Polyamide or polyurethane

Industry

CPC
Y10S430/107

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/107Polyamide or polyurethane

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Aromatic diamines containing three ether-linked-benzonitrile moieti...
- Patent number 9,139,696
- Issue date Sep 22, 2015
- The United States of America, as represented by the Secretary of the Air Force
- Loon-Seng Tan
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive polyimides
- Patent number 8,932,801
- Issue date Jan 13, 2015
- Eternal Chemical Co., Ltd.
- Meng-Yen Chou
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive composition, planographic printing plate precursor,...
- Patent number 8,927,195
- Issue date Jan 6, 2015
- FUJIFILM Corporation
- Yoshinori Taguchi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 8,911,928
- Issue date Dec 16, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-type photosensitive resin composition, pattern forming met...
- Patent number 8,871,422
- Issue date Oct 28, 2014
- Hitachi Chemical DuPont Microsystems Ltd.
- Tomonori Minegishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive modified polyimide resin composition and use thereof
- Patent number 8,859,170
- Issue date Oct 14, 2014
- PI R&D Co., Ltd
- Toshiyuki Goshima
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Positive photosensitive resin composition, and display device and o...
- Patent number 8,735,029
- Issue date May 27, 2014
- Cheil Industries Inc.
- Eun-Kyung Yoon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative photosensitive material, photosensitive board employing th...
- Patent number 8,728,705
- Issue date May 20, 2014
- Nitto Denko Corporation
- Katsutoshi Hirashima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photosensitive resin composition
- Patent number 8,703,367
- Issue date Apr 22, 2014
- Cheil Industries Inc.
- Hyun-Yong Cho
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
8691480
- Patent number 8,691,480
- Issue date Apr 8, 2014
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photo-curable resin composition, pattern forming method and substra...
- Patent number 8,673,537
- Issue date Mar 18, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Furuya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polyimide-based polymers, copolymers thereof and positive type phot...
- Patent number 8,669,038
- Issue date Mar 11, 2014
- LG Chem, Ltd.
- Chan Hyo Park
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photosensitive resin composition
- Patent number 8,568,954
- Issue date Oct 29, 2013
- Cheil Industries Inc.
- Doo-Young Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive polymer composition, method of forming relief patter...
- Patent number 8,304,149
- Issue date Nov 6, 2012
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Polyimide-based polymers, copolymers thereof and positive type phot...
- Patent number 8,257,901
- Issue date Sep 4, 2012
- LG Chem, Ltd.
- Sang Woo Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive resin composition
- Patent number 8,198,002
- Issue date Jun 12, 2012
- Cheil Industries Inc.
- Doo-Young Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic-printing plate precursor and image forming method usin...
- Patent number 8,119,326
- Issue date Feb 21, 2012
- Eastman Kodak Company
- Masamichi Kamiya
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Heat-sensitive positive-working lithographic printing plate precursor
- Patent number 8,110,338
- Issue date Feb 7, 2012
- Agfa Graphics NV
- Johan Loccufier
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method for formation of miniaturized pattern and resist substrate t...
- Patent number 8,101,333
- Issue date Jan 24, 2012
- AZ Electronic Materials USA Corp.
- Go Noya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, resin for use in the resist composition, compou...
- Patent number 8,053,161
- Issue date Nov 8, 2011
- FUJIFILM Corporation
- Kenji Wada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Curable composition, image forming material, and planographic print...
- Patent number 7,989,140
- Issue date Aug 2, 2011
- FUJIFILM Corporation
- Shigefumi Kanchiku
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
(Meth)acrylamide derivative, polymer, chemically amplified photosen...
- Patent number 7,939,241
- Issue date May 10, 2011
- NEC Corporation
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymerizable composition and planographic printing plate precursor
- Patent number 7,883,827
- Issue date Feb 8, 2011
- FUJIFILM Corporation
- Atsushi Sugasaki
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photosensitive polymer composition, method of forming relief patter...
- Patent number 7,851,128
- Issue date Dec 14, 2010
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Heat-sensitive transfer image-receiving sheet and coating compositi...
- Patent number 7,820,359
- Issue date Oct 26, 2010
- FUJIFILM Corporation
- Toshihide Yoshitani
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Lithographic printing plate precursor
- Patent number 7,811,742
- Issue date Oct 12, 2010
- FUJIFILM Corporation
- Yoshinori Taguchi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Heat-sensitive transfer image-receiving sheet and coating compositi...
- Patent number 7,807,330
- Issue date Oct 5, 2010
- FUJIFILM Corporation
- Toshihide Yoshitani
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Ink composition, ink jet recording method, method for producing pla...
- Patent number 7,741,380
- Issue date Jun 22, 2010
- FUJIFILM Corporation
- Ippei Nakamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymerizable composition and planographic printing plate precursor...
- Patent number 7,741,011
- Issue date Jun 22, 2010
- Fujifilm Corporation
- Tetsunori Matsushita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerizable composition and lithographic printing plate precursor
- Patent number 7,645,565
- Issue date Jan 12, 2010
- FUJIFILM Corporation
