Plural frequencies

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CPC
H01J37/32165

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32165Plural frequencies

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Dual-frequency, direct-drive inductively coupled plasma source
- Patent number 12,165,841
- Issue date Dec 10, 2024
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 12,165,872
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 12,165,842
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching a material layer for semiconductor applications
- Patent number 12,165,877
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Zhigang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,154,793
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device
- Patent number 12,148,596
- Issue date Nov 19, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment device having matching box
- Patent number 12,131,885
- Issue date Oct 29, 2024
- ASM IP Holding B.V.
- Tomohiro Arakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,125,682
- Issue date Oct 22, 2024
- Semes Co., Ltd.
- Shant Arakelyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply apparatus
- Patent number 12,125,677
- Issue date Oct 22, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 12,125,679
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 12,119,207
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device
- Patent number 12,119,208
- Issue date Oct 15, 2024
- Daihen Corporation
- Yuya Ueno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distortion current mitigation in a radio frequency plasma processin...
- Patent number 12,106,938
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio-frequency power supply apparatus
- Patent number 12,068,132
- Issue date Aug 20, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 12,062,522
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Keiji Kitagaito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor having a variable coupling of low frequency RF power...
- Patent number 12,062,524
- Issue date Aug 13, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedback loop for controlling a pulsed voltage waveform
- Patent number 12,057,292
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,051,570
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and method for operating the same
- Patent number 12,046,451
- Issue date Jul 23, 2024
- Samsung Electronics Co., Ltd.
- Nam Kyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual frequency matching circuit for inductively coupled plasma (ICP...
- Patent number 12,040,159
- Issue date Jul 16, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,996,271
- Issue date May 28, 2024
- Tokyo Electron Limited
- Satoshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply system
- Patent number 11,990,317
- Issue date May 21, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber and chamber component cleaning methods
- Patent number 11,984,306
- Issue date May 14, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma control device and plasma processing system
- Patent number 11,984,297
- Issue date May 14, 2024
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming metal nitride films
- Patent number 11,978,625
- Issue date May 7, 2024
- Applied Materials, Inc.
- Joseph AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency tuning for modulated plasma systems
- Patent number 11,972,927
- Issue date Apr 30, 2024
- Advanced Energy Industries, Inc.
- Gideon van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling RF parameters at multiple fre...
- Patent number 11,956,883
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing power delivery to an electrode o...
- Patent number 11,908,660
- Issue date Feb 20, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,908,664
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Naohiko Okunishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR CARBON PLUG FORMATION
- Publication number 20240420927
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Daniela ANJOS RIGSBY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...
- Publication number 20240420929
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DETERMINING A PHASE DIFFERENCE BETWEEN RF S...
- Publication number 20240404789
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...
- Publication number 20240395503
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
- Publication number 20240395502
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, PLASMA PROCESSING...
- Publication number 20240371603
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ANOMALOUS PLASMA EVENT DETECTION AND MITIGATION IN SEMICONDUCTOR PR...
- Publication number 20240355600
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, POWER SYSTEM, CONTROL METHOD, AND STOR...
- Publication number 20240347320
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Plasma Control Method
- Publication number 20240339304
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP...
- Publication number 20240339298
- Publication date Oct 10, 2024
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240240320
- Publication date Jul 18, 2024
- SAMSUNG DISPLAY CO., LTD.
- Yong-Suk LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-STATE RF PULSING IN CYCLING RECIPES TO REDUCE CHARGING INDUCE...
- Publication number 20240242935
- Publication date Jul 18, 2024
- LAM RESEARCH CORPORATION
- He Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD
- Publication number 20240234094
- Publication date Jul 11, 2024
- Samsung Electronics Co., Ltd.
- Changho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS
- Publication number 20240234092
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-FREQUENCY POWER SUPPLY SYSTEM
- Publication number 20240222079
- Publication date Jul 4, 2024
- DAIHEN Corporation
- Yuichi HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, P...
- Publication number 20240222080
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Yuto KOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Plasma Processing
- Publication number 20240213005
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...
- Publication number 20240186112
- Publication date Jun 6, 2024
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHING NETWORK MODULE AND SUBSTRATE PROCESSING APPARATUS INCLUDIN...
- Publication number 20240177971
- Publication date May 30, 2024
- SEMES CO., LTD.
- Sung Suk WI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD
- Publication number 20240170258
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240170257
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS SYSTEM FOR MULTI-STATION
- Publication number 20240162006
- Publication date May 16, 2024
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS
- Publication number 20240154594
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240153742
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS
- Publication number 20240136154
- Publication date Apr 25, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD
- Publication number 20240136155
- Publication date Apr 25, 2024
- Samsung Electronics Co., Ltd.
- Changho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL APPARATUS AND METHOD USING THE SAME
- Publication number 20240128054
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Deposition of Thin Films with Improved Stability
- Publication number 20240110284
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Lulu XIONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of Thick Layers of Silicon Dioxide
- Publication number 20240096616
- Publication date Mar 21, 2024
- SPTS TECHNOLOGIES LIMITED
- Matt Edmonds
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240087849
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS

Plural frequencies

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Dual-frequency, direct-drive inductively coupled plasma source

Methods and systems for advanced ion control for etching processes

Control method and plasma processing apparatus

Methods for etching a material layer for semiconductor applications

Etching apparatus and etching method

High-frequency power supply device

Plasma treatment device having matching box

Substrate treating apparatus and substrate treating method

High-frequency power supply apparatus

Plasma processing apparatus and processing method

Apparatus for plasma processing

High-frequency power supply device

Distortion current mitigation in a radio frequency plasma processin...

Plasma processing apparatus and plasma processing method

Radio-frequency power supply apparatus

Plasma etching method and plasma etching apparatus

Plasma reactor having a variable coupling of low frequency RF power...

Feedback loop for controlling a pulsed voltage waveform

Plasma processing apparatus

Plasma etching apparatus and method for operating the same

Dual frequency matching circuit for inductively coupled plasma (ICP...

Plasma processing apparatus

High-frequency power supply system

Plasma chamber and chamber component cleaning methods

Plasma control device and plasma processing system

Methods of forming metal nitride films

Frequency tuning for modulated plasma systems

Methods and apparatus for controlling RF parameters at multiple fre...

Systems and methods for optimizing power delivery to an electrode o...

Plasma processing apparatus

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR CARBON PLUG FORMATION

EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...

SYSTEMS AND METHODS FOR DETERMINING A PHASE DIFFERENCE BETWEEN RF S...

Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...

FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM

PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, PLASMA PROCESSING...

ANOMALOUS PLASMA EVENT DETECTION AND MITIGATION IN SEMICONDUCTOR PR...

PLASMA PROCESSING APPARATUS, POWER SYSTEM, CONTROL METHOD, AND STOR...

Plasma Processing Apparatus and Plasma Control Method

Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MULTI-STATE RF PULSING IN CYCLING RECIPES TO REDUCE CHARGING INDUCE...

PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD

FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS

HIGH-FREQUENCY POWER SUPPLY SYSTEM

PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, P...

System and Method for Plasma Processing

SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...

MATCHING NETWORK MODULE AND SUBSTRATE PROCESSING APPARATUS INCLUDIN...

PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESS SYSTEM FOR MULTI-STATION

FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS

PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD

PLASMA CONTROL APPARATUS AND METHOD USING THE SAME

Selective Deposition of Thin Films with Improved Stability

Deposition of Thick Layers of Silicon Dioxide

PLASMA PROCESSING APPARATUS