Photolithographic processes

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H01L21/0274

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0274Photolithographic processes

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Selective patterning with wet-dry bilayer resist
- Patent number 12,249,508
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,249,507
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing indolocarbazo...
- Patent number 12,242,196
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of using wafer stage
- Patent number 12,242,199
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor developer tool and methods of operation
- Patent number 12,235,582
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device with damascene structure
- Patent number 12,230,535
- Issue date Feb 18, 2025
- NANYA TECHNOLOGY CORPORATION
- Wei-Chen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film-forming composition
- Patent number 12,227,621
- Issue date Feb 18, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photolithography alignment process for bonded wafers
- Patent number 12,230,585
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yeong-Jyh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage device
- Patent number 12,224,213
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-Hsin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film forming composition having a disulfide struc...
- Patent number 12,222,651
- Issue date Feb 11, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and pattern formatio...
- Patent number 12,222,643
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hard-mask forming composition, method for manufacturing electronic...
- Patent number 12,221,556
- Issue date Feb 11, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,216,399
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming organic film, method for forming organic film,...
- Patent number 12,215,221
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 12,210,286
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern forming method and semiconductor chip manufacturing...
- Patent number 12,210,287
- Issue date Jan 28, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photoresist with low-activation-energy ligands or high-develope...
- Patent number 12,210,283
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical proximity correction method and method of fabricating a sem...
- Patent number 12,210,290
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Pilsoo Kang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Chip package and method of forming the same
- Patent number 12,211,801
- Issue date Jan 28, 2025
- Parabellum Strategic Opportunities Fund LLC
- Yu-Hsiang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry development of resists
- Patent number 12,211,691
- Issue date Jan 28, 2025
- Lam Research Corporation
- Boris Volosskiy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning material including silicon-containing layer and method f...
- Patent number 12,205,824
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Szu-Ping Tung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method for reducing roughness of patterned resist...
- Patent number 12,198,931
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist and method
- Patent number 12,197,128
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,198,930
- Issue date Jan 14, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Libin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual channel gate all around transistor device and fabrication meth...
- Patent number 12,198,986
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Sheng Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a wiring and method of manufacturing a semiconduc...
- Patent number 12,193,210
- Issue date Jan 7, 2025
- Samsung Electronics Co., Ltd.
- Hyunchul Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure, semiconductor str...
- Patent number 12,191,154
- Issue date Jan 7, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Junbo Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Droplet recipe creation method, pattern formation method, and manuf...
- Patent number 12,189,285
- Issue date Jan 7, 2025
- Kioxia Corporation
- Ryo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition having diol structure
- Patent number 12,189,294
- Issue date Jan 7, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi Kamibayashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PACKAGES WITH LOW-PROFILE POLYIMIDE LAYERS
- Publication number 20250096156
- Publication date Mar 20, 2025
- TEXAS INSTRUMENTS INCORPORATED
- Katleen Fajardo TIMBOL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250098161
- Publication date Mar 20, 2025
- SK HYNIX INC.
- Yun Cheol HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE MASK, SEMICONDUCTOR DEVICE USING THE EXPOSURE MASK, AND ME...
- Publication number 20250085637
- Publication date Mar 13, 2025
- SK HYNIX INC.
- Jong Hoon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPABLE RESIST OVERLAYER COMPOSITION AS WELL AS METHOD FOR MANU...
- Publication number 20250085635
- Publication date Mar 13, 2025
- Merck Patent GmbH
- Hiroshi Yanagita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Methods for Extreme Ultraviolet (EUV) Resist Patterning Development
- Publication number 20250076771
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SPACER BASED SELF-ALIGNED HIGH ORDER PATTERNING
- Publication number 20250068064
- Publication date Feb 27, 2025
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENTS FOR THIN FILMS USED IN PHOTOLITHOGRAPHY
- Publication number 20250062123
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- SHASHANK SHARMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS
- Publication number 20250060673
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Chenghao Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...
- Publication number 20250062126
- Publication date Feb 20, 2025
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEFORMATION CONTROL OF MANUFACTURING DEVICES USING FRONT-SIDE IRRAD...
- Publication number 20250054757
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Pradeep Kumar Subrahmanyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING AN ALIGNMENT MARK AND METHODS OF FOR...
- Publication number 20250054873
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sung-Hsin YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20250051604
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Sunghwan KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CONFORMAL DEPOSITION OF SILICON NITRIDE
- Publication number 20250054747
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250044708
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...
- Publication number 20250044697
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20250046608
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Jin Wook Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND SILICON-CONTAINING...
- Publication number 20250044701
- Publication date Feb 6, 2025
- JSR Corporation
- Kazunori SAKAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20250036027
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Kosuke IGATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...
- Publication number 20250036023
- Publication date Jan 30, 2025
- The Research Foundation for the State University of New York
- Munsaf Ali
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH DAMASCENE STRUCTUR...
- Publication number 20250029871
- Publication date Jan 23, 2025
- NANYA TECHNOLOGY CORPORATION
- WEI-CHEN PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PACKAGE AND METHOD FOR FABRICATING THE SAME
- Publication number 20250029913
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Jaesic LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND COMPOSITIONS FOR TRENCH FORMATION USING ADVANCED TRACK-...
- Publication number 20250029837
- Publication date Jan 23, 2025
- TOKYO ELECTRON LIMITED
- David Conklin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...
- Publication number 20250028242
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Tzu Shun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ADJUSTING LINEWIDTH DUE TO PATTERN LOAD EFFECT IN SADP M...
- Publication number 20250022717
- Publication date Jan 16, 2025
- Shanghai Huali Integrated Circuit Corporation
- Liyuan Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20250022716
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Eun Jung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPLAY DEVICE
- Publication number 20250014530
- Publication date Jan 9, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Application
POLYCYCLIC AROMATIC HYDROCARBON PHOTOCURABLE RESIN COMPOSITION
- Publication number 20250011507
- Publication date Jan 9, 2025
- NISSAN CHEMICAL CORPORATION
- Takahiro KISHIOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MA...
- Publication number 20250014901
- Publication date Jan 9, 2025
- NISSAN CHEMICAL CORPORATION
- Hayato HATTORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR STRUCTURE AND FABRICATING METHOD THEREOF
- Publication number 20250015010
- Publication date Jan 9, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Wang Kuo LIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Forming Method
- Publication number 20250004378
- Publication date Jan 2, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS

Photolithographic processes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Selective patterning with wet-dry bilayer resist

Method of manufacturing a semiconductor device

Resist underlayer film-forming composition containing indolocarbazo...

Method of using wafer stage

Semiconductor developer tool and methods of operation

Method for fabricating semiconductor device with damascene structure

Solution, solution storage body, actinic ray-sensitive or radiation...

Film-forming composition

Photolithography alignment process for bonded wafers

High voltage device

Resist underlayer film forming composition having a disulfide struc...

Method of manufacturing a semiconductor device and pattern formatio...

Hard-mask forming composition, method for manufacturing electronic...

Method of manufacturing semiconductor device

Material for forming organic film, method for forming organic film,...

Metal-compound-removing solvent and method in lithography

Resist pattern forming method and semiconductor chip manufacturing...

EUV photoresist with low-activation-energy ligands or high-develope...

Optical proximity correction method and method of fabricating a sem...

Chip package and method of forming the same

Dry development of resists

Patterning material including silicon-containing layer and method f...

Ion implantation method for reducing roughness of patterned resist...

Photoresist and method

Method for manufacturing semiconductor device

Dual channel gate all around transistor device and fabrication meth...

Method of forming a wiring and method of manufacturing a semiconduc...

Method for manufacturing semiconductor structure, semiconductor str...

Droplet recipe creation method, pattern formation method, and manuf...

Resist underlayer film-forming composition having diol structure

Patents Applicationslast 30 patents

PACKAGES WITH LOW-PROFILE POLYIMIDE LAYERS

MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME

EXPOSURE MASK, SEMICONDUCTOR DEVICE USING THE EXPOSURE MASK, AND ME...

DEVELOPABLE RESIST OVERLAYER COMPOSITION AS WELL AS METHOD FOR MANU...

Methods for Extreme Ultraviolet (EUV) Resist Patterning Development

ANTI-SPACER BASED SELF-ALIGNED HIGH ORDER PATTERNING

TREATMENTS FOR THIN FILMS USED IN PHOTOLITHOGRAPHY

DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS

SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...

DEFORMATION CONTROL OF MANUFACTURING DEVICES USING FRONT-SIDE IRRAD...

SEMICONDUCTOR DEVICE INCLUDING AN ALIGNMENT MARK AND METHODS OF FOR...

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

CONFORMAL DEPOSITION OF SILICON NITRIDE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND SILICON-CONTAINING...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH DAMASCENE STRUCTUR...

SEMICONDUCTOR PACKAGE AND METHOD FOR FABRICATING THE SAME

METHODS AND COMPOSITIONS FOR TRENCH FORMATION USING ADVANCED TRACK-...

INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...

METHOD FOR ADJUSTING LINEWIDTH DUE TO PATTERN LOAD EFFECT IN SADP M...

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

DISPLAY DEVICE

POLYCYCLIC AROMATIC HYDROCARBON PHOTOCURABLE RESIN COMPOSITION

WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MA...

SEMICONDUCTOR STRUCTURE AND FABRICATING METHOD THEREOF

Pattern Forming Method