- Atsushi Sugasaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR,...
- Publication number 20140134540
- Publication date May 15, 2014
- FUJIFILM CORPORATION
- Yoshinori TAGUCHI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Positive Photosensitive Resin Composition, and Display Device and O...
- Publication number 20130171564
- Publication date Jul 4, 2013
- CHEIL INDUSTRIES INC.
- Eun-Kyung YOON
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20120308928
- Publication date Dec 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POLYIMIDE-BASED POLYMERS, COPOLYMERS THEREOF AND POSITIVE TYPE PHOT...
- Publication number 20120301826
- Publication date Nov 29, 2012
- Chan Hyo Park
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PHOTOSENSITIVE MODIFIED POLYIMIDE RESIN COMPOSITION AND USE THEREOF
- Publication number 20120097435
- Publication date Apr 26, 2012
- PI R&D CO., LTD.
- Toshiyuki Goshima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive Photosensitive Resin Composition
- Publication number 20110171578
- Publication date Jul 14, 2011
- CHEIL INDUSTRIES INC.
- Hyun-Yong CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MET...
- Publication number 20110171436
- Publication date Jul 14, 2011
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Tomonori MINEGISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO-CURABLE RESIN COMPOSITION, PATTERN FORMING METHOD AND SUBSTRA...
- Publication number 20110143103
- Publication date Jun 16, 2011
- Masahiro Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING RELIEF PATTER...
- Publication number 20110076458
- Publication date Mar 31, 2011
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Positive photosensitive resin composition
- Publication number 20110003248
- Publication date Jan 6, 2011
- CHEIL INDUSTRIES INC.
- Doo-Young JUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PHOTOSENSITIVE MATERIAL, PHOTOSENSITIVE BOARD EMPLOYING TH...
- Publication number 20100304298
- Publication date Dec 2, 2010
- Nitto Denko Corporation
- Katsutoshi Hirashima
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
POLYIMIDE-BASED POLYMERS, COPOLYMERS THEREOF AND POSITIVE TYPE PHOT...
- Publication number 20100233618
- Publication date Sep 16, 2010
- Sang Woo KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive Photosensitive Resin Composition
- Publication number 20100099043
- Publication date Apr 22, 2010
- Cheil Industries Inc.
- Doo-Young JUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for formation of miniaturized pattern and resist substrate t...
- Publication number 20100021700
- Publication date Jan 28, 2010
- Go Noya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC-PRINTING PLATE PRECURSOR AND IMAGE FORMING METHOD USIN...
- Publication number 20090208869
- Publication date Aug 20, 2009
- Masamichi Kamiya
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MET...
- Publication number 20090181224
- Publication date Jul 16, 2009
- HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD.
- Tomonori Minegishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE POLYIMIDES
- Publication number 20090181324
- Publication date Jul 16, 2009
- ETERNAL CHEMICAL CO., LTD.
- MENG-YEN CHOU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HEAT-SENSITIVE POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR
- Publication number 20090170028
- Publication date Jul 2, 2009
- AGFA GRAPHICS NV
- Johan Loccufier
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
POLYMERIZABLE COMPOSITION AND PLANOGRAPHIC PRINTING PLATE PRECURSOR...
- Publication number 20090087785
- Publication date Apr 2, 2009
- FUJIFILM Corporation
- Tetsunori MATSUSHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CURABLE COMPOSITION, IMAGE FORMING MATERIAL, AND PLANOGRAPHIC PRINT...
- Publication number 20090075206
- Publication date Mar 19, 2009
- FUJIFILM CORPORATION
- Shigefumi KANCHIKU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
(Meth) acrylamide derivative, polymer, chemically amplified photose...
- Publication number 20090068587
- Publication date Mar 12, 2009
- NEC Corporation
- Katsumi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERIZABLE COMPOSITION AND LITHOGRAPHIC PRINTING PLATE PRECURSOR
- Publication number 20090053653
- Publication date Feb 26, 2009
- FUJIFILM CORPORATION
- Atsushi Sugasaki
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSOR
- Publication number 20080268372
- Publication date Oct 30, 2008
- FUJIFILM CORPORATION
- Yoshinori TAGUCHI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
HEAT-SENSITIVE TRANSFER IMAGE-RECEIVING SHEET AND COATING COMPOSITI...
- Publication number 20080090178
- Publication date Apr 17, 2008
- FUJIFILM CORPORATION
- Toshihide Yoshitani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOU...
- Publication number 20080081290
- Publication date Apr 3, 2008
- FUJIFILM CORPORATION
- Kenji Wada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HEAT-SENSITIVE TRANSFER IMAGE-RECEIVING SHEET AND COATING COMPOSITI...
- Publication number 20080081765
- Publication date Apr 3, 2008
- FUJIFILM CORPORATION
- Toshihide Yoshitani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MAT...
- Publication number 20080070152
- Publication date Mar 20, 2008
- Jianfei Yu
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Polyimide resin soluble in aqueous alkaline solution, composition c...
- Publication number 20080057446
- Publication date Mar 6, 2008
- Shin-Etsu Chemical Co., Ltd.
- Tomoyuki Goto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resin composition and thermo/photosensitive composition
- Publication number 20080044763
- Publication date Feb 21, 2008
- FUJIFILM Corporation
- Kazuhiro Fujimaki
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Negative-working radiation-sensitive compositions and imageable mat...
- Publication number 20070275322
- Publication date Nov 29, 2007
- Eastman Kodak Company
- Ting Tao
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Polyamide or polyurethane

