Plasma source implantation

Industry

CPC
H01J2237/3365

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3365Plasma source implantation

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Extreme edge uniformity control
- Patent number 11,574,800
- Issue date Feb 7, 2023
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine ion implantation system with non-tungsten materials and me...
- Patent number 11,538,687
- Issue date Dec 27, 2022
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine ion implantation method and system
- Patent number 11,315,791
- Issue date Apr 26, 2022
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion angle detector
- Patent number 11,264,212
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extraction apparatus and system for high throughput ion beam proces...
- Patent number 11,127,556
- Issue date Sep 21, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme edge uniformity control
- Patent number 10,665,433
- Issue date May 26, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implant system having grid assembly
- Patent number 10,636,935
- Issue date Apr 28, 2020
- Intevac, Inc.
- Babak Adibi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma doping using a solid dopant source
- Patent number 10,460,941
- Issue date Oct 29, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Siamak Salimian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator and method of controlling ion generator
- Patent number 10,283,326
- Issue date May 7, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Kawaguchi
- B08 - CLEANING
Information Patent Grant
Plasma generation for ion implanter
- Patent number 10,163,609
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF ion source with dynamic volume control
- Patent number 10,134,568
- Issue date Nov 20, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron-containing dopant compositions, systems and methods of use th...
- Patent number 10,090,133
- Issue date Oct 2, 2018
- Praxair Technology, Inc.
- Ashwini K Sinha
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
RF ion source with dynamic volume control
- Patent number 9,899,193
- Issue date Feb 20, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step ion implantation
- Patent number 9,828,668
- Issue date Nov 28, 2017
- Apple Inc.
- Dale N. Memering
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF detector with double balanced linear mixer and corresponding met...
- Patent number 9,805,919
- Issue date Oct 31, 2017
- Lam Research Corporation
- Ernest Beauel Hanks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for implementing low dose implant in a plasma system
- Patent number 9,783,884
- Issue date Oct 10, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Ilwoong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implant system having grid assembly
- Patent number 9,741,894
- Issue date Aug 22, 2017
- Intevac, Inc.
- Babak Adibi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generator and thermal electron emitter
- Patent number 9,659,755
- Issue date May 23, 2017
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Masateru Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ control of ion angular distribution in a processing apparatus
- Patent number 9,620,335
- Issue date Apr 11, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grid for plasma ion implant
- Patent number 9,583,661
- Issue date Feb 28, 2017
- Intevac, Inc.
- Vinay Prabhakar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 9,570,274
- Issue date Feb 14, 2017
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implanter provided with a plurality of plasma source bodies
- Patent number 9,520,274
- Issue date Dec 13, 2016
- Ion Beam Services
- Frank Torregrosa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modified polysilazane film and method for producing gas barrier film
- Patent number 9,512,334
- Issue date Dec 6, 2016
- Lintec Corporation
- Satoshi Naganawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning of magnetic thin film using energized ions
- Patent number 9,263,078
- Issue date Feb 16, 2016
- Applied Materials, Inc.
- Steven Verhaverbeke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pinched plasma bridge flood gun for substrate charge neutralization
- Patent number 9,070,538
- Issue date Jun 30, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Ali Shajii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma grid implant system for use in solar cell fabrications
- Patent number 8,749,053
- Issue date Jun 10, 2014
- Intevac, Inc.
- Babak Adibi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for ion implant using grid assembly
- Patent number 8,697,552
- Issue date Apr 15, 2014
- Intevac, Inc.
- Babak Adibi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 8,637,411
- Issue date Jan 28, 2014
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Patterning of magnetic thin film using energized ions
- Patent number 8,535,766
- Issue date Sep 17, 2013
- Applied Materials, Inc.
- Steven Verhaverbeke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Shield Ring Mounting Using Compliant Hardware
- Publication number 20250014870
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Jordan B. Tye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...
- Publication number 20240371608
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Ryan Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM
- Publication number 20240145217
- Publication date May 2, 2024
- Applied Materials, Inc.
- Qintao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CO-DOPING TO CONTROL WET ETCH RATE OF FCVD OXIDE LAYERS
- Publication number 20240006158
- Publication date Jan 4, 2024
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ION PROCESSING OF SUBSTRATES
- Publication number 20220359163
- Publication date Nov 10, 2022
- Lifehouse Australia as Trustee for The Lifehouse Australia Trust
- David R. MCKENZIE
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
Extreme Edge Uniformity Control
- Publication number 20200243308
- Publication date Jul 30, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE ION IMPLANTATION SYSTEM WITH NON-TUNGSTEN MATERIALS AND ME...
- Publication number 20200194265
- Publication date Jun 18, 2020
- Entegris, Inc.
- Ying TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20190139783
- Publication date May 9, 2019
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Shunpei YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANT PLASMA FLOOD GUN PERFORMANCE BY USING TRACE IN SITU CLE...
- Publication number 20180337020
- Publication date Nov 22, 2018
- Entegris, Inc.
- Steven E. Bishop
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION FOR ION IMPLANTER
- Publication number 20180174807
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Tsung-Min LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF ION SOURCE WITH DYNAMIC VOLUME CONTROL
- Publication number 20180138020
- Publication date May 17, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping Using A Solid Dopant Source
- Publication number 20180130659
- Publication date May 10, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Siamak Salimian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE AREA ENERGETIC ION SOURCE
- Publication number 20180096823
- Publication date Apr 5, 2018
- INTEVAC, INC.
- Terry Bluck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Edge Uniformity Control
- Publication number 20180082824
- Publication date Mar 22, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPING METHOD, DOPING APPARATUS, AND SEMICONDUCTOR ELEMENT MANUFACT...
- Publication number 20180012763
- Publication date Jan 11, 2018
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANT SYSTEM HAVING GRID ASSEMBLY
- Publication number 20170345964
- Publication date Nov 30, 2017
- INTEVAC, INC.
- Babak Adibi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND TECHNIQUES FOR TIME MODULATED EXTRACTION OF AN ION BEAM
- Publication number 20170178866
- Publication date Jun 22, 2017
- Svetlana B. Radovanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION GENERATOR AND METHOD OF CONTROLLING ION GENRATOR
- Publication number 20170140898
- Publication date May 18, 2017
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Kawaguchi
- B08 - CLEANING
Information Patent Application
ION COLLECTOR FOR USE IN PLASMA SYSTEMS
- Publication number 20170076920
- Publication date Mar 16, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Otto CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Boron-Containing Dopant Compositions, Systems and Methods of Use Th...
- Publication number 20170032941
- Publication date Feb 2, 2017
- Praxair Technology, Inc.
- Ashwini K. Sinha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR AND THERMAL ELECTRON EMITTER
- Publication number 20160351379
- Publication date Dec 1, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Masateru Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
- Publication number 20160351398
- Publication date Dec 1, 2016
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-BASED MATERIAL MODIFICATION WITH NEUTRAL BEAM
- Publication number 20160233047
- Publication date Aug 11, 2016
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Daniel TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRID FOR PLASMA ION IMPLANT
- Publication number 20160204295
- Publication date Jul 14, 2016
- INTEVAC, INC.
- Vinay Prabhakar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU CONTROL OF ION ANGULAR DISTRIBUTION IN A PROCESSING APPARATUS
- Publication number 20160189935
- Publication date Jun 30, 2016
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANT SYSTEM HAVING GRID ASSEMBLY
- Publication number 20160181465
- Publication date Jun 23, 2016
- INTEVAC, INC.
- Babak Adibi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR ION IMPLANTATION
- Publication number 20160181070
- Publication date Jun 23, 2016
- ROTH & RAU AG
- UWE SCHEIT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE DELIVERY OF CHEMICAL REAGENTS
- Publication number 20160172164
- Publication date Jun 16, 2016
- Entegris, Inc.
- Joseph D. Sweeney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Method And Apparatus
- Publication number 20160111254
- Publication date Apr 21, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Plasma source implantation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Extreme edge uniformity control

