Plasma immersion ion implantation

Industry

CPC
H01J37/32412

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32412Plasma immersion ion implantation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Cover ring to mitigate carbon contamination in plasma doping chamber
- Patent number 12,165,852
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydraulic feed system for an ion source
- Patent number 12,154,763
- Issue date Nov 26, 2024
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of plasma sheath with bias supplies
- Patent number 12,142,460
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure
- Patent number 11,908,700
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Nai-Han Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,842,884
- Issue date Dec 12, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for reducing vacuum loss in an ion implantatio...
- Patent number 11,764,042
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydraulic feed system for an ion source
- Patent number 11,728,140
- Issue date Aug 15, 2023
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power wafer cooling
- Patent number 11,670,483
- Issue date Jun 6, 2023
- Axcelis Technologies, Inc.
- Joseph Ferrara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma immersion methods for ion implantation
- Patent number 11,621,148
- Issue date Apr 4, 2023
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and techniques
- Patent number 11,615,945
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Vikram M. Bhosle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implanter toxic gas delivery system
- Patent number 11,527,380
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ying-Chieh Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure
- Patent number 11,482,422
- Issue date Oct 25, 2022
- Nai-Han Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,437,221
- Issue date Sep 6, 2022
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for reducing vacuum loss in an ion implantatio...
- Patent number 11,289,311
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,282,677
- Issue date Mar 22, 2022
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion angle detector
- Patent number 11,264,212
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Foam in ion implantation system
- Patent number 11,222,768
- Issue date Jan 11, 2022
- Varian Semiconductor Equipment Associates, Inc.
- James Alan Pixley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and techniques
- Patent number 11,120,973
- Issue date Sep 14, 2021
- Applied Materials, Inc.
- Vikram M. Bhosle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon implantation in substrates and provision of silicon precurs...
- Patent number 11,062,906
- Issue date Jul 13, 2021
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device, system, and method for controlling the focus of a laser to...
- Patent number 11,035,925
- Issue date Jun 15, 2021
- United States of America as represented by the Secretary of the Navy
- Bienvenido Melvin L. Pascoguin
- G01 - MEASURING TESTING
Information Patent Grant
Ion source and cleaning method thereof
- Patent number 10,971,339
- Issue date Apr 6, 2021
- NISSIN ION EQUIPMENT CO., LTD.
- Masakazu Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extension of PVD chamber with multiple reaction gases, high bias po...
- Patent number 10,927,449
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Jingjing Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenated isotopically enriched boront trifluoride dopant source...
- Patent number 10,920,087
- Issue date Feb 16, 2021
- Entegris, Inc.
- Steven Bishop
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of controlling an implanter operating in plasma immersion
- Patent number 10,923,325
- Issue date Feb 16, 2021
- Ion Beam Services
- Frank Gilbert Torregrosa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radiant heating presoak
- Patent number 10,861,731
- Issue date Dec 8, 2020
- Axcelis Technologies, Inc.
- John F. Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for plasma deposition and treatment
- Patent number 10,861,669
- Issue date Dec 8, 2020
- Peter F. Vandermeulen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Directional treatment for multi-dimensional device processing
- Patent number 10,825,665
- Issue date Nov 3, 2020
- Applied Materials, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method thereof
- Patent number 10,763,117
- Issue date Sep 1, 2020
- Taiwan Semiconductor Manufacturing Company Ltd.
- Nai-Han Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for a tunable electromagnetic field apparatus t...
- Patent number 10,734,231
- Issue date Aug 4, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-An Lai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...
- Publication number 20240371608
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Ryan Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILAMENT ALIGNMENT DEVICE
- Publication number 20240153740
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Sangwoo Seon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPROCESS SUBSTRATE TREATMENT FOR ENHANCED SUBSTRATE DOPING
- Publication number 20240153774
- Publication date May 9, 2024
- Applied Materials, Inc.
- Christopher R. Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM
- Publication number 20240145217
- Publication date May 2, 2024
- Applied Materials, Inc.
- Qintao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE AND OPERATING METHOD THEREOF
- Publication number 20240038499
- Publication date Feb 1, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuta IWANAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CO-DOPING TO CONTROL WET ETCH RATE OF FCVD OXIDE LAYERS
- Publication number 20240006158
- Publication date Jan 4, 2024
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20230395354
- Publication date Dec 7, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDRAULIC FEED SYSTEM FOR AN ION SOURCE
- Publication number 20230343558
- Publication date Oct 26, 2023
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COVER RING TO MITIGATE CARBON CONTAMINATION IN PLASMA DOPING CHAMBER
- Publication number 20230282451
- Publication date Sep 7, 2023
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDRAULIC FEED SYSTEM FOR AN ION SOURCE
- Publication number 20230245859
- Publication date Aug 3, 2023
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHIELDED GAS INLET FOR AN ION SOURCE
- Publication number 20230135525
- Publication date May 4, 2023
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT LOW ANGLE ION BEAM EXTRACTION ASSEMBLY AND PROCESSING APPAR...
- Publication number 20230124509
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20230116058
- Publication date Apr 13, 2023
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20220367197
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- NAI-HAN CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ION PROCESSING OF SUBSTRATES
- Publication number 20220359163
- Publication date Nov 10, 2022
- Lifehouse Australia as Trustee for The Lifehouse Australia Trust
- David R. MCKENZIE
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20220285131
- Publication date Sep 8, 2022
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURI...
- Publication number 20220285170
- Publication date Sep 8, 2022
- KIOXIA Corporation
- Junichi HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PERMANENTLY PHASE-TRANSITING SEMIMETAL USING ION IMPLANTA...
- Publication number 20220223365
- Publication date Jul 14, 2022
- University-Industry Cooperation Group of Kyung Hee University
- Suk Ho CHOI
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
METHOD AND APPARATUS FOR REDUCING VACUUM LOSS IN AN ION IMPLANTATIO...
- Publication number 20220216040
- Publication date Jul 7, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Tsung-Min LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATING STRUCTURE, METHOD FOR MANUFACTURING INSULATING STRUCTURE...
- Publication number 20220154328
- Publication date May 19, 2022
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yuuji Ishida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION IMPLANTER, ION IMPLANTATION METHOD, AND SEMICONDUCTOR DEVICE MA...
- Publication number 20220130636
- Publication date Apr 28, 2022
- Sumitomo Heavy Industries, Ltd.
- Sayumi Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND TECHNIQUES
- Publication number 20210375590
- Publication date Dec 2, 2021
- Applied Materials, Inc.
- Vikram M. Bhosle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20210241996
- Publication date Aug 5, 2021
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IMMERSION METHODS FOR ION IMPLANTATION
- Publication number 20210090860
- Publication date Mar 25, 2021
- Entegris, Inc.
- Ying TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20210005428
- Publication date Jan 7, 2021
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING ON OPTICAL SURFACES AND METHODS OF...
- Publication number 20200408959
- Publication date Dec 31, 2020
- Trion Technology
- Addison Randolph Crockett
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20200402806
- Publication date Dec 24, 2020
- Taiwan Semiconductor Manufacturing company Ltd.
- NAI-HAN CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND TECHNIQUES
- Publication number 20200357611
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Vikram M. Bhosle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION SOURCE AND CLEANING METHOD THEREOF
- Publication number 20200279720
- Publication date Sep 3, 2020
- NISSIN ION EQUIPMENT CO., LTD.
- Masakazu ADACHI
- H01 - BASIC ELECTRIC ELEMENTS

