Polarising the substrate

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CPC
H01J37/32706

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32706Polarising the substrate

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,191,121
- Issue date Jan 7, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,142,465
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Sho Hiraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of plasma sheath with bias supplies
- Patent number 12,142,460
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ real-time sensing and compensation of non-uniformities in s...
- Patent number 12,142,464
- Issue date Nov 12, 2024
- Lam Research Corporation
- Changyou Jing
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,136,535
- Issue date Nov 5, 2024
- Tokyo Electron Limited
- Tatsuro Ohshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotating biasable pedestal and electrostatic chuck in semiconductor...
- Patent number 12,112,972
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,112,925
- Issue date Oct 8, 2024
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,087,556
- Issue date Sep 10, 2024
- Kioxia Corporation
- Yosuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective etch using material modification and RF pulsing
- Patent number 12,057,329
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Bhargav Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,908,664
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Naohiko Okunishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,842,884
- Issue date Dec 12, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having a function of tuning low frequency RF power d...
- Patent number 11,830,747
- Issue date Nov 28, 2023
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma flood gun for charged particle apparatus
- Patent number 11,830,705
- Issue date Nov 28, 2023
- Ximan Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses and methods for avoiding electrical breakdown from RF t...
- Patent number 11,784,027
- Issue date Oct 10, 2023
- Lam Research Corporation
- Hyungjoon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, electrostatic attraction method, and e...
- Patent number 11,764,038
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma flood gun for charged particle apparatus
- Patent number 11,735,398
- Issue date Aug 22, 2023
- Ximan Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 11,728,124
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck device
- Patent number 11,664,261
- Issue date May 30, 2023
- Sumitomo Osaka Cement Co., Ltd.
- Mamoru Kosakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 11,664,233
- Issue date May 30, 2023
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method, and apparatus for controlling ion energy distributi...
- Patent number 11,615,941
- Issue date Mar 28, 2023
- Advanced Energy Industries, Inc.
- Victor Brouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and etching method
- Patent number 11,562,887
- Issue date Jan 24, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,501,958
- Issue date Nov 15, 2022
- Tokyo Electron Limited
- Naohiko Okunishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter device and plasma processing apparatus
- Patent number 11,495,443
- Issue date Nov 8, 2022
- Tokyo Electron Limited
- Naohiko Okunishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,437,221
- Issue date Sep 6, 2022
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,424,108
- Issue date Aug 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,398,371
- Issue date Jul 26, 2022
- HITACHI HIGH-TECH CORPORATION
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with electrode assembly for moving substrate
- Patent number 11,355,321
- Issue date Jun 7, 2022
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,315,792
- Issue date Apr 26, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,282,677
- Issue date Mar 22, 2022
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250022684
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Tatsuro OHSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...
- Publication number 20250022745
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTI...
- Publication number 20240071721
- Publication date Feb 29, 2024
- Advanced Energy Industries, Inc.
- Victor Brouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND METHODS FOR AVOIDING ELECTRICAL BREAKDOWN FROM RF T...
- Publication number 20230420218
- Publication date Dec 28, 2023
- LAM RESEARCH CORPORATION
- Hyungjoon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20230395354
- Publication date Dec 7, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Creating Ion Energy Distribution Functions (IEDF)
- Publication number 20230352264
- Publication date Nov 2, 2023
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20230116058
- Publication date Apr 13, 2023
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230072102
- Publication date Mar 9, 2023
- TOKYO ELECTRON LIMITED
- Sho HIRAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230057937
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Naohiko OKUNISHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILTER DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20230031368
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Naohiko OKUNISHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220359172
- Publication date Nov 10, 2022
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20220285131
- Publication date Sep 8, 2022
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCH TOOL FOR HIGH ASPECT RATIO ETCHING
- Publication number 20220165546
- Publication date May 26, 2022
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND METHODS FOR AVOIDING ELECTRICAL BREAKDOWN FROM RF T...
- Publication number 20220139670
- Publication date May 5, 2022
- LAM RESEARCH CORPORATION
- Hyungjoon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220139678
- Publication date May 5, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Controlling Electrostatic Attractor and Plasma Processin...
- Publication number 20220093407
- Publication date Mar 24, 2022
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- B08 - CLEANING
Information Patent Application
PLASMA FLOOD GUN FOR CHARGED PARTICLE APPARATUS
- Publication number 20220059326
- Publication date Feb 24, 2022
- PIE Scientific LLC
- Ximan Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220028665
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20210358758
- Publication date Nov 18, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20210343496
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210319986
- Publication date Oct 14, 2021
- Toshiba Memory Corporation
- Yosuke SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPPORT UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20210280398
- Publication date Sep 9, 2021
- SEMES CO., LTD.
- Seungjun Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20210241996
- Publication date Aug 5, 2021
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, ELECTROSTATIC ATTRACTION METHOD, AND E...
- Publication number 20210074522
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20210005428
- Publication date Jan 7, 2021
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC BIAS CIRCUIT AND GAS DELIVERY SYSTEM FOR SUBSTRATE PROCESSING SY...
- Publication number 20200332418
- Publication date Oct 22, 2020
- LAM RESEARCH CORPORATION
- Arul Dhas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20200266022
- Publication date Aug 20, 2020
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND METHODS FOR AVOIDING ELECTRICAL BREAKDOWN FROM RF T...
- Publication number 20200251307
- Publication date Aug 6, 2020
- LAM RESEARCH CORPORATION
- Hyungjoon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200234924
- Publication date Jul 23, 2020
- Hitachi High-Technologies Corporation
- Kenetsu YOKOGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Controlling Electrostatic Attractor and Plasma Processin...
- Publication number 20200234931
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- B08 - CLEANING