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Aromatic diamines containing three ether-linked-benzonitrile moieti...

Photosensitive polyimides

Photosensitive composition, planographic printing plate precursor,...

Resist composition, method of forming resist pattern, polymeric com...

Negative-type photosensitive resin composition, pattern forming met...

Photosensitive modified polyimide resin composition and use thereof

Positive photosensitive resin composition, and display device and o...

Negative photosensitive material, photosensitive board employing th...

Positive photosensitive resin composition

8691480

Photo-curable resin composition, pattern forming method and substra...

Polyimide-based polymers, copolymers thereof and positive type phot...

Positive photosensitive resin composition

Photosensitive polymer composition, method of forming relief patter...

Polyimide-based polymers, copolymers thereof and positive type phot...

Positive photosensitive resin composition

Lithographic-printing plate precursor and image forming method usin...

Heat-sensitive positive-working lithographic printing plate precursor

Method for formation of miniaturized pattern and resist substrate t...

Resist composition, resin for use in the resist composition, compou...

Curable composition, image forming material, and planographic print...

(Meth)acrylamide derivative, polymer, chemically amplified photosen...

Polymerizable composition and planographic printing plate precursor

Photosensitive polymer composition, method of forming relief patter...

Heat-sensitive transfer image-receiving sheet and coating compositi...

Lithographic printing plate precursor

Heat-sensitive transfer image-receiving sheet and coating compositi...

Ink composition, ink jet recording method, method for producing pla...

Polymerizable composition and planographic printing plate precursor...

Polymerizable composition and lithographic printing plate precursor

Patents Applicationslast 30 patents

PHOTOSENSITIVE COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR,...

Positive Photosensitive Resin Composition, and Display Device and O...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

POLYIMIDE-BASED POLYMERS, COPOLYMERS THEREOF AND POSITIVE TYPE PHOT...

PHOTOSENSITIVE MODIFIED POLYIMIDE RESIN COMPOSITION AND USE THEREOF

Positive Photosensitive Resin Composition

NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MET...

PHOTO-CURABLE RESIN COMPOSITION, PATTERN FORMING METHOD AND SUBSTRA...

PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING RELIEF PATTER...

Positive photosensitive resin composition

NEGATIVE PHOTOSENSITIVE MATERIAL, PHOTOSENSITIVE BOARD EMPLOYING TH...

POLYIMIDE-BASED POLYMERS, COPOLYMERS THEREOF AND POSITIVE TYPE PHOT...

Positive Photosensitive Resin Composition

Method for formation of miniaturized pattern and resist substrate t...

LITHOGRAPHIC-PRINTING PLATE PRECURSOR AND IMAGE FORMING METHOD USIN...

NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MET...

PHOTOSENSITIVE POLYIMIDES

HEAT-SENSITIVE POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR

POLYMERIZABLE COMPOSITION AND PLANOGRAPHIC PRINTING PLATE PRECURSOR...

CURABLE COMPOSITION, IMAGE FORMING MATERIAL, AND PLANOGRAPHIC PRINT...

(Meth) acrylamide derivative, polymer, chemically amplified photose...

POLYMERIZABLE COMPOSITION AND LITHOGRAPHIC PRINTING PLATE PRECURSOR

LITHOGRAPHIC PRINTING PLATE PRECURSOR

HEAT-SENSITIVE TRANSFER IMAGE-RECEIVING SHEET AND COATING COMPOSITI...

RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOU...

HEAT-SENSITIVE TRANSFER IMAGE-RECEIVING SHEET AND COATING COMPOSITI...

NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MAT...

Polyimide resin soluble in aqueous alkaline solution, composition c...

Resin composition and thermo/photosensitive composition

Negative-working radiation-sensitive compositions and imageable mat...