VAPORIZER

ATOMIC LAYER DEPOSITION APPARATUS

SUBSTRATE PROCESSING APPARATUS INCLUDING IMPROVED EXHAUST STRUCTURE

ALD APPARATUS, METHOD AND VALVE

APPARATUS FOR CONDUCTING PLASMA SURFACE TREATMENT, BOARD TREATMENT...

GAS INLET ELEMENT OF A CVD REACTOR WITH TWO INFEED POINTS

GAS DISTRIBUTION SYSTEM AND REACTOR SYSTEM INCLUDING SAME

MPCVD DEVICE CAPABLE OF REALIZING EFFECTIVE DOPING

DEPOSITION METHOD AND DEPOSITION APPARATUS

AUTOMATED SHOWERHEAD TILT ADJUSTMENT

METHODS FOR MANUFACTURING A SEMICONDUCTOR WAFER USING A PREHEAT RIN...

CHEMICAL VAPOR INFILTRATION APPARATUS AND ASSEMBLY FOR GAS INFLOW I...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS AND THE METHOD THEREOF

GAS SUPPLY UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING GAS SU...

SHOWERHEAD DESIGNS FOR CONTROLLING DEPOSITION ON WAFER BEVEL/EDGE

GACHEMICAL VAPOR DEPOSITION APPARATUS WITH CLEANING GAS FLOW GUIDIN...

SEMICONDUCTOR DEPOSITION METHOD AND SEMICONDUCTOR DEPOSITION SYSTEM