Plasma immersion ion implantation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Cover ring to mitigate carbon contamination in plasma doping chamber

Spatial control of plasma processing environments

Hydraulic feed system for an ion source

Control of plasma sheath with bias supplies

Method for manufacturing semiconductor structure

Spatial monitoring and control of plasma processing environments

Method and apparatus for reducing vacuum loss in an ion implantatio...

Hydraulic feed system for an ion source

High power wafer cooling

Plasma immersion methods for ion implantation

Plasma processing apparatus and techniques

Ion implanter toxic gas delivery system

Method for manufacturing semiconductor structure

Spatial monitoring and control of plasma processing environments

Method and apparatus for reducing vacuum loss in an ion implantatio...

Spatial monitoring and control of plasma processing environments

Ion angle detector

Foam in ion implantation system

Plasma processing apparatus and techniques

Silicon implantation in substrates and provision of silicon precurs...

Device, system, and method for controlling the focus of a laser to...

Ion source and cleaning method thereof

Extension of PVD chamber with multiple reaction gases, high bias po...

Hydrogenated isotopically enriched boront trifluoride dopant source...

Method of controlling an implanter operating in plasma immersion

Radiant heating presoak

Methods and systems for plasma deposition and treatment

Directional treatment for multi-dimensional device processing

Semiconductor manufacturing apparatus and method thereof

Systems and methods for a tunable electromagnetic field apparatus t...

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...

FILAMENT ALIGNMENT DEVICE

MULTIPROCESS SUBSTRATE TREATMENT FOR ENHANCED SUBSTRATE DOPING

METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

ION SOURCE AND OPERATING METHOD THEREOF

CO-DOPING TO CONTROL WET ETCH RATE OF FCVD OXIDE LAYERS

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

HYDRAULIC FEED SYSTEM FOR AN ION SOURCE

COVER RING TO MITIGATE CARBON CONTAMINATION IN PLASMA DOPING CHAMBER

HYDRAULIC FEED SYSTEM FOR AN ION SOURCE

SHIELDED GAS INLET FOR AN ION SOURCE

COMPACT LOW ANGLE ION BEAM EXTRACTION ASSEMBLY AND PROCESSING APPAR...

SPATIAL CONTROL OF PLASMA PROCESSING ENVIRONMENTS

METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

PLASMA ION PROCESSING OF SUBSTRATES

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURI...

METHOD OF PERMANENTLY PHASE-TRANSITING SEMIMETAL USING ION IMPLANTA...

METHOD AND APPARATUS FOR REDUCING VACUUM LOSS IN AN ION IMPLANTATIO...

INSULATING STRUCTURE, METHOD FOR MANUFACTURING INSULATING STRUCTURE...

ION IMPLANTER, ION IMPLANTATION METHOD, AND SEMICONDUCTOR DEVICE MA...

PLASMA PROCESSING APPARATUS AND TECHNIQUES

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

PLASMA IMMERSION METHODS FOR ION IMPLANTATION

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

APPARATUS FOR PLASMA PROCESSING ON OPTICAL SURFACES AND METHODS OF...

METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

PLASMA PROCESSING APPARATUS AND TECHNIQUES

ION SOURCE AND CLEANING METHOD THEREOF