Fluorine ion implantation system with non-tungsten materials and me...

Fluorine ion implantation method and system

Ion angle detector

Extraction apparatus and system for high throughput ion beam proces...

Extreme edge uniformity control

Ion implant system having grid assembly

Plasma doping using a solid dopant source

Ion generator and method of controlling ion generator

Plasma generation for ion implanter

RF ion source with dynamic volume control

Boron-containing dopant compositions, systems and methods of use th...

RF ion source with dynamic volume control

Multi-step ion implantation

RF detector with double balanced linear mixer and corresponding met...

Method for implementing low dose implant in a plasma system

Ion implant system having grid assembly

Plasma generator and thermal electron emitter

In situ control of ion angular distribution in a processing apparatus

Grid for plasma ion implant

Plasma activated conformal dielectric film deposition

Ion implanter provided with a plurality of plasma source bodies

Modified polysilazane film and method for producing gas barrier film

Patterning of magnetic thin film using energized ions

Pinched plasma bridge flood gun for substrate charge neutralization

Plasma grid implant system for use in solar cell fabrications

Method for ion implant using grid assembly

Plasma activated conformal dielectric film deposition

Patterning of magnetic thin film using energized ions

Patents Applicationslast 30 patents

Shield Ring Mounting Using Compliant Hardware

SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...

METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

CO-DOPING TO CONTROL WET ETCH RATE OF FCVD OXIDE LAYERS

PLASMA ION PROCESSING OF SUBSTRATES

Extreme Edge Uniformity Control

FLUORINE ION IMPLANTATION SYSTEM WITH NON-TUNGSTEN MATERIALS AND ME...

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

ION IMPLANT PLASMA FLOOD GUN PERFORMANCE BY USING TRACE IN SITU CLE...

PLASMA GENERATION FOR ION IMPLANTER

RF ION SOURCE WITH DYNAMIC VOLUME CONTROL

Plasma Doping Using A Solid Dopant Source

LARGE AREA ENERGETIC ION SOURCE

Extreme Edge Uniformity Control

DOPING METHOD, DOPING APPARATUS, AND SEMICONDUCTOR ELEMENT MANUFACT...

ION IMPLANT SYSTEM HAVING GRID ASSEMBLY

APPARATUS AND TECHNIQUES FOR TIME MODULATED EXTRACTION OF AN ION BEAM

ION GENERATOR AND METHOD OF CONTROLLING ION GENRATOR

ION COLLECTOR FOR USE IN PLASMA SYSTEMS

Boron-Containing Dopant Compositions, Systems and Methods of Use Th...

PLASMA GENERATOR AND THERMAL ELECTRON EMITTER

SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

PLASMA-BASED MATERIAL MODIFICATION WITH NEUTRAL BEAM

GRID FOR PLASMA ION IMPLANT

IN SITU CONTROL OF ION ANGULAR DISTRIBUTION IN A PROCESSING APPARATUS

ION IMPLANT SYSTEM HAVING GRID ASSEMBLY

DEVICE FOR ION IMPLANTATION

REMOTE DELIVERY OF CHEMICAL REAGENTS

Workpiece Processing Method And Apparatus