Polarising the substrate

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus

Spatial control of plasma processing environments

Plasma processing method and plasma processing apparatus

Control of plasma sheath with bias supplies

In situ real-time sensing and compensation of non-uniformities in s...

Plasma processing apparatus and plasma processing method

Rotating biasable pedestal and electrostatic chuck in semiconductor...

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Selective etch using material modification and RF pulsing

Plasma processing apparatus

Spatial monitoring and control of plasma processing environments

Plasma reactor having a function of tuning low frequency RF power d...

Plasma flood gun for charged particle apparatus

Apparatuses and methods for avoiding electrical breakdown from RF t...

Plasma processing apparatus, electrostatic attraction method, and e...

Plasma flood gun for charged particle apparatus

Creating ion energy distribution functions (IEDF)

Electrostatic chuck device

Method for releasing sample and plasma processing apparatus using same

System, method, and apparatus for controlling ion energy distributi...

Plasma processing apparatus and etching method

Plasma processing apparatus

Filter device and plasma processing apparatus

Spatial monitoring and control of plasma processing environments

Plasma processing apparatus

Plasma processing apparatus

Plasma reactor with electrode assembly for moving substrate

Plasma processing apparatus and plasma processing method

Spatial monitoring and control of plasma processing environments

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...

SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTI...

APPARATUSES AND METHODS FOR AVOIDING ELECTRICAL BREAKDOWN FROM RF T...

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

Creating Ion Energy Distribution Functions (IEDF)

SPATIAL CONTROL OF PLASMA PROCESSING ENVIRONMENTS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

FILTER DEVICE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

PLASMA ETCH TOOL FOR HIGH ASPECT RATIO ETCHING

APPARATUSES AND METHODS FOR AVOIDING ELECTRICAL BREAKDOWN FROM RF T...

PLASMA PROCESSING APPARATUS

Method for Controlling Electrostatic Attractor and Plasma Processin...

PLASMA FLOOD GUN FOR CHARGED PARTICLE APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUPPORT UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

PLASMA PROCESSING APPARATUS, ELECTROSTATIC ATTRACTION METHOD, AND E...

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

DC BIAS CIRCUIT AND GAS DELIVERY SYSTEM FOR SUBSTRATE PROCESSING SY...

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

APPARATUSES AND METHODS FOR AVOIDING ELECTRICAL BREAKDOWN FROM RF T...

PLASMA PROCESSING APPARATUS

Method for Controlling Electrostatic Attractor and Plasma Processin...