Plural frequencies

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CPC
H01J37/32165

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32165Plural frequencies

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma generating device
- Patent number 12,354,838
- Issue date Jul 8, 2025
- EN2CORE TECHNOLOGY INC.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing power delivery to an electrode o...
- Patent number 12,354,840
- Issue date Jul 8, 2025
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,646
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Bongseong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-state RF pulsing to control mask shape and breaking selectivi...
- Patent number 12,322,571
- Issue date Jun 3, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anomalous plasma event detection and mitigation in semiconductor pr...
- Patent number 12,322,582
- Issue date Jun 3, 2025
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for use of low frequency harmonics in bias radi...
- Patent number 12,308,211
- Issue date May 20, 2025
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control for ion energy delivery using multiple generators a...
- Patent number 12,255,052
- Issue date Mar 18, 2025
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,249,487
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,249,486
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing methods using multiphase multifrequency bias pulses
- Patent number 12,217,935
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-state pulsing for achieving a balance between bow control and...
- Patent number 12,217,972
- Issue date Feb 4, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply apparatus
- Patent number 12,205,798
- Issue date Jan 21, 2025
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency generator
- Patent number 12,206,372
- Issue date Jan 21, 2025
- Comet AG
- Daniel Gruner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual RF for controllable film deposition
- Patent number 12,191,115
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,191,116
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency, direct-drive inductively coupled plasma source
- Patent number 12,165,841
- Issue date Dec 10, 2024
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 12,165,872
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 12,165,842
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching a material layer for semiconductor applications
- Patent number 12,165,877
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Zhigang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,154,793
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device
- Patent number 12,148,596
- Issue date Nov 19, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment device having matching box
- Patent number 12,131,885
- Issue date Oct 29, 2024
- ASM IP Holding B.V.
- Tomohiro Arakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,125,682
- Issue date Oct 22, 2024
- Semes Co., Ltd.
- Shant Arakelyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply apparatus
- Patent number 12,125,677
- Issue date Oct 22, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 12,125,679
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 12,119,207
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device
- Patent number 12,119,208
- Issue date Oct 15, 2024
- Daihen Corporation
- Yuya Ueno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distortion current mitigation in a radio frequency plasma processin...
- Patent number 12,106,938
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio-frequency power supply apparatus
- Patent number 12,068,132
- Issue date Aug 20, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GAP-FILLING METHOD FOR A SEMICONDUCTOR DEVICE AND METHOD OF MANUFAC...
- Publication number 20250233017
- Publication date Jul 17, 2025
- WONIK IPS CO., LTD.
- Chang Gyu SONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250232954
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Mitsuhiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250210331
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takumi IMAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode and Coil Configurations For Processing Chambers and Relat...
- Publication number 20250210304
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD
- Publication number 20250191883
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ryuta HIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process Control for Ion Energy Delivery Using Multiple Generators a...
- Publication number 20250191882
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND END POINT DETECTION METHOD
- Publication number 20250157787
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Masakazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250149296
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...
- Publication number 20250140565
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING EUV RESIST UNDERLAYER
- Publication number 20250130500
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Sudha RATHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20250118566
- Publication date Apr 10, 2025
- HITACHI HIGH-TECH CORPORATION
- Junya Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CENTRAL FREQUENCY TUNING
- Publication number 20250118534
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE
- Publication number 20250079121
- Publication date Mar 6, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PLASMA PROCESSING
- Publication number 20250069852
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250062101
- Publication date Feb 20, 2025
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20250014865
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR CARBON PLUG FORMATION
- Publication number 20240420927
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Daniela ANJOS RIGSBY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...
- Publication number 20240420929
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DETERMINING A PHASE DIFFERENCE BETWEEN RF S...
- Publication number 20240404789
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...
- Publication number 20240395503
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
- Publication number 20240395502
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, PLASMA PROCESSING...
- Publication number 20240371603
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ANOMALOUS PLASMA EVENT DETECTION AND MITIGATION IN SEMICONDUCTOR PR...
- Publication number 20240355600
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, POWER SYSTEM, CONTROL METHOD, AND STOR...
- Publication number 20240347320
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Plasma Control Method
- Publication number 20240339304
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP...
- Publication number 20240339298
- Publication date Oct 10, 2024
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240240320
- Publication date Jul 18, 2024
- SAMSUNG DISPLAY CO., LTD.
- Yong-Suk LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-STATE RF PULSING IN CYCLING RECIPES TO REDUCE CHARGING INDUCE...
- Publication number 20240242935
- Publication date Jul 18, 2024
- LAM RESEARCH CORPORATION
- He Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD
- Publication number 20240234094
- Publication date Jul 11, 2024
- Samsung Electronics Co., Ltd.
- Changho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS
- Publication number 20240234092
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS

Plural frequencies

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma generating device

Systems and methods for optimizing power delivery to an electrode o...

Plasma processing apparatus

Multi-state RF pulsing to control mask shape and breaking selectivi...

Anomalous plasma event detection and mitigation in semiconductor pr...

Systems and methods for use of low frequency harmonics in bias radi...

Process control for ion energy delivery using multiple generators a...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing methods using multiphase multifrequency bias pulses

Multi-state pulsing for achieving a balance between bow control and...

High-frequency power supply apparatus

Radio frequency generator

Dual RF for controllable film deposition

Plasma processing apparatus and plasma processing method

Dual-frequency, direct-drive inductively coupled plasma source

Methods and systems for advanced ion control for etching processes

Control method and plasma processing apparatus

Methods for etching a material layer for semiconductor applications

Etching apparatus and etching method

High-frequency power supply device

Plasma treatment device having matching box

Substrate treating apparatus and substrate treating method

High-frequency power supply apparatus

Plasma processing apparatus and processing method

Apparatus for plasma processing

High-frequency power supply device

Distortion current mitigation in a radio frequency plasma processin...

Plasma processing apparatus and plasma processing method

Radio-frequency power supply apparatus

Patents Applicationslast 30 patents

GAP-FILLING METHOD FOR A SEMICONDUCTOR DEVICE AND METHOD OF MANUFAC...

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

PLASMA PROCESSING APPARATUS

Electrode and Coil Configurations For Processing Chambers and Relat...

PLASMA PROCESSING APPARATUS, RF SYSTEM, AND RF CONTROL METHOD

Process Control for Ion Energy Delivery Using Multiple Generators a...

PLASMA PROCESSING APPARATUS AND END POINT DETECTION METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...

METHODS FOR FORMING EUV RESIST UNDERLAYER

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

SYSTEMS AND METHODS FOR CENTRAL FREQUENCY TUNING

DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE

METHOD FOR PLASMA PROCESSING

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

APPARATUS FOR PLASMA PROCESSING

SYSTEM AND METHOD FOR CARBON PLUG FORMATION

EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...

SYSTEMS AND METHODS FOR DETERMINING A PHASE DIFFERENCE BETWEEN RF S...

Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...

FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM

PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, PLASMA PROCESSING...

ANOMALOUS PLASMA EVENT DETECTION AND MITIGATION IN SEMICONDUCTOR PR...

PLASMA PROCESSING APPARATUS, POWER SYSTEM, CONTROL METHOD, AND STOR...

Plasma Processing Apparatus and Plasma Control Method

Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MULTI-STATE RF PULSING IN CYCLING RECIPES TO REDUCE CHARGING INDUCE...

PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD

FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS